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公开(公告)号：US20230398655A1
公开(公告)日：2023-12-14
申请号：US18333125
申请日：2023-06-12
IPC分类号： B24B7/22
CPC分类号： B24B7/228
摘要： Proposed herein is a method for producing a substrate suitable for mask blanks for EUVL and the method being capable of suppressing a concave defect having a depth of less than 5 nm.
The present invention provides a method for producing a substrate in which final polishing is performed by a polishing apparatus having an upper polishing plate equipped with a polishing pad, the method comprising the steps of placing a substrate stock in the polishing apparatus so that the main surface of the substrate stock face toward the upper polishing plate; rotating the upper polishing plate and polishing the substrate stock concomitantly with a polishing slurry on the main surface of the substrate stock; and raising the upper polishing plate which is kept being rotated to separate it from the main surface of the polished substrate stock.-
公开(公告)号：US20220352427A1
公开(公告)日：2022-11-03
申请号：US17866230
申请日：2022-07-15
摘要： A synthetic quartz glass cavity member (1) is bonded to a substrate (6) having an optical device (7) mounted thereon such that the device may be accommodated in the cavity member. The cavity member (1) has an inside surface consisting of a top surface (2a) opposed to the device (7) and a side surface (3a). The top surface (2a) is a mirror surface and the side surface (3a) is a rough surface.
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公开(公告)号：US20180057399A1
公开(公告)日：2018-03-01
申请号：US15685520
申请日：2017-08-24
发明人： Daijitsu HARADA , Masaki TAKEUCHI
摘要： A rectangular glass substrate has a front surface, a back surface, four side surfaces, and eight chamfered surfaces, and a thickness of at least 6 mm. A first curved surface along the edge line between the front surface and the chamfered surface disposed adjacent thereto has an average gradient of up to 25% in a range from the front surface to a position of 50 μm below the front surface when the substrate is rested horizontal with the front surface facing upward. A second curved surface along the edge line between at least one of four side surfaces and the chamfered surface disposed adjacent to the front surface has an average gradient of at least 30% in a range from the at least one side surface to a position of 50 μm below the at least one side surface when the substrate is rested horizontal with the at least one side surface facing upward.
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公开(公告)号：US20230037856A1
公开(公告)日：2023-02-09
申请号：US17856191
申请日：2022-07-01
IPC分类号： G03F1/60
摘要： A mask blanks substrate having a flatness of a calculation surface of 100 nm or less when a calculation region passing through central portions of first and second main surfaces and extending in a horizontal direction is set, a first region surface is cut out, a second region surface is cut out by setting a reference plane and a rotation axis and rotating the substrate by 180°, least square planes are calculated, the first and second region surfaces are converted into height maps to positions on the least square planes, the height map of the to second region surface is set as a reverse height map by symmetrically moving the height map, and a map of a calculated height obtained by adding heights of the height map of the first region surface and the reverse height map of the second region surface is set as the calculation surface.
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公开(公告)号：US20220372331A1
公开(公告)日：2022-11-24
申请号：US17732242
申请日：2022-04-28
摘要： A polishing composition including a colloidal silica containing colloidal silica particles, a pH adjusting agent, and a chelating agent provides a substrate that has a surface having a high flatness, low defects and a low surface roughness with low cost and high productivity, and a substrate having high surface quality suitable as a substrate for mask blanks such as a glass substrate containing SiO2 as a main component, particularly, as a substrate for mask blanks used in EUVL.
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公开(公告)号：US20220149247A1
公开(公告)日：2022-05-12
申请号：US17515753
申请日：2021-11-01
IPC分类号： H01L33/48 , C09J1/00 , C09J11/04 , B23K35/02 , C03C27/08 , B23K35/26 , B23K35/362 , B23K35/36 , H01L33/60
摘要： A bonding and sealing material includes, as the essential ingredients, a solder powder, silver nanoparticles coated with a coating material and a solvent, and additionally includes at least one ingredient selected from the group consisting of selenium metal, oxide film inhibitors and oxide film removers. This bonding and sealing material can easily form under mild conditions a metallic adhesive layer having good hermetic sealability and UV resistance of the sort desired when sealing a short-wavelength light-emitting device such as a UV-LED, and can be stably used over a long period of time.
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7.发明申请公开(公告)号：US20200346974A1
公开(公告)日：2020-11-05
申请号：US16933343
申请日：2020-07-20
摘要： A large-size synthetic quartz glass substrate has a diagonal length of at least 1,000 mm. Provided that an effective range is defined on the substrate surface, and the effective range is partitioned into a plurality of evaluation regions such that the evaluation regions partly overlap each other, a flatness in each evaluation region is up to 3 μm. From the quartz glass substrate having a high flatness and a minimal local gradient within the substrate surface, a large-size photomask is prepared.
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8.发明申请公开(公告)号：US20200028031A1
公开(公告)日：2020-01-23
申请号：US16518263
申请日：2019-07-22
摘要： A synthetic quartz glass cavity member (1) is bonded to a substrate (6) having an optical device (7) mounted thereon such that the device may be accommodated in the cavity member. The cavity member (1) has an inside surface consisting of a top surface (2a) opposed to the device (7) and a side surface (3a). The top surface (2a) is a mirror surface and the side surface (3a) is a rough surface.
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公开(公告)号：US20170260081A1
公开(公告)日：2017-09-14
申请号：US15452910
申请日：2017-03-08
CPC分类号： C03B33/02 , B28D5/00 , C03C3/06 , C03C15/00 , C03C17/28 , C03C2201/02 , C03C2203/50 , C03C2218/114 , C03C2218/32 , G01B11/06 , G01N21/23
摘要： Synthetic quartz glass substrates are prepared by furnishing a synthetic quartz glass block, coating two opposed surfaces of the glass block with a liquid having a transmittance of at least 99.0%/mm at a birefringence measuring wavelength, measuring a birefringence of the glass block by directing light thereacross, determining a slice thickness on the basis of the birefringence measurement and the dimensions of the substrate, and slicing the glass block at the determined slice thickness.
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10.发明申请SYNETHETIC QUARTZ GLASS SUBTRATE POLISHING SLURRY AND MANUFACTURE OF SYNETHETIC QUARTZ GLASS SUBSTRATE USING THE SAME 审中-公开SYNETHETIC QUARTZ玻璃剥离抛光浆料和使用它的SYNETHETIC QUARTZ玻璃基材的制造公开(公告)号：US20140242884A1
公开(公告)日：2014-08-28
申请号：US14269694
申请日：2014-05-05
IPC分类号： B24B1/00
CPC分类号： B24B1/00 , B24B37/044 , C03C19/00 , C09G1/02
摘要： A polishing slurry comprising a collagen derivative and a colloidal solution is effective for polishing of synthetic quartz glass substrates. It prevents formation of defects having a size that can be detected by a high-sensitivity flaw detector.
摘要翻译： 包含胶原衍生物和胶体溶液的抛光浆液对于合成石英玻璃基材的研磨是有效的。 它可以防止形成具有可被高灵敏度探伤仪检测出的尺寸的缺陷。
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