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公开(公告)号：US20240389215A1
公开(公告)日：2024-11-21
申请号：US18787736
申请日：2024-07-29
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Tai-Yu Chen , Cho-Ying Lin , Sagar Deepak Khivsara , Hsiang Chen , Chieh Hsieh , Sheng-Kang Yu , Shang-Chieh Chien , Kai Tak Lam , Li-Jui Chen , Heng-Hsin Liu , Zhiqiang Wu
Abstract: A light source is provided capable of maintaining the temperature of a collector surface at or below a predetermined temperature. The light source in accordance with various embodiments of the present disclosure includes a processor, a droplet generator for generating a droplet to create extreme ultraviolet light, a collector for reflecting the extreme ultraviolet light into an intermediate focus point, a light generator for generating pre-pulse light and main pulse light, and a thermal image capture device for capturing a thermal image from a reflective surface of the collector.
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公开(公告)号：US11243479B2
公开(公告)日：2022-02-08
申请号：US16683432
申请日：2019-11-14
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor： Hsiang Chen , Sheng-Kang Yu , Shang-Chieh Chien , Li-Jui Chen
Abstract: A method of controlling a temperature of the semiconductor device includes operating an semiconductor apparatus; maintaining a temperature of a vessel of the semiconductor apparatus with a first cooling output by a cooling controller; heating the vessel for removing a material on the vessel; transferring a first signal, by a converter, to the cooling controller when heating the vessel; and reducing the first cooling output to a second cooling output by the cooling controller base on the first signal.
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公开(公告)号：US12287572B2
公开(公告)日：2025-04-29
申请号：US17232483
申请日：2021-04-16
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Cheng Hung Tsai , Sheng-Kang Yu , Shang-Chieh Chien , Heng-Hsin Liu , Li-Jui Chen
Abstract: A method includes: depositing a mask layer over a substrate; directing first radiation reflected from a central collector section of a sectional collector of a lithography system toward the mask layer according to a pattern; directing second radiation reflected from a peripheral collector section of the sectional collector toward the mask layer according to the pattern, wherein the peripheral collector section is vertically separated from the central collector section by a gap; forming openings in the mask layer by removing first regions of the mask layer exposed to the first radiation and second regions of the mask layer exposed to the second radiation; and removing material of a layer underlying the mask layer exposed by the openings.
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公开(公告)号：US20230132074A1
公开(公告)日：2023-04-27
申请号：US17691647
申请日：2022-03-10
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Wei-Chun Yen , Chi Yang , Sheng-Kang Yu , Shang-Chieh Chien , Li-Jui Chen , Heng-Hsin Liu
Abstract: In an embodiment, a method includes: heating a byproduct transport ring of an extreme ultraviolet source, the byproduct transport ring disposed beneath vanes of the extreme ultraviolet source; after heating the byproduct transport ring for a first duration, heating the vanes; after heating the vanes, cooling the vanes; and after cooling the vanes for a second duration, cooling the byproduct transport ring.
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公开(公告)号：US11513441B2
公开(公告)日：2022-11-29
申请号：US17208791
申请日：2021-03-22
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor： Yu-Chih Chen , Po-Chung Cheng , Li-Jui Chen , Shang-Chieh Chien , Sheng-Kang Yu , Wei-Chun Yen
Abstract: An EUV collector mirror for an extreme ultra violet (EUV) radiation source apparatus includes an EUV collector mirror body on which a reflective layer as a reflective surface is disposed, a heater attached to or embedded in the EUV collector mirror body and a drain structure to drain melted metal from the reflective surface of the EUV collector mirror body to a back side of the EUV collector mirror body.
