摘要:
There is provided a positive resist composition which, during resist pattern formation, can prevent the collapse of very fine resist patterns during the drying step following developing. This positive resist composition is used in a resist pattern formation method comprising a step, within the lithography process, for substituting a liquid remaining on the substrate following alkali developing with a critical drying liquid, and then drying this critical drying liquid by causing passage through a critical state. The positive resist composition comprises a resin component (A), which has an alkali-soluble unit content of less than 20 mol %, contains an acid dissociable, dissolution inhibiting group, and displays increased alkali solubility under action of acid, an acid generator component (B) that generates acid on exposure, and an organic solvent (C) for dissolving the components (A) and (B), and moreover, the component (A) comprises a structural unit (a1) containing an acid dissociable, dissolution inhibiting group, a structural unit (a2) containing a lactone unit, and a structural unit (a3) containing a polycyclic group with an alcoholic hydroxyl group.
摘要:
A tracking servo apparatus in which reflection light obtained when a laser beam is irradiated onto a recording surface of an optical disc is photoelectrically converted, thereby obtaining a photoelectric conversion signal, a tracking error signal showing a deviation amount of an irradiating position of said laser beam for a track in a disc radial direction on the recording surface is generated by the photoelectric conversion signal, a spherical aberration occurring in an optical system is detected, a level of the tracking error signal is corrected on the basis of the detection result, and the irradiating position of the laser beam is moved in the disc radial direction in accordance with the level-corrected tracking error signal.
摘要:
A semiconductor device includes semiconductor substrate, a trench capacitor formed in the semiconductor substrate, a cell transistor adjacently formed to the trench capacitor and having a gate electrode formed on the semiconductor substrate and a source/drain region formed in a surface of the semiconductor substrate, an impurity diffusion region formed in the semiconductor substrate so as to be electrically connected between the trench capacitor and the source/drain region, and a Ge inclusion region formed between the impurity diffusion region and the trench capacitor.
摘要:
Provided are a polymer compound having high transparency for use in a photoresist composition for microfabrication of the next generation, a resist composition using the polymer compound as a base polymer, and a dissolution inhibitor agent composed of the polymer compound. To ensure etching resistance, an alicyclic group is introduced into a side chain portion. Hydrogen atoms on the ring of the alicyclic group are highly fluorinated to ensure transparency to light of 157 nanometer wavelength, represented by an adsorption coefficient equal to or less than 3.0 μm−1. As the alicyclic group, a polycyclic group is preferably used. Hydrogen atoms are highly fluorinated by preferably substituting all hydrogen atoms on the ring by fluorine atoms, that is, forming a perfluoroalicyclic group. The resist composition is formed by using the polymer compound as a base polymer and further, the dissolution inhibitor agent is formed of the polymer compound.
摘要:
A phase device for providing a phase difference between an inner radius portion and an outer radius portion of a light beam which is emitted from a light source is provided in an optical path between the light source of an optical pickup apparatus and an objective lens. The light beam to which the phase difference has been provided is converged by the objective lens and irradiated to an optical disc. An interference of an inner radius portion and an outer radius portion of the returning light beam caused when the light beam is diffracted by the optical disc with ±1 primary diffracted light caused by the diffraction is suppressed. Therefore, an intensity fluctuation of the returning light beam caused by the interference is suppressed. A spherical aberration error showing a thickness error of the optical disc and a focusing error having a high linearity can be detected with high precision on the basis of the returning light. A numerical aperture of the objective lens, consequently, can be increased, high density information recording and information reproduction can be performed, and further, an optical pickup apparatus and an information recording and/or reproducing apparatus each having compatibility are realized.
摘要:
An optical pickup is provided for preventing an objective lens from colliding with an optical recording medium at the stage of initial adjustments. The optical pickup device comprises a servo circuit, and a lens driver for driving an objective lens. In the servo circuit, a drive signal generator supplies the lens driver with one of a first focus drive signal for moving the objective lens in a direction closer to an information recording layer, and a second focus drive signal for moving the objective lens in a direction away from the information recording layer. A controller in a timing generator switches a signal supplied to the lens driver from the first focus drive signal to the second focus drive signal when the level changes by a predetermined range or more in a servo signal which is generated during a period in which the first focus drive signal is being supplied to the lens driver.
摘要:
A solid-state image pickup device is constructed in which a charge transfer portion is provided on one side of a light-receiving sensor portion, the charge transfer portion is composed of charge transfer electrodes 2A, 2B of a plurality of layers, sidewall insulating layers 11, 8 being formed on the side surfaces of the charge transfer electrodes 2A, 2B of the respective layers of the charge transfer electrodes of a plurality of layers. A method of forming the above-described solid-state image pickup device manufacturing method comprises the process for forming the charge transfer electrodes 2A, 2B and the process for forming an insulating film on the whole surface and forming the sidewall insulating layers 11, 8 on the side surfaces of the charge transfer electrodes 2A, 2B of the respective layers by effecting etch-back process on this insulating film. It is possible to provide the solid-state image pickup device having the structure in which the charge transfer electrode can be suppressed from being reduced in size due to oxidation caused when the interlayer insulators are formed on the charge transfer electrodes and in which the number of the pixels of the solid-state image pickup device can be increased and the solid-state image pickup device can be increased in density and a manufacturing method of such solid-state image pickup device.
摘要:
A coordinate inputting/detecting apparatus, for optically detecting a position of a designating device inserted into a flat or substantially flat two-dimensional coordinate inputting/detecting area, and including a coordinate determining device to determine two-dimensional coordinates of the designating device in the area. A distance determining device determines a distance of the designating device from a surface of the area when the designating device is located on or in vicinity to the area. A storing device stores information of the determined coordinates and information of the determined distance. A coordinates change detecting/storing device detects and stores a change of the coordinates information. A distance change detecting/storing device detects and stores a change of the distance information. A state allocating device allocates at least one designating state among designating states of the designating device stored in advance, based upon the coordinate change and distance change information.
摘要:
A controller in a banding packing machine which can easily correct a shift from the predetermined timing cycle. The controller includes a cam shaft having a plurality of cams, a timing plate which includes a plurality of holes corresponding to rotation positions of the cam shaft, and a detecting means. An inching mode is also disclosed which provides for the manual adjustment of presser members following a step in the rotation of the cam shaft.
摘要:
In a method of removing a coating from an edge of a substrate a solvent reservoir is filled with a solvent to dissolve and remove a photoresist film, the solvent includes one of dipropylene glycol monoalkyl ether, a mixture of this ether and an easily volatile organic solvent (boiling point of 75-130.degree. C., vapor pressure of 5-75 mmHg at 20.degree. C.), and an alkaline aqueous solution, an edge of a substrate W is horizontally inserted in the reservoir, and thereafter, the edge of the substrate W is immersed in the solvent for a period of time, so as to dissolve and remove a coating such as photoresist from the edge of the substrate. The solvent may be filled into the solvent reservoir either before or after the edge of the substrate is inserted therein, and the method may further involve aspirating the solvent from the reservoir after the substrate edge has been inserted therein.