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    Piezo-electric substrate and manufacturing method of the same
    1.
    发明申请
    Piezo-electric substrate and manufacturing method of the same 有权
    压电基板及其制造方法相同

    公开(公告)号：US20080024037A1

    公开(公告)日：2008-01-31

    申请号：US11880168

    申请日：2007-07-20

    申请人： Noboru Tamura ,  Nakaba Ichikawa ,  Takeshi Takabatake ,  Kaname Yasuda

    发明人： Noboru Tamura ,  Nakaba Ichikawa ,  Takeshi Takabatake ,  Kaname Yasuda

    IPC分类号： H01L41/04 ,  H01L41/22

    CPC分类号： H03H9/02834 ,  H03H3/10 ,  H03H9/02574 ,  Y10T29/42

    摘要： A piezo-electric substrate is mainly comprised of a base material and a film formed on one main surface of the base material. In the base material, the main surface on which the film is formed is a roughed main surface. The piezo-electric substrate is obtained by forming the film comprised of a material with a coefficient of linear expansion smaller than a coefficient of linear expansion of the base material on the roughened main surface using a thermal spraying method.

    摘要翻译： 压电基板主要由基材和形成在基材的一个主表面上的膜构成。 在基材中，形成有膜的主表面是粗糙的主表面。 通过使用热喷涂法将由包括粗糙化主表面上的基材的线膨胀系数的线性膨胀系数的材料构成的膜形成为压电基板。

    Piezo-electric substrate and manufacturing method of the same
    2.
    发明授权
    Piezo-electric substrate and manufacturing method of the same 有权
    压电基板及其制造方法相同

    公开(公告)号：US07569976B2

    公开(公告)日：2009-08-04

    申请号：US11880168

    申请日：2007-07-20

    申请人： Noboru Tamura ,  Nakaba Ichikawa ,  Takeshi Takabatake ,  Kaname Yasuda

    发明人： Noboru Tamura ,  Nakaba Ichikawa ,  Takeshi Takabatake ,  Kaname Yasuda

    IPC分类号： H01L41/08

    CPC分类号： H03H9/02834 ,  H03H3/10 ,  H03H9/02574 ,  Y10T29/42

    摘要： A piezo-electric substrate is mainly comprised of a base material and a film formed on one main surface of the base material. In the base material, the main surface on which the film is formed is a roughed main surface. The piezo-electric substrate is obtained by forming the film comprised of a material with a coefficient of linear expansion smaller than a coefficient of linear expansion of the base material on the roughened main surface using a thermal spraying method.

    摘要翻译： 压电基材主要由基材和形成在基材的一个主表面上的膜构成。 在基材中，形成有膜的主表面是粗糙的主表面。 通过使用热喷涂法将由包括粗糙化主表面上的基材的线膨胀系数的线性膨胀系数的材料构成的膜形成为压电基板。

    ACOUSTIC WAVE DEVICE AND METHOD FOR MANUFACTURING THE SAME
    4.
    发明申请
    ACOUSTIC WAVE DEVICE AND METHOD FOR MANUFACTURING THE SAME 有权
    声波装置及其制造方法

    公开(公告)号：US20100301700A1

    公开(公告)日：2010-12-02

    申请号：US12864073

    申请日：2008-11-26

    申请人： Toshiyuki Fuyutsume ,  Taro Nishino ,  Hisashi Yamazaki ,  Kiyoto Araki ,  Noboru Tamura ,  Nakaba Ichikawa ,  Masaki Aruga

    发明人： Toshiyuki Fuyutsume ,  Taro Nishino ,  Hisashi Yamazaki ,  Kiyoto Araki ,  Noboru Tamura ,  Nakaba Ichikawa ,  Masaki Aruga

    IPC分类号： H01L41/04 ,  H01L41/22

    CPC分类号： H03H3/10 ,  Y10T29/42

    摘要： Provided are an acoustic wave device and a method for manufacturing the same, the acoustic wave device being effectively prevented from expanding and contracting due to temperature change and having a small frequency shift. The acoustic wave device of the present invention has a piezoelectric substrate (1) having an IDT (2) formed on one principal surface of the piezoelectric substrate (1), and a thermal spray film (3) formed on an opposite principal surface (1b) of the piezoelectric substrate (1), the thermal spray film being of a material having a smaller linear thermal expansion coefficient than the piezoelectric substrate (1) and having grain boundaries and pores (4), at least a part of which is filled with a filling material (5).

