Selective application of word line bias to minimize fringe effects in electromagnetic fields during erase of nonvolatile memory
    2.
    发明授权
    Selective application of word line bias to minimize fringe effects in electromagnetic fields during erase of nonvolatile memory 有权
    选择性地应用字线偏置,以最大限度地减少非易失性存储器擦除期间电磁场中的边缘效应

    公开(公告)号:US07952938B2

    公开(公告)日:2011-05-31

    申请号:US12773232

    申请日:2010-05-04

    IPC分类号: G11C16/04

    CPC分类号: G11C16/3418

    摘要: A memory device comprising an optimization component that facilitates erasing memory cells in a substantially homogeneous electromagnetic field and methods that facilitate erasing memory cells in a substantially homogeneous electromagnetic field are presented. The optimization component facilitates selecting a subset of memory cells to be erased at the same time, such that a memory cell in the subset of memory cells has two neighbor memory cells adjacent thereto that are in the subset of memory, or one neighbor memory cell adjacent thereto when the memory cell is an end-row memory cell. The optimization component facilitates performing a Fowler-Nordheim channel erase to erase the subset of memory cells, and a predetermined voltage potential associated with an erase command is applied to each cell of the subset of memory cells to facilitate reducing fringing effect associated with the electromagnetic fields applied to the cells during the erase.

    摘要翻译: 提供了一种存储器件,其包括便于擦除基本上均匀的电磁场中的存储器单元的优化部件,以及便于在基本均匀的电磁场中擦除存储器单元的方法。 优化组件有助于同时选择要擦除的存储器单元的子集,使得存储器单元子集中的存储单元具有与存储单元相邻的两个相邻存储器单元,其位于存储器的子集中,或者相邻的一个相邻存储器单元 当存储器单元是端行存储单元时。 优化组件有助于执行Fowler-Nordheim信道擦除来擦除存储器单元的子集,并且与擦除命令相关联的预定电压电位被施加到存储器单元子集的每个单元,以便于减少与电磁场相关联的边缘效应 在擦除期间应用于细胞。

    Selective application of word line bias to minimize fringe effects in electromagnetic fields during erase of nonvolatile memory
    3.
    发明授权
    Selective application of word line bias to minimize fringe effects in electromagnetic fields during erase of nonvolatile memory 有权
    选择性地应用字线偏置,以最大限度地减少非易失性存储器擦除期间电磁场中的边缘效应

    公开(公告)号:US07746705B2

    公开(公告)日:2010-06-29

    申请号:US11953689

    申请日:2007-12-10

    IPC分类号: G11C16/04

    CPC分类号: G11C16/3418

    摘要: A memory device comprising an optimization component that facilitates erasing memory cells in a substantially homogeneous electromagnetic field and methods that facilitate erasing memory cells in a substantially homogeneous electromagnetic field are presented. The optimization component facilitates selecting a subset of memory cells to be erased at the same time, such that a memory cell in the subset of memory cells has two neighbor memory cells adjacent thereto that are in the subset of memory, or one neighbor memory cell adjacent thereto when the memory cell is an end-row memory cell. The optimization component facilitates performing a Fowler-Nordheim channel erase to erase the subset of memory cells, and a predetermined voltage potential associated with an erase command is applied to each cell of the subset of memory cells to facilitate reducing fringing effect associated with the electromagnetic fields applied to the cells during the erase.

    摘要翻译: 提供了一种存储器件,其包括便于擦除基本上均匀的电磁场中的存储器单元的优化部件,以及便于在基本均匀的电磁场中擦除存储器单元的方法。 优化组件有助于同时选择要擦除的存储器单元的子集,使得存储器单元子集中的存储单元具有与存储单元相邻的两个相邻存储器单元,其位于存储器的子集中,或者相邻的一个相邻存储器单元 当存储器单元是端行存储单元时。 优化组件有助于执行Fowler-Nordheim信道擦除来擦除存储器单元的子集,并且与擦除命令相关联的预定电压电位被施加到存储器单元子集的每个单元,以便于减少与电磁场相关联的边缘效应 在擦除期间应用于细胞。

