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1.发明授权公开(公告)号：US07816658B2
公开(公告)日：2010-10-19
申请号：US11808264
申请日：2007-06-07
IPC分类号： G21K1/10
CPC分类号： G03F7/70908 , G03F7/70191 , G21K1/10
摘要： An extreme ultra-violet lithographic apparatus for imaging a pattern onto a substrate includes a radiation system constructed and arranged to provide a beam of an extreme ultra-violet radiation, and an absorber arranged in the beam and constructed and arranged to absorb at least a portion of the radiation beam. The absorber has a volume configured to accommodate a flow of an absorbing gas. The flow is directed in a transverse direction with respect to the beam. The absorber includes a structure having an extreme ultra-violet radiation-transmissive beam entry area and an extreme ultra-violet radiation-transmissive beam exit area. The apparatus also includes a gas inlet actuator array configured to inject the gas into the volume and a gas outlet actuator array arranged to evacuate the gas from the volume.
摘要翻译： 用于将图案成像到基板上的极紫外光刻设备包括构造和布置成提供极紫外辐射光束的辐射系统和布置在光束中的构造和布置成吸收至少一部分 的辐射束。 吸收器具有构造成容纳吸收气体流的体积。 流动相对于梁的横向被引导。 吸收器包括具有极紫外辐射透射光束入射区域和极紫外辐射透射光束出射区域的结构。 该装置还包括配置成将气体注入容积的气体入口致动器阵列和布置成从体积排出气体的气体出口致动器阵列。
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2.发明申请公开(公告)号：US20080302980A1
公开(公告)日：2008-12-11
申请号：US11808264
申请日：2007-06-07
CPC分类号： G03F7/70908 , G03F7/70191 , G21K1/10
摘要： An extreme ultra-violet lithographic apparatus for imaging a pattern onto a substrate includes a radiation system constructed and arranged to provide a beam of an extreme ultra-violet radiation, and an absorber arranged in the beam and constructed and arranged to absorb at least a portion of the radiation beam. The absorber has a volume configured to accommodate a flow of an absorbing gas. The flow is directed in a transverse direction with respect to the beam. The absorber includes a structure having an extreme ultra-violet radiation-transmissive beam entry area and an extreme ultra-violet radiation-transmissive beam exit area. The apparatus also includes a gas inlet actuator array configured to inject the gas into the volume and a gas outlet actuator array arranged to evacuate the gas from the volume.
摘要翻译： 用于将图案成像到基板上的极紫外光刻设备包括构造和布置成提供极紫外辐射光束的辐射系统和布置在光束中的构造和布置成吸收至少一部分 的辐射束。 吸收器具有构造成容纳吸收气体流的体积。 流动相对于梁的横向被引导。 吸收器包括具有极紫外辐射透射光束入射区域和极紫外辐射透射光束出射区域的结构。 该装置还包括配置成将气体注入容积的气体入口致动器阵列和布置成从体积排出气体的气体出口致动器阵列。
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3.发明申请Lithographic Apparatus, Spectral Purity Filter and Device Manufacturing Method 有权光刻设备，光谱纯化过滤器和器件制造方法公开(公告)号：US20140085619A1
公开(公告)日：2014-03-27
申请号：US14002000
申请日：2011-12-21
申请人： Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin
发明人： Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , B82Y10/00 , G02B1/11 , G02B5/1838 , G02B5/281 , G02B5/283 , G03F7/70008 , G03F7/702 , G03F7/70308 , G03F7/70575 , G21K1/062 , G21K1/067 , G21K2201/061 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/008
摘要： A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.
摘要翻译： 一种光刻设备，用于将辐射束图案化并将其投影到衬底上，包括至少两个光谱纯度滤光器，其被配置为在至少一个不期望的辐射波长范围内降低辐射束中的辐射强度，其中两个光谱纯度 过滤器具有彼此不同的辐射过滤结构。
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4.发明授权Lithographic apparatus, spectral purity filter and device manufacturing method 有权平版印刷设备，光谱纯度滤光片和器件制造方法公开(公告)号：US09594306B2
公开(公告)日：2017-03-14
申请号：US14002000
申请日：2011-12-21
申请人： Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin
发明人： Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin
CPC分类号： G03F7/70191 , B82Y10/00 , G02B1/11 , G02B5/1838 , G02B5/281 , G02B5/283 , G03F7/70008 , G03F7/702 , G03F7/70308 , G03F7/70575 , G21K1/062 , G21K1/067 , G21K2201/061 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/008
摘要： A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.
