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公开(公告)号：US08575021B2
公开(公告)日：2013-11-05
申请号：US13829290
申请日：2013-03-14
Applicant: Intermolecular, Inc.
Inventor： Thomas R. Boussie , Tony P. Chiang , Anh Duong , Zachary Fresco , Nitin Kumar , Chi-I Lang , Sandra G. Malhotra , Jinhong Tong
IPC: H01L21/31 , H01L21/312 , H01L21/32
CPC classification number: H01L21/02112 , H01L21/02123 , H01L21/3105 , H01L21/321 , H01L21/76834 , H01L21/7685
Abstract: Methods for substrate processing are described. The methods include forming a material layer on a substrate. The methods include selecting constituents of a molecular masking layer (MML) to remove an effect of variations in the material layer as a result of substrate processing. The methods include normalizing the surface characteristics of the material layer by selectively depositing the MML on the material layer.
Abstract translation: 描述基板处理方法。 所述方法包括在基底上形成材料层。 所述方法包括选择分子屏蔽层（MML）的成分以消除作为衬底处理的结果的材料层中的变化的影响。 所述方法包括通过在材料层上选择性地沉积MML来使材料层的表面特性归一化。
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公开(公告)号：US20150104360A1
公开(公告)日：2015-04-16
申请号：US14573872
申请日：2014-12-17
Applicant: Intermolecular, Inc.
Inventor： Zachary Fresco , Rich Endo
CPC classification number: B01J19/0053 , B01J2219/00353 , B01J2219/00418 , B01J2219/00495 , H01L21/67023 , H01L21/67051 , H01L21/6708
Abstract: A reactor assembly having a plurality of reaction chambers defined therein is provided. The reactor assembly includes a fluid flow module that provides a pressurized control flow of fluid from an open container. In another embodiment, the reactor block includes a plurality of passageways defined over a surface of a substrate to accommodate the combinatorial processing in order to obtain multiple data points from a single substrate.
Abstract translation: 提供了具有限定在其中的多个反应室的反应器组件。 反应器组件包括流体流动模块，其提供来自开放容器的流体的加压控制流。 在另一个实施例中，反应器块包括限定在衬底的表面上的多个通道，以适应组合处理，以便从单个衬底获得多个数据点。
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公开(公告)号：US20140166840A1
公开(公告)日：2014-06-19
申请号：US13716044
申请日：2012-12-14
Applicant: INTERMOLECULAR, INC.
Inventor： Wayne R. French , Kent Riley Child , Alonzo T. Collins , Jay B. Dedontney , Richard R. Endo , Aaron T. Francis , Zachary Fresco , Edward L. Haywood , Ashley David Lacey , Monica Sawkar Mathur , James Tsung , Danny Wang , Kenneth A. Williams , Maosheng Zhao
IPC: H01L21/687
CPC classification number: H01L21/68728 , H01L21/68757
Abstract: A substrate carrier is provided. The substrate carrier includes a base for supporting a substrate. A plurality of support tabs is affixed to a surface of the base. The plurality of support tabs have a cavity defined within an inner region of each support tab of the plurality of support tabs. A plurality of protrusions extends from the surface of the base, wherein one of the plurality of protrusions mates with one cavity to support one of the plurality of support tabs. A film is deposited over the surface of the base, surfaces of the plurality of support tabs and surfaces of the plurality of protrusions.
Abstract translation: 提供衬底载体。 衬底载体包括用于支撑衬底的基底。 多个支撑片固定到基座的表面上。 多个支撑突片具有限定在多个支撑突片中的每个支撑突片的内部区域内的空腔。 多个突起从基座的表面延伸，其中多个突起中的一个与一个空腔配合，以支撑多个支撑突片中的一个。 薄膜沉积在基底的表面上，多个支撑突片的表面和多个突起的表面。
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公开(公告)号：US20130217238A1
公开(公告)日：2013-08-22
申请号：US13829290
申请日：2013-03-14
Applicant: Intermolecular, Inc.
Inventor： Thomas R. Boussie , Tony P. Chiang , Anh Duong , Zachary Fresco , Nitin Kumar , Chi-I Lang , Sandra G. Malhotra , Jinhong Tong
IPC: H01L21/02
CPC classification number: H01L21/02112 , H01L21/02123 , H01L21/3105 , H01L21/321 , H01L21/76834 , H01L21/7685
Abstract: Methods for substrate processing are described. The methods include forming a material layer on a substrate. The methods include selecting constituents of a molecular masking layer (MML) to remove an effect of variations in the material layer as a result of substrate processing. The methods include normalizing the surface characteristics of the material layer by selectively depositing the MML on the material layer.
Abstract translation: 描述基板处理方法。 所述方法包括在基底上形成材料层。 所述方法包括选择分子屏蔽层（MML）的成分以消除作为衬底处理的结果的材料层中的变化的影响。 所述方法包括通过在材料层上选择性地沉积MML来使材料层的表面特性归一化。
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