公开(公告)号：US10241420B2

公开(公告)日：2019-03-26

申请号：US15809293

申请日：2017-11-10

Applicant: Samsung Electronics Co., Ltd.

Inventor： Tae-Hyun Kim ,  Sang Woo Bae ,  Sang Don Jang

IPC: G03B27/54 ,  G03F7/20 ,  G02B3/00

Abstract: A position adjusting unit according to some example embodiments includes a base; a mounting part, a driving unit, and a locking part on the base. The mounting part may be movably installed on the base and configured to have an optical element mounted thereto. The driving unit may include a plurality of actuators connected between the base and the mounting part. The driving unit may be configured to move the mounting part with respect to the base. The locking part may be configured to provide a fixing force for fixing a position of the mounting part. The locking part may be configured to release the fixing force when electricity is supplied to the locking part.

公开(公告)号：US09507272B2

公开(公告)日：2016-11-29

申请号：US15014746

申请日：2016-02-03

Applicant: Samsung Electronics Co., Ltd.

Inventor： Ja Yul Kim ,  Sang Don Jang ,  Tae Kyu Son

IPC: H01L21/68 ,  G03F7/20

CPC classification number: G03F7/707 ,  G03F7/70775 ,  H01L21/681 ,  Y10T29/49998 ,  Y10T29/53013 ,  Y10T29/53022 ,  Y10T29/53052 ,  Y10T29/53061 ,  Y10T29/53087 ,  Y10T29/53091 ,  Y10T279/21

Abstract: Exemplary embodiments of the invention disclose an exposure apparatus and a method of tuning parameters of a chuck, which may reduce a time taken to level the chuck by previously tuning parameters of the chuck. The method of tuning parameters of a chuck includes detecting a tilt component of the chuck, performing chuck tilt adjustment to minimize the tilt component of the chuck, and tuning the parameters of the chuck if a residual tilt component is present after performing the chuck tilt adjustment.

Abstract translation: 本发明的示例性实施例公开了一种调整卡盘参数的曝光装置和方法，其可以通过预先调谐卡盘的参数来减少卡盘水准所需的时间。 调整卡盘的参数的方法包括检测卡盘的倾斜分量，执行卡盘倾斜调整以最小化卡盘的倾斜分量，以及如果在执行卡盘倾斜调整之后存在剩余倾斜分量，则调整卡盘的参数 。

公开(公告)号：US09255694B2

公开(公告)日：2016-02-09

申请号：US13762782

申请日：2013-02-08

Applicant: Samsung Electronics Co., Ltd.

Inventor： Won-Don Joo ,  Woo-Seok Ko ,  Yu-Sin Yang ,  Sue-Jin Cho ,  Sang Don Jang ,  Byeong Hwan Jeon

IPC: F21V13/04 ,  G01N21/88 ,  G01N21/95

CPC classification number: F21V13/04 ,  G01N21/8806 ,  G01N21/9501 ,  G03B2215/0582 ,  G03B2215/0592

Abstract: An illumination optic system includes a convex mirror to reflect light from a light source to towards a lens. The light source is at a first focus position and the lens is at a second focus position of the mirror. The system also includes a reflector to reflect light not incident on the lens toward the convex mirror. The reflector has a light guide hole to guide light to the incidence surface of the lens.

Abstract translation: 照明光学系统包括用于将来自光源的光反射到透镜的凸面镜。 光源处于第一焦点位置，并且透镜处于反射镜的第二焦点位置。 该系统还包括反射器，以将未入射到透镜的光朝向凸面镜反射。 反射器具有导光孔以将光引导到透镜的入射表面。

公开(公告)号：US09891537B2

公开(公告)日：2018-02-13

申请号：US15348173

申请日：2016-11-10

Applicant: Samsung Electronics Co., Ltd.

Inventor： Ji Young Chu ,  Shiva Ram Krishna ,  Tae Hyun Kim ,  Song Woo Bae ,  Sang Don Jang ,  Won Don Joo

IPC: G03F7/20

CPC classification number: G03F7/70391 ,  G03F7/7005 ,  G03F7/70133 ,  G03F7/70208 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70383 ,  G03F7/704 ,  G03F7/70425 ,  G03F7/70558 ,  G03F7/7085

Abstract: Maskless lithographic apparatus measuring accumulated amount of light is provided. The maskless lithographic apparatus includes a light source which emits light, a stage on which a substrate is disposed, an optical system which converts the light into a beam spot array including a plurality of columns and a plurality of rows and irradiates the beam spot array onto the stage, a slit to which the beam spot array is irradiated and which passes an nth (n is a natural number) row of the beam spot array, an optical sensor which senses the nth row of the beam spot array which has passed through the slit, and a measuring unit which measures an accumulated amount of light in the nth row of the beam spot array sensed by the optical sensor.

公开(公告)号：US20170261862A1

公开(公告)日：2017-09-14

申请号：US15348173

申请日：2016-11-10

Applicant: Samsung Electronics Co., Ltd.

Inventor： Ji Young CHU ,  Shiva Ram Krishna ,  Tae Hyun Kim ,  Song Woo Bae ,  Sang Don Jang ,  Won Don Joo

IPC: G03F7/20

CPC classification number: G03F7/70391 ,  G03F7/7005 ,  G03F7/70133 ,  G03F7/70208 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70383 ,  G03F7/704 ,  G03F7/70425 ,  G03F7/70558 ,  G03F7/7085

Abstract: Maskless lithographic apparatus measuring accumulated amount of light is provided. The maskless lithographic apparatus includes a light source which emits light, a stage on which a substrate is disposed, an optical system which converts the light into a beam spot array including a plurality of columns and a plurality of rows and irradiates the beam spot array onto the stage, a slit to which the beam spot array is irradiated and which passes an nth (n is a natural number) row of the beam spot array, an optical sensor which senses the nth row of the beam spot array which has passed through the slit, and a measuring unit which measures an accumulated amount of light in the nth row of the beam spot array sensed by the optical sensor