公开(公告)号：US08970114B2

公开(公告)日：2015-03-03

申请号：US13756986

申请日：2013-02-01

Applicant: Lam Research Corporation

Inventor： Matt Busche ,  Adam Mace ,  Michael Kang ,  Allan Ronne

IPC: H01J7/24 ,  H01J37/32

CPC classification number: H01J37/32522 ,  H01J37/32119

Abstract: A temperature controlled dielectric window of an inductively coupled plasma processing chamber includes a dielectric window forming a top wall of the plasma processing chamber having at least first and second channels therein. A liquid circulating system includes a source of cold liquid circulating in a first closed loop which is not in fluid communication with the channels, a source of hot liquid circulating in a second closed loop which is in fluid communication with the channels, and first and second heat exchangers. The cold liquid passes through the first heat exchanger at a controllable flow rate and temperature of the hot liquid is adjusted by heat exchange with the cold liquid as the hot liquid passes through the first heat exchanger and then through the inlet of the first channel. The cold liquid passes through the second heat exchanger at a controllable flow rate and temperature of the hot liquid is adjusted by heat exchange with the cold liquid as the hot liquid passes through the second heat exchanger and then through the inlet of the second channel.

Abstract translation: 电感耦合等离子体处理室的温度控制电介质窗包括形成等离子体处理室的顶壁的电介质窗口，其中至少具有第一和第二通道。 液体循环系统包括在与通道不流体连通的第一闭环中循环的冷液体源，在与通道流体连通的第二闭环中循环的热液体源，以及第一和第二 热交换器。 冷液体以可控的流速通过第一热交换器，当热液体通过第一热交换器然后通过第一通道的入口时，通过与冷液体的热交换来调节热液体的温度。 冷液体以可控的流速通过第二热交换器，当热液体通过第二热交换器然后通过第二通道的入口时，通过与冷液体的热交换来调节热液体的温度。

公开(公告)号：US20140065827A1

公开(公告)日：2014-03-06

申请号：US14031840

申请日：2013-09-19

Applicant: Lam Research Corporation

Inventor： Michael Kang ,  Alex Paterson ,  Ian J. Kenworthy

IPC: H01L21/306 ,  B05B1/18

CPC classification number: H01L21/30604 ,  B05B1/185 ,  B05D1/62 ,  C23C16/455 ,  C23C16/45561 ,  C23C16/505 ,  C23C16/507 ,  H01J37/3211 ,  H01J37/3244 ,  H01J2237/3341 ,  H01L21/30655 ,  H01L21/67069

Abstract: A two piece ceramic showerhead includes upper and lower plates which deliver process gas to an inductively coupled plasma processing chamber. The upper plate overlies the lower plate and includes radially extending gas passages which extend inwardly from an outer periphery of the upper plate, axially extending gas passages in fluid communication with the radially extending gas passages and an annular recess forming a plenum between the upper and lower plates. The lower plate includes axially extending gas holes in fluid communication with the plenum. The two piece ceramic showerhead forms a dielectric window of the chamber through which radiofrequency energy generated by an antenna is coupled into the chamber. The gas delivery system is operable to supply an etching gas and a deposition gas into the processing chamber such that the etching gas in the plenum can be replaced with the deposition gas.

Abstract translation: 两件式陶瓷喷头包括将处理气体输送到电感耦合等离子体处理室的上板和下板。 上板覆盖在下板上，并且包括从上板的外周向内延伸的径向延伸的气体通道，与径向延伸的气体通道流体连通的轴向延伸的气体通道和在上部和下部之间形成增压室的环形凹槽 盘子 下板包括与增压室流体连通的轴向延伸的气孔。 两件式陶瓷喷头形成室的电介质窗口，通过天线产生的射频能量耦合到腔室中。 气体输送系统可操作以将蚀刻气体和沉积气体供应到处理室中，使得气室中的蚀刻气体可以被沉积气体代替。

公开(公告)号：US09934979B2

公开(公告)日：2018-04-03

申请号：US14800850

申请日：2015-07-16

Applicant: Lam Research Corporation

Inventor： Michael Kang ,  Alex Paterson ,  Ian J. Kenworthy

IPC: C23C16/455 ,  H01L21/306 ,  C23C16/505 ,  C23C16/507 ,  B05D1/00 ,  H01J37/32 ,  H01L21/67 ,  H01L21/3065 ,  B05B1/18

