公开(公告)号：US20240231225A1

公开(公告)日：2024-07-11

申请号：US18325465

申请日：2023-05-30

Applicant: Samsung Electronics Co., Ltd.

Inventor： Haengdeog KOH ,  Yoonhyun KWAK ,  Mijeong KIM ,  Youngmin NAM ,  Chanjae AHN ,  Changheon LEE ,  Kyuhyun IM ,  Sungwon CHOI ,  Sunghyun HAN

IPC: G03F7/004 ,  G03F7/20 ,  G03F7/32

CPC classification number: G03F7/0044 ,  G03F7/2004 ,  G03F7/32

Abstract: Provided are a resist composition and a pattern forming method using the same. The resist composition may include an organometallic compound represented by Formula 1 below and a polymer repeating unit represented by Formula 2 below.




In Formulas 1 and 2, descriptions of M11, R11, R12, n, A21, L21 to L24, a21 to a24, R21, R22, b22, p, and X21 refer to the specification.

公开(公告)号：US20220171284A1

公开(公告)日：2022-06-02

申请号：US17238355

申请日：2021-04-23

Applicant: Samsung Electronics Co., Ltd.

Inventor： Eunkyung LEE ,  Sumin KIM ,  Hyunwoo KIM ,  Juhyeon PARK ,  Giyoung SONG ,  Sukkoo HONG ,  Yoonhyun KWAK ,  Youngmin NAM ,  Byunghee SOHN ,  Sunyoung LEE ,  Aram JEON ,  Sungwon CHOI

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  C07C381/12 ,  C07C309/12 ,  C07D333/76

Abstract: Disclosed are a photoacid generator, a photoresist composition including the same, and a method of preparing the photoacid generator. The photoacid generator may include a compound represented by Formula 1: wherein, in Formula 1, CY, A1, A2, and B are respectively described in the specification.

公开(公告)号：US20190315760A1

公开(公告)日：2019-10-17

申请号：US16166800

申请日：2018-10-22

Applicant: Samsung Electronics Co., Ltd.

Inventor： Soonok JEON ,  Hiroshi MIYAZAKI ,  Yeonsook CHUNG ,  Kyungdoc KIM ,  Youngmin NAM ,  Myungsun SIM ,  Hasup LEE ,  Sooghang IHN ,  Yasushi KOISHIKAWA

IPC: C07D487/14 ,  C07D487/16 ,  C07D209/82 ,  C07D401/14 ,  C07D401/10 ,  C07D409/14 ,  C07D405/10 ,  C07D405/14 ,  C07D307/91 ,  C07D403/14 ,  C07C13/62 ,  C07C43/235 ,  C07C211/54 ,  C07C321/30 ,  H01L51/00 ,  H01L51/50 ,  H01L51/52

Abstract: A condensed cyclic compound represented by Formula 1: wherein, in Formula 1, groups and variables are the same as described in the specification.

公开(公告)号：US20180002287A1

公开(公告)日：2018-01-04

申请号：US15632518

申请日：2017-06-26

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hyun Sik CHAE ,  Kyungdoc KIM ,  Sae Youn LEE ,  Soonok JEON ,  Hiroshi MIYAZAKI ,  Masaki NUMATA ,  Youngmin NAM ,  Tae-Rae KIM ,  In Koo KIM ,  Won-Joon SON ,  Won Seok OH ,  Younsuk CHOI ,  Sunghan KIM ,  Jeong-Ju CHO

IPC: C07D213/22 ,  C09K11/06 ,  H01L51/00

CPC classification number: C07D213/22 ,  C09K11/06 ,  C09K2211/1007 ,  C09K2211/1011 ,  C09K2211/1029 ,  C09K2211/1033 ,  C09K2211/1037 ,  C09K2211/1044 ,  C09K2211/1092 ,  C09K2211/185 ,  H01L51/0054 ,  H01L51/0067 ,  H01L51/0071 ,  H01L51/0072 ,  H01L51/5012 ,  H01L51/5016

Abstract: A condensed cyclic compound represented by Formula 1: Ar1-(L1)a1-B-(L2)a2-Ar2  Formula 1 wherein, in Formula 1, groups and variables are the same as described in the specification.

公开(公告)号：US20240337928A1

公开(公告)日：2024-10-10

申请号：US18613810

申请日：2024-03-22

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hana KIM ,  Haengdeog KOH ,  Hyeran KIM ,  Youngmin NAM ,  Giyoung SONG ,  Changheon LEE ,  Aram JEON ,  Jungha CHAE ,  Songse YI ,  Sukkoo HONG

IPC: G03F7/004

CPC classification number: G03F7/0045

Abstract: Provided are an organic salt represented by Formula 1 below, a photoresist composition including the same, and a method of forming a pattern by using the photoresist composition.




