Internal vapour deposition process
    4.
    发明授权
    Internal vapour deposition process 有权
    内部气相沉积工艺

    公开(公告)号:US08402792B2

    公开(公告)日:2013-03-26

    申请号:US13082076

    申请日:2011-04-07

    Abstract: A method for manufacturing a primary preform for optical fibers using an internal vapor deposition process, including the steps of: i) providing a hollow glass substrate tube having a supply side and a discharge side, ii) surrounding at least part of the hollow glass substrate tube by a furnace, iii) supplying doped or undoped glass-forming gases to the interior of the hollow glass substrate tube via the supply side thereof, iv) creating a reaction zone in which conditions such that deposition of glass will take place on the interior of the hollow glass tube are created, and v) moving the reaction zone back and forth along the length of the hollow glass substrate tube between a reversal point located near the supply side and a reversal point located near the discharge side of the hollow glass substrate tube, wherein, during at least part of step v), the gas flow comprises a first concentration of fluorine-containing compound when the reaction zone is moving in the direction of the discharge side.

    Abstract translation: 一种使用内部气相沉积工艺制造用于光纤的初级预制棒的方法,包括以下步骤:i)提供具有供给侧和排出侧的中空玻璃基板管,ii)至少部分中空玻璃基板 通过炉子管,iii)通过其供应侧将掺杂或未掺杂的玻璃形成气体供应到中空玻璃基底管的内部,iv)产生反应区,其中在内部发生玻璃沉积的条件 并且v)沿着中空玻璃基板管的长度在位于供给侧附近的反转点与位于中空玻璃基板的排出侧附近的反转点之间前后移动反应区域 管,其中在步骤v)的至少一部分期间,当反应区沿盘的方向移动时,气流包括第一浓度的含氟化合物 大一边

    Method of silica optical fiber preform production
    7.
    发明授权
    Method of silica optical fiber preform production 有权
    二氧化硅光纤预制棒生产方法

    公开(公告)号:US06988380B2

    公开(公告)日:2006-01-24

    申请号:US10219861

    申请日:2002-08-15

    Abstract: A method is disclosed for the manufacture of optical fiber preforms using plasma enhanced chemical vapor deposition (PECVD). The invention consists of a cylindrical reactor in which material such as flourine-doped silica glass is deposited on a cylindrical silica rod. A furnace for regulating reactor temperature encases the reactor. A microwave generator coupled with a resonator and an H10 waveguide delivers microwave energy to the reactor, producing simultaneously symmetrical excitations in the E010 mode and a plasma surface wave in E01 mode located at the surface of the rod. A microwave plasma is scanned along the length of the rod through a slit in the reactor to deposit a homogeneous film of a desired thickness. The benefits of the present invention over the prior art include increased absorption of delivered power, and the ability to uniformly deposit films such as flourine-doped silica on rods with diameters of up to 30–35 mm and thus produce optical fiber preforms with diameters greater than 40 mm.

    Abstract translation: 公开了一种使用等离子体增强化学气相沉积(PECVD)制造光纤预制件的方法。 本发明由圆柱形反应器组成,其中诸如掺杂有掺杂的二氧化硅玻璃的材料沉积在圆柱形二氧化硅棒上。 用于调节反应器温度的炉包装反应堆。 与谐振器和H 10 O波导耦合的微波发生器将微波能量传递到反应器,在E 101模式中产生同时对称的激励,并且在E < SUB> 01 模式位于杆的表面。 沿着杆的长度扫描微波等离子体通过反应器中的狭缝,以沉积所需厚度的均质膜。 本发明相对于现有技术的优点包括增加的输送功率的吸收,以及将直径为30-35mm的棒均匀沉积诸如掺杂二氧化硅的薄膜的能力,从而产生直径更大的光纤预制棒 超过40毫米。

    Use of amorphous carbon film as a hardmask in the fabrication of optical waveguides
    8.
    发明申请
    Use of amorphous carbon film as a hardmask in the fabrication of optical waveguides 失效
    在制造光波导中使用无定形碳膜作为硬掩模

    公开(公告)号:US20050199013A1

    公开(公告)日:2005-09-15

    申请号:US10799147

    申请日:2004-03-12

    Abstract: Methods are provided for forming optical devices, such as waveguides, with minimal defect formation. In one aspect, the invention provides a method for forming a waveguide structure on a substrate surface including forming a cladding layer on the substrate surface, forming a core layer on the cladding layer, depositing an amorphous carbon hardmask on the core layer, forming a patterned photoresist layer on the amorphous carbon hardmask, etching the amorphous carbon hardmask, and etching the core material.

    Abstract translation: 提供了用于形成具有最小缺陷形成的光学器件(例如波导)的方法。 一方面,本发明提供了一种在基板表面上形成波导结构的方法,包括在基板表面上形成包覆层,在包层上形成芯层,在芯层上沉积无定形碳硬掩模,形成图案化 无定形碳硬掩模上的光致抗蚀剂层,蚀刻无定形碳硬掩模,并蚀刻芯材。

    Electrophoretic deposition process for making quartz glass products
    10.
    发明申请
    Electrophoretic deposition process for making quartz glass products 失效
    制造石英玻璃制品的电泳沉积工艺

    公开(公告)号:US20020152768A1

    公开(公告)日:2002-10-24

    申请号:US10139940

    申请日:2002-05-07

    CPC classification number: C03B19/12 C03B19/06 C03B19/066 C03B20/00 C03B2201/24

    Abstract: Cup-shaped porous silica preforms suitable for manufacture of large 24-inch crucibles used in Czochralski crystal-growing furnaces are produced by a unique electrophoretic casting process using a high-purity aqueous silica slip or slurry having a predetermined particle-size distribution, an average particle size of from 6 to 10 microns and a solids content of from 80 to 85 percent by weight. The slurry contains an electrolyte, such as ammonium hydroxide, has a pH of from 7.5 to 8.5, and can be wet milled at a pH of at least 7 in such manner as to provide the micronized silica particles with excellent electrophoretic mobility, thereby providing a superb process for economical mass production of large pure silica preforms using safe voltages, such as 20 to 40 volts. The electrophoretic casting apparatus can be of the type shown in FIGS. 1 and 2 and includes a permeable porous cup-shaped carbon-graphite mold (2) that serves as a positive anode and an internal reticulate or perforated cathode (3) of similar shape having a thin pervious cover means, such as the shroud 25, to prevent local dilution of the slurry at the cathode.

    Abstract translation: 用于制造用于切克劳斯基晶体生长炉的大型24英寸坩埚的杯形多孔二氧化硅预制件通过使用具有预定粒度分布的高纯度水性二氧化硅滑石或浆料的独特的电泳铸造方法生产,平均 粒度为6至10微米,固体含量为80至85重量%。 该浆料含有电解质如氢氧化铵,其pH值为7.5-8.5,并且可以在pH至少为7的条件下进行湿法研磨,以使微粉化的二氧化硅颗粒具有优异的电泳迁移率,从而提供了一种 使用安全电压(例如20至40伏特)大规模生产大型纯二氧化硅预制件的卓越工艺。 电泳铸造装置可以是图1和图2所示的类型。 如图1和图2所示,并且包括用作正阳极的可渗透多孔杯形碳 - 石墨模具(2)和具有类似形状的内部网状或多孔阴极(3),其具有薄的可透过的覆盖装置,例如护罩25, 以防止浆料在阴极处的局部稀释。

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