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公开(公告)号：US09372399B2
公开(公告)日：2016-06-21
申请号：US13812459
申请日：2011-07-21
申请人： Martinus Bernardus Van Der Mark , Vadim Yevgenyevich Banine , Andre Bernardus Jeunink , Johan Frederik Dijksman , Sander Frederik Wuister , Emiel Andreas Godefridus Peeters , Johan Hendrik Klootwijk , Roelof Koole , Christianus Martinus Van Heesch , Ruediger Guenter Mauczok , Jacobus Bernardus Giesbers
发明人： Martinus Bernardus Van Der Mark , Vadim Yevgenyevich Banine , Andre Bernardus Jeunink , Johan Frederik Dijksman , Sander Frederik Wuister , Emiel Andreas Godefridus Peeters , Johan Hendrik Klootwijk , Roelof Koole , Christianus Martinus Van Heesch , Ruediger Guenter Mauczok , Jacobus Bernardus Giesbers
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint lithography method is disclosed for reducing a difference between an intended topography and an actual topography arising from a part of a patterned layer of fixed imprintable medium. The method involves imprinting an imprint lithography template into a layer of flowable imprintable medium to form a patterned layer in the imprintable medium, and fixing the imprintable medium to form a patterned layer of fixed imprintable medium. Local excitation is applied to the part of the patterned layer to adjust a chemical reaction in the part of the patterned layer to reduce the difference between the intended topography and the actual topography arising from the part of the fixed patterned layer of imprintable medium when this is subsequently used as a resist for patterning the substrate. An imprint medium suitable for imprint lithography with the method is also disclosed.
摘要翻译： 公开了一种压印光刻方法，用于减少由固定的可打印介质的图案层的一部分产生的预期形貌和实际形貌之间的差异。 该方法包括将压印光刻模板压印到可流动的可压印介质层中以在可压印介质中形成图案化层，并固定可压印介质以形成固定可压印介质的图案化层。 局部激发被施加到图案化层的部分以调整图案化层的部分中的化学反应，以减少所期望的形貌与由可压印介质的固定图案化层的部分产生的实际形貌之间的差异，当这是 随后用作图案化基板的抗蚀剂。 还公开了适用于该方法的压印光刻的压印介质。
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公开(公告)号：US20130120725A1
公开(公告)日：2013-05-16
申请号：US13812459
申请日：2011-07-21
申请人： Martinus Bernardus Van Der Mark , Vadim Yevgenyevich Banine , Andre Bernardus Jeunink , Johan Frederik Dijksman , Sander Frederik Wuister , Emiel Andreas Godefridus Peeters , Johan Hendrik Klootwijk , Roelof Koole , Christianus Martinus Van Heesch , Ruediger Guenter Mauczok , JAcobus Bernardus Giesbers
发明人： Martinus Bernardus Van Der Mark , Vadim Yevgenyevich Banine , Andre Bernardus Jeunink , Johan Frederik Dijksman , Sander Frederik Wuister , Emiel Andreas Godefridus Peeters , Johan Hendrik Klootwijk , Roelof Koole , Christianus Martinus Van Heesch , Ruediger Guenter Mauczok , JAcobus Bernardus Giesbers
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint lithography method is disclosed for reducing a difference between an intended topography and an actual topography arising from a part of a patterned layer of fixed imprintable medium. The method involves imprinting an imprint lithography template into a layer of flowable imprintable medium to form a patterned layer in the imprintable medium, and fixing the imprintable medium to form a patterned layer of fixed imprintable medium. Local excitation is applied to the part of the patterned layer to adjust a chemical reaction in the part of the patterned layer to reduce the difference between the intended topography and the actual topography arising from the part of the fixed patterned layer of imprintable medium when this is subsequently used as a resist for patterning the substrate. An imprint medium suitable for imprint lithography with the method is also disclosed.
