Method and system to compensate for lamp intensity differences in a photolithographic inspection tool
    2.
    发明授权
    Method and system to compensate for lamp intensity differences in a photolithographic inspection tool 失效
    补偿光刻检测工具灯强度差异的方法和系统

    公开(公告)号:US07680321B2

    公开(公告)日:2010-03-16

    申请号:US12101260

    申请日:2008-04-11

    申请人: David Dixon Lloyd Lee

    发明人: David Dixon Lloyd Lee

    IPC分类号: G06K9/00

    摘要: An after develop inspection tool considers tool-to-tool variability when determining confidence score for wafers under inspection. A golden wafer is used to calculate a RGB signature as well as the slope of the individual RGB curves for different lamp intensities. These slopes are normalized in order to generate a compensation factor for red values and blue values within a signature. When a wafer is subsequently inspected at an ADI station using a different lamp, the test wafer RGB signature is likely captured at a different lamp intensity. Consequently, when comparing the signatures, the golden wafer RGB signature is adjusted by the compensation factors, based on the different lamp's intensity setting, and this adjusted RGB signature is then used to determine whether a defect exists on the test wafer.

    摘要翻译: 在确定检查中的晶片的置信度得分后,开发后的检查工具会考虑刀具对刀具的变异性。 使用金色晶片来计算RGB特征以及不同灯泡强度的各个RGB曲线的斜率。 这些斜率被归一化以便在签名中产生红色值和蓝色值的补偿因子。 当使用不同的灯随后在ADI站检查晶片时,可能以不同的灯强度捕获测试晶片RGB特征。 因此,当比较签名时,基于不同的灯的强度设置,通过补偿因子来调整金色晶片RGB签名,然后使用该调整的RGB签名来确定在测试晶片上是否存在缺陷。

    Method and apparatus for determining a material's characteristics by
photoreflectance using improved computer control
    3.
    发明授权
    Method and apparatus for determining a material's characteristics by photoreflectance using improved computer control 失效
    使用改进的计算机控制通过光反射率确定材料特性的方法和装置

    公开(公告)号:US5270797A

    公开(公告)日:1993-12-14

    申请号:US408903

    申请日:1989-09-13

    摘要: A method and apparatus for determining the characteristics of materials, particularly of semiconductors, semiconductor heterostructures and semiconductor interfaces by the use of photoreflectance, in which monochromatic light and modulated light beam reflected from the sample is detected to produce a d.c. signal and an a.c. signal, whereby the d.c. signal is applied to one input of a computer and the a.c. signal is used with another input of the computer which controls the light intensity of the monochromatic light impinging on the sample to maintain the d.c. signal substantially constant. A stepping motor is preferably utilized for varying the light intensity of the monochromatic light which is controlled by a computer to re-establish rapidly a predetermined d.c. signal established during normalization procedures when the light intensity of the monochromatic light changes, especially during change of its wavelength. Additionally, the modulation frequency of the modulated beam and/or the wavelength of the monochromatic light can also be varied by the computer.

    METHOD AND SYSTEM TO COMPENSATE FOR LAMP INTENSITY DIFFERENCES IN A PHOTOLITHOGRAPHIC INSPECTION TOOL
    4.
    发明申请
    METHOD AND SYSTEM TO COMPENSATE FOR LAMP INTENSITY DIFFERENCES IN A PHOTOLITHOGRAPHIC INSPECTION TOOL 失效
    补偿光刻检测工具中的强度差异的方法和系统

    公开(公告)号:US20080218745A1

    公开(公告)日:2008-09-11

    申请号:US12101260

    申请日:2008-04-11

    申请人: David Dixon Lloyd Lee

    发明人: David Dixon Lloyd Lee

    IPC分类号: G01N21/00

    摘要: An after develop inspection tool considers tool-to-tool variability when determining confidence score for wafers under inspection. A golden wafer is used to calculate a RGB signature as well as the slope of the individual RGB curves for different lamp intensities. These slopes are normalized in order to generate a compensation factor for red values and blue values within a signature. When a wafer is subsequently inspected at an ADI station using a different lamp, the test wafer RGB signature is likely captured at a different lamp intensity. Consequently, when comparing the signatures, the golden wafer RGB signature is adjusted by the compensation factors, based on the different lamp's intensity setting, and this adjusted RGB signature is then used to determine whether a defect exists on the test wafer.