    摘要翻译： 提供一种声波装置及其制造方法，能够有效地防止声波装置由于温度变化而发生膨胀和收缩，并具有小的频移。 本发明的声波元件具有在压电基板（1）的一个主面上形成有IDT（2）的压电基板（1）和形成在相对的主面（1b）上的热喷涂膜 ），所述热喷涂膜是具有比所述压电基板（1）更小的线性热膨胀系数并且具有晶界和孔（4）的材料，所述材料的至少一部分填充有 填充材料（5）。

    Acoustic wave device and method for manufacturing the same
    5.
    发明授权
    Acoustic wave device and method for manufacturing the same 有权
    声波装置及其制造方法

    公开(公告)号：US08319394B2

    公开(公告)日：2012-11-27

    申请号：US12864073

    申请日：2008-11-26

    申请人： Toshiyuki Fuyutsume ,  Taro Nishino ,  Hisashi Yamazaki ,  Kiyoto Araki ,  Noboru Tamura ,  Nakaba Ichikawa ,  Masaki Aruga

    发明人： Toshiyuki Fuyutsume ,  Taro Nishino ,  Hisashi Yamazaki ,  Kiyoto Araki ,  Noboru Tamura ,  Nakaba Ichikawa ,  Masaki Aruga

    IPC分类号： H03H9/25

    CPC分类号： H03H3/10 ,  Y10T29/42

    摘要： Provided are an acoustic wave device and a method for manufacturing the same, the acoustic wave device being effectively prevented from expanding and contracting due to temperature change and having a small frequency shift. The acoustic wave device of the present invention has a piezoelectric substrate (1) having an IDT (2) formed on one principal surface of the piezoelectric substrate (1), and a thermal spray film (3) formed on an opposite principal surface (1b) of the piezoelectric substrate (1), the thermal spray film being of a material having a smaller linear thermal expansion coefficient than the piezoelectric substrate (1) and having grain boundaries and pores (4), at least a part of which is filled with a filling material (5).

    摘要翻译： 提供一种声波装置及其制造方法，能够有效地防止声波装置由于温度变化而发生膨胀和收缩，并具有小的频移。 本发明的声波元件具有在压电基板（1）的一个主面上形成有IDT（2）的压电基板（1）和形成在相对的主面（1b）上的热喷涂膜 ），所述热喷涂膜是具有比所述压电基板（1）更小的线性热膨胀系数并且具有晶界和孔（4）的材料，所述材料的至少一部分填充有 填充材料（5）。

    Processing apparatus
    7.
    发明授权
    Processing apparatus 有权
    处理装置

    公开(公告)号：US09150965B2

    公开(公告)日：2015-10-06

    申请号：US13262005

    申请日：2010-03-30

    申请人： Shuji Moriya ,  Toyohiko Shindo ,  Noboru Tamura

    发明人： Shuji Moriya ,  Toyohiko Shindo ,  Noboru Tamura

    IPC分类号： C23F1/00 ,  H01L21/306 ,  C23C16/44 ,  C23C16/448 ,  C23C16/452 ,  C23C16/52 ,  C23C16/455

    CPC分类号： C23C16/4402 ,  C23C16/448 ,  C23C16/4488 ,  C23C16/452 ,  C23C16/45561 ,  C23C16/52

    摘要： A processing apparatus includes a gas supply passage for supplying a corrosive gas having a halogen, a part of the passage being made of a metal; a stabilization reaction unit which has an energy generator for supplying light energy or heat energy to the corrosive gas that has passed through the metallic part of the gas supply passage and/or has an obstacle configured to apply a collision energy to the corrosive gas that has passed through the metallic part of the gas supply passage, the collision energy being generated from a collision between the obstacle and said corrosive gas. A reaction for stabilizing a compound containing the metal and the halogen contained in the corrosive gas takes place by means of at least one of the light energy, heat energy, and collision energy; and a trapping unit which traps the compound stabilized in the stabilization reaction unit.

