公开(公告)号：US09309773B2

公开(公告)日：2016-04-12

申请号：US12977548

申请日：2010-12-23

申请人： Akio Sayano ,  Masashi Takahashi ,  Masahiro Saito ,  Kazuyoshi Nakajima ,  Tadashi Tanuma ,  Satoru Asai ,  Kenji Kamimura

发明人： Akio Sayano ,  Masashi Takahashi ,  Masahiro Saito ,  Kazuyoshi Nakajima ,  Tadashi Tanuma ,  Satoru Asai ,  Kenji Kamimura

IPC分类号： F01D5/28 ,  C23C18/12

CPC分类号： F01D5/286 ,  C23C18/1208 ,  F05D2220/31 ,  F05D2230/90 ,  F05D2250/60

摘要： A steam turbine 3 includes: a turbine rotor 4; a rotor blade 5 implanted to the turbine rotor 4; a stator blade 6 provided at an upstream side of the rotor blade 5; and a turbine casing 13 supporting the stator blade 6 and including the turbine rotor 4, the rotor blade 5 and the stator blade 6, and have a constitution in which a stage 7 is formed by a pair of the rotor blade 5 and the stator blade 6, and a steam passage 8 is formed by arranging plural stages 7 in an axial direction of the turbine rotor 4. A surface treatment to suppress an increase of a surface roughness caused by oxidation is performed for at least a part of a surface of the stator blade 6 and a surface of the rotor blade 5.

摘要翻译： 蒸汽轮机3包括：涡轮机转子4; 植入涡轮机转子4的转子叶片5; 设置在转子叶片5的上游侧的定子叶片6; 以及支撑定子叶片6并且包括涡轮转子4，转子叶片5和定子叶片6的涡轮壳体13，并且具有这样的构造，其中阶段7由一对转子叶片5和定子叶片形成 并且通过在涡轮机转子4的轴向上配置多个级7来形成蒸汽通道8.为了抑制由氧化引起的表面粗糙度的增加，进行表面处理以至少部分表面粗糙度 定子叶片6和转子叶片5的表面。

公开(公告)号：US20110286005A1

公开(公告)日：2011-11-24

申请号：US13111217

申请日：2011-05-19

申请人： Setsu YAMAMOTO ,  Takahiro Miura ,  Takeshi Hoshi ,  Tsuyoshi Ogawa ,  Yoshihiro Fujita ,  Shozo Hirano ,  Kazumi Watanabe ,  Satoshi Nagai ,  Masahiro Yoshida ,  Satoru Asai ,  Makoto Ochiai ,  Jun Semboshi

发明人： Setsu YAMAMOTO ,  Takahiro Miura ,  Takeshi Hoshi ,  Tsuyoshi Ogawa ,  Yoshihiro Fujita ,  Shozo Hirano ,  Kazumi Watanabe ,  Satoshi Nagai ,  Masahiro Yoshida ,  Satoru Asai ,  Makoto Ochiai ,  Jun Semboshi

IPC分类号： G01B11/02

CPC分类号： G01N29/46 ,  B23K31/125 ,  G01N29/2418 ,  G01N2291/267

摘要： A welding inspection method has steps of: generating transmission laser light for generating an ultrasonic wave and transmitting the transmission laser light to an object to be inspected during or after welding operation for irradiation; generating reception laser light for detecting an ultrasonic wave and transmitting the reception laser light to the object to be inspected for irradiation; collecting laser light scattered and reflected at surface of the object to be inspected; performing interference measurement of the laser light and obtaining an ultrasonic signal; and analyzing the ultrasonic signal obtained by the interference measurement. At least one of the transmission laser light generated in the transmission laser light irradiation step and the reception laser light generated in the reception laser light irradiation step is irradiated onto a welded metal part or a groove side surface.

