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公开(公告)号：US20050274400A1
公开(公告)日：2005-12-15
申请号：US11151870
申请日：2005-06-13
申请人： Yu-Ying Chan , Ching-Lung Wang , Wen-Cheng Hsu , Tseng-Kui Tseng , Chen Teng , Ho-Li Hsieh
发明人： Yu-Ying Chan , Ching-Lung Wang , Wen-Cheng Hsu , Tseng-Kui Tseng , Chen Teng , Ho-Li Hsieh
CPC分类号： B08B3/14 , G03F7/3092
摘要： An apparatus (100) for processing substrates includes: a substrate cleaning device (20), which cleans the substrates with treating liquid; a developing device (40); and a treating liquid recovery system (30), which is connected with the cleaning device and the developing device. The treating liquid recovery system can convey the treating liquid from the cleaning device to the developing device. Thus the treating liquid that has been used in the cleaning device can be reused in the developing device. Therefore the apparatus can economize on treating liquid and reduce costs.
摘要翻译： 一种用于处理衬底的设备（100），包括：用处理液清洗衬底的衬底清洗装置（20）; 显影装置（40）; 以及与清洁装置和显影装置连接的处理液回收系统（30）。 处理液回收系统可将处理液从清洗装置输送到显影装置。 因此，已经在清洁装置中使用的处理液体可以重新用于显影装置。 因此，该设备可以节省处理液体并降低成本。
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公开(公告)号：US07371023B2
公开(公告)日：2008-05-13
申请号：US11151870
申请日：2005-06-13
申请人： Yu-Ying Chan , Ching-Lung Wang , Wen-Cheng Hsu , Tseng-Kui Tseng , Chen Kun Teng , Ho-Li Hsieh
发明人： Yu-Ying Chan , Ching-Lung Wang , Wen-Cheng Hsu , Tseng-Kui Tseng , Chen Kun Teng , Ho-Li Hsieh
IPC分类号： G03D5/00
CPC分类号： B08B3/14 , G03F7/3092
摘要： An apparatus (100) for processing substrates includes: a substrate cleaning device (20), which cleans the substrates with treating liquid; a developing device (40); and a treating liquid recovery system (30), which is connected with the cleaning device and the developing device. The treating liquid recovery system can convey the treating liquid from the cleaning device to the developing device. Thus the treating liquid that has been used in the cleaning device can be reused in the developing device. Therefore the apparatus can economize on treating liquid and reduce costs.
摘要翻译： 一种用于处理衬底的设备（100），包括：用处理液清洗衬底的衬底清洗装置（20）; 显影装置（40）; 以及与清洁装置和显影装置连接的处理液回收系统（30）。 处理液回收系统可将处理液从清洗装置输送到显影装置。 因此，已经在清洁装置中使用的处理液体可以重新用于显影装置。 因此，该设备可以节省处理液体并降低成本。
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公开(公告)号：US20050235910A1
公开(公告)日：2005-10-27
申请号：US11111101
申请日：2005-04-20
申请人： Chen Teng , Ching-Lung Wang , Wen-Cheng Hsu , Yu-Ying Chan , Tseng-Kuei Tseng , Ho-Li Hsieh
发明人： Chen Teng , Ching-Lung Wang , Wen-Cheng Hsu , Yu-Ying Chan , Tseng-Kuei Tseng , Ho-Li Hsieh
CPC分类号： B08B5/04 , B05C5/0254 , B05C9/10 , B08B7/028 , G03F7/16
摘要： A coating apparatus (20) for forming a photoresist film on a substrate (21) includes a flat table (30), a nozzle unit (40), and a particle cleaning unit (50). The flat table is used for supporting the substrate. The nozzle unit is used for dispensing photoresist material on a top surface of the substrate. The particle cleaning unit is used for removing particles from the top surface before the photoresist material is coated thereon. The coating apparatus can timely clean the substrate before coating. The coating performance is improved, and the nozzle unit is protected from being scratched or damaged.