摘要翻译： 公开了一种压印光刻方法，用于减少由固定的可打印介质的图案层的一部分产生的预期形貌和实际形貌之间的差异。 该方法包括将压印光刻模板压印到可流动的可压印介质层中以在可压印介质中形成图案化层，并固定可压印介质以形成固定可压印介质的图案化层。 局部激发被施加到图案化层的部分以调整图案化层的部分中的化学反应，以减少所期望的形貌与由可压印介质的固定图案化层的部分产生的实际形貌之间的差异，当这是 随后用作图案化基板的抗蚀剂。 还公开了适用于该方法的压印光刻的压印介质。
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公开(公告)号：US20110001254A1
公开(公告)日：2011-01-06
申请号：US12820492
申请日：2010-06-22
申请人： Yvonne Wendela Kruijt-Stegeman , Andre Bernardus Jeunink , Arie Jeffrey Den Boef , Vadim Yevgenyevich Banine , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Johan Frederik Dijksman , Carolus Johannes Catharina Schoormans , Adrianus Hendrik Koevoets , Catharinus De Schiffart , Sander Frederik Wuister
发明人： Yvonne Wendela Kruijt-Stegeman , Andre Bernardus Jeunink , Arie Jeffrey Den Boef , Vadim Yevgenyevich Banine , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Johan Frederik Dijksman , Carolus Johannes Catharina Schoormans , Adrianus Hendrik Koevoets , Catharinus De Schiffart , Sander Frederik Wuister
CPC分类号： G03F9/7042 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint lithography apparatus is disclosed that includes an imprint template holder arranged to hold an imprint template, and a plurality of position sensors configured to measure change of the size and/or shape of the imprint template, wherein the position sensors are mechanically isolated from the imprint template. Also disclosed is a lithography method that includes using an imprint template to imprint a pattern onto a substrate, and measuring changes of the size and/or shape of the imprint template while imprinting the pattern onto the substrate.
摘要翻译： 公开了一种压印光刻设备，其包括布置成保持压印模板的压印模板保持器和被配置为测量压印模板的尺寸和/或形状的变化的多个位置传感器，其中位置传感器与 印记模板 还公开了一种光刻方法，其包括使用压印模板将图案印刷到基板上，以及在将图案压印到基板上的同时测量压印模板的尺寸和/或形状的变化。
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公开(公告)号：US08529823B2
公开(公告)日：2013-09-10
申请号：US12891422
申请日：2010-09-27
申请人： Arie Jeffrey Den Boef , Vadim Yevgenyevich Banine , Andre Bernardus Jeunink , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman
发明人： Arie Jeffrey Den Boef , Vadim Yevgenyevich Banine , Andre Bernardus Jeunink , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/7003 , G03F9/7049 , G03F9/7076
摘要： A method of determining an offset between an imprint template and a substrate using an alignment grating on the imprint template and an alignment grating on the substrate is disclosed. The method includes bringing the imprint template alignment grating and the substrate alignment grating sufficiently close together such that they form a composite grating, directing an alignment radiation beam at the composite grating while modulating the relative position of the imprint template and the substrate, detecting the intensity of alignment radiation which is reflected from the composite grating, and determining the offset by analyzing modulation of the detected intensity.
摘要翻译： 公开了一种使用压印模板上的对准光栅和衬底上的对准光栅来确定压印模板和衬底之间的偏移的方法。 该方法包括使压印模板对准光栅和衬底对准光栅足够靠近在一起，使得它们形成复合光栅，将复合光栅的对准辐射束引导，同时调制压印模板和衬底的相对位置，检测强度 从复合光栅反射的对准辐射，并通过分析检测强度的调制来确定偏移。
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公开(公告)号：US09864279B2
公开(公告)日：2018-01-09
申请号：US13812844
申请日：2011-06-14
申请人： Catharinus De Schiffart , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Andre Bernardus Jeunink , Gregor Edward Van Baars , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Norbert Erwin Therenzo Jansen , Toon Hardeman , George Arie Jan De Fockert , Johan Frederik Dijksman
发明人： Catharinus De Schiffart , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Andre Bernardus Jeunink , Gregor Edward Van Baars , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Norbert Erwin Therenzo Jansen , Toon Hardeman , George Arie Jan De Fockert , Johan Frederik Dijksman
CPC分类号： G03F7/7035 , B29C43/021 , B29C43/04 , B29C43/14 , B29C2043/142 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/70775 , G03F7/70825 , G03F7/7085 , G03F7/709 , G03F9/7042
摘要： An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.
