Quantum dot and method for manufacturing the same

    公开(公告)号:US10669477B2

    公开(公告)日:2020-06-02

    申请号:US15806995

    申请日:2017-11-08

    Abstract: A method for manufacturing a quantum dot and a quantum dot are provided. The method includes adding a core semiconductor precursor solution into a seed composition solution. The seed composition solution includes a seed composition, and the seed composition is a dendrimer-metal nanoparticle composite. The core semiconductor precursor solution includes a first semiconductor ion and a second semiconductor ion. The method also includes carrying out a first synthesis reaction to form a core semiconductor material wrapping the seed composition. The core semiconductor material is formed by combining the first semiconductor ion with the second semiconductor ion.

    COATING, METHOD FOR MANUFACTURING THE COATING AND FILM FORMED BY THE COATING
    5.
    发明申请
    COATING, METHOD FOR MANUFACTURING THE COATING AND FILM FORMED BY THE COATING 有权
    涂料,制造涂料和由涂料形成的膜的方法

    公开(公告)号:US20140147649A1

    公开(公告)日:2014-05-29

    申请号:US13893668

    申请日:2013-05-14

    Abstract: A coating includes an organosiloxane polymer and a mesoporous silica material bonded with the organosiloxane polymer. A monomer of the organosiloxane polymer is and the surface of the mesoporous silica material includes a hydrophilic group. A method for manufacturing the coating includes the following steps. Provide an organosiloxane polymer polymerized from a plurality of organosiloxanes including a terminal functional group. Provide a mesoporous silica precursor including a surface functional group. The organosiloxane polymer and the mesoporous silica precursor are blended in a solution, so that the surface functional group reacts with the terminal functional group to form a bond, and a mesoporous silica material is formed, as well as the surface of the mesoporous silica material includes a hydrophilic group. A film including a thickness of 0.1-500 μm is formed by the coating.

    Abstract translation: 涂层包括与有机硅氧烷聚合物结合的有机硅氧烷聚合物和介孔二氧化硅材料。 有机硅氧烷聚合物的单体是介孔二氧化硅材料的表面包括亲水基团。 涂布方法包括以下步骤。 提供从包括末端官能团的多个有机硅氧烷聚合的有机硅氧烷聚合物。 提供包含表面官能团的介孔二氧化硅前体。 将有机硅氧烷聚合物和介孔二氧化硅前体混合在溶液中,使得表面官能团与末端官能团反应形成键,形成介孔二氧化硅材料,并且介孔二氧化硅材料的表面包括 亲水基团。 通过涂层形成厚度为0.1-500μm的膜。

Patent Agency Ranking