A description of Formula 1 is provided herein.

公开(公告)号：US20230324791A1

公开(公告)日：2023-10-12

申请号：US18313555

申请日：2023-05-08

Applicant: Samsung Electronics Co., Ltd.

Inventor： Eunkyung LEE ,  Sumin KIM ,  Hyunwoo KIM ,  Juhyeon PARK ,  Giyoung SONG ,  Sukkoo HONG ,  Yoonhyun KWAK ,  Youngmin NAM ,  Byunghee SOHN ,  Sunyoung LEE ,  Aram JEON ,  Sungwon CHOI

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  C07C309/12 ,  C07D333/76 ,  C07C381/12

CPC classification number: G03F7/0045 ,  C07C309/12 ,  C07C381/12 ,  C07D333/76 ,  G03F7/038 ,  G03F7/039 ,  C07C2603/74

Abstract: Disclosed are a photoacid generator, a photoresist composition including the same, and a method of preparing the photoacid generator. The photoacid generator may include a compound represented by Formula 1:





wherein, in Formula 1, CY, A1, A2, and B are respectively described in the specification.

公开(公告)号：US20180166634A1

公开(公告)日：2018-06-14

申请号：US15840491

申请日：2017-12-13

Applicant: Samsung Electronics Co., Ltd.

Inventor： Masaki NUMATA ,  Soonok JEON ,  Hiroshi MIYAZAKI ,  Saeyoun LEE ,  Myungsun SIM ,  Sooghang IHN ,  Hasup LEE ,  Yeonsook CHUNG ,  Youngchun KWON ,  Taerae KIM ,  Youngmin NAM ,  Munbo SHIM ,  Won-joon SON

IPC: H01L51/00 ,  C07D403/14 ,  C09K11/06 ,  C07D403/12

CPC classification number: H01L51/0067 ,  C07D403/04 ,  C07D403/12 ,  C07D403/14 ,  C07D487/04 ,  C07D491/04 ,  C07D519/00 ,  C09K11/06 ,  C09K2211/1007 ,  C09K2211/1018 ,  H01L51/0072 ,  H01L51/5012 ,  H01L51/5028

Abstract: An organic light-emitting device including a first electrode, a second electrode facing the first electrode, and an organic layer disposed between the first electrode and the second electrode, wherein the organic layer includes an emission layer, and wherein the emission layer includes a fluorescent compound represented by a specific formula described in the specification.

公开(公告)号：US20240094633A1

公开(公告)日：2024-03-21

申请号：US18150012

申请日：2023-01-04

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jungha CHAE ,  Haengdeog KOH ,  Yoonhyun KWAK ,  Minsang KIM ,  Hana KIM ,  Hyeran KIM ,  Youngmin NAM ,  Changheon LEE ,  Kyuhyun IM

IPC: G03F7/004 ,  C07C65/30 ,  G03F7/20

CPC classification number: G03F7/0045 ,  C07C65/30 ,  G03F7/2006

Abstract: Provided are a carboxylate salt represented by Formula 1, a photoresist composition including the carboxylate salt represented by Formula 1, and a method of forming a pattern by using the photoresist composition






wherein, in Formula 1, A11, R11 to R15, b15, n11, n12, and M+ are described in the specification.

公开(公告)号：US20210174910A1

公开(公告)日：2021-06-10

申请号：US17114713

申请日：2020-12-08

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Youngchun KWON ,  Jiho YOO ,  Younsuk CHOI ,  Youngmin NAM ,  Minsik PARK ,  Jinwoo PARK ,  Dongseon LEE

IPC: G16C20/50 ,  G06N3/04 ,  G06N3/08 ,  G16C20/70

Abstract: A neural network apparatus for generating a new chemical structure may receive a structure input of a chemical structure; generate, based on the structure input, a negative attention vector that indicates a respective probability of presence of each of a plurality of blacklists in the structure input; generate a structure expression by encoding the structure input; generate a final reverse blacklist vector that does not include the plurality of blacklists, based on the negative attention vector and the structure expression; and generate the new chemical structure by decoding the final reverse blacklist vector.

公开(公告)号：US20210125060A1

公开(公告)日：2021-04-29

申请号：US16887062

申请日：2020-05-29

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Youngchun KWON ,  Jinwoo PARK ,  Dongseon LEE ,  Youngmin NAM ,  Minsik PARK ,  Jiho YOO ,  Younsuk CHOI

IPC: G06N3/08 ,  G06N3/04

Abstract: An apparatus for optimizing experimental conditions by using a neural network may calculate a prediction yield and accuracy of the prediction yield by using a neural network-based experimental prediction model. The apparatus may optimize the experimental conditions by determining an experiment priority of a respective experiment condition combination based on the prediction yield and the prediction accuracy and receiving a feedback of results of experiments performed according to the experiment priority.