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公开(公告)号：US20130182236A1
公开(公告)日：2013-07-18
申请号：US13812844
申请日：2011-06-14
申请人： Catharinus De Schiffart , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Andre Bernardus Jeunink , Gregor Edward Van Baars , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Norbert Erwin Therenzo Jansen , Toon Hardeman , George Arie Jan De Fockert , Johan Frederik Dijksman
发明人： Catharinus De Schiffart , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Andre Bernardus Jeunink , Gregor Edward Van Baars , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Norbert Erwin Therenzo Jansen , Toon Hardeman , George Arie Jan De Fockert , Johan Frederik Dijksman
IPC分类号： G03F7/00
CPC分类号： G03F7/7035 , B29C43/021 , B29C43/04 , B29C43/14 , B29C2043/142 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/70775 , G03F7/70825 , G03F7/7085 , G03F7/709 , G03F9/7042
摘要： An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.
摘要翻译： 一种压印光刻设备，具有要安装在地板上的第一框架，通过运动耦合安装在第一框架上的第二框架，安装在第二框架上的对准传感器，以将压印光刻模板布置与目标部分对准 基板和位置传感器，用于测量压印光刻模板布置和/或基板台相对于第二框架的位置。
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公开(公告)号：US20110008483A1
公开(公告)日：2011-01-13
申请号：US12821806
申请日：2010-06-23
申请人： Andre Bernardus Jeunink , Vadim Yevgenyevich Banine , Hans Butler , Engelbertus Antonius Fransiscus Van Der Pasch , Johannes Petrus Martinus Bernardus Vermeulen , Yvonne Wendela Kruijt-Stegeman
发明人： Andre Bernardus Jeunink , Vadim Yevgenyevich Banine , Hans Butler , Engelbertus Antonius Fransiscus Van Der Pasch , Johannes Petrus Martinus Bernardus Vermeulen , Yvonne Wendela Kruijt-Stegeman
IPC分类号： B29C59/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/00
摘要： An imprint lithography apparatus is disclosed that includes a structure located away from a substrate holder and extending across the substrate holder, and such that an imprint template arrangement is, in use, located between the structure and the substrate holder, wherein the structure has one or more arrays of lines or one or more encoders, and the substrate or substrate holder and the imprint template have a corresponding one or more encoders that face towards one or more of the one or more arrays of lines or one or more arrays of lines that face towards one or more of the one or more encoders, and the configuration determination arrangement is configured to determine a relative configuration between the substrate or substrate holder and the structure, and/or a relative configuration between the imprint template arrangement and the structure, and/or a relative configuration between the imprint template arrangement and the substrate or substrate holder.
