公开(公告)号：US06232758B1

公开(公告)日：2001-05-15

申请号：US09365753

申请日：1999-08-03

申请人： Shinichi Konda ,  Kunihiko Goto ,  Satoru Asai

发明人： Shinichi Konda ,  Kunihiko Goto ,  Satoru Asai

IPC分类号： H02J100

CPC分类号： H03K17/302 ,  H03K17/6871 ,  H03K2217/0036

摘要： A load drive control apparatus includes a drive control circuit for driving and controlling a load in response to a given drive condition. A power supply circuit operates for feeding drive electric power to the drive control circuit. The feed of the drive electric power to the drive control circuit by the power supply circuit is controlled in response to a control signal for drive and control of the load to implement a change between a normal mode of operation and a stand-by mode of operation in which consumed electric power is reduced.

摘要翻译： 负载驱动控制装置包括用于响应于给定的驱动条件来驱动和控制负载的驱动控制电路。 电源电路用于将驱动电力馈送到驱动控制电路。 响应于用于驱动和控制负载的控制信号来控制由电源电路向驱动控制电路馈送驱动电力，以实现正常操作模式和待机操作模式之间的改变 其中消耗的电力降低。

公开(公告)号：US20110284508A1

公开(公告)日：2011-11-24

申请号：US13111211

申请日：2011-05-19

申请人： Takahiro Miura ,  Setsu Yamamoto ,  Takeshi Hoshi ,  Tsuyoshi Ogawa ,  Yoshihiro Fujita ,  Shozo Hirano ,  Kazumi Watanabe ,  Satoshi Nagai ,  Masahiro Yoshida ,  Jun Semboshi ,  Satoru Asai ,  Makoto Ochiai

发明人： Takahiro Miura ,  Setsu Yamamoto ,  Takeshi Hoshi ,  Tsuyoshi Ogawa ,  Yoshihiro Fujita ,  Shozo Hirano ,  Kazumi Watanabe ,  Satoshi Nagai ,  Masahiro Yoshida ,  Jun Semboshi ,  Satoru Asai ,  Makoto Ochiai

IPC分类号： B23K26/00

CPC分类号： B23K31/125

摘要： A welding system has: a welding mechanism, a reception laser light source, a reception optical mechanism, an interferometer, a data recording/analysis mechanism and a data recording/analysis mechanism. The reception laser light source generates reception laser light so as to irradiate the object to be welded with the reception laser light for the purpose of detecting a reflected ultrasonic wave obtained as a result of reflection of a transmission ultrasonic wave. The reception optical mechanism transmits, during or after welding operation, the reception laser light generated from the reception laser light source to the surface of the object to be welded for irradiation while moving, together with the welding mechanism, relative to the object to be welded and collects laser light scattered/reflected at the surface of the object to be welded.

摘要翻译： 焊接系统具有：焊接机构，接收激光光源，接收光学机构，干涉仪，数据记录/分析机构和数据记录/分析机构。 为了检测作为发送超声波的反射而得到的反射超声波，接收激光光源产生接收激光以照射被接收激光的被焊物体。 接收光学机构在焊接操作期间或之后将从接收激光光源产生的接收激光与焊接机构相对于被焊接物体一起移动而被发射到被焊接物体的表面 并收集在待焊接物体的表面上散射/反射的激光。

公开(公告)号：US20070275331A1

公开(公告)日：2007-11-29

申请号：US11529678

申请日：2006-09-29

申请人： Tomohiko Yamamoto ,  Satoru Asai

发明人： Tomohiko Yamamoto ,  Satoru Asai

IPC分类号： G03F7/20

CPC分类号： G03F7/70466

摘要： A micropattern is formed with high accuracy with a sufficient manufacture process margin without using a photomask complicated in manufacture process at high manufacture cost like an alternating phase shift mask. Double exposure is performed by using a pair of photomasks such as an ordinary chrome mask, an attenuated phase shift mask or the like which is not an alternating phase shift mask, and a pattern is transferred onto a photoresist. Here, on the occasion of performing exposure with the photomask for forming a finer pattern, double pole illumination is used as an illumination system.