CPC classification number: H01L21/30604 ,  B05B1/185 ,  B05D1/62 ,  C23C16/455 ,  C23C16/45561 ,  C23C16/505 ,  C23C16/507 ,  H01J37/3211 ,  H01J37/3244 ,  H01J2237/3341 ,  H01L21/30655 ,  H01L21/67069

Abstract: A two piece ceramic showerhead includes upper and lower plates which deliver process gas to an inductively coupled plasma processing chamber. The upper plate overlies the lower plate and includes radially extending gas passages which extend inwardly from an outer periphery of the upper plate, axially extending gas passages in fluid communication with the radially extending gas passages and an annular recess forming a plenum between the upper and lower plates. The lower plate includes axially extending gas holes in fluid communication with the plenum. The upper plate can include eight radially extending gas passages evenly spaced around the periphery of the upper plate and the lower plate can include inner and outer rows of gas holes. The two piece ceramic showerhead forms a dielectric window of the chamber through which radiofrequency energy generated by an antenna is coupled into the chamber. A gas delivery system delivers process gas to a plenum between the upper and lower plates having a gas volume of no greater than 500 cm3. The gas holes in the lower plate extend between the plenum and a plasma exposed yttria coated surface of the lower plate. The gas delivery system is operable to supply an etching gas and a deposition gas into the processing chamber such that the etching gas in the plenum can be replaced with the deposition gas within about 200 milliseconds and vice versa.

公开(公告)号：US20160217977A1

公开(公告)日：2016-07-28

申请号：US15005877

申请日：2016-01-25

Applicant: LAM RESEARCH CORPORATION

Inventor： Michael Kang ,  Alex Paterson

IPC: H01J37/32 ,  H01L21/67

CPC classification number: H01J37/3244 ,  B01F15/0264 ,  C23C16/45561 ,  C23C16/45563 ,  C23C16/4558 ,  H01J37/321 ,  H01J37/3211 ,  H01J37/32642 ,  H01J2237/006 ,  H01J2237/334 ,  H01L21/30655 ,  H01L21/31116 ,  H01L21/67069 ,  Y10T137/0402 ,  Y10T137/85938

Abstract: A gas delivery system for a ceramic showerhead includes gas connection blocks and a gas ring, the gas connection blocks mounted on the gas ring such that gas outlets in the blocks deliver process gas to gas inlets in an outer periphery of the showerhead. The gas ring includes a bottom ring with channels therein and a welded cover plate enclosing the channels. The gas ring can include a first channel extending ½ the length of the gas ring, two second channels connected at midpoints thereof to downstream ends of the first channel, and four third channels connected at midpoints thereof to downstream ends of the second channels. the cover plate can include a first section enclosing the first channel, two second sections connected at midpoints thereof to ends of the first section, and third sections connected at midpoints thereof to ends of the second sections. The channels are arranged such that the process gas travels equal distances for a single gas inlet in the gas ring to eight outlets in the cover ring allowing equal gas flow.

Abstract translation: 用于陶瓷喷头的气体输送系统包括气体连接块和气体环，气体连接块安装在气体环上，使得块中的气体出口将工艺气体输送到喷头外周的气体入口。 气环包括其中具有通道的底环和封闭通道的焊接盖板。 气体环可以包括在气体环的长度上延伸1/2的第一通道，在其中点连接到第一通道的下游端的两个第二通道，以及在其中点处连接到第二通道的下游端的四个第三通道。 盖板可以包括封闭第一通道的第一部分，在其中点连接到第一部分的端部的两个第二部分，以及在其中点处连接到第二部分的端部的第三部分。 通道布置成使得处理气体相对于气体环中的单个气体入口相等的距离传递到盖环中的八个出口，允许相等的气体流动。

公开(公告)号：US10366865B2

公开(公告)日：2019-07-30

申请号：US15005877

申请日：2016-01-25

Applicant: LAM RESEARCH CORPORATION

Inventor： Michael Kang ,  Alex Paterson

IPC: B01F15/02 ,  C23C16/455 ,  H01J37/32 ,  H01L21/67 ,  H01L21/3065 ,  H01L21/311

Abstract: A gas delivery system for a ceramic showerhead includes gas connection blocks and a gas ring, the gas connection blocks mounted on the gas ring such that gas outlets in the blocks deliver process gas to gas inlets in an outer periphery of the showerhead. The gas ring includes a bottom ring with channels therein and a welded cover plate enclosing the channels. The gas ring can include a first channel extending ½ the length of the gas ring, two second channels connected at midpoints thereof to downstream ends of the first channel, and four third channels connected at midpoints thereof to downstream ends of the second channels. the cover plate can include a first section enclosing the first channel, two second sections connected at midpoints thereof to ends of the first section, and third sections connected at midpoints thereof to ends of the second sections. The channels are arranged such that the process gas travels equal distances for a single gas inlet in the gas ring to eight outlets in the cover ring allowing equal gas flow.

