公开(公告)号：US20140263164A1

公开(公告)日：2014-09-18

申请号：US13831193

申请日：2013-03-14

Applicant: Wisconsin Alumni Research Foundation

Inventor： Padma Gopalan ,  Daniel Patrick Sweat ,  Jonathan Woosun Choi ,  Myungwoong Kim

IPC: C09D153/00

CPC classification number: B32B27/30 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y30/00 ,  C08F220/18 ,  C09D153/00

Abstract: Polymer films comprising crosslinked random copolymers and methods for making the films are provided. Also provided are polymer films comprising random copolymers that are covalently linked to an underlying substrate. The polymer films can be incorporated into structures in which the films are employed as surface-modifying layers for domain-forming block copolymers and the structures can be used for pattern transfer applications via block copolymer lithography. The crosslinks between the random copolymer chains in the polymer films or the links between the random copolymer chains and the substrate surface are characterized in that they can be cleaved under relatively mild conditions.

Abstract translation: 提供包含交联无规共聚物的聚合物薄膜和制备薄膜的方法。 还提供了包含共价连接到下面的基底的无规共聚物的聚合物膜。 聚合物膜可以结合到其中使用膜作为区域形成嵌段共聚物的表面改性层的结构中，并且该结构可以通过嵌段共聚物光刻用于图案转移应用。 聚合物膜中的无规共聚物链之间的交联或无规共聚物链与基材表面之间的连接的特征在于它们可以在相对温和的条件下裂解。

公开(公告)号：US20140273361A1

公开(公告)日：2014-09-18

申请号：US13829078

申请日：2013-03-14

Applicant: Wisconsin Alumni Research Foundation

Inventor： Michael S. Arnold ,  Padma Gopalan ,  Nathaniel S. Safron ,  Myungwoong Kim ,  Jonathan Woosun Choi

IPC: H01L21/04 ,  H01L21/027 ,  C01B31/04 ,  H01L21/02

CPC classification number: H01L21/042 ,  B82Y10/00 ,  B82Y40/00 ,  C01B32/194 ,  C01B2204/065 ,  H01L21/3065 ,  H01L21/3086 ,  H01L21/31058 ,  H01L21/31116 ,  H01L21/31138 ,  H01L29/0673 ,  H01L29/1606 ,  H01L29/66015 ,  H01L29/66439 ,  H01L29/778

Abstract: Methods of fabricating patterned substrates, including patterned graphene substrates, using etch masks formed from self-assembled block copolymer films are provided. Some embodiments of the methods are based on block copolymer (BCP) lithography in combination with graphoepitaxy. Some embodiments of the methods are based on BCP lithography techniques that utilize hybrid organic/inorganic etch masks derived from BCP templates. Also provided are field effect transistors incorporating graphene nanoribbon arrays as the conducting channel and methods for fabricating such transistors.

Abstract translation: 提供了使用由自组装嵌段共聚物膜形成的蚀刻掩模来制造包括图案化石墨烯衬底的图案化衬底的方法。 该方法的一些实施方案基于嵌段共聚物（BCP）平版印刷术与组合蛋白质外延法。 该方法的一些实施方案基于利用衍生自BCP模板的混合有机/无机蚀刻掩模的BCP光刻技术。 还提供了结合了石墨烯纳米线阵列作为导电沟道的场效应晶体管以及用于制造这种晶体管的方法。

公开(公告)号：US09105480B2

公开(公告)日：2015-08-11

申请号：US13829078

申请日：2013-03-14

Applicant: Wisconsin Alumni Research Foundation

Inventor： Michael S. Arnold ,  Padma Gopalan ,  Nathaniel S. Safron ,  Myungwoong Kim ,  Jonathan Woosun Choi

IPC: C01B31/04 ,  H01L21/04 ,  H01L21/3065 ,  H01L21/308 ,  H01L21/3105 ,  H01L21/311 ,  B82Y10/00

CPC classification number: H01L21/042 ,  B82Y10/00 ,  B82Y40/00 ,  C01B32/194 ,  C01B2204/065 ,  H01L21/3065 ,  H01L21/3086 ,  H01L21/31058 ,  H01L21/31116 ,  H01L21/31138 ,  H01L29/0673 ,  H01L29/1606 ,  H01L29/66015 ,  H01L29/66439 ,  H01L29/778

Abstract: Methods of fabricating patterned substrates, including patterned graphene substrates, using etch masks formed from self-assembled block copolymer films are provided. Some embodiments of the methods are based on block copolymer (BCP) lithography in combination with graphoepitaxy. Some embodiments of the methods are based on BCP lithography techniques that utilize hybrid organic/inorganic etch masks derived from BCP templates. Also provided are field effect transistors incorporating graphene nanoribbon arrays as the conducting channel and methods for fabricating such transistors.

Abstract translation: 提供了使用由自组装嵌段共聚物膜形成的蚀刻掩模来制造包括图案化石墨烯衬底的图案化衬底的方法。 该方法的一些实施方案基于嵌段共聚物（BCP）平版印刷术与组合蛋白质外延法。 该方法的一些实施方案基于利用衍生自BCP模板的混合有机/无机蚀刻掩模的BCP光刻技术。 还提供了结合了石墨烯纳米线阵列作为导电沟道的场效应晶体管以及用于制造这种晶体管的方法。

公开(公告)号：US08999623B2

公开(公告)日：2015-04-07

申请号：US13831193

申请日：2013-03-14

Applicant: Wisconsin Alumni Research Foundation

Inventor： Padma Gopalan ,  Daniel Patrick Sweat ,  Jonathan Woosun Choi ,  Myungwoong Kim

IPC: G03C1/00 ,  G03F7/00 ,  B32B27/30 ,  B82Y30/00 ,  C09D153/00

CPC classification number: B32B27/30 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y30/00 ,  C08F220/18 ,  C09D153/00

Abstract: Polymer films comprising crosslinked random copolymers and methods for making the films are provided. Also provided are polymer films comprising random copolymers that are covalently linked to an underlying substrate. The polymer films can be incorporated into structures in which the films are employed as surface-modifying layers for domain-forming block copolymers and the structures can be used for pattern transfer applications via block copolymer lithography. The crosslinks between the random copolymer chains in the polymer films or the links between the random copolymer chains and the substrate surface are characterized in that they can be cleaved under relatively mild conditions.

Abstract translation: 提供包含交联无规共聚物的聚合物薄膜和制备薄膜的方法。 还提供了包含共价连接到下面的基底的无规共聚物的聚合物膜。 聚合物膜可以结合到其中使用膜作为区域形成嵌段共聚物的表面改性层的结构中，并且该结构可以通过嵌段共聚物光刻用于图案转移应用。 聚合物膜中的无规共聚物链之间的交联或无规共聚物链与基材表面之间的连接的特征在于它们可以在相对温和的条件下裂解。