    摘要翻译: 在确定检查中的晶片的置信度得分后,开发后的检查工具会考虑刀具对刀具的变异性。 使用金色晶片来计算RGB特征以及不同灯泡强度的各个RGB曲线的斜率。 这些斜率被归一化以便在签名中产生红色值和蓝色值的补偿因子。 当使用不同的灯随后在ADI站检查晶片时,可能以不同的灯强度捕获测试晶片RGB特征。 因此,当比较签名时,基于不同的灯的强度设置,通过补偿因子来调整金色晶片RGB签名,然后使用该调整的RGB签名来确定在测试晶片上是否存在缺陷。

    Method and system to compensate for lamp intensity differences in a photolithographic inspection tool
    5.
    发明授权
    Method and system to compensate for lamp intensity differences in a photolithographic inspection tool 失效
    补偿光刻检测工具灯强度差异的方法和系统

    公开(公告)号:US07359545B2

    公开(公告)日:2008-04-15

    申请号:US10749887

    申请日:2003-12-31

    申请人: David Dixon Lloyd Lee

    发明人: David Dixon Lloyd Lee

    IPC分类号: G06K9/00

    摘要: An after develop inspection tool considers tool-to-tool variability when determining confidence score for wafers under inspection. A golden wafer is used to calculate a RGB signature as well as the slope of the individual RGB curves for different lamp intensities. These slopes are normalized in order to generate a compensation factor for red values and blue values within a signature. When a wafer is subsequently inspected at an ADI station using a different lamp, the test wafer RGB signature is likely captured at a different lamp intensity. Consequently, when comparing the signatures, the golden wafer RGB signature is adjusted by the compensation factors, based on the different lamp's intensity setting, and this adjusted RGB signature is then used to determine whether a defect exists on the test wafer.

    摘要翻译: 在确定检查中的晶片的置信度得分后,开发后的检查工具会考虑刀具对刀具的变异性。 使用金色晶片来计算RGB特征以及不同灯泡强度的各个RGB曲线的斜率。 这些斜率被归一化以便在签名中产生红色值和蓝色值的补偿因子。 当使用不同的灯随后在ADI站检查晶片时,可能以不同的灯强度捕获测试晶片RGB特征。 因此,当比较签名时,基于不同的灯的强度设置,通过补偿因子来调整金色晶片RGB签名,然后使用该调整的RGB签名来确定在测试晶片上是否存在缺陷。

    Method and apparatus for determining a material's characteristics by
photoreflectance
    6.
    发明授权
    Method and apparatus for determining a material's characteristics by photoreflectance 失效
    用于通过光反射率确定材料特性的方法和装置

    公开(公告)号:US5260772A

    公开(公告)日:1993-11-09

    申请号:US382191

    申请日:1989-07-20

    摘要: A method and apparatus for determining the characteristics of materials, particularly of semi-conductors, semi-conductor heterostructures and semi-conductor interfaces by the use of photoreflectance, in which monochromatic light and modulated light beam reflected from the sample is detected to produce a d.c. signal and an a.c. signal, whereby the d.c. signal is applied to one input of a computer and the a.c. signal is used with another input of the computer which controls the light intensity of the monochromatic light impinging on the sample to maintain the d.c. signal substantially constant. A stepping motor is preferably utilized for varying the light intensity of the monochromatic light. Additionally, the modulation frequency of the modulated beam and/or the wavelength of the monochromatic light can also be varied by the computer. Growth conditions of semi-conductor materials as well as information about trap times can be obtained by analyzing the energy band gaps and determining the dependence of the in-phase photoreflectance signal on the pump modulating frequency, respectively.

    摘要翻译: 一种用于通过使用光反射率确定材料特别是半导体,半导体异质结构和半导体界面的特性的方法和装置,其中检测从样品反射的单色光和调制光束产生直流。 信号和a.c. 信号,由此直流。 信号被应用于计算机的一个输入端和等 信号与计算机的另一个输入端一起使用,该输入端控制着入射在样品上的单色光的光强度,以保持直流。 信号基本上恒定。 步进电机最好用于改变单色光的光强度。 此外,调制光束的调制频率和/或单色光的波长也可以由计算机改变。 半导体材料的生长条件以及关于陷阱时间的信息可以通过分析能带隙并分别确定同相光反射信号对泵调制频率的依赖性来获得。

    BODY FLUID CONSTITUENTS MEASUREMENT DEVICE
    7.
    发明申请
    BODY FLUID CONSTITUENTS MEASUREMENT DEVICE 有权
    身体液体测量装置

    公开(公告)号:US20080309939A1

    公开(公告)日:2008-12-18

    申请号:US12195604

    申请日:2008-08-21

    IPC分类号: G01N21/25 G01N33/48 G01K11/00

    摘要: A body fluid constituents measurement device, which performs measurement under a setting where light intensity of the light-emitting element is suitably stabilized, is provided. The present invention is a body fluid constituents measurement device which comprises: a light-emitting element that emits light onto a test paper onto which body fluid is spotted, a light receiving element which receives reflected light of the light emitted by said light-emitting element, a temperature measurement unit which measures the ambient temperature in the vicinity of said light-emitting element, a determination unit which determines conditions of light emission based on said temperature measured at said temperature measurement unit in order to stabilize light intensity of said light-emitting element, and a driving control unit which controls driving of said light-emitting element based on the conditions of light emission; and is characterized in that it starts measurement of body fluid constituents after the light intensity of light emitted by said light-emitting element has been stabilized.

