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公开(公告)号：US09831626B2
公开(公告)日：2017-11-28
申请号：US14872228
申请日：2015-10-01
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Sung-Yoon Ryu , Woo-Seok Ko , Yu-Sin Yang , Sang-Kil Lee , Chung-Sam Jun , Seong-Jin Yun
IPC: H01S3/00 , G01N21/88 , G01N21/956
CPC classification number: H01S3/0071 , G01N21/8806 , G01N21/956
Abstract: A broadband light source includes a first electrodeless lamp to generate first broadband light from plasma, a first elliptical reflector having first and second focuses, the first elliptical reflector enclosing a rear portion of the first electrodeless lamp positioned at the first focus of the first elliptical reflector such that the first broadband light is reflected from the first elliptical reflector toward a light collector as a collective light, a symmetrically curved reflector having a third focus, the symmetrically curved reflector positioned such that the third focus is coincident with one of the first and second focuses, and a laser irradiator to provide a laser beam to the first electrodeless lamp.
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公开(公告)号：US09255694B2
公开(公告)日：2016-02-09
申请号：US13762782
申请日：2013-02-08
Applicant: Samsung Electronics Co., Ltd.
Inventor： Won-Don Joo , Woo-Seok Ko , Yu-Sin Yang , Sue-Jin Cho , Sang Don Jang , Byeong Hwan Jeon
CPC classification number: F21V13/04 , G01N21/8806 , G01N21/9501 , G03B2215/0582 , G03B2215/0592
Abstract: An illumination optic system includes a convex mirror to reflect light from a light source to towards a lens. The light source is at a first focus position and the lens is at a second focus position of the mirror. The system also includes a reflector to reflect light not incident on the lens toward the convex mirror. The reflector has a light guide hole to guide light to the incidence surface of the lens.
Abstract translation: 照明光学系统包括用于将来自光源的光反射到透镜的凸面镜。 光源处于第一焦点位置，并且透镜处于反射镜的第二焦点位置。 该系统还包括反射器，以将未入射到透镜的光朝向凸面镜反射。 反射器具有导光孔以将光引导到透镜的入射表面。
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Patent Agency Ranking
公开(公告)号：US08841824B2
公开(公告)日：2014-09-23
申请号：US13667203
申请日：2012-11-02
Applicant: Samsung Electronics Co., Ltd.
Inventor： Woo-Seok Ko , Yu-Sin Yang , Sue-Jin Cho , Won-Don Joo , Min-Kook Kim , Sang-Kil Lee , Byeong-Hwan Jeon
CPC classification number: H01J65/04
Abstract: A broadband light illuminator of an optical inspector for optically detecting defects of an inspection object may include an electrode-less chamber including a plasma area from which broadband light is generated; a first energy provider, exterior to the chamber, configured to provide first energy for ionizing high pressure gases to form ionized gases in the chamber; a second energy provider, exterior to the chamber, configured to provide second energy for transforming the ionized gases into a plasma state to form the plasma area at a central portion of the chamber; an elliptical reflector having a first focus at which the chamber is positioned and a second focus such that the broadband light is reflected from the elliptical reflector toward the second focus; and a lens unit focusing the reflected broadband light onto the inspection object to form an inspection light for detecting the defects of the inspection object.
Abstract translation: 用于光学检测检查对象的缺陷的光学检查器的宽带照明器可以包括：无电极室，包括产生宽带光的等离子体区域; 第一能量提供者，在室外，被配置为提供第一能量，用于离子化高压气体以在室中形成离子化气体; 第二能量供应器，室外，被配置为提供第二能量，用于将电离气体转换成等离子体状态，以在室的中心部分形成等离子体区域; 具有第一焦点的椭圆形反射器，室被定位，第二焦点使得宽带光从椭圆形反射器反射到第二焦点; 以及透镜单元，将反射的宽带光聚焦到检查对象上，以形成用于检测检查对象的缺陷的检查光。
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公开(公告)号：US20140224987A1
公开(公告)日：2014-08-14
申请号：US14257048
申请日：2014-04-21
Applicant: Samsung Electronics Co., Ltd.
Inventor： Min-Kook KIM , Woo-Seok Ko , Yu-Sin Yang , Sang-Kil Lee , Chang-Hoon Choi
CPC classification number: H01J37/265 , H01J37/08 , H01J2237/002 , H01J2237/006 , H01J2237/0807
Abstract: Microelectronic substrate inspection equipment includes a gas container which contains helium gas, a helium ion generator which is disposed in the gas container and converts the helium gas into helium ions and a wafer stage which is disposed under the gas container and on which a substrate to be inspected is placed. The equipment further includes a secondary electron detector which is disposed above the wafer stage and detects electrons generated from the substrate, a compressor which receives first gaseous nitrogen from a continuous nitrogen supply device and compresses the received first gaseous nitrogen into liquid nitrogen, a liquid nitrogen dewar which is connected to the compressor and stores the liquid nitrogen, and a cooling device that is coupled to the helium ion generator. The cooling device is disposed on the gas container, and cools the helium ion generator by vaporizing the liquid nitrogen received from the liquid nitrogen dewar into second gaseous nitrogen. Related methods are also disclosed.
