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    Substrate polishing apparatus, substrate polishing method, and apparatus for regulating temperature of polishing surface of polishing pad used in polishing apparatus
    1.
    发明授权
    Substrate polishing apparatus, substrate polishing method, and apparatus for regulating temperature of polishing surface of polishing pad used in polishing apparatus 有权
    基板研磨装置，基板研磨方法以及调整抛光装置所使用的抛光垫的研磨面温度的装置

    公开(公告)号：US08845391B2

    公开(公告)日：2014-09-30

    申请号：US12974123

    申请日：2010-12-21

    申请人： Tadakazu Sone ,  Yasuyuki Motoshima ,  Toru Maruyama ,  Katsutoshi Ono ,  Yoichi Shiokawa

    发明人： Tadakazu Sone ,  Yasuyuki Motoshima ,  Toru Maruyama ,  Katsutoshi Ono ,  Yoichi Shiokawa

    IPC分类号： B24B1/00 ,  B24B55/02 ,  B24B37/015 ,  B24B37/34 ,  B24B37/10

    CPC分类号： B24B37/015 ,  B24B37/042 ,  B24B37/10 ,  B24B37/34 ,  B24B55/02

    摘要： An apparatus for polishing a substrate includes a rotatable polishing table supporting a polishing pad, a substrate holder configured to hold the substrate and press the substrate against a polishing surface of the polishing pad on the rotating polishing table so as to polish the substrate, and a pad-temperature detector configured to measure a temperature of the polishing surface of the polishing pad. The apparatus also includes a pad-temperature regulator configured to contact the polishing surface to regulate the temperature of the polishing surface, and a temperature controller configured to control the temperature of the polishing surface by controlling the pad-temperature regulator based on information on the temperature of the polishing surface detected by the pad-temperature detector.

    摘要翻译： 用于抛光基板的装置包括：支撑抛光垫的可旋转的抛光台;衬底保持器，其构造成保持基板，并将基板压靠在旋转的抛光台上的抛光垫的抛光表面上，以便抛光基板;以及 衬垫温度检测器，被配置为测量抛光垫的抛光表面的温度。 该装置还包括：衬垫温度调节器，其被配置为接触抛光表面以调节抛光表面的温度;以及温度控制器，其被配置为通过基于关于温度的信息控制焊盘温度调节器来控制抛光表面的温度 由焊盘温度检测器检测到的抛光表面。

    Polishing apparatus having temperature regulator for polishing pad
    2.
    发明授权
    Polishing apparatus having temperature regulator for polishing pad 有权
    具有抛光垫温度调节器的抛光装置

    公开(公告)号：US09475167B2

    公开(公告)日：2016-10-25

    申请号：US13397908

    申请日：2012-02-16

    申请人： Toru Maruyama ,  Tadakazu Sone ,  Yasuyuki Motoshima

    发明人： Toru Maruyama ,  Tadakazu Sone ,  Yasuyuki Motoshima

    IPC分类号： B24B37/015 ,  B24B37/04

    CPC分类号： B24B37/04 ,  B24B37/015

    摘要： A substrate polishing apparatus includes: a polishing table supporting a polishing pad; a top ring configured to press the substrate against the polishing pad; and a pad temperature regulator configured to regulate a surface temperature of the polishing pad. The pad temperature regulator includes a pad contact element and a liquid supply system configured to supply a temperature-controlled liquid to the pad contact element. The pad contact element has a space therein and a partition that divide the space into a first liquid passage and a second liquid passage that are connected in series. At least one baffle substantially perpendicular to a radial direction of the polishing table is provided in each of the first liquid passage and the second liquid passage.

