公开(公告)号：US08192921B2

公开(公告)日：2012-06-05

申请号：US12686836

申请日：2010-01-13

申请人： Jun Hatakeyama ,  Takao Yoshihara ,  Kazuhiro Katayama

发明人： Jun Hatakeyama ,  Takao Yoshihara ,  Kazuhiro Katayama

IPC分类号： G03F7/00 ,  G03F7/16 ,  G03F7/20 ,  G03F7/40

CPC分类号： G03F7/0397 ,  G03F1/26 ,  G03F7/0046 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/40

摘要： A pattern is formed by coating a chemically amplified positive resist composition comprising a resin comprising acid labile group-containing recurring units and a photoacid generator onto a substrate, drying to form a resist film, exposing the resist film to high-energy radiation through a phase shift mask having a lattice-like array of shifters, PEB, developing to form a positive pattern, illuminating or heating the positive pattern to eliminate acid labile groups for increasing alkaline solubility and to induce crosslinking for imparting solvent resistance, coating a reversal film, and dissolving away the positive pattern in an alkaline wet etchant to form a pattern by way of positive/negative reversal.

摘要翻译： 通过将包含含有酸不稳定基团的重复单元和光致酸产生剂的树脂的化学放大正性抗蚀剂组合物涂布在基材上，干燥以形成抗蚀剂膜，将抗蚀剂膜暴露于通过相的高能量辐射而形成图案 具有晶格状移位器阵列PEB，显影以形成阳性图案，照亮或加热阳性图案以消除酸不稳定基团以增加碱溶性并引发交联以赋予耐溶剂性，涂覆反转膜，和 将阳性图案溶解在碱性湿蚀刻剂中，以通过正/负反转形成图案。

公开(公告)号：US20100178618A1

公开(公告)日：2010-07-15

申请号：US12686836

申请日：2010-01-13

申请人： Jun Hatakeyama ,  Takao Yoshihara ,  Kazuhiro Katayama

发明人： Jun Hatakeyama ,  Takao Yoshihara ,  Kazuhiro Katayama

IPC分类号： G03F7/20

CPC分类号： G03F7/0397 ,  G03F1/26 ,  G03F7/0046 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/40

摘要： A pattern is formed by coating a chemically amplified positive resist composition comprising a resin comprising acid labile group-containing recurring units and a photoacid generator onto a substrate, drying to form a resist film, exposing the resist film to high-energy radiation through a phase shift mask having a lattice-like array of shifters, PEB, developing to form a positive pattern, illuminating or heating the positive pattern to eliminate acid labile groups for increasing alkaline solubility and to induce crosslinking for imparting solvent resistance, coating a reversal film, and dissolving away the positive pattern in an alkaline wet etchant to form a pattern by way of positive/negative reversal.

摘要翻译： 通过将包含含有酸不稳定基团的重复单元和光致酸产生剂的树脂的化学放大正性抗蚀剂组合物涂布在基材上，干燥以形成抗蚀剂膜，将抗蚀剂膜暴露于通过相的高能量辐射而形成图案 具有晶格状移位器阵列PEB，显影以形成阳性图案，照亮或加热阳性图案以消除酸不稳定基团以增加碱溶性并引发交联以赋予耐溶剂性，涂覆反转膜，和 将阳性图案溶解在碱性湿蚀刻剂中，以通过正/负反转形成图案。

公开(公告)号：US07537880B2

公开(公告)日：2009-05-26

申请号：US11905763

申请日：2007-10-03

申请人： Yuji Harada ,  Jun Hatakeyama ,  Takao Yoshihara ,  Wataru Kusaki ,  Tomohiro Kobayashi ,  Koji Hasegawa

发明人： Yuji Harada ,  Jun Hatakeyama ,  Takao Yoshihara ,  Wataru Kusaki ,  Tomohiro Kobayashi ,  Koji Hasegawa

IPC分类号： G03F7/004 ,  G03F7/30 ,  C08F24/00

CPC分类号： G03F7/0397 ,  C08F24/00 ,  C08F220/32 ,  G03F7/0046 ,  G03F7/11 ,  G03F7/2041 ,  Y10S430/106 ,  Y10S430/108 ,  Y10S430/111

摘要： To a resist composition, an alkali-soluble polymer having fluorinated ester-containing lactone units incorporated therein is included as an additive. The resist composition forms a resist film having a reduced contact angle after development. The resist film prevents water penetration during immersion lithography.