    SELECTIVE APPLICATION OF WORD LINE BIAS TO MINIMIZE FRINGE EFFECTS IN ELECTROMAGNETIC FIELDS DURING ERASE OF NONVOLATILE MEMORY
    4.
    发明申请
    SELECTIVE APPLICATION OF WORD LINE BIAS TO MINIMIZE FRINGE EFFECTS IN ELECTROMAGNETIC FIELDS DURING ERASE OF NONVOLATILE MEMORY 有权
    选择性应用字线偏移以最小化非易失性存储器中的电磁场中的影响

    公开(公告)号:US20100208527A1

    公开(公告)日:2010-08-19

    申请号:US12773232

    申请日:2010-05-04

    IPC分类号: G11C16/04

    CPC分类号: G11C16/3418

    摘要: A memory device comprising an optimization component that facilitates erasing memory cells in a substantially homogeneous electromagnetic field and methods that facilitate erasing memory cells in a substantially homogeneous electromagnetic field are presented. The optimization component facilitates selecting a subset of memory cells to be erased at the same time, such that a memory cell in the subset of memory cells has two neighbor memory cells adjacent thereto that are in the subset of memory, or one neighbor memory cell adjacent thereto when the memory cell is an end-row memory cell. The optimization component facilitates performing a Fowler-Nordheim channel erase to erase the subset of memory cells, and a predetermined voltage potential associated with an erase command is applied to each cell of the subset of memory cells to facilitate reducing fringing effect associated with the electromagnetic fields applied to the cells during the erase.

    摘要翻译: 提供了一种存储器件,其包括便于擦除基本上均匀的电磁场中的存储器单元的优化部件,以及便于在基本均匀的电磁场中擦除存储器单元的方法。 优化组件有助于同时选择要擦除的存储器单元的子集,使得存储器单元子集中的存储单元具有与存储单元相邻的两个相邻存储器单元,其位于存储器的子集中,或者相邻的一个相邻存储器单元 当存储器单元是端行存储单元时。 优化组件有助于执行Fowler-Nordheim信道擦除来擦除存储器单元的子集,并且与擦除命令相关联的预定电压电位被施加到存储器单元子集的每个单元,以便于减少与电磁场相关联的边缘效应 在擦除期间应用于细胞。

    Selective Application Of Word Line Bias To Minimize Fringe Effects In Electromagnetic Fields During Erase Of Nonvolatile Memory
    5.
    发明申请
    Selective Application Of Word Line Bias To Minimize Fringe Effects In Electromagnetic Fields During Erase Of Nonvolatile Memory 有权
    在非易失性存储器擦除期间,字线偏置的选择性应用以最小化电磁场中的边缘效应

    公开(公告)号:US20090147589A1

    公开(公告)日:2009-06-11

    申请号:US11953689

    申请日:2007-12-10

    IPC分类号: G11C16/18

    CPC分类号: G11C16/3418

    摘要: A memory device comprising an optimization component that facilitates erasing memory cells in a substantially homogeneous electromagnetic field and methods that facilitate erasing memory cells in a substantially homogeneous electromagnetic field are presented. The optimization component facilitates selecting a subset of memory cells to be erased at the same time, such that a memory cell in the subset of memory cells has two neighbor memory cells adjacent thereto that are in the subset of memory, or one neighbor memory cell adjacent thereto when the memory cell is an end-row memory cell. The optimization component facilitates performing a Fowler-Nordheim channel erase to erase the subset of memory cells, and a predetermined voltage potential associated with an erase command is applied to each cell of the subset of memory cells to facilitate reducing fringing effect associated with the electromagnetic fields applied to the cells during the erase.