摘要翻译： 公开了一种压印光刻设备，其包括远离衬底保持器并延伸穿过衬底保持器的结构，并且使得压印模板布置在使用中位于结构和衬底保持器之间，其中结构具有一个或 更多的线阵列或一个或多个编码器，并且衬底或衬底保持器和压印模板具有对应的一个或多个编码器，其面向一个或多个线阵列或一个或多个面阵列阵列 朝向一个或多个编码器中的一个或多个，并且配置确定装置被配置为确定衬底或衬底保持器与结构之间的相对配置，和/或压印模板布置和结构之间的相对配置，和/ 或压印模板布置和基板或基板保持器之间的相对配置。
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公开(公告)号：US09116423B2
公开(公告)日：2015-08-25
申请号：US12821806
申请日：2010-06-23
申请人： Andre Bernardus Jeunink , Vadim Yevgenyevich Banine , Hans Butler , Engelbertus Antonius Fransiscus Van Der Pasch , Johannes Petrus Martinus Bernardus Vermeulen , Yvonne Wendela Kruijt-Stegeman
发明人： Andre Bernardus Jeunink , Vadim Yevgenyevich Banine , Hans Butler , Engelbertus Antonius Fransiscus Van Der Pasch , Johannes Petrus Martinus Bernardus Vermeulen , Yvonne Wendela Kruijt-Stegeman
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/00
摘要： An imprint lithography apparatus is disclosed that includes a structure located away from a substrate holder and extending across the substrate holder, and such that an imprint template arrangement is, in use, located between the structure and the substrate holder, wherein the structure has one or more arrays of lines or one or more encoders, and the substrate or substrate holder and the imprint template have a corresponding one or more encoders that face towards one or more of the one or more arrays of lines or one or more arrays of lines that face towards one or more of the one or more encoders, and the configuration determination arrangement is configured to determine a relative configuration between the substrate or substrate holder and the structure, and/or a relative configuration between the imprint template arrangement and the structure, and/or a relative configuration between the imprint template arrangement and the substrate or substrate holder.
摘要翻译： 公开了一种压印光刻设备，其包括远离衬底保持器并延伸穿过衬底保持器的结构，并且使得压印模板布置在使用中位于结构和衬底保持器之间，其中结构具有一个或 更多的线阵列或一个或多个编码器，并且衬底或衬底保持器和压印模板具有对应的一个或多个编码器，其面向一个或多个线阵列或一个或多个面阵列阵列 朝向一个或多个编码器中的一个或多个，并且配置确定装置被配置为确定衬底或衬底保持器与结构之间的相对配置，和/或压印模板布置与结构之间的相对配置，和/ 或压印模板布置和基板或基板保持器之间的相对配置。
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公开(公告)号：US20120313295A1
公开(公告)日：2012-12-13
申请号：US13579544
申请日：2011-01-11
申请人： Arie Jeffrey Den Boef , Andre Bernardus Jeunink , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman
发明人： Arie Jeffrey Den Boef , Andre Bernardus Jeunink , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/7042
摘要： A method of determining a position of an imprint template in an imprint lithography apparatus. In an embodiment, the method includes illuminating an area of the imprint template in which an alignment mark is expected to be found by scanning an alignment radiation beam over that area, detecting an intensity of radiation reflected or transmitted from the area, and identifying the alignment mark via analysis of the detected intensity.
摘要翻译： 一种在压印光刻设备中确定压印模板的位置的方法。 在一个实施例中，该方法包括通过扫描在该区域上的对准辐射束来照射其中期望找到对准标记的压印模板的区域，检测从该区域反射或发射的辐射的强度，以及识别对准 通过分析检测到的强度来标记。
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公开(公告)号：US09535322B2
公开(公告)日：2017-01-03
申请号：US13579544
申请日：2011-01-11
申请人： Arie Jeffrey Den Boef , Andre Bernardus Jeunink , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman
发明人： Arie Jeffrey Den Boef , Andre Bernardus Jeunink , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/7042
摘要： A method of determining a position of an imprint template in an imprint lithography apparatus. In an embodiment, the method includes illuminating an area of the imprint template in which an alignment mark is expected to be found by scanning an alignment radiation beam over that area, detecting an intensity of radiation reflected or transmitted from the area, and identifying the alignment mark via analysis of the detected intensity.
摘要翻译： 一种在压印光刻设备中确定压印模板的位置的方法。 在一个实施例中，该方法包括通过扫描在该区域上的对准辐射束来照射其中期望找到对准标记的压印模板的区域，检测从该区域反射或发射的辐射的强度，以及识别对准 通过分析检测到的强度来标记。
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