摘要翻译： 一种光刻设备，用于将辐射束图案化并将其投影到衬底上，包括至少两个光谱纯度滤光器，其被配置为在至少一个不期望的辐射波长范围内降低辐射束中的辐射强度，其中两个光谱纯度 过滤器具有彼此不同的辐射过滤结构。
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公开(公告)号：US20140253894A1
公开(公告)日：2014-09-11
申请号：US14346530
申请日：2012-08-23
申请人： Jan Bernard Plechelmus Van Schoot , Hermanus Johannes Maria Kreuwel , Vadim Yevgenyevich Banine , Andrei Mikhailovich Yakunin , Johannes Hubertus Josephina Moors , Olav Waldimir Frijns , Gerardus Hubertus Petrus Maria Swinkels , Ivo Vanderhallen , Uwe Bruno Heini Stamm
发明人： Jan Bernard Plechelmus Van Schoot , Hermanus Johannes Maria Kreuwel , Vadim Yevgenyevich Banine , Andrei Mikhailovich Yakunin , Johannes Hubertus Josephina Moors , Olav Waldimir Frijns , Gerardus Hubertus Petrus Maria Swinkels , Ivo Vanderhallen , Uwe Bruno Heini Stamm
CPC分类号： G03F7/70058 , G03F7/70033 , H05G2/005 , H05G2/008
摘要： A radiation source having a fuel stream generator (110) that generates and directs a fuel stream (102) along a trajectory towards a plasma formation location (104). A pre-pulse laser radiation assembly directs a first beam of laser radiation (100) at the fuel stream at the plasma formation location to generate a modified fuel target (106). A main pulse laser radiation assembly directs a second beam of laser radiation (108) at the modified fuel target at the plasma formation location to generate a radiation generating plasma (117). A collector (122) collects the radiation and directs it along an optical axis (105) of the radiation source. The first beam of laser radiation being directed toward the fuel stream substantially along the optical axis.
摘要翻译： 一种具有燃料流发生器（110）的辐射源，其产生并引导燃料流（102）沿轨迹朝向等离子体形成位置（104）。 预脉冲激光辐射组件将等离子体形成位置处的燃料流处的第一激光辐射束（100）引导以产生经修改的燃料靶（106）。 主脉冲激光辐射组件在等离子体形成位置处引导在修改的燃料靶处的第二激光辐射束（108）以产生辐射产生等离子体（117）。 收集器（122）收集辐射并沿辐射源的光轴（105）引导辐射。 激光辐射的第一束基本上沿着光轴指向燃料流。
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公开(公告)号：US20090090877A1
公开(公告)日：2009-04-09
申请号：US12197693
申请日：2008-08-25
申请人： Tjarko Adriaan Rudolf Van Empel , Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriel Van De Vijver , Gerardus Hubertus Petrus Maria Swinkels , Hendrikus Gijsbertus Schimmel , Dzmitry Labetski
发明人： Tjarko Adriaan Rudolf Van Empel , Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriel Van De Vijver , Gerardus Hubertus Petrus Maria Swinkels , Hendrikus Gijsbertus Schimmel , Dzmitry Labetski
CPC分类号： H05G2/008 , G03F7/70175 , G03F7/70891 , G03F7/70916 , G03F7/70983 , H05G2/003 , H05G2/006 , H05K7/2039
摘要： A module for producing extreme ultraviolet radiation includes a supply configured to supply droplets of an ignition material to a predetermined target ignition position and a laser arranged to be focused on the predetermined target ignition position and to produce a plasma by hitting such a droplet which is located at the predetermined target ignition position in order to change the droplet into an extreme ultraviolet producing plasma. Also, the module includes a collector mirror having a mirror surface constructed and arranged to reflect the radiation in order to focus the radiation on a focal point. A fluid supply is constructed and arranged to form a gas flow flowing away from the mirror surface in a direction transverse with respect to the mirror surface in order to mitigate particle debris produced by the plasma.
摘要翻译： 用于产生极紫外线辐射的模块包括被配置为将点火材料的液滴供应到预定的目标点火位置的电源和布置成聚焦在预定的目标点火位置上的激光器，并且通过击打位于 在预定的目标点火位置，以便将液滴变成极紫外线产生等离子体。 此外，模块包括收集器反射镜，其具有构造和布置成反射辐射的镜面，以便将辐射聚焦在焦点上。 流体供应器被构造和布置成在相对于镜面横向的方向上形成从镜面流出的气流，以便减轻由等离子体产生的颗粒碎片。
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公开(公告)号：US09632419B2
公开(公告)日：2017-04-25
申请号：US14346530
申请日：2012-08-23
申请人： Jan Bernard Plechelmus Van Schoot , Vadim Yevgenyevich Banine , Olav Waldemar Vladimir Frijns , Hermanus Kreuwel , Johannes Hubertus Josephina Moors , Uwe Bruno Heini Stamm , Gerardus Hubertus Petrus Maria Swinkels , Ivo Vanderhallen , Andrei Mikhailovich Yakunin
发明人： Jan Bernard Plechelmus Van Schoot , Vadim Yevgenyevich Banine , Olav Waldemar Vladimir Frijns , Hermanus Kreuwel , Johannes Hubertus Josephina Moors , Uwe Bruno Heini Stamm , Gerardus Hubertus Petrus Maria Swinkels , Ivo Vanderhallen , Andrei Mikhailovich Yakunin
CPC分类号： G03F7/70058 , G03F7/70033 , H05G2/005 , H05G2/008
摘要： A radiation source having a fuel stream generator (110) that generates and directs a fuel stream (102) along a trajectory towards a plasma formation location (104). A pre-pulse laser radiation assembly directs a first beam of laser radiation (100) at the fuel stream at the plasma formation location to generate a modified fuel target (106). A main pulse laser radiation assembly directs a second beam of laser radiation (108) at the modified fuel target at the plasma formation location to generate a radiation generating plasma (117). A collector (122) collects the radiation and directs it along an optical axis (105) of the radiation source. The first beam of laser radiation being directed toward the fuel stream substantially along the optical axis.