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Patent Agency Ranking
公开(公告)号：US10859928B2
公开(公告)日：2020-12-08
申请号：US16415642
申请日：2019-05-17
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor： Yu-Chih Chen , Sheng-Kang Yu , Chi Yang , Shang-Chieh Chien , Li-Jui Chen , Po-Chung Cheng
Abstract: An extreme ultraviolet (EUV) radiation source apparatus includes a collector and a target droplet generator for generating a tin (Sn) droplet. A debris collection device is disposed over a reflection surface of the collector, and at least one drip hole is located between the debris collection device and the collector. A tin bucket for collecting debris from the debris collection device is located below the at least one drip hole, and a tube or guide rod extends from the drip hole to the tin bucket.
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公开(公告)号：US11647578B2
公开(公告)日：2023-05-09
申请号：US17462563
申请日：2021-08-31
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Tai-Yu Chen , Cho-Ying Lin , Sagar Deepak Khivsara , Hsiang Chen , Chieh Hsieh , Sheng-Kang Yu , Shang-Chieh Chien , Kai Tak Lam , Li-Jui Chen , Heng-Hsin Liu , Zhiqiang Wu
CPC classification number: H05G2/008 , G03F7/70033 , G03F7/7055 , G03F7/7085 , H05G2/006
Abstract: A light source is provided capable of maintaining the temperature of a collector surface at or below a predetermined temperature. The light source in accordance with various embodiments of the present disclosure includes a processor, a droplet generator for generating a droplet to create extreme ultraviolet light, a collector for reflecting the extreme ultraviolet light into an intermediate focus point, a light generator for generating pre-pulse light and main pulse light, and a thermal image capture device for capturing a thermal image from a reflective surface of the collector.
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公开(公告)号：US12007694B2
公开(公告)日：2024-06-11
申请号：US17691647
申请日：2022-03-10
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Wei-Chun Yen , Chi Yang , Sheng-Kang Yu , Shang-Chieh Chien , Li-Jui Chen , Heng-Hsin Liu
CPC classification number: G03F7/70033 , G03F7/70891 , H05G2/005 , H05G2/008
Abstract: In an embodiment, a method includes: heating a byproduct transport ring of an extreme ultraviolet source, the byproduct transport ring disposed beneath vanes of the extreme ultraviolet source; after heating the byproduct transport ring for a first duration, heating the vanes; after heating the vanes, cooling the vanes; and after cooling the vanes for a second duration, cooling the byproduct transport ring.
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公开(公告)号：US12096544B2
公开(公告)日：2024-09-17
申请号：US18298927
申请日：2023-04-11
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Tai-Yu Chen , Cho-Ying Lin , Sagar Deepak Khivsara , Hsiang Chen , Chieh Hsieh , Sheng-Kang Yu , Shang-Chieh Chien , Kai Tak Lam , Li-Jui Chen , Heng-Hsin Liu , Zhiqiang Wu
CPC classification number: H05G2/008 , G03F7/70033 , G03F7/7055 , G03F7/7085 , H05G2/006
Abstract: A light source is provided capable of maintaining the temperature of a collector surface at or below a predetermined temperature. The light source in accordance with various embodiments of the present disclosure includes a processor, a droplet generator for generating a droplet to create extreme ultraviolet light, a collector for reflecting the extreme ultraviolet light into an intermediate focus point, a light generator for generating pre-pulse light and main pulse light, and a thermal image capture device for capturing a thermal image from a reflective surface of the collector.
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公开(公告)号：US20240295825A1
公开(公告)日：2024-09-05
申请号：US18660862
申请日：2024-05-10
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Wei-Chun Yen , Chi Yang , Sheng-Kang Yu , Shang-Chieh Chien , Li-Jui Chen , Heng-Hsin Liu
CPC classification number: G03F7/70033 , G03F7/70891 , H05G2/005 , H05G2/008
Abstract: In an embodiment, a method includes: heating a byproduct transport ring of an extreme ultraviolet source, the byproduct transport ring disposed beneath vanes of the extreme ultraviolet source; after heating the byproduct transport ring for a first duration, heating the vanes; after heating the vanes, cooling the vanes; and after cooling the vanes for a second duration, cooling the byproduct transport ring.
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