    摘要翻译： 一种处理装置，包括用于供给具有卤素的腐蚀性气体的气体供给通道，所述通道的一部分由金属制成; 稳定化反应单元，其具有能量发生器，用于向已经通过气体供给通道的金属部分的腐蚀性气体提供光能或热能，和/或具有构造成将碰撞能量施加到具有 通过供气通道的金属部分，碰撞能量是由障碍物和腐蚀性气体之间的碰撞产生的。 通过光能，热能和碰撞能量中的至少一种，使包含在腐蚀性气体中的金属和卤素的化合物稳定化的反应; 以及捕获稳定化反应单元中稳定化合物的捕集单元。

    Device and method for driving jetting head
    8.
    发明授权
    Device and method for driving jetting head 失效
    驱动喷头的装置及方法

    公开(公告)号：US07625056B2

    公开(公告)日：2009-12-01

    申请号：US11382859

    申请日：2006-05-11

    申请人： Takakazu Fukano ,  Noboru Tamura

    发明人： Takakazu Fukano ,  Noboru Tamura

    IPC分类号： B41J29/38

    CPC分类号： B41J2/04541 ,  B41J2/0452 ,  B41J2/04553 ,  B41J2/04563 ,  B41J2/0457 ,  B41J2/04573 ,  B41J2/04581 ,  B41J2/04588

    摘要： There is disclosed a head driving device which drives a plurality of pressure generating elements for generating pressure fluctuation in a jetted object contained in each of associated pressure chambers formed in a jetting head of a jetting apparatus to eject the jetted object from each of nozzles communicated with the associated pressure chambers. In the device, a head driver generates a drive signal which is selectively applied to at least one of the pressure generating elements to be driven. A bias potential provider selectively applies a bias potential to at least one of the pressure generating elements not to be driven.

    摘要翻译： 公开了一种头驱动装置，其驱动多个压力发生元件，用于在喷射装置的喷射头中形成的每个相关联的压力室中包含的喷射物体中产生压力波动，以从与每个喷嘴连通的喷嘴喷射喷射物体 相关压力室。 在该装置中，头驱动器产生驱动信号，该驱动信号被选择性地施加到待驱动的至少一个压力产生元件。 偏置电位提供器选择性地将偏压电位施加到不被驱动的压力产生元件中的至少一个。

    IMAGE FORMING APPARATUS, DATA PROCESSING METHOD THEREOF, AND COMPUTER-READABLE RECORDING MEDIUM STORING PROGRAM OF THE METHOD
    10.
    发明申请
    IMAGE FORMING APPARATUS, DATA PROCESSING METHOD THEREOF, AND COMPUTER-READABLE RECORDING MEDIUM STORING PROGRAM OF THE METHOD 审中-公开
    图像形成装置，其数据处理方法和方法的计算机可读记录介质存储程序

    公开(公告)号：US20070177919A1

    公开(公告)日：2007-08-02

    申请号：US11668793

    申请日：2007-01-30

    申请人： Kazuma Saitoh ,  Noboru Tamura

    发明人： Kazuma Saitoh ,  Noboru Tamura

    IPC分类号： B41J5/30

    CPC分类号： G06F3/1285 ,  G03G15/5004 ,  G03G15/5079 ,  G06F3/1203 ,  G06F3/1229 ,  G06F3/1236 ,  Y02D10/1592

    摘要： An image forming apparatus is disclosed. The image forming apparatus includes a data receiving section connected to a computer via a network for receiving a command from the computer, a command processing section for processing the command received by the data receiving section, a command interpreting section for interpreting the command and a data transmitting section for transmitting device information obtained by the command processing section. The command processing section requests the command interpreting section to interpret the command before completing a start-up of a device from which the command processing section obtains the device information.

    摘要翻译： 公开了一种图像形成装置。 图像形成装置包括经由网络连接到计算机的数据接收部分，用于从计算机接收命令，用于处理由数据接收部分接收的命令的命令处理部分，用于解释命令的命令解释部分和数据 发送部分，用于发送由命令处理部分获得的设备信息。 命令处理部分在完成命令处理部分从其获取设备信息的设备的启动之前请求命令解释部分解释该命令。