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公开(公告)号：US08901521B2
公开(公告)日：2014-12-02
申请号：US12197693
申请日：2008-08-25
申请人： Tjarko Adriaan Rudolf Van Empel , Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Gerardus Hubertus Petrus Maria Swinkels , Hendrikus Gijsbertus Schimmel , Dzmitry Labetski
发明人： Tjarko Adriaan Rudolf Van Empel , Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Gerardus Hubertus Petrus Maria Swinkels , Hendrikus Gijsbertus Schimmel , Dzmitry Labetski
CPC分类号： H05G2/008 , G03F7/70175 , G03F7/70891 , G03F7/70916 , G03F7/70983 , H05G2/003 , H05G2/006 , H05K7/2039
摘要： A module for producing extreme ultraviolet radiation includes a supply configured to supply droplets of an ignition material to a predetermined target ignition position and a laser arranged to be focused on the predetermined target ignition position and to produce a plasma by hitting such a droplet which is located at the predetermined target ignition position in order to change the droplet into an extreme ultraviolet producing plasma. Also, the module includes a collector mirror having a mirror surface constructed and arranged to reflect the radiation in order to focus the radiation on a focal point. A fluid supply is constructed and arranged to form a gas flow flowing away from the mirror surface in a direction transverse with respect to the mirror surface in order to mitigate particle debris produced by the plasma.
摘要翻译： 用于产生极紫外线辐射的模块包括被配置为将点火材料的液滴供应到预定的目标点火位置的电源和布置成聚焦在预定的目标点火位置上的激光器，并且通过击打位于 在预定的目标点火位置，以便将液滴变成极紫外线产生等离子体。 此外，模块包括收集器反射镜，其具有构造和布置成反射辐射的镜面，以便将辐射聚焦在焦点上。 流体供应器被构造和布置成在相对于镜面横向的方向上形成从镜面流出的气流，以便减轻由等离子体产生的颗粒碎片。
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9.发明授权Lithographic apparatus and device manufacturing method with corrective positioning of reflective element 有权平版印刷设备和反射元件校正定位的器件制造方法公开(公告)号：US09170500B2
公开(公告)日：2015-10-27
申请号：US13510518
申请日：2010-09-08
CPC分类号： G03F7/70425 , G02B26/0833 , G02B27/0068 , G03F7/70075 , G03F7/70116 , G03F7/70191
摘要： In a lithographic apparatus, an illumination mode is set using a field mirror comprising a plurality of movable facets to direct radiation to selectable positions on a pupil facet mirror. In the event that a field facet mirror is defective and cannot be set to a desired position, another of the movable facet mirrors is set to a corrective position, different than its desired position, to at least partially ameliorate a deleterious effect of the defective facet mirror.
摘要翻译： 在光刻设备中，使用包括多个可移动小面的场反射镜来设置照明模式，以将辐射引导到瞳孔面反射镜上的可选位置。 在场面反射镜有缺陷并且不能被设置到期望位置的情况下，可移动刻面镜中的另一个被设置为与其期望位置不同的校正位置，以至少部分地改善缺陷面的有害影响 镜子。
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10.发明授权Illumination system for lithographic apparatus with control system to effect an adjustment of an imaging parameter 有权用于具有控制系统的光刻设备的照明系统以实现成像参数的调整公开(公告)号：US09052605B2
公开(公告)日：2015-06-09
申请号：US13517480
申请日：2010-11-19
IPC分类号： G03F7/20
CPC分类号： G03F7/70116 , G03F7/70075
摘要： In a lithographic apparatus, an illumination mode is set using a field mirror that includes a plurality of movable facets to direct radiation to selectable positions on a pupil facet mirror. A base illumination mode is selected from a set of predetermined illumination modes and the movable facets are set to effect that mode. In order to adjust an imaging parameter, a fraction of the movable facets are set to different positions. The determination of which facets to set to different positions is based on summing the effects of setting each facet to a different position.
摘要翻译： 在光刻设备中，使用包括多个可移动小面的场反射镜来设置照明模式，以将辐射引导到瞳孔面反射镜上的可选位置。 从一组预定照明模式中选择基本照明模式，并且可移动小面被设置为实现该模式。 为了调整成像参数，可移动小面的一部分被设定为不同的位置。 确定哪些面设置到不同的位置是基于将每个方面设置为不同位置的效果的总和。
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