公开(公告)号：US11435664B2

公开(公告)日：2022-09-06

申请号：US16968084

申请日：2019-12-13

Applicant: LG CHEM, LTD. ,  KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Heon Kim ,  Yoosik Kim ,  Raisa Kharbash ,  Se Hyun Kwon ,  Yeongrae Chang ,  Seokhoon Jang

IPC: G03H1/02 ,  G03F7/031 ,  G03F7/035 ,  G03F7/027 ,  G03F7/075 ,  G03F7/105 ,  C08J3/24 ,  C08F220/18 ,  G03F7/00

Abstract: Provided is a photopolymer composition for hologram recording comprising: a polymer matrix or a precursor thereof; a dye including a compound of the following Chemical Formula 1; a photoreactive monomer; and a photoinitiator,

公开(公告)号：US11084933B2

公开(公告)日：2021-08-10

申请号：US16651906

申请日：2018-12-07

Applicant: LG CHEM, LTD. ,  KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Heon Kim ,  Yoosik Kim ,  Raisa Kharbash ,  Se Hyun Kwon ,  Yeongrae Chang ,  Seokhoon Jang

IPC: C09B57/00 ,  C08K5/55 ,  C07F5/02 ,  G03H1/02 ,  G03F7/028 ,  G03F7/033 ,  G03F7/035 ,  G03H1/04

Abstract: The present invention relates to a compound having a novel structure, a photopolymer composition including the compound as a dye, a hologram recording medium produced from the photopolymer composition, an optical element including the hologram recording medium, and a holographic recording method using the hologram recording medium.

公开(公告)号：US12001141B2

公开(公告)日：2024-06-04

申请号：US16976206

申请日：2019-04-29

Applicant: LG CHEM, LTD. ,  KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Heon Kim ,  Yoosik Kim ,  Raisa Kharbash ,  Se Hyun Kwon ,  Yeongrae Chang ,  Seokhoon Jang

IPC: G03F7/075 ,  C09B11/24 ,  G02B5/32 ,  G03F7/028 ,  G03H1/04

CPC classification number: G03F7/0755 ,  C09B11/24 ,  G02B5/32 ,  G03F7/028 ,  G03H1/0402 ,  G03H2001/0439 ,  G03H2260/12

Abstract: The present disclosure relates to a photopolymer composition, and more particularly, to a compound having a novel structure, a photopolymer composition including the compound as a dye, a hologram recording medium produced from the photopolymer composition, an optical element including the hologram recording medium, and a holographic recording method using the photopolymer composition.

公开(公告)号：US11994704B2

公开(公告)日：2024-05-28

申请号：US16972547

申请日：2019-09-11

Applicant: LG CHEM, LTD.

Inventor： Seokhoon Jang ,  Jinseok Byun ,  Heon Kim ,  Se Hyun Kwon ,  Yeongrae Chang

IPC: G02B5/32 ,  C08L33/10 ,  G03F7/075 ,  G03H1/02

CPC classification number: G02B5/32 ,  C08L33/10 ,  G03F7/075 ,  G03H2001/0264 ,  G03H2260/12

Abstract: The present disclosure relates to a hologram recording medium having one surface with a higher surface energy than a polymer resin layer containing at least one polymer selected from the group consisting of triacetyl cellulose, alicyclic olefin polymer and polyethylene terephthalate, a hologram recording medium wherein the surface energy of any one surface is 50 mN/m or more, and an optical element comprising the hologram medium.

公开(公告)号：US20220204767A1

公开(公告)日：2022-06-30

申请号：US17601909

申请日：2020-05-21

Applicant: LG CHEM, LTD.

Inventor： Hee Jung Choi ,  Yeongrae Chang ,  Heon Kim ,  Hye Min Kim ,  Youngsuk Kim ,  Jaeyoung Kim ,  Soonhwa Jung

IPC: C08L81/02 ,  C08G75/06 ,  G02B1/04

Abstract: A curable composition for forming a high refractive index optical material, the curable composition including an episulfide compound, a thiol compound and an aromatic ring compound containing two or more hydroxyl groups, and an optical material including a cured product of the curable composition.

公开(公告)号：US20220204702A1

公开(公告)日：2022-06-30

申请号：US17613001

申请日：2020-10-26

Applicant: LG CHEM, LTD.