摘要翻译： 用于在基板（21）上形成光致抗蚀剂膜的涂布装置（20）包括平台（30），喷嘴单元（40）和颗粒清洁单元（50）。 平台用于支撑基板。 喷嘴单元用于在基板的顶表面上分配光致抗蚀剂材料。 颗粒清洁单元用于在光致抗蚀剂材料被涂覆之前从顶表面去除颗粒。 涂布装置可以在涂布之前及时清洁基材。 改善了涂层性能，并且防止喷嘴单元被划伤或损坏。
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公开(公告)号：US20050233076A1
公开(公告)日：2005-10-20
申请号：US11111100
申请日：2005-04-20
申请人： Shao-Ming Hsu , Ching-Lung Wang , Wen-Cheng Hsu , Yu-Ying Chan , Tseng-Kuei Tseng , Ho-Li Hsieh , Chen-Kun Teng
发明人： Shao-Ming Hsu , Ching-Lung Wang , Wen-Cheng Hsu , Yu-Ying Chan , Tseng-Kuei Tseng , Ho-Li Hsieh , Chen-Kun Teng
CPC分类号： H01L21/68735 , H01L21/67034 , H01L21/6875 , H01L21/68757
摘要： An apparatus (20) for supporting a substrate (S2) includes a number of slats (28), a number of connecting blocks (24) separately positioned on the slats, and a number of soft sleeves (22) connected with the connecting blocks, respectively. Because top surfaces of the soft sleeves are shaped as annular, the force applied between the substrate and the soft sleeves is distributed, and is reduced at each contact point. The surface of the substrate is hardly if at all deformed by the soft sleeves, thereby reducing the risk of or even altogether preventing the formation of undulations. The quality of the pattern to be processed is improved.
摘要翻译： 用于支撑基板（S 2）的装置（20）包括多个板条（28），分开定位在板条上的多个连接块（24）和与连接块连接的多个软套筒（22） ， 分别。 由于软套筒的顶面形状为环形，所以施加在基体和软套之间的力分布，并在每个接触点处被减小。 如果通过软套筒变形，基材的表面几乎不变，从而降低或甚至完全防止起伏形成的风险。 要处理的图案的质量得到改善。
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公开(公告)号：US20050211789A1
公开(公告)日：2005-09-29
申请号：US11092230
申请日：2005-03-28
申请人： Ho-Li Hsieh , Hung-Wen Yang , Ching-Lung Wang , Yu-Ying Chan , Tseng-Kuei Tseng
发明人： Ho-Li Hsieh , Hung-Wen Yang , Ching-Lung Wang , Yu-Ying Chan , Tseng-Kuei Tseng
IPC分类号： G06K19/06
CPC分类号： G06K19/06028
摘要： A glass substrate includes a two-dimensional barcode, which is provided on a peripheral region of a major surface of the glass substrate. A side of the two-dimensional barcode is oblique to a nearest side of the glass substrate. The two-dimensional barcode includes a reference line, and is for recording identification information of the glass substrate. If the two-dimensional barcode sustains partial damage at the nearest side of the glass substrate, there is a reasonable likelihood that only part of the side of the two-dimensional barcode will sustain damage. In such case, the risk of damage occurring to the reference line of the two-dimensional barcode is minimized. If the reference line remains intact, then the two-dimensional barcode can still be properly read.
