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1.发明授权Lithographic apparatus and device manufacturing method utilizing a continuous light beam in combination with pixel grid imaging 有权利用连续光束与像素网格成像相结合的平版印刷设备和器件制造方法公开(公告)号：US07251019B2
公开(公告)日：2007-07-31
申请号：US11185024
申请日：2005-07-20
CPC分类号： G03F7/70358 , G03F7/70275 , G03F7/70291
摘要： A continuous source of radiation, for example a lamp, is used in conjunction with pixel grid imaging. In one example, the individually controllable elements operate at a frequency of at least about 50 kHz. To compensate for any distortion of an exposed spot a point spread function is adjusted to be shorter in a scanning direction.
摘要翻译： 连续的辐射源，例如灯，与像素网格成像结合使用。 在一个示例中，独立可控元件以至少约50kHz的频率工作。 为了补偿曝光点的任何变形，点扩散函数被调整为在扫描方向上更短。
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公开(公告)号：US09316926B2
公开(公告)日：2016-04-19
申请号：US13885960
申请日：2011-11-15
IPC分类号： G03F7/20
CPC分类号： G03F7/70641 , G03F7/70216 , G03F7/70258 , G03F7/70266 , G03F7/70275 , G03F7/70375 , G03F7/70383 , G03F7/70391 , G03F7/704
摘要： A system to control the focus of a mask-less lithographic apparatus, the apparatus including a projection system to project an image of a programmable patterning device onto a substrate. A first actuator system is configured to move at least one of the lenses of the projection system in a direction perpendicular to the optical axis of the projection system. A radiation beam expander is configured to project an image of the programmable patterning device onto the at least one lens. A second actuator system is configured to move the radiation beam expander in a direction parallel to the optical axis of the projection system in order to control the focus of the image projected onto the substrate.
摘要翻译： 一种用于控制无掩模光刻设备的焦点的系统，该设备包括将可编程图案形成装置的图像投影到基板上的投影系统。 第一致动器系统被配置为沿着垂直于投影系统的光轴的方向移动投影系统的透镜中的至少一个。 辐射束扩展器被配置为将可编程图案形成装置的图像投影到至少一个透镜上。 第二致动器系统被配置成沿着平行于投影系统的光轴的方向移动辐射束扩展器，以便控制投影到基板上的图像的焦点。
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3.发明申请公开(公告)号：US20130242277A1
公开(公告)日：2013-09-19
申请号：US13885066
申请日：2011-12-02
IPC分类号： G03F7/20
CPC分类号： G03F7/70508 , G03F7/70291 , G03F7/70433 , G03F7/7055 , G03F7/70558
摘要： A system for controlling a patterning device in a lithographic apparatus using a patterning device having individually controllable elements that may only be set to two states. The method includes converting a representation of a pattern to be formed on the substrate into a plurality of area intensity signals, each corresponding to a radiation intensity level required to be set in a respective area of the patterning device in order to provide the desired pattern on the substrate and a separate step of converting each of the area intensity signals into control signals for a plurality of individually controllable elements that each correspond to the area of the patterning device.
摘要翻译： 一种用于使用具有单独可控元件的图案形成装置来控制光刻设备中的图案形成装置的系统，该单独可控元件仅可设置为两种状态。 该方法包括将要形成在衬底上的图案的表示转换为多个区域强度信号，每个区域强度信号对应于需要设置在图案形成装置的相应区域中的辐射强度水平，以便提供期望的图案 基板和单独的步骤，将每个区域强度信号转换成多个独立可控元件的控制信号，每个对应于图案形成装置的区域。
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4.发明授权Lithographic apparatus, programmable patterning device and lithographic method 有权光刻设备，可编程图案形成装置和光刻方法公开(公告)号：US08531648B2
公开(公告)日：2013-09-10
申请号：US13119884
申请日：2009-09-21
申请人： Pieter Willem Herman De Jager , Vadim Yevgenyevich Banine , Jozef Petrus Henricus Benschop , Cheng-Qun Gui , Johannes Onvlee , Erwin John Van Zwet
发明人： Pieter Willem Herman De Jager , Vadim Yevgenyevich Banine , Jozef Petrus Henricus Benschop , Cheng-Qun Gui , Johannes Onvlee , Erwin John Van Zwet
CPC分类号： G03F7/70183 , G03F7/70275 , G03F7/70291 , G03F7/70391 , G03F7/704
摘要： In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator may be moveable with respect the exposure area and/or the projection system may have an array of lenses to receive the plurality of beams, the array of lenses moveable with respect to the exposure area.
摘要翻译： 在一个实施例中，公开了一种光刻设备，其包括调制器，该调制器被配置为将基板的曝光区域暴露于根据期望图案调制的多个光束;以及投影系统，该投影系统被配置为将经调制的光束投影到基板上。 调制器可以相对于曝光区域可移动，和/或投影系统可以具有用于接收多个光束的透镜阵列，透镜阵列可相对于曝光区域移动。
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公开(公告)号：US08395755B2
公开(公告)日：2013-03-12
申请号：US12506808
申请日：2009-07-21
申请人： Richard Alexander George , Cheng-Qun Gui , Pieter Willem Herman De Jager , Robbert Edgar Van Leeuwen , Jacobus Burghoorn
发明人： Richard Alexander George , Cheng-Qun Gui , Pieter Willem Herman De Jager , Robbert Edgar Van Leeuwen , Jacobus Burghoorn
CPC分类号： G03B27/53 , G03F7/70291 , G03F7/70791 , G03F9/7003 , G03F9/7026
摘要： A lithography apparatus includes a projection system configured to project a radiation beam onto a substrate, a detector configured to inspect the substrate, and a substrate table configured to support the substrate and move the substrate relative to the projection system and the detector. The detector is arranged to inspect a portion of the substrate while the substrate is moved and before the portion is exposed to the radiation beam.