摘要翻译： 在具有高制造成本的制造工艺中使用像交替相移掩模那样使用复杂的光掩模的情况下，以高精度形成具有足够的制造工艺余量的微图案。 通过使用不是交替相移掩模的普通镀铬掩模，衰减相移掩模等的一对光掩模进行双重曝光，并将图案转印到光致抗蚀剂上。 这里，在用用于形成更精细图案的光掩模进行曝光的场合，使用双极照明作为照明系统。

公开(公告)号：US07144303B2

公开(公告)日：2006-12-05

申请号：US11312341

申请日：2005-12-21

申请人： Kenji Kamimura ,  Satoru Asai ,  Satoru Yanaka ,  Ryusuke Tsuboi ,  Tadashi Tanuma ,  Masataka Kikuchi

发明人： Kenji Kamimura ,  Satoru Asai ,  Satoru Yanaka ,  Ryusuke Tsuboi ,  Tadashi Tanuma ,  Masataka Kikuchi

IPC分类号： B24B1/00

CPC分类号： B24C1/08 ,  B24C1/086 ,  B24C11/00 ,  F01D5/286 ,  Y02T50/673

摘要： A surface to be polished of a large part is polished by projecting and colliding an abrasive comprising abrasive grains and an elastic petrochemical high polymer material having the specific gravity of 0.5 to 1.8 g/cm3 and elasticity of 10 to 200 ckg/cm2 or an elastic natural material, to the surface to be polished of the large part at a speed of 600 m to 3800 m per minute and by a volume of 5 to 300 cc/cm2·sec per unit area, and sliding the abrasive.

公开(公告)号：US20060018529A1

公开(公告)日：2006-01-26

申请号：US10995215

申请日：2004-11-24

申请人： Teruyoshi Yao ,  Satoru Asai ,  Morimi Osawa ,  Hiromi Hoshino ,  Kouzou Ogino ,  Kazumasa Morishita

发明人： Teruyoshi Yao ,  Satoru Asai ,  Morimi Osawa ,  Hiromi Hoshino ,  Kouzou Ogino ,  Kazumasa Morishita

IPC分类号： G03C5/00 ,  G06K9/00 ,  G03F1/00

CPC分类号： G03F7/70941 ,  G03F7/70433 ,  G03F7/705

摘要： In view of realizing a lithographic process which makes it possible to estimate and correct flare with an extremely high accuracy, and causes only an extremely small dimensional variation in width, over the entire portion not only of a single shot region, but also of a single chip region, a mask pattern correction device of the present invention has a numerical aperture calculation unit calculating, for every -single shot region, flare energy for a mask pattern corresponding to a transferred pattern, based on an exposure layout of a plurality of shot regions, or more specifically, while considering flare from a plurality of shot regions located around every single shot region.

摘要翻译： 鉴于实现能够以极高的精度估计和校正火炬的平版印刷工艺，并且在整个部分上不仅在单一拍摄区域上，而且在单个区域的整个部分上仅产生非常小的尺寸变化 芯片区域，本发明的掩模图案校正装置具有数值孔径计算单元，对于每个单独拍摄区域，基于多个拍摄区域的曝光布局来计算对应于被转印图案的掩模图案的闪光能量 或者更具体地，同时考虑来自位于每个单个拍摄区域周围的多个拍摄区域的闪光。

公开(公告)号：US06499946B1

公开(公告)日：2002-12-31

申请号：US09692179

申请日：2000-10-20

申请人： Masayuki Yamada ,  Takao Inukai ,  Masataka Kikuchi ,  Joji Kaneko ,  Satoru Asai ,  Yoichi Tsuda ,  Ryuichi Ishii ,  Yomei Yoshioka

发明人： Masayuki Yamada ,  Takao Inukai ,  Masataka Kikuchi ,  Joji Kaneko ,  Satoru Asai ,  Yoichi Tsuda ,  Ryuichi Ishii ,  Yomei Yoshioka

IPC分类号： F03B104

CPC分类号： C22C38/22 ,  C22C38/24 ,  C22C38/44 ,  C22C38/46 ,  F01D5/063 ,  F01D5/28

摘要： A steam turbine rotor having a combination of at least one of a high pressure rotor, an intermediate pressure rotor and a low pressure rotor, which are each formed from a metal material of different chemical composition and welded together by means of welding.

