公开(公告)号：US10074521B2

公开(公告)日：2018-09-11

申请号：US14730771

申请日：2015-06-04

Applicant: Lam Research Corporation

Inventor： Daniel Arthur Brown ,  Jeffrey A. Bogart ,  Ian J. Kenworthy

IPC: H01J37/32 ,  C23C16/455

CPC classification number: H01J37/3244 ,  C23C16/45563 ,  C23C16/45578 ,  H01J37/321 ,  H01J37/32119 ,  H01J37/32449 ,  H01J37/32458 ,  H01J37/32477 ,  H01J37/32495 ,  H01J37/32513 ,  H01J37/32522

Abstract: An upper chamber section of a plasma reaction chamber includes a ceramic window with blind bores in an upper surface for receipt of a thermal couple and a resistance temperature detector, a top chamber interface which comprises an upper surface which vacuum seals against the bottom of the window and a gas injection system comprising 8 side injectors mounted in the sidewall of the top chamber interface and a gas delivery system comprising tubing which provides symmetric gas flow to the 8 injectors from a single gas feed connection.

公开(公告)号：US11495486B2

公开(公告)日：2022-11-08

申请号：US17310751

申请日：2020-02-21

Applicant: Lam Research Corporation

Inventor： Paul Albert Avanzino ,  Jerrel K. Antolik ,  Daniel Arthur Brown ,  Jason Lee Treadwell

IPC: H01L21/68 ,  H01L21/687 ,  H01L21/67

Abstract: Semiconductor processing tools are provided that include an upper support framework, a plurality of semiconductor processing chambers arranged along a first axis, a linear guide system fixedly supported by the upper support framework and extending along a second axis substantially parallel to the first axis, and a carriage. Each chamber has a base portion fixedly mounted relative to the upper support framework and a removable top cover with one or more hoisting features. The carriage includes a hoist arm configured to pivot about a vertical axis that is substantially perpendicular to the second axis, the carriage is configured to movably engage with the linear guide system and translate along the second axis relative to the linear guide system. The carriage and hoist arm are movable such that a hoist feature engagement interface of the hoist arm can be moved engage with hoisting features of any of the removable top covers.

公开(公告)号：US20180174804A1

公开(公告)日：2018-06-21

申请号：US15895367

申请日：2018-02-13

Applicant: LAM RESEARCH CORPORATION

Inventor： Darrell EHRLICH ,  Daniel Arthur Brown ,  Ian Kenworthy

IPC: H01J37/32 ,  H01L21/3065

CPC classification number: H01J37/32541 ,  C23C16/4557 ,  H01J37/32091 ,  H01J37/3244 ,  H01J37/32522 ,  H01L21/3065 ,  Y10T29/49002 ,  Y10T29/49083 ,  Y10T29/49098 ,  Y10T29/49117 ,  Y10T29/49803

Abstract: A compression member for use in a showerhead electrode assembly of a capacitively coupled plasma chamber. The member applies a compression force to a portion of a film heater adjacent a power supply boot on an upper surface of a thermal control plate and is located between the thermal control plate and a temperature-controlled top plate. The member is composed of an electrically insulating elastomeric material which can work over a large range of compressions and temperatures.

公开(公告)号：US20230032820A1

公开(公告)日：2023-02-02

申请号：US17938285

申请日：2022-10-05

Applicant: Lam Research Corporation

Inventor： Paul Albert Avanzino ,  Jerrel K. Antolik ,  Daniel Arthur Brown ,  Jason Lee Treadwell

IPC: H01L21/687 ,  H01L21/67 ,  H01L21/68

Abstract: Semiconductor processing tools are provided that include a support framework, semiconductor processing chambers arranged along an axis, an attachment point connected to the support framework, and a detachable hoist system. Each chamber includes a base portion fixedly mounted relative to the support framework and a removable top cover including one or more hoisting features. The detachable hoist system includes a vertical member including a top end including a complementary attachment point and a bottom end including a movement mechanism supported by a floor. The complementary attachment point is detachably connected to the attachment point. The detachable hoist system further includes a hoist arm connected to the vertical member. The hoist arm is configured to pivot about a vertical axis substantially perpendicular to the axis, and includes one or more links and a hoist feature engagement interface configured to engage with the hoisting features of any of the removable top covers.

公开(公告)号：US20190371579A1

公开(公告)日：2019-12-05

申请号：US16538637

申请日：2019-08-12

Applicant: Lam Research Corporation

Inventor： Daniel Arthur Brown ,  John Patrick Holland ,  Michael C. Kellogg ,  James E. Tappan ,  Jerrel K. Antolik ,  Ian Kenworthy ,  Theo Panagopoulos ,  Zhigang Chen

IPC: H01J37/32

Abstract: A plasma chamber is provided to increase conductance within the plasma chamber and to increase uniformity of the conductance. A radio frequency (RF) path for supplying power to the plasma chamber is symmetric with respect to a center axis of the plasma chamber. Moreover, pumps used to remove materials from the plasma chamber are located symmetric with respect to the center axis. The symmetric arrangements of the RF paths and the pumps facilitate an increase in conductance uniformity within the plasma chamber.