摘要翻译： 作为添加剂，作为抗蚀剂组合物，含有含有含氟酯的内酯单元的碱溶性聚合物。 抗蚀剂组合物形成显影后具有降低的接触角的抗蚀剂膜。 抗蚀剂膜防止浸渍光刻时的水渗透。

公开(公告)号：US08741548B2

公开(公告)日：2014-06-03

申请号：US12194129

申请日：2008-08-19

申请人： Jun Hatakeyama ,  Takao Yoshihara ,  Katsuya Takemura ,  Yoshio Kawai

发明人： Jun Hatakeyama ,  Takao Yoshihara ,  Katsuya Takemura ,  Yoshio Kawai

IPC分类号： G03F7/30 ,  G03F7/40 ,  G03F7/38 ,  G03F7/039

CPC分类号： G03F7/40 ,  G03F7/0035 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/38 ,  H01L21/0274 ,  H01L21/3081 ,  H01L21/31144 ,  H01L21/32139

摘要： A pattern is formed by applying a first positive resist composition onto a substrate, heat treatment, exposure, heat treatment and development to form a first resist pattern; causing the first resist pattern to crosslink and cure by irradiation of high-energy radiation of up to 180 nm wavelength or EB; further applying a second positive resist composition onto the substrate, heat treatment, exposure, heat treatment and development to form a second resist pattern. The double patterning process reduces the pitch between patterns to one half.

摘要翻译： 通过将第一正性抗蚀剂组合物施加到基材上，热处理，曝光，热处理和显影以形成第一抗蚀剂图案而形成图案; 使得第一抗蚀剂图案通过辐射高达180nm波长或EB的高能量辐射而交联和固化; 进一步将第二正性抗蚀剂组合物施加到基材上，进行热处理，曝光，热处理和显影以形成第二抗蚀剂图案。 双重图案化工艺将图案之间的间距缩小到一半。

公开(公告)号：US07771914B2

公开(公告)日：2010-08-10

申请号：US11872952

申请日：2007-10-16

申请人： Jun Hatakeyama ,  Takao Yoshihara ,  Yuji Harada ,  Wataru Kusaki

发明人： Jun Hatakeyama ,  Takao Yoshihara ,  Yuji Harada ,  Wataru Kusaki

IPC分类号： G03F7/039 ,  G03F7/038 ,  G03F7/20 ,  G03F7/30

CPC分类号： G03F7/0397 ,  C08F220/10 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392 ,  Y10S430/108 ,  Y10S430/111 ,  Y10S430/143

摘要： A resist composition comprises a polymer comprising recurring units having formula (1) wherein R1, R4, R7, and R14 are H or methyl, R2, R3, R15, and R16 are H, alkyl or fluoroalkyl, R is F or H, R5 is alkylene, R6 is fluorinated alkyl, R8 is a single bond or alkylene, R10 and R11 are H, F, methyl or trifluoromethyl, R12 and R13 are a single bond, —O— or —CR18R19—, R9, R18, and R19 are H, F, methyl or trifluoromethyl, R17 is alkylene, X1, X2 and X3 are —C(═O)—O—, —O—, or —C(═O)—R20—C(═O)—O— wherein R20 is alkylene, 0≦(a-1)

摘要翻译： 抗蚀剂组合物包含含有式（1）的重复单元的聚合物，其中R 1，R 4，R 7和R 14为H或甲基，R 2，R 3，R 15和R 16为H，烷基或氟代烷基，R为F或H，R 5 是亚烷基，R6是氟化烷基，R8是单键或亚烷基，R10和R11是H，F，甲基或三氟甲基，R12和R13是单键，-O-或-CR18R19-，R9，R18和R19 是H，F，甲基或三氟甲基，R 17是亚烷基，X 1，X 2和X 3是-C（= O）-O-，-O-或-C（= O）-R 20 -C（= O）-O （a-1）+（a-2）+（a-1）+（a-2）+（a-2） （a-3）<1,0