摘要翻译： 一种具有高压转子，中压转子和低压转子中的至少一个的组合的汽轮机转子，它们均由不同化学成分的金属材料形成并通过焊接焊接在一起。

公开(公告)号：US06420094B1

公开(公告)日：2002-07-16

申请号：US09500527

申请日：2000-02-09

申请人： Tamae Haruki ,  Kenji Nakagawa ,  Satoru Asai ,  Isamu Hanyu

发明人： Tamae Haruki ,  Kenji Nakagawa ,  Satoru Asai ,  Isamu Hanyu

IPC分类号： G03F720

CPC分类号： G03F7/70566 ,  G03F7/201 ,  G03F7/70091 ,  G03F7/701 ,  G03F7/70125 ,  G03F7/70241 ,  G03F7/70283 ,  G03F7/70583

摘要： An optical exposure method in photolithography applied for precise processing when semiconductor devices are produced. A pattern on a photomask is projected and exposed on a register on a base plate with an exposure device including a deformation illumination system, a photomask and a projection lens. The deformation illumination system is composed of a light source, a diaphragm and a condenser lens, and the diaphragm is provided with a linear through-hole. The optical exposure method uses a ray of linear light for illumination or two rays of linear light for illumination that are parallel with the pattern. The two rays of linear light are symmetrical with respect to an optical axis. These rays are parallel with the pattern in a position separate from the optical axis of the exposure device when the photomask pattern is a line and space pattern.

摘要翻译： 在制造半导体器件时，用于精密加工的光刻中的光学曝光方法。 光掩模上的图案被投影并暴露在具有包括变形照明系统，光掩模和投影透镜的曝光装置的基板上的寄存器上。 变形照明系统由光源，光阑和聚光透镜组成，隔膜设有直线通孔。 光学曝光方法使用用于照明的线性光线或与图案平行的用于照明的两束线性光。 两条线性光线相对于光轴对称。 当光掩模图案是线和空间图案时，这些光线与图案平行于与曝光装置的光轴分离的位置。

公开(公告)号：US6107708A

公开(公告)日：2000-08-22

申请号：US268409

申请日：1999-03-15

申请人： Mineo Yamaguchi ,  Hideto Matsuzaki ,  Keisuke Sasaki ,  Masaaki Shimizu ,  Shinji Iwama ,  Satoru Asai

发明人： Mineo Yamaguchi ,  Hideto Matsuzaki ,  Keisuke Sasaki ,  Masaaki Shimizu ,  Shinji Iwama ,  Satoru Asai

IPC分类号： H02K29/00 ,  B60H1/00 ,  F04D29/00 ,  F04D29/44 ,  F04D29/58 ,  H02K5/20 ,  H02K7/14 ,  H02K9/02 ,  H02K9/06 ,  H02K9/26 ,  H02K11/02 ,  H02K11/04 ,  H02K21/22 ,  H02K9/00

CPC分类号： H02K9/06 ,  B60H1/00457 ,  H02K11/024 ,  H02K11/33 ,  H02K5/20 ,  H02K9/26 ,  H02K7/14

摘要： A brushless motor includes a stator attached to a motor case and a rotor. A circuit substrate is attached to the motor case. The substrate includes an electric circuit, which supplies electric current to the stator thereby rotating the rotor. A fan generates and moves air in accordance with rotation of the rotor. A duct guides some of the air moved by the fan to the stator. A flange extends from the stator. The air guided by the duct flows along the flange. This structure reduces the size of the brushless motor while increasing its power.