    摘要翻译: 提供了一种存储器件,其包括便于擦除基本上均匀的电磁场中的存储器单元的优化部件,以及便于在基本均匀的电磁场中擦除存储器单元的方法。 优化组件有助于同时选择要擦除的存储器单元的子集,使得存储器单元子集中的存储单元具有与存储单元相邻的两个相邻存储器单元,其位于存储器的子集中,或者相邻的一个相邻存储器单元 当存储器单元是端行存储单元时。 优化组件有助于执行Fowler-Nordheim信道擦除来擦除存储器单元的子集,并且与擦除命令相关联的预定电压电位被施加到存储器单元子集的每个单元,以便于减少与电磁场相关联的边缘效应 在擦除期间应用于细胞。

    Method and apparatus for eliminating word line bending by source side implantation
    8.
    发明授权
    Method and apparatus for eliminating word line bending by source side implantation 有权
    通过源侧植入消除字线弯曲的方法和装置

    公开(公告)号:US07029975B1

    公开(公告)日:2006-04-18

    申请号:US10839561

    申请日:2004-05-04

    IPC分类号: H01L21/336

    摘要: A method and apparatus for coupling to a source line is disclosed. A semiconductor structure having an array of memory cells arranged in rows and columns is described. The array of memory cells includes a source region that is implanted with n-type dopants isolated between an adjoining pair of the non-intersecting STI regions and isolated from a drain region during the implantation. A source contact is located along a row of drain contacts that are coupled to drain regions of a row of memory cells and the source contact is coupled to the source region for providing electrical coupling with a plurality of source lines. The isolating of the implanted source region from the drain region during the implanting enables coupling of the source contact to the source lines while maintaining the n-type dopants between the STI regions and avoiding lateral diffusion to a bit-line.

    摘要翻译: 公开了一种用于耦合到源极线的方法和装置。 描述了具有排列成行和列的存储单元阵列的半导体结构。 存储单元阵列包括源区域,其注入在相邻的一对不相交的STI区域之间隔离并在植入期间与漏区隔离的n型掺杂剂。 源极触点沿着一排漏极触点排列,其被连接到一行存储器单元的漏极区域,并且源极触点耦合到源极区域以提供与多个源极线的电耦合。 在植入期间将注入的源极区域与漏极区域隔离使得能够将源极接触耦合到源极线,同时保持STI区域之间的n型掺杂剂并且避免横向扩散到位线。

    Memory cell with plasma-grown oxide spacer for reduced DIBL and Vss resistance and increased reliability
    10.
    发明授权
    Memory cell with plasma-grown oxide spacer for reduced DIBL and Vss resistance and increased reliability 有权
    具有等离子体生长氧化物间隔物的存储单元用于降低DIBL和Vss电阻并增加可靠性

    公开(公告)号:US07151028B1

    公开(公告)日:2006-12-19

    申请号:US10981174

    申请日:2004-11-04

    IPC分类号: H01L21/26

    摘要: According to one exemplary embodiment, a method for fabricating a floating gate memory cell on a substrate comprises a step of forming a first spacer adjacent to a source sidewall of a stacked gate structure, where the stacked gate structure is situated over a channel region in the substrate. The method further comprises forming a high energy implant doped region adjacent to the first spacer in a source region of the substrate. The method further comprises forming a recess in the source region, where a sidewall of the recess is situated adjacent to a source of the floating gate memory cell, and where forming the recess comprises removing the first spacer. The method further comprises forming a second spacer adjacent to the source sidewall of the stacked gate structure, where the second spacer extends to a bottom of the recess, and where the second spacer comprises plasma-grown oxide.

    摘要翻译: 根据一个示例性实施例,用于在衬底上制造浮动栅极存储器单元的方法包括形成邻近层叠栅极结构的源极侧壁的第一间隔物的步骤,其中堆叠的栅极结构位于 基质。 该方法还包括在衬底的源区中形成与第一间隔物相邻的高能注入掺杂区。 该方法还包括在源极区域中形成凹部,其中凹部的侧壁位于与浮动栅极存储单元的源极相邻处,并且其中形成凹槽包括移除第一间隔物。 该方法还包括形成邻近层叠栅极结构的源极侧壁的第二间隔物,其中第二间隔物延伸到凹部的底部,并且其中第二间隔物包括等离子体生长的氧化物。