公开(公告)号：US09099398B2

公开(公告)日：2015-08-04

申请号：US14031840

申请日：2013-09-19

Applicant: Lam Research Corporation

Inventor： Michael Kang ,  Alex Paterson ,  Ian J. Kenworthy

IPC: C23C16/505 ,  C23C16/507 ,  C23C16/455 ,  C23F1/00 ,  H01L21/306 ,  H01L21/3065 ,  H01J37/32 ,  B05B1/18 ,  C23C16/06 ,  C23C16/22

CPC classification number: H01L21/30604 ,  B05B1/185 ,  B05D1/62 ,  C23C16/455 ,  C23C16/45561 ,  C23C16/505 ,  C23C16/507 ,  H01J37/3211 ,  H01J37/3244 ,  H01J2237/3341 ,  H01L21/30655 ,  H01L21/67069

Abstract: A two piece ceramic showerhead includes upper and lower plates which deliver process gas to an inductively coupled plasma processing chamber. The upper plate overlies the lower plate and includes radially extending gas passages which extend inwardly from an outer periphery of the upper plate, axially extending gas passages in fluid communication with the radially extending gas passages and an annular recess forming a plenum between the upper and lower plates. The lower plate includes axially extending gas holes in fluid communication with the plenum. The two piece ceramic showerhead forms a dielectric window of the chamber through which radiofrequency energy generated by an antenna is coupled into the chamber. The gas delivery system is operable to supply an etching gas and a deposition gas into the processing chamber such that the etching gas in the plenum can be replaced with the deposition gas.

Abstract translation: 两件式陶瓷喷头包括将处理气体输送到电感耦合等离子体处理室的上板和下板。 上板覆盖在下板上，并且包括从上板的外周向内延伸的径向延伸的气体通道，与径向延伸的气体通道流体连通的轴向延伸的气体通道和在上部和下部之间形成增压室的环形凹槽 盘子 下板包括与增压室流体连通的轴向延伸的气孔。 两件式陶瓷喷头形成室的电介质窗口，通过天线产生的射频能量耦合到腔室中。 气体输送系统可操作以将蚀刻气体和沉积气体供应到处理室中，使得气室中的蚀刻气体可以被沉积气体代替。

公开(公告)号：US20140217895A1

公开(公告)日：2014-08-07

申请号：US13756986

申请日：2013-02-01

Applicant: LAM RESEARCH CORPORATION

Inventor： Matt Busche ,  Adam Mace ,  Michael Kang ,  Allan Ronne

IPC: H01J37/32

CPC classification number: H01J37/32522 ,  H01J37/32119

Abstract: A temperature controlled dielectric window of an inductively coupled plasma processing chamber includes a dielectric window forming a top wall of the plasma processing chamber having at least first and second channels therein. A liquid circulating system includes a source of cold liquid circulating in a first closed loop which is not in fluid communication with the channels, a source of hot liquid circulating in a second closed loop which is in fluid communication with the channels, and first and second heat exchangers. The cold liquid passes through the first heat exchanger at a controllable flow rate and temperature of the hot liquid is adjusted by heat exchange with the cold liquid as the hot liquid passes through the first heat exchanger and then through the inlet of the first channel. The cold liquid passes through the second heat exchanger at a controllable flow rate and temperature of the hot liquid is adjusted by heat exchange with the cold liquid as the hot liquid passes through the second heat exchanger and then through the inlet of the second channel.

Abstract translation: 电感耦合等离子体处理室的温度控制电介质窗包括形成等离子体处理室的顶壁的电介质窗口，其中至少具有第一和第二通道。 液体循环系统包括在与通道不流体连通的第一闭环中循环的冷液体源，在与通道流体连通的第二闭环中循环的热液体源，以及第一和第二 热交换器。 冷液体以可控的流速通过第一热交换器，当热液体通过第一热交换器然后通过第一通道的入口时，通过与冷液体的热交换来调节热液体的温度。 冷液体以可控的流速通过第二热交换器，当热液体通过第二热交换器然后通过第二通道的入口时，通过与冷液体的热交换来调节热液体的温度。