摘要翻译： 玻璃基板包括设置在玻璃基板的主表面的周边区域上的二维条形码。 二维条形码的一侧与玻璃基板的最近侧倾斜。 二维条形码包括参考线，用于记录玻璃基板的识别信息。 如果二维条形码在玻璃基板的最近侧保持部分损伤，那么二维条形码只有部分侧面会有损坏的合理可能性。 在这种情况下，二维条形码的参考线发生损坏的危险被最小化。 如果参考线保持原样，则二维条形码仍然可以正确读取。
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公开(公告)号：US07326300B2
公开(公告)日：2008-02-05
申请号：US11178069
申请日：2005-07-07
申请人： Lu Nan Sun , Ching Lung Wang , Wen Cheng Hsu , Yu-Ying Chan
发明人： Lu Nan Sun , Ching Lung Wang , Wen Cheng Hsu , Yu-Ying Chan
CPC分类号： H01L21/6715 , B05C5/0254 , B05C13/00 , G03F7/16 , H01L21/67784
摘要： A coating apparatus (2) includes a work table (20) having a plurality of blowing holes (201) for suspending a substrate (200) thereabove, a coating unit (22) having a photoresist coating nozzle (222) and a supplying device (224) for photoresist material. The photoresist coating nozzle is disposed above the work table, and the supplying device connects to the coating nozzle for supplying photoresist thereto. In operation, the substrate to be coated is continuously suspended in the gas just above but not in contact with the work table. Therefore, accumulation of static electricity and/or foreign particles on the substrate can be avoided. Gas emitting from the blowing holes can remove foreign particles from the surface of the work table and the backside of the work table.
摘要翻译： 涂覆装置（2）包括具有多个用于悬挂上述基板（200）的吹扫孔（201）的工作台（20），具有光致抗蚀剂涂布喷嘴（222）和供给装置（22）的涂布单元 224）用于光致抗蚀剂材料。 光致抗蚀剂涂布喷嘴设置在工作台的上方，供给装置连接到用于向其施加光致抗蚀剂的涂布喷嘴。 在操作中，待涂覆的基板连续地悬挂在正好在工作台上方但不与工作台接触的气体中。 因此，可以避免静电和/或异物在基板上的积聚。 从吹风孔排出的气体可以从工作台表面和工作台的背面除去异物。
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公开(公告)号：US20050238350A1
公开(公告)日：2005-10-27
申请号：US11111141
申请日：2005-04-20
申请人： Wen-Cheng Hsu , Ching-Lung Wang , Yu-Ying Chan , Tseng-Kuei Tseng
发明人： Wen-Cheng Hsu , Ching-Lung Wang , Yu-Ying Chan , Tseng-Kuei Tseng
CPC分类号： G03F7/32 , G03D5/04 , G03F7/0007 , G03F7/30 , G03F7/322
摘要： An apparatus (3) for removing developing solution from a substrate (30) includes a working table (36) for placing the substrate, a supporting frame (33) positioned on the working table, a gas dispensing nozzle (31) mounted on the supporting frame, and a water dispensing nozzle (32) mounted on the supporting frame. The apparatus can remove the residual developing solution from the substrate and needs not to lift the substrate. The substrate is safely processed and the working time is improved.
摘要翻译： 一种用于从基板（30）去除显影液的装置（3），包括：放置基板的工作台（36），位于工作台上的支撑框架（33），安装在支撑件上的气体分配喷嘴 框架和安装在支撑框架上的水分配喷嘴（32）。 该装置可以从基板上除去残留的显影液，并且不需要提起基板。 基板被安全处理，工作时间得到改善。
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公开(公告)号：US07367725B2
公开(公告)日：2008-05-06
申请号：US11111141
申请日：2005-04-20
申请人： Wen-Cheng Hsu , Ching-Lung Wang , Yu-Ying Chan , Tseng-Kuei Tseng
发明人： Wen-Cheng Hsu , Ching-Lung Wang , Yu-Ying Chan , Tseng-Kuei Tseng
IPC分类号： G03D5/00
CPC分类号： G03F7/32 , G03D5/04 , G03F7/0007 , G03F7/30 , G03F7/322
摘要： An apparatus (3) for removing developing solution from a substrate (30) includes a working table (36) for placing the substrate, a supporting frame (33) positioned on the working table, a gas dispensing nozzle (31) mounted on the supporting frame, and a water dispensing nozzle (32) mounted on the supporting frame. The apparatus can remove the residual developing solution from the substrate and needs not to lift the substrate. The substrate is safely processed and the working time is improved.