    摘要翻译: 一种体液成分测量装置,其在发光元件的光强度适当稳定的设定下进行测量。 本发明是一种体液成分测量装置,其特征在于,包括:发光元件,其向被检测体液的试纸上发光;受光元件,其接收由所述发光元件发出的光的反射光 ,测量所述发光元件附近的环境温度的温度测量单元,确定单元,其基于在所述温度测量单元测量的所述温度来确定发光条件,以便稳定所述发光元件的光强度 元件和驱动控制单元,其基于发光条件来控制所述发光元件的驱动; 其特征在于,在由所述发光元件发出的光的光强已经稳定之后开始测量体液成分。

    Method for in-situ determination of the fermi level in GaAs and similar
materials by photoreflectance
    8.
    发明授权
    Method for in-situ determination of the fermi level in GaAs and similar materials by photoreflectance 失效
    GaAs和类似材料通过光反射原位测定费米能级的方法

    公开(公告)号:US5159410A

    公开(公告)日:1992-10-27

    申请号:US563094

    申请日:1990-08-03

    摘要: A method for in-situ determination by photoreflectance of the Fermi level (V.sub.F) at the surfaces or interfaces of GaAs and related materials, in which a probe beam of monochromatic light and a modulated pump beam from a pump source are directed onto a sample, and the measured barrier height V.sub.m =V.sub.F -V.sub.S is obtained from the information in the reflected light, where V.sub.S represents the surface voltage effects on the sample by the photoreflectance, whereby V.sub.m approaches V.sub.F as V.sub.S approaches zero during repeated tests in which a parameter such as temperature affecting the numerical value of V.sub.S is changed until there is flattening of the curve illlustrating V.sub.m as a function of the parameter.

    摘要翻译: 用于通过GaAs和相关材料的表面或界面处的费米能级(VF)的光反射原位测定的方法,其中单色光的探测光束和来自泵浦源的调制的泵浦光束被引导到样品上, 并且从反射光中的信息获得测量的势垒高度Vm = VF-VS,其中VS表示通过光反射率对样品的表面电压影响,由此在反复测试期间,Vm接近VF,其中参数 随着影响VS数值的温度的变化,直到曲线的平坦化显示Vm为参数的函数为止。

    OPTICAL ANALYZER
    10.
    发明申请
    OPTICAL ANALYZER 有权
    光学分析仪

    公开(公告)号:US20160234904A1

    公开(公告)日:2016-08-11

    申请号:US15015810

    申请日:2016-02-04

    IPC分类号: H05B33/08 G01N21/33

    摘要: Provided is an optical analyzer for performing a feedback control on the amount of light emitted from an LED as a light source, in which the configuration of an optical system is made simple and the degree of freedom in optical system arrangement is secured. An optical member 2 for focusing most of light while discharging part of the light as unfocused light is provided on an optical path from a light casting unit 1 to a sample cell 3. The optical member 2 can be achieved with a simple configuration, for example, two ball lenses spaced apart by a predetermined distance from each other. The light focused by the optical member 2 is cast as measurement light into the sample cell 3. Meanwhile, a second photodetector 5 is arranged at a position where the unfocused light reaches. The second photodetector 5 generates a detection signal in accordance with the amount of light that has entered the second photodetector 5 as monitored light, and a drive current to be supplied to an LED is controlled through a drive current controlling unit 6 and a current source 7 such that the amount of light is maintained at a fixed level.

    摘要翻译: 提供了一种用于对从光源发出的光量进行反馈控制的光学分析器,其中光学系统的结构简单且光学系统布置的自由度得到确保。 在从光铸造单元1到样品池3的光路上设置有用于聚焦大部分光的光学构件2,同时以未聚焦的光排出部分光。光学构件2可以以简单的构造实现,例如 ,彼此隔开预定距离的两个球透镜。 将由光学构件2聚焦的光作为测量光铸造到样品池3中。同时,第二光电检测器5布置在未聚焦的光到达的位置。 第二光电检测器5根据作为监视光进入第二光电检测器5的光量产生检测信号,通过驱动电流控制单元6和电流源7控制提供给LED的驱动电流 使得光量保持在固定的水平。