Abstract:
A single mode optical fiber having a core made from silica and less than or equal to about 11 weight % germania and having a maximum relative refractive index Δ1MAX. The optical fiber also has an inner cladding surrounding the core and having a minimum relative refractive index Δ2MIN, a first outer cladding surrounding the inner cladding and a second outer cladding surrounding the first outer cladding. The viscosity at 1650° C. of the second outer cladding minus the viscosity at 1650° C. of the first outer cladding is greater than 0.1e7 Poise, and Δ1MAX>Δ2MIN. The single mode optical fiber may also have an outer cladding surrounding the inner cladding made from silica or SiON. The first outer cladding has a maximum relative refractive index Δ3MAX, and Δ3MAX>Δ2MIN.
Abstract:
A single mode optical fiber having a core made from silica and less than or equal to about 11 weight % germania and having a maximum relative refractive index Δ1MAX. The optical fiber also has an inner cladding surrounding the core and having a minimum relative refractive index Δ2MIN, a first outer cladding surrounding the inner cladding and a second outer cladding surrounding the first outer cladding. The viscosity at 1650° C. of the second outer cladding minus the viscosity at 1650° C. of the first outer cladding is greater than 0.1e7 Poise, and Δ1MAX>Δ2MIN. The single mode optical fiber may also have an outer cladding surrounding the inner cladding made from silica or SiON. The first outer cladding has a maximum relative refractive index Δ3MAX, and Δ3MAX>Δ2MIN.
Abstract:
The invention relates to a silica glass compound having improved physical and chemical properties. In one embodiment, the present invention relates to a silica glass having a desirable brittleness in combination with a desirable density while still yielding a glass composition having a desired hardness and desired strength relative to other glasses. In another embodiment, the present invention relates to a silica glass composition that contains at least about 85 mole percent silicon dioxide and up to about 15 mole percent of one or more dopants selected from F, B, N, Al, Ge, one or more alkali metals (e.g., Li, Na, K, etc.), one or more alkaline earth metals (e.g., Mg, Ca, Sr, Ba, etc.), one or more transition metals (e.g., Ti, Zn, Y, Zr, Hf, etc.), one or more lanthanides (e.g., Ce, etc.), or combinations of any two or more thereof.
Abstract:
A method for manufacturing a primary preform for optical fibers using an internal vapor deposition process, including the steps of: i) providing a hollow glass substrate tube having a supply side and a discharge side, ii) surrounding at least part of the hollow glass substrate tube by a furnace, iii) supplying doped or undoped glass-forming gases to the interior of the hollow glass substrate tube via the supply side thereof, iv) creating a reaction zone in which conditions such that deposition of glass will take place on the interior of the hollow glass tube are created, and v) moving the reaction zone back and forth along the length of the hollow glass substrate tube between a reversal point located near the supply side and a reversal point located near the discharge side of the hollow glass substrate tube, wherein, during at least part of step v), the gas flow comprises a first concentration of fluorine-containing compound when the reaction zone is moving in the direction of the discharge side.
Abstract:
The invention starts from a known component of quartz glass for use in semiconductor manufacture, which component at least in a near-surface region shows a co-doping of a first dopant and of a second oxidic dopant, said second dopant containing one or more rare-earth metals in a concentration of 0.1-3% by wt. each (based on the total mass of SiO2 and dopant). Starting from this, to provide a quartz glass component for use in semiconductor manufacture in an environment with etching action, which component is distinguished by both high purity and high resistance to dry etching and avoids known drawbacks caused by co-doping with aluminum oxide, it is suggested according to the invention that the first dopant should be nitrogen and that the mean content of metastable hydroxyl groups of the quartz glass is less than 30 wtppm.
Abstract:
An ideal quartz glass for a wafer jig for use in an environment having an etching effect is distinguished by both high purity and high resistance to dry etching. To indicate a quartz glass that substantially fulfills these requirements, it is suggested according to the invention that the quartz glass is doped with nitrogen at least in a near-surface area, has a mean content of metastable hydroxyl groups of less than 30 wt ppm and that its fictive temperature is below 1250° C. and its viscosity is at least 1013 dPa·s at a temperature of 1200° C. An economic method for producing such a quartz glass comprises the following method steps: melting an SiO2 raw material to obtain a quartz glass blank, the SiO2 raw material or the quartz glass blank being subjected to a dehydration measure, heating the SiO2 raw material or the quartz glass blank to a nitriding temperature in the range between 1050° C. and 1850° C. in an ammonia-containing atmosphere, a temperature treatment by means of which the quartz glass of the quartz glass blank is set to a fictive temperature of 1250° C. or less, and a surface treatment of the quartz glass blank with formation of the quartz glass jig.
Abstract:
A method is disclosed for the manufacture of optical fiber preforms using plasma enhanced chemical vapor deposition (PECVD). The invention consists of a cylindrical reactor in which material such as flourine-doped silica glass is deposited on a cylindrical silica rod. A furnace for regulating reactor temperature encases the reactor. A microwave generator coupled with a resonator and an H10 waveguide delivers microwave energy to the reactor, producing simultaneously symmetrical excitations in the E010 mode and a plasma surface wave in E01 mode located at the surface of the rod. A microwave plasma is scanned along the length of the rod through a slit in the reactor to deposit a homogeneous film of a desired thickness. The benefits of the present invention over the prior art include increased absorption of delivered power, and the ability to uniformly deposit films such as flourine-doped silica on rods with diameters of up to 30–35 mm and thus produce optical fiber preforms with diameters greater than 40 mm.
Abstract:
Methods are provided for forming optical devices, such as waveguides, with minimal defect formation. In one aspect, the invention provides a method for forming a waveguide structure on a substrate surface including forming a cladding layer on the substrate surface, forming a core layer on the cladding layer, depositing an amorphous carbon hardmask on the core layer, forming a patterned photoresist layer on the amorphous carbon hardmask, etching the amorphous carbon hardmask, and etching the core material.
Abstract:
A microstructured optical fiber is described. The microstructured optical fiber comprises an inner region and an outer region. The inner region includes an inner material and a plurality of holes formed in the inner material. The outer region surrounds the inner region, and includes an outer material. The softening point temperature of the inner material is greater than the softening point temperature of the outer material by at least about 50° C. Microstructured optical fiber preforms and methods for making the microstructured optical fibers are also described. The microstructured optical fiber may be made to have substantially undistorted holes in the inner region.
Abstract:
Cup-shaped porous silica preforms suitable for manufacture of large 24-inch crucibles used in Czochralski crystal-growing furnaces are produced by a unique electrophoretic casting process using a high-purity aqueous silica slip or slurry having a predetermined particle-size distribution, an average particle size of from 6 to 10 microns and a solids content of from 80 to 85 percent by weight. The slurry contains an electrolyte, such as ammonium hydroxide, has a pH of from 7.5 to 8.5, and can be wet milled at a pH of at least 7 in such manner as to provide the micronized silica particles with excellent electrophoretic mobility, thereby providing a superb process for economical mass production of large pure silica preforms using safe voltages, such as 20 to 40 volts. The electrophoretic casting apparatus can be of the type shown in FIGS. 1 and 2 and includes a permeable porous cup-shaped carbon-graphite mold (2) that serves as a positive anode and an internal reticulate or perforated cathode (3) of similar shape having a thin pervious cover means, such as the shroud 25, to prevent local dilution of the slurry at the cathode.