摘要翻译： 一种用于从基板（30）去除显影液的装置（3），包括：放置基板的工作台（36），位于工作台上的支撑框架（33），安装在支撑件上的气体分配喷嘴 框架和安装在支撑框架上的水分配喷嘴（32）。 该装置可以从基板上除去残留的显影液，并且不需要提起基板。 基板被安全处理，工作时间得到改善。
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公开(公告)号：US20060008591A1
公开(公告)日：2006-01-12
申请号：US11178069
申请日：2005-07-07
申请人： Lu Sun , Ching Wang , Wen Hsu , Yu-Ying Chan
发明人： Lu Sun , Ching Wang , Wen Hsu , Yu-Ying Chan
IPC分类号： B05D7/00
CPC分类号： H01L21/6715 , B05C5/0254 , B05C13/00 , G03F7/16 , H01L21/67784
摘要： A coating apparatus (2) includes a work table (20) having a plurality of blowing holes (201) for suspending a substrate (200) thereabove, a coating unit (22) having a photoresist coating nozzle (222) and a supplying device (224) for photoresist material. The photoresist coating nozzle is disposed above the work table, and the supplying device connects to the coating nozzle for supplying photoresist thereto. In operation, the substrate to be coated is continuously suspended in the gas just above but not in contact with the work table. Therefore, accumulation of static electricity and/or foreign particles on the substrate can be avoided. Gas emitting from the blowing holes can remove foreign particles from the surface of the work table and the backside of the work table.
摘要翻译： 涂覆装置（2）包括具有多个用于悬挂上述基板（200）的吹扫孔（201）的工作台（20），具有光致抗蚀剂涂布喷嘴（222）和供给装置（22）的涂布单元 224）用于光致抗蚀剂材料。 光致抗蚀剂涂布喷嘴设置在工作台的上方，供给装置连接到用于向其施加光致抗蚀剂的涂布喷嘴。 在操作中，待涂覆的基板连续地悬挂在正好在工作台上方但不与工作台接触的气体中。 因此，可以避免静电和/或异物在基板上的积聚。 从吹风孔排出的气体可以从工作台表面和工作台的背面除去异物。
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公开(公告)号：US20060254625A1
公开(公告)日：2006-11-16
申请号：US11130509
申请日：2005-05-16
申请人： Yi-Yen Chen , Yu-Ying Chan , Wen Hsu , Ching Wang
发明人： Yi-Yen Chen , Yu-Ying Chan , Wen Hsu , Ching Wang
IPC分类号： B08B3/00
CPC分类号： H01L21/67051 , B08B3/02
摘要： A cleaning apparatus for cleaning a substrate (4) includes a brush-cleaning tank, a rinsing tank, and a drying room. The rinsing tank is arranged proximate to the brush-cleaning tank. The drying room is arranged proximate to the rinsing tank. The rinsing tank includes a sprayer (5) disposed therein. The sprayer includes a tube (51). The tube includes an elongated hollow body and a plurality of nozzle holes (52) defined in the body. The nozzle holes are arranged along an axial direction of the tube. Diameters of the nozzle holes are progressively decreasing along the axial direction. The sprayer is capable of cleaning the substrate with a relatively small total amount of deionized water.
摘要翻译： 用于清洁基板（4）的清洁装置包括刷洗槽，漂洗槽和干燥室。 清洗槽布置成靠近刷子清洗槽。 干燥室靠近清洗槽设置。 漂洗槽包括设置在其中的喷雾器（5）。 喷雾器包括管（51）。 管包括细长的中空体和在体内限定的多个喷嘴孔（52）。 喷嘴孔沿着管的轴向布置。 喷嘴孔的直径沿着轴向逐渐减小。 喷雾器能够用相对小量的去离子水清洗基材。
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