Water ski rack
    2.
    发明授权
    Water ski rack 失效
    滑水架

    公开(公告)号:US4582015A

    公开(公告)日:1986-04-15

    申请号:US653672

    申请日:1984-09-21

    Inventor: James A. Hunter

    CPC classification number: B63B35/85

    Abstract: A ski rack for supporting water skis in a position outboard one side of a water ski tow boat. A pair of support members are held in sockets which can be clamped to portions of the hull of the boat on the inboard side of the gunwale. Arms which are part of the support members extend at a downward slope outside the hull of the boat, and pairs of fingers which are coated with a protective plastic layer extend upwardly generally vertically from the arms, to hold water skis securely between the fingers, out of the way of passengers in the boat and out of the line of sight between the operator of the boat and a water skier being towed.

    Abstract translation: 一个滑雪架,用于在水滑道拖船的一侧支撑滑水板。 一对支撑构件被保持在插座中,该插座可以被夹在船舷内侧的船的船体部分上。 作为支撑构件的一部分的臂在船的船体外部向下倾斜延伸,并且涂有保护性塑料层的成对指状物从臂垂直向上延伸,以将水滑动件牢固地保持在手指之间, 在船上的乘客的方式,并且在船的操作者和被拖曳的滑水者之间的视线之外。

    Conductive etch stop for etching a sacrificial layer
    3.
    发明授权
    Conductive etch stop for etching a sacrificial layer 有权
    用于蚀刻牺牲层的导电蚀刻停止

    公开(公告)号:US07045381B1

    公开(公告)日:2006-05-16

    申请号:US10788565

    申请日:2004-02-27

    CPC classification number: H01L21/321 B81C1/00587 H01L21/32135

    Abstract: In one embodiment, a method of forming a metallic electrode comprises depositing a metal layer over a surface (e.g., substrate) and thermally processing the metal layer to form a conductive metallized ceramic. The metal layer may be deposited by sputtering and thermally processed by rapid thermal processing, for example. Among other advantages, embodiments of the present invention allow for the formation of conductive metallized ceramics, such as titanium-nitride, without the use of relatively expensive deposition tools.

    Abstract translation: 在一个实施例中,形成金属电极的方法包括在表面(例如,衬底)上沉积金属层并热处理金属层以形成导电金属化陶瓷。 可以通过溅射沉积金属层,例如通过快速热处理进行热处理。 除了其它优点之外,本发明的实施例允许形成诸如氮化钛的导电金属化陶瓷,而不使用相对昂贵的沉积工具。

    Integrated driver process flow
    4.
    发明授权

    公开(公告)号:US06767751B2

    公开(公告)日:2004-07-27

    申请号:US10161191

    申请日:2002-05-28

    Inventor: James A. Hunter

    Abstract: An integrated device including one or more device drivers and a diffractive light modulator monolithically coupled to the one or more driver circuits. The one or more driver circuits are configured to process received control signals and to transmit the processed control signals to the diffractive light modulator. A method of fabricating the integrated device preferably comprises fabricating a front-end portion for each of a plurality of transistors, isolating the front-end portions of the plurality of transistors, fabricating a front-end portion of a diffractive light modulator, isolating the front end portion of the diffractive light modulator, fabricating interconnects for the plurality of transistors, applying an open array mask and wet etch to access the diffractive light modulator, and fabricating a back-end portion of the diffractive light modulator, thereby monolithically coupling the diffractive light modulator and the plurality of transistors.

    Diffractive light modulator having continuously deformable surface
    6.
    发明授权
    Diffractive light modulator having continuously deformable surface 有权
    衍射光调制器具有连续变形的表面

    公开(公告)号:US07359106B1

    公开(公告)日:2008-04-15

    申请号:US11230874

    申请日:2005-09-20

    CPC classification number: G02B26/0808 G02B26/0825

    Abstract: A light modulator and a method of manufacturing the same are provided having a continuously deformable optical surface. Generally, the modulator includes a substrate, a membrane disposed above and spaced apart from an upper surface of the substrate, the membrane having a continuously deformable light reflective surface formed on its upper side facing away from the upper surface of the substrate, and a means for deflecting the deformable surface relative to the substrate. Light reflected from different points of the deformable surface can interfere to modulate light reflected from the modulator in 0th order applications. In one embodiment, the membrane includes a static reflective surface surrounding the deformable surface. Light reflected from the static surface and the deformable surface can interfere to modulate light reflected from the modulator in non-0th order applications. Preferably, the static surface is substantially planar and the deformable surface are sized and shaped to define substantially equal areas. In one embodiment, the static surface circumscribes the deformable surface to define a parabolic reflector.

    Abstract translation: 光调制器及其制造方法具有连续变形的光学表面。 通常,调制器包括基板,设置在基板的上表面上方并与其间隔开的膜,所述膜具有形成在其远离基板的上表面的上侧上的可连续变形的光反射表面, 用于使可变形表面相对于基底偏转。 从可变形表面的不同点反射的光可能会干扰在第0级应用中调制从调制器反射的光。 在一个实施例中,膜包括围绕可变形表面的静态反射表面。 从静态表面和可变形表面反射的光可以干扰在非0级以上的应用中调制从调制器反射的光。 优选地,静态表面基本上是平面的,并且可变形表面的尺寸和形状被设计成限定基本相等的面积。 在一个实施例中,静态表面围绕可变形表面以限定抛物面反射器。

    Spatial light modulator with robust mirror substrate condition
    7.
    发明授权
    Spatial light modulator with robust mirror substrate condition 有权
    空间光调制器,具有鲁棒的镜面基板条件

    公开(公告)号:US07085059B2

    公开(公告)日:2006-08-01

    申请号:US11087230

    申请日:2005-03-23

    CPC classification number: G02B26/0808

    Abstract: A light modulator and a method of manufacturing the same are provided having a substrate with reflectivity enhancing layers formed thereon. The layers include at least a top surface for receiving incident light, a first layer overlying the substrate, and a second layer between the top surface and the first layer, the second layer overlying and abutting the first layer. The second layer has a predetermined thickness selected in relation to an index of refraction of the second layer and to a wavelength of the incident light such that the light reflecting off an interface between the first and second layers constructively interferes with light reflected from the top surface. Preferably, the first layer also has a predetermined thickness selected such that the light reflecting off an interface between the first layer and the substrate constructively interferes with light reflected from the top surface.