Abstract translation: 微电子基板检查设备包括含有氦气的气体容器，设置在气体容器中并将氦气转换为氦离子的氦离子发生器和设置在气体容器下方的晶片载台， 检查被放置。 该设备还包括二次电子检测器，其设置在晶片台上方并检测从基板产生的电子;压缩机，其接收来自连续氮供应装置的第一气态氮并将接收到的第一气态氮压缩成液态氮;液氮 连接到压缩机并储存液氮的杜瓦瓶，以及耦合到氦离子发生器的冷却装置。 冷却装置设置在气体容器上，并且通过将从液氮氮气中接收的液氮蒸发成第二气态氮来冷却氦离子发生器。 还公开了相关方法。
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5.发明授权公开(公告)号：US09733178B2
公开(公告)日：2017-08-15
申请号：US14806775
申请日：2015-07-23
Applicant: Samsung Electronics Co., Ltd.
Inventor： Sung-Yoon Ryu , Woo-Seok Ko , Yu-Sin Yang , Sang-Kil Lee , Chung-Sam Jun
IPC: G01N21/21 , G01N21/95 , G01N21/956
CPC classification number: G01N21/211 , G01N21/9501 , G01N21/956 , G01N2021/213
Abstract: Spectral ellipsometry measurement systems are provided including a polarizer that rotates at a first angle and adjusts a polarizing direction of incident light of a measurement sample; a compensator that rotates at a second angle, different from the first angle, and adjusts a phase difference of the incident light; an analyzer that rotates at a third angle and adjusts a polarizing direction of light reflected on the measurement sample; a detector that detects a spectral image from the reflected light; a controller that controls one of the polarizer, the compensator, and the analyzer according to polarizer-compensator-analyzer (PCA) angle sets including the first to third angles; and a processor that receives, from the detector, a first spectral image corresponding to a first PCA angle set and a first wavelength and a second spectral image corresponding to a second PCA angle set and a second wavelength, different from the first wavelength, and generates a polarizer-compensator-analyzer rotating (PCAR) spectral matrix using the first and second spectral images.
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6.发明授权Apparatus for measuring thickness of thin film, system including the apparatus, and method for measuring thickness of thin film 有权用于测量薄膜厚度的装置，包括该装置的系统以及用于测量薄膜厚度的方法公开(公告)号：US09417055B2
公开(公告)日：2016-08-16
申请号：US14799107
申请日：2015-07-14
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Sung-Yoon Ryu , Sang-Kil Lee , Chung-Sam Jun , Woo-Seok Ko , Ho-Jeong Kwak , Souk Kim , Kwan-Woo Ryu , Yu-Sin Yang
CPC classification number: G01B11/0633
Abstract: An apparatus and a system for measuring the thickness of a thin film are provided. The apparatus includes a signal detector, a Fast Fourier Transform (FFT) generator, an Inverse Fast Fourier Transform (IFFT) generator, and a thickness analyzer. The signal detector detects an electric field signal with respect to a reflected light that is reflected from a thin film. The FFT generator performs FFT with respect to the electric field signal to separate a DC component from an AC component of the electric field signal. The IFFT generator receives the separated AC component of the electric field signal, performs IFFT with respect to the AC component, and extracts a phase value of the AC component. The thickness analyzer measures the thickness of the thin film using the extracted phase value.
Abstract translation: 提供了用于测量薄膜厚度的装置和系统。 该装置包括信号检测器，快速傅里叶变换（FFT）发生器，快速傅里叶逆变换（IFFT）发生器和厚度分析器。 信号检测器检测相对于从薄膜反射的反射光的电场信号。 FFT发生器相对于电场信号执行FFT，以将DC分量与电场信号的AC分量分离。 IFFT发生器接收电场信号的分离的AC分量，相对于AC分量执行IFFT，并提取AC分量的相位值。 厚度分析器使用提取的相位值来测量薄膜的厚度。
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公开(公告)号：US09123503B2
公开(公告)日：2015-09-01
申请号：US14257048
申请日：2014-04-21
Applicant: Samsung Electronics Co., Ltd.
Inventor： Min-Kook Kim , Woo-Seok Ko , Yu-Sin Yang , Sang-Kil Lee , Chang-Hoon Choi
CPC classification number: H01J37/265 , H01J37/08 , H01J2237/002 , H01J2237/006 , H01J2237/0807
Abstract: Microelectronic substrate inspection equipment includes a gas container which contains helium gas, a helium ion generator which is disposed in the gas container and converts the helium gas into helium ions and a wafer stage which is disposed under the gas container and on which a substrate to be inspected is placed. The equipment further includes a secondary electron detector which is disposed above the wafer stage and detects electrons generated from the substrate, a compressor which receives first gaseous nitrogen from a continuous nitrogen supply device and compresses the received first gaseous nitrogen into liquid nitrogen, a liquid nitrogen dewar which is connected to the compressor and stores the liquid nitrogen, and a cooling device that is coupled to the helium ion generator. The cooling device is disposed on the gas container, and cools the helium ion generator by vaporizing the liquid nitrogen received from the liquid nitrogen dewar into second gaseous nitrogen. Related methods are also disclosed.
Abstract translation: 微电子基板检查设备包括含有氦气的气体容器，设置在气体容器中并将氦气转换为氦离子的氦离子发生器和设置在气体容器下方的晶片载台， 检查被放置。 该设备还包括二次电子检测器，其设置在晶片台上方并检测从基板产生的电子;压缩机，其接收来自连续氮供应装置的第一气态氮并将接收到的第一气态氮压缩成液态氮;液氮 连接到压缩机并储存液氮的杜瓦瓶，以及耦合到氦离子发生器的冷却装置。 冷却装置设置在气体容器上，并且通过将从液氮氮气中接收的液氮蒸发成第二气态氮来冷却氦离子发生器。 还公开了相关方法。
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