    摘要翻译： 衬底抛光装置包括：支撑抛光垫的抛光台; 顶环，构造成将衬底压靠在抛光垫上; 以及衬垫温度调节器，其构造成调节抛光垫的表面温度。 焊盘温度调节器包括焊盘接触元件和液体供应系统，该液体供应系统被配置为将温度控制的液体供应到焊盘接触元件。 垫接触元件在其中具有空间和将空间分成串联连接的第一液体通道和第二液体通道的隔板。 在第一液体通道和第二液体通道的每一个中设置至少一个基本上垂直于抛光台的径向的挡板。

    METHOD AND APPARATUS FOR POLISHING A SUBSTRATE
    3.
    发明申请
    METHOD AND APPARATUS FOR POLISHING A SUBSTRATE 有权

    公开(公告)号：US20130023186A1

    公开(公告)日：2013-01-24

    申请号：US13548361

    申请日：2012-07-13

    申请人： Yasuyuki MOTOSHIMA ,  Toru Maruyama ,  Hisanori Matsuo

    发明人： Yasuyuki MOTOSHIMA ,  Toru Maruyama ,  Hisanori Matsuo

    IPC分类号： B24B49/14 ,  B24B7/00 ,  B24B1/00 ,  B24B37/015

    CPC分类号： B24B37/015 ,  B24B37/34 ,  B24B49/14 ,  B24B53/017 ,  B24B55/02

    摘要： A polishing apparatus polishes a surface of a substrate by pressing the substrate against a polishing pad on a polishing table. The polishing apparatus is configured to control a temperature of the polishing surface of the polishing pad by blowing a gas on the polishing pad during polishing. The polishing apparatus includes a pad temperature control mechanism having at least one gas ejection nozzle for ejecting a gas toward the polishing pad and configured to blow the gas onto the polishing pad to control a temperature of the polishing pad, and an atomizer having at least one nozzle for ejecting a liquid or a mixed fluid of a gas and a liquid and configured to blow the liquid or the mixed fluid onto the polishing pad to remove foreign matters on the polishing pad. The pad temperature control mechanism and the atomizer are formed into an integral unit.

    Method and apparatus for polishing a substrate
    4.
    发明授权
    Method and apparatus for polishing a substrate 有权
    抛光基板的方法和装置

    公开(公告)号：US09579768B2

    公开(公告)日：2017-02-28

    申请号：US13548361

    申请日：2012-07-13

    申请人： Yasuyuki Motoshima ,  Toru Maruyama ,  Hisanori Matsuo

    发明人： Yasuyuki Motoshima ,  Toru Maruyama ,  Hisanori Matsuo

    IPC分类号： B24B49/14 ,  B24B37/015 ,  B24B55/02 ,  B24B37/34 ,  B24B53/017

    CPC分类号： B24B37/015 ,  B24B37/34 ,  B24B49/14 ,  B24B53/017 ,  B24B55/02

    摘要： A polishing apparatus polishes a surface of a substrate by pressing the substrate against a polishing pad on a polishing table. The polishing apparatus is configured to control a temperature of the polishing surface of the polishing pad by blowing a gas on the polishing pad during polishing. The polishing apparatus includes a pad temperature control mechanism having at least one gas ejection nozzle for ejecting a gas toward the polishing pad and configured to blow the gas onto the polishing pad to control a temperature of the polishing pad, and an atomizer having at least one nozzle for ejecting a liquid or a mixed fluid of a gas and a liquid and configured to blow the liquid or the mixed fluid onto the polishing pad to remove foreign matters on the polishing pad. The pad temperature control mechanism and the atomizer are formed into an integral unit.

