Method of forming highly sensitive photoresist film in the absence of
water
    1.
    发明授权
    Method of forming highly sensitive photoresist film in the absence of water 失效
    在不存在水的情况下形成高灵敏度光刻胶膜的方法

    公开(公告)号:US4663269A

    公开(公告)日:1987-05-05

    申请号:US763371

    申请日:1985-08-07

    CPC classification number: G03F7/039

    Abstract: Method of forming highly sensitive, high resolution positive photoresist compositions that are developed from polycarbonates derived from t-diols and various diphenols and homopolycarbonates from t-diols, mixed with 2-10% of onium salts wtih complex metal halide counterions. The high sensitivity of the photoresist compositions is due to the thermodynamic stabilities of the resulting incipient dicarbocations and dienes.

    Abstract translation: 形成高灵敏度,高分辨率的正性光致抗蚀剂组合物的方法,其由衍生自叔二醇和各种二酚的聚碳酸酯和来自叔二醇的均聚碳酸酯开发,与2-10%的鎓盐和复合金属卤化物相反离子混合。 光致抗蚀剂组合物的高灵敏度是由于所得初始二羧酸和二烯的热力学稳定性。

    Adhesive compositions free of metallic catalyst
    9.
    发明授权
    Adhesive compositions free of metallic catalyst 有权
    不含金属催化剂的粘合剂组合物

    公开(公告)号:US07537839B1

    公开(公告)日:2009-05-26

    申请号:US11695091

    申请日:2007-04-02

    Abstract: The present invention generally relates to anaerobically curable compositions of: (a) a cyanate ester compound having the structure of formula I: R1O—C≡N)m  (I)  wherein m is from 2 to 5 and R1 is an aromatic nucleus-containing residue; (b) a (meth)acrylate monomer; and (c) an anaerobic cure inducing composition comprising peroxide and saccharin, wherein said composition is free of added metallic catalyst.

    Abstract translation: 本发明一般涉及以下可能的无氧可固化组合物:(a)具有式I结构的氰酸酯化合物:<?in-line-formula description =“In-line Formulas”end =“lead”?> R1 OC≡N)m(I)<?in-line-formula description =“In-line Formulas”end =“tail”?>其中m为2至5,R1为芳香族 含核残留物; (b)(甲基)丙烯酸酯单体; 和(c)包含过氧化物和糖精的厌氧固化诱导组合物,其中所述组合物不含添加的金属催化剂。

Patent Agency Ranking