摘要翻译： 光刻设备包括投影系统，该投影系统配置成将辐射束投影到基板上，检测器被配置为检查基板;以及基板台，其构造成支撑基板并相对于投影系统和检测器移动基板。 检测器布置成在衬底移动时和在暴露于辐射束之前检查衬底的一部分。
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公开(公告)号：US20120255161A1
公开(公告)日：2012-10-11
申请号：US13498582
申请日：2010-09-28
CPC分类号： H01L21/67144 , H01L2924/0002 , Y10T29/49002 , Y10T29/53096 , H01L2924/00
摘要： A place station for a pick-and-place machine, comprising: a place stage assembly comprising a place stage for supporting a substrate; a covering for providing a clean environment at the substrate, the covering comprising a first opening in a first face of the covering through which a placement operation may be performed to a limited area of the substrate; wherein the place stage and the covering are mounted for relative movement to allow the opening to achieve a selected relative position over the substrate.
摘要翻译： 一种用于拾取和放置机器的放置台，包括：放置台组件，其包括用于支撑衬底的放置台; 用于在基板上提供清洁环境的覆盖物，所述覆盖物包括在所述覆盖物的第一面中的第一开口，通过所述第一开口可以对所述基板的有限区域进行放置操作; 其中所述放置台和所述覆盖物安装成相对运动以允许所述开口在所述基板上实现选定的相对位置。
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公开(公告)号：US07253881B2
公开(公告)日：2007-08-07
申请号：US11024030
申请日：2004-12-29
CPC分类号： G03F7/70283
摘要： Improved gray scaling imaging methods and systems include a group of elements within an array of individually controllable elements that project a part of a radiation beam onto a lens in an array of microlenses, and are individually controllable so that any number of the individually controllable elements may be switched on or off to generate a gray scale.
摘要翻译： 改进的灰度成像方法和系统包括在独立可控元件阵列内的一组元件，其将辐射束的一部分投影到微透镜阵列中的透镜上，并且是可单独控制的，使得任何数量的独立可控元件可以 打开或关闭以生成灰度级。
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公开(公告)号：US07190434B2
公开(公告)日：2007-03-13
申请号：US10779823
申请日：2004-02-18
IPC分类号： G03B27/42
CPC分类号： G03F7/70208 , G03F7/70275 , G03F7/70283 , G03F7/70291
摘要： Provided is a radiation distribution system for distributing the radiation from an illumination system to two or more patterning means, each for patterning beams of radiation, which are subsequently projected onto a substrate.
摘要翻译： 提供了一种用于将照明系统的辐射分配到两个或更多个图案形成装置的辐射分布系统，每个图案装置用于构图辐射束，随后将其投影到衬底上。
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9.发明申请LITHOGRAPHIC APPARATUS, PROGRAMMABLE PATTERNING DEVICE AND LITHOGRAPHIC METHOD 审中-公开光栅设备，可编程格式设备和光刻方法公开(公告)号：US20140160452A1
公开(公告)日：2014-06-12
申请号：US14233361
申请日：2012-07-20
申请人： Pieter Willem Herman De Jager , Vadim Yevgenyevich Banine , Arno Jan Bleeker , Harmen Klaas Van Der Schoot , Lucas Henricus Johnannes Stevens , Johannes Petrus Martinus Bernardus Vermeulen , Sander Frederik Wuister
发明人： Pieter Willem Herman De Jager , Vadim Yevgenyevich Banine , Arno Jan Bleeker , Harmen Klaas Van Der Schoot , Lucas Henricus Johnannes Stevens , Johannes Petrus Martinus Bernardus Vermeulen , Sander Frederik Wuister
IPC分类号： B41C1/10
CPC分类号： B41C1/1091 , C23C14/28 , G03F7/70375 , G03F7/70383
摘要： A lithographic apparatus is disclosed that includes a modulator to modulate a plurality of beams according to a desired pattern and a donor structure on to which the modulated beams impinge. The donor structure is configured such that the impinging modulated beams cause a donor material to be transferred from the donor structure to the substrate.
摘要翻译： 公开了一种光刻设备，其包括根据期望的图案调制多个光束的调制器和被调制的光束照射到的施主结构。 供体结构被配置为使得入射的调制光束使施主材料从施主结构转移到衬底。
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公开(公告)号：US20130250267A1
公开(公告)日：2013-09-26
申请号：US13885960
申请日：2011-11-15
IPC分类号： G03F7/20
CPC分类号： G03F7/70641 , G03F7/70216 , G03F7/70258 , G03F7/70266 , G03F7/70275 , G03F7/70375 , G03F7/70383 , G03F7/70391 , G03F7/704
摘要： A system to control the focus of a mask-less lithographic apparatus, the apparatus including a projection system to project an image of a programmable patterning device onto a substrate. A first actuator system is configured to move at least one of the lenses of the projection system in a direction perpendicular to the optical axis of the projection system. A radiation beam expander is configured to project an image of the programmable patterning device onto the at least one lens. A second actuator system is configured to move the radiation beam expander in a direction parallel to the optical axis of the projection system in order to control the focus of the image projected onto the substrate.
摘要翻译： 一种用于控制无掩模光刻设备的焦点的系统，该设备包括将可编程图案形成装置的图像投影到基板上的投影系统。 第一致动器系统被配置为沿着垂直于投影系统的光轴的方向移动投影系统的透镜中的至少一个。 辐射束扩展器被配置为将可编程图案形成装置的图像投影到至少一个透镜上。 第二致动器系统被配置成沿着平行于投影系统的光轴的方向移动辐射束扩展器，以便控制投影到基板上的图像的焦点。
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