摘要翻译： 焊接检查方法具有以下步骤：产生用于产生超声波的发射激光，并且在用于照射的焊接操作期间或之后将发送激光发射到待检查对象; 产生用于检测超声波的接收激光并将接收激光发送到待检查对象进行照射; 收集被检测物体的表面散射并反射的激光; 执行激光的干涉测量并获得超声波信号; 并分析通过干涉测量得到的超声波信号。 在发射激光照射步骤中产生的发射激光中的至少一个和在接收激光照射步骤中产生的接收激光照射到焊接的金属部分或槽侧表面上。

公开(公告)号：US20070298353A1

公开(公告)日：2007-12-27

申请号：US11848786

申请日：2007-08-31

申请人： Tomohiko YAMAMOTO ,  Satoru ASAI

发明人： Tomohiko YAMAMOTO ,  Satoru ASAI

IPC分类号： G03C5/00

CPC分类号： G03F1/32 ,  G03F1/70

摘要： Double exposure is performed by using a pair of photomasks, an attenuated phase shift mask or the like which is not an alternating phase shift mask, and a pattern is transferred onto a photoresist. Here, on the occasion of performing exposure with the photomask for forming a finer pattern, double pole illumination is used as an illumination system.

摘要翻译： 通过使用不是交替相移掩模的一对光掩模，衰减相移掩模等进行双重曝光，并且将图案转印到光致抗蚀剂上。 这里，在用用于形成更精细图案的光掩模进行曝光的场合，使用双极照明作为照明系统。

公开(公告)号：US20060111025A1

公开(公告)日：2006-05-25

申请号：US11313696

申请日：2005-12-22

申请人： Satoru Yanaka ,  Satoru Asai ,  Ryusuke Tsuboi ,  Kenji Kamimura ,  Tadashi Tanuma ,  Masataka Kikuchi

发明人： Satoru Yanaka ,  Satoru Asai ,  Ryusuke Tsuboi ,  Kenji Kamimura ,  Tadashi Tanuma ,  Masataka Kikuchi

IPC分类号： B24C3/00

CPC分类号： B24C1/08 ,  B24C3/24 ,  B24C9/003 ,  B24C9/006 ,  B24C11/00 ,  F01D5/005 ,  F01D25/002 ,  F05D2230/10 ,  F05D2230/14 ,  F05D2230/90 ,  Y02P70/179

摘要： The present invention comprises a turntable which holds a turbine part at a predetermined position, the turn table being rotatably supported by a support member, and rotated and driven by a driving motor, an abrasive feeding unit which feeds an abrasive particle having an elastic material as a core to a predetermined position as an abrasive, and a polishing head including an impeller which is rotated and driven by an impeller driving motor at high speed and applies rotary energy to the abrasive particle to be supplied from the abrasive feeding unit, the polishing head injecting the abrasive particle flying from the tangential direction of the impeller at a predetermined speed toward a surface to be polished of the turbine part held on the turntable, and an abrasive recovery unit which recovers the abrasive particle provided for polishing of the turbine part from the polishing head, and feeding into the abrasive feeding unit.

摘要翻译： 本发明包括将涡轮部分保持在预定位置的转台，转台由支撑构件可旋转地支撑，并由驱动电机旋转驱动;磨料供给单元，其将具有弹性材料的磨料颗粒作为 将作为研磨剂的预定位置的芯体，以及包括叶轮的研磨头，所述叶轮由叶轮驱动马达高速旋转驱动，并向从研磨给料单元供给的磨料颗粒施加旋转能量，抛光头 将磨粒从叶轮的切线方向以预定的速度喷射到被保持在转台上的涡轮部分的待抛光表面;以及研磨回收单元，其从所述涡轮机部件的磨 抛光头，并送入研磨给料单元。