    Abstract translation: 提供一种光调制器及其制造方法,具有在其上形成有反射增强层的基板。 这些层至少包括用于接收入射光的顶表面,覆盖衬底的第一层,以及顶表面和第一层之间的第二层,第二层覆盖并邻接第一层。 第二层具有相对于第二层的折射率和入射光的波长选择的预定厚度,使得从第一和第二层之间的界面反射的光建构性地干扰从顶表面反射的光 。 优选地,第一层还具有选择的预定厚度,使得从第一层和衬底之间的界面反射的光构造地干扰从顶表面反射的光。

    Conductive etch stop for etching a sacrificial layer
    8.
    发明授权
    Conductive etch stop for etching a sacrificial layer 有权
    用于蚀刻牺牲层的导电蚀刻停止

    公开(公告)号:US06777258B1

    公开(公告)日:2004-08-17

    申请号:US10187028

    申请日:2002-06-28

    Inventor: James A. Hunter

    Abstract: In one embodiment a micro device is formed by depositing a sacrificial layer over a metallic electrode, forming a moveable structure over the sacrificial layer, and then etching the sacrificial layer with a noble gas fluoride. Because the metallic electrode is comprised of a metallic material that also serves as an etch stop in the sacrificial layer etch, charge does not appreciably build up in the metallic electrode. This helps stabilize the driving characteristic of the moveable structure. In one embodiment, the moveable structure is a ribbon in a light modulator.

    Abstract translation: 在一个实施例中,通过在金属电极上沉积牺牲层来形成微器件,在牺牲层上形成可移动结构,然后用惰性气体氟化物蚀刻牺牲层。 因为金属电极由在牺牲层蚀刻中也用作蚀刻停止层的金属材料组成,所以电荷在金属电极中不会明显地积聚。 这有助于稳定可移动结构的驱动特性。 在一个实施例中,可移动结构是光调制器中的带状物。

    Method of fabricating a probe card
    9.
    发明授权
    Method of fabricating a probe card 有权
    制造探针卡的方法

    公开(公告)号:US07685705B2

    公开(公告)日:2010-03-30

    申请号:US12008483

    申请日:2008-01-11

    Abstract: A probe card for testing dice on a wafer includes a substrate, a number of cantilevers formed on a surface thereof, and a number of probes extending from unsupported ends of the cantilevers. The unsupported ends of the cantilevers project over cavities on the surface of the substrate. The probes have tips to contact pads on the dice under test. The probe card may include a compressive layer above the surface of the substrate with a number of holes through which the probes extend.

    Abstract translation: 用于在晶片上测试晶片的探针卡包括基底,在其表面上形成的多个悬臂和从悬臂的未支撑端延伸的多个探针。 悬臂的未支撑的端部突出在基板表面上的空腔上。 探针具有接触被测试骰子上的垫的提示。 探针卡可以包括在衬底的表面上方的压缩层,其具有探针延伸穿过的多个孔。

    Method of patterning elements within a semiconductor topography
    10.
    发明授权
    Method of patterning elements within a semiconductor topography 有权
    半导体形貌图案化元件的方法

    公开(公告)号:US07390750B1

    公开(公告)日:2008-06-24

    申请号:US11087924

    申请日:2005-03-23

    CPC classification number: H01L21/32139 H01L21/0337 H01L21/0338 H01L21/28132

    Abstract: A method is provided which includes forming a hardmask feature adjacent to a patterned sacrificial structure of a semiconductor topography, selectively removing the patterned sacrificial structure to expose a lower layer and etching exposed portions of the lower layer in alignment with the hardmask feature. In some embodiments, forming the hardmask feature may include conformably depositing a hardmask material above the patterned sacrificial structure and lower layer as well as blanket etching the hardmask material such that upper surfaces of the patterned sacrificial structure and portions of the lower layer are exposed and portions of the hardmask material remain along sidewalls of the patterned sacrificial structure. The method may be applied to produce an exemplary semiconductor topography including a plurality of gate structures each having a width less than approximately 70 nm, wherein a variation of the widths among the plurality of gate structures is less than approximately 10%.

    Abstract translation: 提供了一种方法,其包括形成与半导体形貌的图案化牺牲结构相邻的硬掩模特征,选择性地去除图案化的牺牲结构以暴露下层并蚀刻与硬掩模特征对准的下层的暴露部分。 在一些实施例中,形成硬掩模特征可以包括在图案化的牺牲结构和下层之上顺应地沉积硬掩模材料,以及橡皮布蚀刻硬掩模材料,使得图案化的牺牲结构的上表面和下层的部分被暴露, 硬掩模材料保留在图案化牺牲结构的侧壁上。 该方法可以应用于产生包括多个栅极结构的示例性半导体形貌,每个栅极结构的宽度小于约70nm,其中多个栅极结构之间的宽度变化小于约10%。

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