    摘要翻译： 抛光装置通过将基板压靠在研磨台上的抛光垫上来抛光基板的表面。 抛光装置被配置为通过在抛光期间在抛光垫上吹入气体来控制抛光垫的抛光表面的温度。 抛光装置包括：衬垫温度控制机构，其具有至少一个气体喷射喷嘴，用于向抛光垫喷射气体，并且构造成将气体吹送到抛光垫上以控制抛光垫的温度;以及雾化器，其具有至少一个 用于喷射气体和液体的液体或混合流体的喷嘴，用于将液体或混合流体吹送到抛光垫上以去除抛光垫上的异物。 焊盘温度控制机构和雾化器形成为一体的单元。

    BICYCLIC COMPOUND AND USE THEREOF FOR MEDICAL PURPOSES
    5.
    发明申请
    BICYCLIC COMPOUND AND USE THEREOF FOR MEDICAL PURPOSES 有权
    双相化合物及其用途用于医疗用途

    公开(公告)号：US20130310438A1

    公开(公告)日：2013-11-21

    申请号：US13982052

    申请日：2012-01-26

    申请人： Toru Maruyama ,  Tohru Kambe ,  Shinsaku Yamane ,  Satoshi Nakayama

    发明人： Toru Maruyama ,  Tohru Kambe ,  Shinsaku Yamane ,  Satoshi Nakayama

    IPC分类号： C07D335/04

    CPC分类号： C07D335/04 ,  C07F7/1804

    摘要： Provided is a compound which has strong intraocular pressure lowering action and has no side effect on eyes such as ocular stimulating property, humor protein rise etc.Since a compound represented by the formula (I): (wherein definition of each group is as described in the specification), or a salt thereof, a solvate thereof, or a prodrug thereof has strong intraocular pressure lowering activity and, further, has no side effect on eyes such as ocular stimulating property (hyperemia, corneal clouding etc.), aqueous humor protein rise etc., it has high safety, and can be an excellent agent for preventing and/or treating glaucoma etc.

    摘要翻译： 本发明提供一种具有强烈的眼内降低作用，对眼睛无刺激性，幽默蛋白质上升等副作用的化合物。由式（I）表示的化合物：（其中，各组的定义如 说明书）或其盐，其溶剂合物或其前药具有强烈的眼内压降低活性，并且对眼睛没有副作用，例如眼刺激性（充血，角膜混浊等），房水蛋白 上升等，安全性高，可以作为预防和/或治疗青光眼等的优异剂。

    8-AZAPROSTAGLANDIN DERIVATIVES AND MEDICAL USE THEREOF
    7.
    发明申请
    8-AZAPROSTAGLANDIN DERIVATIVES AND MEDICAL USE THEREOF 审中-公开
    8-AZAPROSTAGLANDIN衍生物及其医疗用途

    公开(公告)号：US20080033033A1

    公开(公告)日：2008-02-07

    申请号：US11749531

    申请日：2007-05-16

    申请人： Tohru Kambe ,  Toru Maruyama ,  Kaoru Kobayashi ,  Kousuke Tani ,  Yoshihiko Nakai ,  Toshihiko Nagase ,  Takayuki Maruyama ,  Kiyoto Sakata ,  Hideyuki Yoshida ,  Shinsei Fujimura ,  Akio Nishiura ,  Nobutaka Abe

    发明人： Tohru Kambe ,  Toru Maruyama ,  Kaoru Kobayashi ,  Kousuke Tani ,  Yoshihiko Nakai ,  Toshihiko Nagase ,  Takayuki Maruyama ,  Kiyoto Sakata ,  Hideyuki Yoshida ,  Shinsei Fujimura ,  Akio Nishiura ,  Nobutaka Abe