公开(公告)号：US20050233226A1

公开(公告)日：2005-10-20

申请号：US11156592

申请日：2005-06-21

申请人： Morimi Osawa ,  Teruyoshi Yao ,  Hiroshi Arimoto ,  Satoru Asai

发明人： Morimi Osawa ,  Teruyoshi Yao ,  Hiroshi Arimoto ,  Satoru Asai

IPC分类号： G03F1/36 ,  G03F1/68 ,  G03F7/20 ,  H01L21/027 ,  G03F9/00 ,  G03B27/00 ,  G03C5/00 ,  G06F17/50 ,  G06K9/00

CPC分类号： G03F7/70941 ,  G03F1/44 ,  G03F1/70 ,  G03F7/70591 ,  G03F7/70625

摘要： The width values of transferred patterns of respective evaluation patterns transferred using a test photo mask (11) are calculated by first calculation unit (12) based on the relationship with the opening ratio of flare generation patterns. The distribution of the calculated width values of the respective transferred patterns is linearly approximated by second calculation unit (13) and the inclination thereof is calculated. On the basis of a table defining the inclination of the width values of the respective transferred patterns (the ratio of dimension fluctuation), the amount of correction is changed for each pattern by correction unit (14). Consequently, the amount of dimension fluctuation caused by local flares can be accurately calculated. This enables accurately performing pattern-dimension corrections against local flares.

摘要翻译： 使用测试光掩模（11）转印的各个评估图案的转印图案的宽度值基于与闪光发生图案的开口率的关系由第一计算单元（12）计算。 所计算的各个转移图案的宽度值的分布由第二计算单元（13）线性近似，并且计算其倾斜度。 基于定义各个转印图案的宽度值的倾斜度（尺寸波动的比例）的表格，通过校正单元（14）对每个图案改变校正量。 因此，可以精确地计算由局部耀斑引起的尺寸波动量。 这使得能够对局部耀斑进行精确的模式维度校正。

公开(公告)号：US20050050490A1

公开(公告)日：2005-03-03

申请号：US10782821

申请日：2004-02-23

申请人： Hiroki Futatsuya ,  Satoru Asai

发明人： Hiroki Futatsuya ,  Satoru Asai

IPC分类号： G03F1/36 ,  G03F1/68 ,  G06F17/50 ,  G06G7/62 ,  G06K9/00 ,  H01L21/027

CPC分类号： G03F1/70

摘要： The simulation equipment has division unit for dividing a layout of a photo mask (mask layout) into a plurality of areas, average light intensity value calculation unit for calculating an average value of light intensity in each of the areas, smoothing unit for subjecting the calculated average value to smoothing processing, and multiplication unit for multiplying the smoothed average value by a predetermined multiplier.

摘要翻译： 模拟设备具有用于将光掩模（掩模布局）的布局分割成多个区域的分割单元，用于计算每个区域中的光强度的平均值的平均光强度值计算单元， 平滑处理的平均值，以及将平滑后的平均值乘以预定乘数的乘法单元。

公开(公告)号：US5818078A

公开(公告)日：1998-10-06

申请号：US517041

申请日：1995-08-21

申请人： Kozo Makiyama ,  Masahiko Takikawa ,  Satoru Asai ,  Yusuke Matsukura ,  Toshihide Kikkawa

发明人： Kozo Makiyama ,  Masahiko Takikawa ,  Satoru Asai ,  Yusuke Matsukura ,  Toshihide Kikkawa

IPC分类号： H01L21/331 ,  H01L21/335 ,  H01L21/8252 ,  H01L27/06 ,  H01L29/08 ,  H01L29/417 ,  H01L29/45 ,  H01L29/737 ,  H01L29/778 ,  H01L29/80 ,  H01L29/90 ,  H01L31/112

CPC分类号： H01L29/66318 ,  H01L21/8252 ,  H01L27/0605 ,  H01L29/0891 ,  H01L29/41725 ,  H01L29/452 ,  H01L29/66462 ,  H01L29/7371 ,  H01L29/7783 ,  H01L29/802

摘要： A method of fabricating a compound semiconductor device includes a step of removing a semiconductor layer by an etching process to expose an upper major surface of an underlying semiconductor layer, followed by a growth of another semiconductor layer of the p-type on the surface thus exposed, wherein the exposed surface is cleaned by a flushing of a gaseous metal organic compound containing a group V element for removing impurities therefrom and further doping the exposed surface to the p-type.

