公开(公告)号：US20140311408A1

公开(公告)日：2014-10-23

申请号：US14321198

申请日：2014-07-01

Applicant: Intermolecular, Inc.

Inventor： Indranil De ,  Rick Endo ,  James Tsung ,  Kurt Weiner ,  Maosheng Zhao

IPC: C23C16/455

CPC classification number: C23C16/45565 ,  B05B14/30 ,  B05B16/80 ,  B05D1/10 ,  B05D1/62 ,  C23C16/4412 ,  C23C16/45589 ,  C23C16/4584 ,  C23C16/4585 ,  C23C16/4587 ,  C23C16/50 ,  Y10S438/942

Abstract: The various embodiments of the invention provide for relative movement of the substrate and a process head to access the entire wafer in a minimal space to conduct combinatorial processing on various regions of the substrate. The heads enable site isolated processing within the chamber described and method of using the same are described.

Abstract translation: 本发明的各种实施例提供了基板和工艺头在最小空间中访问整个晶片的相对运动，以在基板的各个区域上进行组合处理。 这些头使得所描述的室内的现场隔离处理和使用其的方法被描述。

公开(公告)号：US20140166840A1

公开(公告)日：2014-06-19

申请号：US13716044

申请日：2012-12-14

Applicant: INTERMOLECULAR, INC.

Inventor： Wayne R. French ,  Kent Riley Child ,  Alonzo T. Collins ,  Jay B. Dedontney ,  Richard R. Endo ,  Aaron T. Francis ,  Zachary Fresco ,  Edward L. Haywood ,  Ashley David Lacey ,  Monica Sawkar Mathur ,  James Tsung ,  Danny Wang ,  Kenneth A. Williams ,  Maosheng Zhao

IPC: H01L21/687

CPC classification number: H01L21/68728 ,  H01L21/68757

Abstract: A substrate carrier is provided. The substrate carrier includes a base for supporting a substrate. A plurality of support tabs is affixed to a surface of the base. The plurality of support tabs have a cavity defined within an inner region of each support tab of the plurality of support tabs. A plurality of protrusions extends from the surface of the base, wherein one of the plurality of protrusions mates with one cavity to support one of the plurality of support tabs. A film is deposited over the surface of the base, surfaces of the plurality of support tabs and surfaces of the plurality of protrusions.

Abstract translation: 提供衬底载体。 衬底载体包括用于支撑衬底的基底。 多个支撑片固定到基座的表面上。 多个支撑突片具有限定在多个支撑突片中的每个支撑突片的内部区域内的空腔。 多个突起从基座的表面延伸，其中多个突起中的一个与一个空腔配合，以支撑多个支撑突片中的一个。 薄膜沉积在基底的表面上，多个支撑突片的表面和多个突起的表面。

公开(公告)号：US20150093898A1

公开(公告)日：2015-04-02

申请号：US14562952

申请日：2014-12-08

Applicant: Intermolecular, Inc.

Inventor： Rick Endo ,  Jeremy Cheng ,  Indranil De ,  James Tsung ,  Kurt Weiner ,  Maosheng Zhao

IPC: H01L21/3205

CPC classification number: H01L21/32051 ,  B01J19/0046 ,  B01J2219/0043 ,  B01J2219/00536 ,  B01J2219/00596 ,  B01J2219/00659 ,  B01J2219/00745 ,  B01J2219/00756 ,  C23C14/042 ,  C23C14/50 ,  C23C14/548 ,  C23C16/45544 ,  H01L21/67005 ,  H01L21/6719

Abstract: A combinatorial processing chamber is provided. The combinatorial processing chamber is configured to isolate a radial portion of a rotatable substrate support, which in turn is configured to support a substrate. The chamber includes a plurality of clusters process heads in one embodiment. An insert having a base plate disposed between the substrate support and the process heads defines a confinement region for a deposition process in one embodiment. The base plate has an opening to enable access of the deposition material to the substrate. Through rotation of the substrate and movement of the opening, multiple regions of the substrate are accessible for performing combinatorial processing on a single substrate.

Abstract translation: 提供组合处理室。 组合处理室被配置为隔离可旋转的衬底支撑件的径向部分，该可旋转衬底支撑件又被配置为支撑衬底。 在一个实施例中，腔室包括多个聚集过程头。 在一个实施例中，具有设置在基板支撑件和工艺头之间的基板的插入件限定了用于沉积工艺的约束区域。 基板具有能够将沉积材料接近基板的开口。 通过基板的旋转和开口的移动，基板的多个区域是可访问的，以在单个基板上执行组合处理。