公开(公告)号：US20180323044A1

公开(公告)日：2018-11-08

申请号：US16039229

申请日：2018-07-18

Applicant: Lam Research Corporation

Inventor： Daniel Arthur Brown ,  John Patrick Holland ,  Michael C. Kellogg ,  James E. Tappan ,  Jerrel K. Antolik ,  Ian Kenworthy ,  Theo Panagopoulos ,  Zhigang Chen

IPC: H01J37/32

CPC classification number: H01J37/32816 ,  H01J37/32082 ,  H01J37/32183 ,  H01J37/32651 ,  H01J37/32724

Abstract: A plasma chamber is provided to increase conductance within the plasma chamber and to increase uniformity of the conductance. A radio frequency (RF) path for supplying power to the plasma chamber is symmetric with respect to a center axis of the plasma chamber. Moreover, pumps used to remove materials from the plasma chamber are located symmetric with respect to the center axis. The symmetric arrangements of the RF paths and the pumps facilitate an increase in conductance uniformity within the plasma chamber.

公开(公告)号：US20150243487A1

公开(公告)日：2015-08-27

申请号：US14710100

申请日：2015-05-12

Applicant: Lam Research Corporation

Inventor： Darrell Ehrlich ,  Daniel Arthur Brown ,  Ian Kenworthy

IPC: H01J37/32 ,  H01L21/3065

CPC classification number: H01J37/32541 ,  C23C16/4557 ,  H01J37/32091 ,  H01J37/3244 ,  H01J37/32522 ,  H01L21/3065 ,  Y10T29/49002 ,  Y10T29/49083 ,  Y10T29/49098 ,  Y10T29/49117 ,  Y10T29/49803

Abstract: A compression member for use in a showerhead electrode assembly of a capacitively coupled plasma chamber. The member applies a compression force to a portion of a film heater adjacent a power supply boot on an upper surface of a thermal control plate and is located between the thermal control plate and a temperature-controlled top plate. The member is composed of an electrically insulating elastomeric material which can work over a large range of compressions and temperatures.

Abstract translation: 一种用于电容耦合等离子体室的喷头电极组件中的压缩构件。 该构件对与热控制板的上表面相邻的电源罩的薄膜加热器的一部分施加压缩力，并且位于热控制板和温度控制的顶板之间。 该构件由电绝缘的弹性体材料组成，其可在大范围的压缩和温度下工作。

公开(公告)号：US12027411B2

公开(公告)日：2024-07-02

申请号：US17938285

申请日：2022-10-05

Applicant: Lam Research Corporation

Inventor： Paul Albert Avanzino ,  Jerrel K. Antolik ,  Daniel Arthur Brown ,  Jason Lee Treadwell

IPC: H01L21/68 ,  H01L21/67 ,  H01L21/687

CPC classification number: H01L21/68742 ,  H01L21/67161 ,  H01L21/68

Abstract: Semiconductor processing tools are provided that include a support framework, semiconductor processing chambers arranged along an axis, an attachment point connected to the support framework, and a detachable hoist system. Each chamber includes a base portion fixedly mounted relative to the support framework and a removable top cover including one or more hoisting features. The detachable hoist system includes a vertical member including a top end including a complementary attachment point and a bottom end including a movement mechanism supported by a floor. The complementary attachment point is detachably connected to the attachment point. The detachable hoist system further includes a hoist arm connected to the vertical member. The hoist arm is configured to pivot about a vertical axis substantially perpendicular to the axis, and includes one or more links and a hoist feature engagement interface configured to engage with the hoisting features of any of the removable top covers.

公开(公告)号：US10665435B2

公开(公告)日：2020-05-26

申请号：US16538637

申请日：2019-08-12

Applicant: Lam Research Corporation

Inventor： Daniel Arthur Brown ,  John Patrick Holland ,  Michael C. Kellogg ,  James E. Tappan ,  Jerrel K. Antolik ,  Ian Kenworthy ,  Theo Panagopoulos ,  Zhigang Chen

IPC: H01J37/32

Abstract: A plasma chamber is provided to increase conductance within the plasma chamber and to increase uniformity of the conductance. A radio frequency (RF) path for supplying power to the plasma chamber is symmetric with respect to a center axis of the plasma chamber. Moreover, pumps used to remove materials from the plasma chamber are located symmetric with respect to the center axis. The symmetric arrangements of the RF paths and the pumps facilitate an increase in conductance uniformity within the plasma chamber.

公开(公告)号：US10395902B2

公开(公告)日：2019-08-27

申请号：US16039229

申请日：2018-07-18

Applicant: Lam Research Corporation

Inventor： Daniel Arthur Brown ,  John Patrick Holland ,  Michael C. Kellogg ,  James E. Tappan ,  Jerrel K. Antolik ,  Ian Kenworthy ,  Theo Panagopoulos ,  Zhigang Chen

IPC: H01J37/32

Abstract: A plasma chamber is provided to increase conductance within the plasma chamber and to increase uniformity of the conductance. A radio frequency (RF) path for supplying power to the plasma chamber is symmetric with respect to a center axis of the plasma chamber. Moreover, pumps used to remove materials from the plasma chamber are located symmetric with respect to the center axis. The symmetric arrangements of the RF paths and the pumps facilitate an increase in conductance uniformity within the plasma chamber.