Abstract:
A method of calibrating a measuring apparatus includes determining apparatus parameters that have an influence on a measurement spectrum generated by the measuring apparatus, generating the measurement spectrum by exposing a measurement target on a sample to light generated by the measuring apparatus, calculating an error of the apparatus parameters by comparing the measurement spectrum to an ideal spectrum corresponding to the apparatus parameters, and calibrating the measuring apparatus based on the calculated error of the apparatus parameters.
Abstract:
Microelectronic substrate inspection equipment includes a gas container which contains helium gas, a helium ion generator which is disposed in the gas container and converts the helium gas into helium ions and a wafer stage which is disposed under the gas container and on which a substrate to be inspected is placed. The equipment further includes a secondary electron detector which is disposed above the wafer stage and detects electrons generated from the substrate, a compressor which receives first gaseous nitrogen from a continuous nitrogen supply device and compresses the received first gaseous nitrogen into liquid nitrogen, a liquid nitrogen dewar which is connected to the compressor and stores the liquid nitrogen, and a cooling device that is coupled to the helium ion generator. The cooling device is disposed on the gas container, and cools the helium ion generator by vaporizing the liquid nitrogen received from the liquid nitrogen dewar into second gaseous nitrogen. Related methods are also disclosed.
Abstract:
An optical inspecting apparatus includes a first light source, a beam splitter, a first lens, a first light detector, and pinhole plates. The first light source emits a first light beam. The beam splitter transmits or reflects the first light beam. The first lens provides the first light beam to transmit through a transparent substrate of a photomask and forms a first focusing spot on a first surface of the transparent substrate or a top surface of a photomask pattern formed on the transparent substrate. The first light detector detects a first reflection light beam generated by reflecting the first light beam from the first surface of the transparent substrate or the top surface of the photomask pattern. The pinhole plates are disposed in front of the first light detector to filter noise in the reflection light beam.
Abstract:
A method of inspecting a surface of an object includes providing a laser beam irradiated in a first direction substantially parallel to the surface of the object, adjusting a diameter of the annular laser beam, reflecting the annular laser beam toward the surface of the object in a second direction substantially perpendicular to the first direction, in a primary reflection, and reflecting the primarily reflected laser toward an inspection region of the object, in a secondary reflection. An incident angle of the annular laser beam with respect to the surface of the object may be determined by the diameter of the annular laser beam.
Abstract:
Microelectronic substrate inspection equipment includes a gas container which contains helium gas, a helium ion generator which is disposed in the gas container and converts the helium gas into helium ions and a wafer stage which is disposed under the gas container and on which a substrate to be inspected is placed. The equipment further includes a secondary electron detector which is disposed above the wafer stage and detects electrons generated from the substrate, a compressor which receives first gaseous nitrogen from a continuous nitrogen supply device and compresses the received first gaseous nitrogen into liquid nitrogen, a liquid nitrogen dewar which is connected to the compressor and stores the liquid nitrogen, and a cooling device that is coupled to the helium ion generator. The cooling device is disposed on the gas container, and cools the helium ion generator by vaporizing the liquid nitrogen received from the liquid nitrogen dewar into second gaseous nitrogen. Related methods are also disclosed.