公开(公告)号：US5465220A

公开(公告)日：1995-11-07

申请号：US69853

申请日：1993-06-01

申请人： Tamae Haruki ,  Kenji Nakagawa ,  Masao Taguchi ,  Hiroyuki Tanaka ,  Satoru Asai ,  Isamu Hanyu

发明人： Tamae Haruki ,  Kenji Nakagawa ,  Masao Taguchi ,  Hiroyuki Tanaka ,  Satoru Asai ,  Isamu Hanyu

IPC分类号： G03F7/20 ,  G03F7/207 ,  G06F9/00

CPC分类号： G03F7/70566 ,  G03F7/201 ,  G03F7/70091 ,  G03F7/701 ,  G03F7/70125 ,  G03F7/70241 ,  G03F7/70283 ,  G03F7/70583

摘要： An optical exposure method in photolithography applied for precise processing when semiconductor devices are produced. A pattern on a photomask is projected and exposed on a register on a base plate with an exposure device including a deformation illumination system, a photomask and a projection lens. The deformation illumination system is composed of a light source, a diaphragm and a condenser lens, and the diaphragm is provided with a linear through-hole. The optical exposure method uses a ray of linear light for illumination or two rays of linear light for illumination that are parallel with the pattern. The two rays of linear light are symmetrical with respect to an optical axis. These rays are parallel with the pattern in a position separate from the optical axis of the exposure device when the photomask pattern is a line and space pattern.

公开(公告)号：US5428478A

公开(公告)日：1995-06-27

申请号：US118173

申请日：1993-09-09

申请人： Isamu Hanyu ,  Satoru Asai

发明人： Isamu Hanyu ,  Satoru Asai

IPC分类号： G02B27/44 ,  G03F1/30 ,  G03F1/68 ,  G03F1/80 ,  H01L21/027

CPC分类号： G03F1/30

摘要： An optical mask including a 2.pi.n phase shifter pattern, a .pi.(2n+1) phase shifter pattern, an intermediate phase shifter pattern which shifts the phase of an incident light by an angle between 2.pi.n and .pi.(2n+1), and a reversed intermediate phase shifter pattern which shifts the phase of an incident light by an angle being reversed by .pi. for the phase shift angle of the intermediate phase shifter pattern. The intermediate phase shifter patterns are formed in the vicinity of the reversed intermediate phase shifter patterns having light shielding films in between.

摘要翻译： 包括2πn移相器图案，pi（2n + 1）移相器图案的光学掩模，将入射光的相位偏移2πn和pi（2n + 1）之间的角度的中间移相器图案， 以及反转的中间移相器图案，其将入射光的相位以相对于中间移相器图案的相移角反转角度为π。 中间移相器图案形成在其间具有遮光膜的反向中间移相器图案附近。

公开(公告)号：US5424153A

公开(公告)日：1995-06-13

申请号：US139782

申请日：1993-10-22

申请人： Satoru Asai

发明人： Satoru Asai

IPC分类号： G03F1/00 ,  G03F9/00

CPC分类号： G03F1/29 ,  G03F1/80

摘要： A phase shift optical mask is used for exposing a pattern using an exposure light. The phase shift optical mask includes a substrate which is transparent with respect to the exposure light, a light blocking layer which is non-transparent with respect to the exposure light and is provided on the substrate, where the light blocking layer has an opening having a predetermined shape and size and being defined by a side wall of the light blocking layer, and a phase shift layer which is transparent with respect to the exposure light and is provided on the light blocking layer and the substrate which is exposed within the opening. The phase shift layer has a uniform thickness, and the light blocking layer has a predetermined thickness so that a phase of the exposure light transmitted through the phase shift layer provided on the side wall of the light blocking layer is shifted by approximately 180.degree. relative to a phase of the exposure light transmitted through the phase shift layer provided on the substrate.

摘要翻译： 使用相移光学掩模来曝光使用曝光光的图案。 相移光学掩模包括相对于曝光光透明的基板，相对于曝光光不透明的遮光层，并设置在基板上，其中遮光层具有开口具有 预定的形状和尺寸，并且由遮光层的侧壁限定，相对于曝光光透明的相移层，并设置在曝光在开口内的遮光层和基板上。 相移层具有均匀的厚度，并且遮光层具有预定的厚度，使得透过通过设置在遮光层的侧壁上的相移层的曝光光的相位相对于 通过设置在基板上的相移层透过的曝光光的相位。