Inventor： Hee Jung Choi ,  Jeewoo Lim ,  Heon Kim ,  Donghwa Seo ,  Yeongrae Chang

IPC: C08G75/14 ,  G02B1/04

Abstract: A curable composition for forming a high refractive index optical material, the curable composition comprising an episulfide compound; sulfur-containing organic particles comprising a specific content of sulfur atoms; and a reducing agent, and an optical material comprising the curable composition.

公开(公告)号：US11292888B2

公开(公告)日：2022-04-05

申请号：US16756072

申请日：2018-10-16

Applicant: LG CHEM, LTD.

Inventor： Seok Hoon Jang ,  Heon Kim ,  Boo Kyung Kim ,  Yeong Rae Chang ,  Yongjoon Heo ,  Se Hyun Kwon

IPC: G03H1/02 ,  G03F7/035 ,  G11B7/245 ,  C08G18/79 ,  C08G18/78 ,  C08G18/32 ,  C08G18/08 ,  C08K5/02 ,  G11B7/0065 ,  C08K5/00 ,  G03H1/26

Abstract: A photopolymerizable composition including: a polymer matrix or a precursor thereof containing a reaction product of an acrylate-based polyol and a compound containing at least one isocyanate group; a photoreactive monomer; and a non-reactive fluoro compound and a photoinitiator; a hologram recording medium produced from the composition; an optical element including the hologram recording medium; and a method of recording a hologram using the photopolymerizable composition.

公开(公告)号：US10809419B2

公开(公告)日：2020-10-20

申请号：US15741465

申请日：2016-12-05

Applicant: LG CHEM, LTD.

Inventor： Seok Hoon Jang ,  Heon Kim ,  Boo Kyung Kim ,  Jin Seok Byun ,  Yeong Rae Chang

IPC: G02B1/14 ,  G02B1/111 ,  G02B1/16 ,  C09D7/61 ,  C09D5/00 ,  C09D7/40 ,  C08K3/36 ,  G02F1/1335

Abstract: The present invention relates to an antireflection film including: a hard coating layer in which center line average roughness (Ra) of the surface is 1.2 nm or less and surface energy is 34 mN/m or less; and a low refractive index layer which is formed on the hard coating layer.

公开(公告)号：US10414840B2

公开(公告)日：2019-09-17

申请号：US15511591

申请日：2015-09-16

Applicant: LG CHEM, LTD.

Inventor： Han Na Lee ,  Heon Kim ,  Yeong Rae Chang ,  Soon Hwa Jung ,  Jin Seok Byun

IPC: C08F22/20 ,  C09D135/02 ,  C09D4/00

Abstract: The present invention relates to a curable composition for a glass substitute. By using a curable composition, excellent wear resistance and high hardness at a glass level can be obtained, and two-dimensional planar plastic film and three-dimensional plastic film without cracks or curls can be provided. The plastic films can be a substitute for existing glass, thereby enabling manufacturing of various electronic products, such as a display and the like, which are light and will not be easily damaged by external pressure.

公开(公告)号：US09884969B2

公开(公告)日：2018-02-06

申请号：US14020419

申请日：2013-09-06

Applicant: LG CHEM, LTD.

Inventor： Heon Kim ,  Yeong-Rae Chang ,  Hye-Min Kim

IPC: C09D7/12 ,  C08B37/16 ,  C08L101/00 ,  C08G83/00 ,  C08G63/08 ,  C09D105/16 ,  C08L5/16 ,  C09D4/06 ,  C08J7/04 ,  G03F7/027 ,  G03F7/031 ,  G03F7/032 ,  G03F7/033 ,  G03F7/035 ,  G03F7/075 ,  C08F220/34

CPC classification number: C09D7/63 ,  C08B37/0012 ,  C08B37/0015 ,  C08F2220/343 ,  C08G63/08 ,  C08G83/007 ,  C08J7/047 ,  C08J2367/02 ,  C08J2400/21 ,  C08L5/16 ,  C08L101/005 ,  C09D4/06 ,  C09D105/16 ,  G03F7/027 ,  G03F7/031 ,  G03F7/032 ,  G03F7/033 ,  G03F7/035 ,  G03F7/0757 ,  C08L67/04

Abstract: The present invention relates to a novel polyrotaxane compound having a specific chemical structure, a photocurable coating composition that may provide a coating material having excellent mechanical properties such as scratch resistance, chemical resistance, abrasion resistance, and the like, and excellent self-healing capability, and a coating film obtained from the photocurable coating composition.