摘要翻译： 无刷电动机包括附接到电动机壳体和转子的定子。 电路基板安装在电动机壳体上。 基板包括电路，其向定子提供电流，从而使转子旋转。 风扇根据转子的旋转产生并移动空气。 导管将一些由风扇移动的空气引导到定子。 法兰从定子延伸。 由导管引导的空气沿着法兰流动。 这种结构在增加功率的同时减小了无刷电动机的尺寸。

公开(公告)号：US5607821A

公开(公告)日：1997-03-04

申请号：US510128

申请日：1995-08-01

申请人： Tamae Haruki ,  Kenji Nakagawa ,  Masao Taguchi ,  Hiroyuki Tanaka ,  Satoru Asai ,  Isamu Hanyu

发明人： Tamae Haruki ,  Kenji Nakagawa ,  Masao Taguchi ,  Hiroyuki Tanaka ,  Satoru Asai ,  Isamu Hanyu

IPC分类号： G03F7/20 ,  G03F7/207 ,  G03C5/04 ,  G03B27/32 ,  G03B27/68 ,  G03B27/72

CPC分类号： G03F7/70566 ,  G03F7/201 ,  G03F7/70091 ,  G03F7/701 ,  G03F7/70125 ,  G03F7/70241 ,  G03F7/70283 ,  G03F7/70583

摘要： An optical exposure method in photolithography applied for precise processing when semiconductor devices are produced. A pattern on a photomask is projected and exposed on a register on a base plate with an exposure device including a deformation illumination system, a photomask and a projection lens. The deformation illumination system is composed of a light source, a diaphragm and a condenser lens, and the diaphragm is provided with a linear through-hole. The optical exposure method uses a ray of linear light for illumination or two rays of linear light for illumination that are parallel with the pattern. The two rays of linear light are symmetrical with respect to an optical axis. These rays are parallel with the pattern in a position separate from the optical axis of the exposure device when the photomask pattern is a line and space pattern.

摘要翻译： 在制造半导体器件时，用于精密加工的光刻中的光学曝光方法。 光掩模上的图案被投影并暴露在具有包括变形照明系统，光掩模和投影透镜的曝光装置的基板上的寄存器上。 变形照明系统由光源，光阑和聚光透镜组成，隔膜设有直线通孔。 光学曝光方法使用用于照明的线性光线或与图案平行的用于照明的两束线性光。 两条线性光线相对于光轴对称。 当光掩模图案是线和空间图案时，这些光线与图案平行于与曝光装置的光轴分离的位置。

公开(公告)号：US09309773B2

公开(公告)日：2016-04-12

申请号：US12977548

申请日：2010-12-23

申请人： Akio Sayano ,  Masashi Takahashi ,  Masahiro Saito ,  Kazuyoshi Nakajima ,  Tadashi Tanuma ,  Satoru Asai ,  Kenji Kamimura

发明人： Akio Sayano ,  Masashi Takahashi ,  Masahiro Saito ,  Kazuyoshi Nakajima ,  Tadashi Tanuma ,  Satoru Asai ,  Kenji Kamimura

IPC分类号： F01D5/28 ,  C23C18/12

CPC分类号： F01D5/286 ,  C23C18/1208 ,  F05D2220/31 ,  F05D2230/90 ,  F05D2250/60

摘要： A steam turbine 3 includes: a turbine rotor 4; a rotor blade 5 implanted to the turbine rotor 4; a stator blade 6 provided at an upstream side of the rotor blade 5; and a turbine casing 13 supporting the stator blade 6 and including the turbine rotor 4, the rotor blade 5 and the stator blade 6, and have a constitution in which a stage 7 is formed by a pair of the rotor blade 5 and the stator blade 6, and a steam passage 8 is formed by arranging plural stages 7 in an axial direction of the turbine rotor 4. A surface treatment to suppress an increase of a surface roughness caused by oxidation is performed for at least a part of a surface of the stator blade 6 and a surface of the rotor blade 5.

摘要翻译： 蒸汽轮机3包括：涡轮机转子4; 植入涡轮机转子4的转子叶片5; 设置在转子叶片5的上游侧的定子叶片6; 以及支撑定子叶片6并且包括涡轮转子4，转子叶片5和定子叶片6的涡轮壳体13，并且具有这样的构造，其中阶段7由一对转子叶片5和定子叶片形成 并且通过在涡轮机转子4的轴向上配置多个级7来形成蒸汽通道8.为了抑制由氧化引起的表面粗糙度的增加，进行表面处理以至少部分表面粗糙度 定子叶片6和转子叶片5的表面。