    IPC分类号： A61K31/41 ,  A61K31/4015 ,  C07D207/18 ,  C07D257/04

    CPC分类号： C07D417/12 ,  C07D417/14

    摘要： The pharmaceutical composition comprising the compound of the invention having 8-azaprostaglandin skeleton represented by formula (I) (wherein, all the symbols have the same meanings as that of the specification.) a salt thereof, a solvate thereof or a cyclodextrin clathrate thereof, or a prodrug thereof and them as active ingredient have EP4 agonistic action and thus are considered useful for the prevention and/or treatment of immunological diseases, asthma, neuronal cell death, arthritis, lung failure, pulmonary fibrosis, pulmonary emphysema, bronchitis, chronic obstructive pulmonary disease, liver damage, acute hepatitis, nephritis, renal insufficiency, hypertension, myocardial ischemia, systemic inflammatory response syndrome, sepsis, hemophagous syndrome, macrophage activation syndrome, Still's disease, Kawasaki disease, burn, systemic granulomatosis, ulcerative colitis, Crohn's disease, hypercytokinemia at dialysis, multiple organ failure, shock and glaucoma, etc. Furthermore, the compounds also have an action of accelerating bone formation, so it is expected to be useful for the prevention and/or treatment of diseases associated with loss in bone mass, for example, primary osteoporosis, secondary osteoporosis, bone metastasis of cancer, hypercalcemia, Paget's disease, bone loss, osteonecrosis, bone formation after bone operation, alternative treatment for bone grafting.

    摘要翻译： 包含本发明化合物的盐，其盐，其溶剂合物或环糊精包合物，其具有由式（I）表示的8-氮杂前列腺素骨架（其中所有符号具有与说明书相同的含义） 或其前药，并且它们作为活性成分具有EP 4激动作用，因此被认为可用于预防和/或治疗免疫疾病，哮喘，神经元细胞死亡，关节炎，肺衰竭，肺纤维化 ，肺气肿，支气管炎，慢性阻塞性肺疾病，肝损伤，急性肝炎，肾炎，肾功能不全，高血压，心肌缺血，全身炎症反应综合征，败血症，血液综合征，巨噬细胞活化综合征，静脉炎，川崎病，烧伤，系统性 肉芽肿病，溃疡性结肠炎，克罗恩病，透析中的高细胞因子血症，多器官功能衰竭，休克和青光眼等。 此外，化合物还具有促进骨形成的作用，因此预期可用于预防和/或治疗与骨量丧失相关的疾病，例如原发性骨质疏松症，继发性骨质疏松症，癌症的骨转移， 高钙血症，佩吉特氏病，骨丢失，骨坏死，骨手术后的骨形成，骨移植的替代治疗。

    Bilirubin Excretion Enhancer
    10.
    发明申请
    Bilirubin Excretion Enhancer 审中-公开
    胆红素排泄增强剂

    公开(公告)号：US20140187744A1

    公开(公告)日：2014-07-03

    申请号：US14237694

    申请日：2012-08-09

    申请人： Masaki Otagiri ,  Toru Maruyama ,  Yu Ishima ,  Ai Minomo

    发明人： Masaki Otagiri ,  Toru Maruyama ,  Yu Ishima ,  Ai Minomo

    IPC分类号： C07K14/765

    CPC分类号： A61K38/385 ,  A61K38/00 ,  C07K14/765

    摘要： The purpose of the present invention is to establish a novel therapy method for hyperbilirubinemia and therefore, to provide a bilirubin excretion enhancer. The present invention provides a bilirubin excretion enhancer comprising, as an active ingredient, a serum albumin domain II-like protein comprising a serum albumin subdomain IIA. In one embodiment, the serum albumin subdomain IIA has an amino acid sequence of SEQ ID NO: 1. In one embodiment, the serum albumin domain II-like protein is a serum albumin domain II. In one embodiment, the serum albumin domain II comprises the amino add sequence of SEQ ID NO: 4.

    摘要翻译： 本发明的目的是建立一种新的高胆红素血症治疗方法，从而提供一种胆红素排泄增强剂。 本发明提供一种胆红素排泄增强剂，其包含作为活性成分的血清白蛋白结构域II样蛋白，其包含血清白蛋白亚结构域IIA。 在一个实施方案中，血清白蛋白亚结构域IIA具有SEQ ID NO：1的氨基酸序列。在一个实施方案中，血清白蛋白结构域II样蛋白是血清白蛋白结构域II。 在一个实施方案中，血清白蛋白结构域II包含SEQ ID NO：4的氨基酸序列。