公开(公告)号：US08666665B2

公开(公告)日：2014-03-04

申请号：US13088144

申请日：2011-04-15

申请人： Jeffrey Drue David ,  Harry Q. Lee ,  Jun Qian ,  Jimin Zhang

发明人： Jeffrey Drue David ,  Harry Q. Lee ,  Jun Qian ,  Jimin Zhang

IPC分类号： G06F19/00 ,  H01L21/00

CPC分类号： G01J3/46 ,  B24B37/013 ,  B24B37/042 ,  B24B49/12

摘要： A method of generating reference spectra includes polishing a first substrate in a polishing apparatus, measuring a sequence of spectra from the first substrate during polishing with an in-situ optical monitoring system, for each spectrum in the sequence of spectra, determining a best matching reference spectrum from a first plurality of first reference spectra to generate a sequence of reference spectra, calculating a value of a metric of fit of the sequence of spectra to the sequence of reference spectra, comparing the value of the metric of fit to a threshold value and determining whether to generate a second library based on the comparison, and if the second library is determined to be generated, storing the sequence of spectra as a second plurality of reference spectra.

摘要翻译： 产生参考光谱的方法包括抛光抛光装置中的第一衬底，在光谱序列中的每个光谱下，用原位光学监测系统在抛光期间测量来自第一衬底的光谱序列，确定最佳匹配参考 频谱从第一多个第一参考光谱生成参考光谱序列，计算光谱序列的拟合度量与参考光谱序列的值，将拟合度量的值与阈值进行比较，以及 基于所述比较确定是否生成第二库，以及如果确定要生成所述第二库，则将所述光谱序列存储为第二多个参考光谱。

公开(公告)号：US08190285B2

公开(公告)日：2012-05-29

申请号：US12781644

申请日：2010-05-17

申请人： Jun Qian ,  Charles C. Garretson ,  Sivakumar Dhandapani ,  Jeffrey Drue David ,  Harry Q Lee

发明人： Jun Qian ,  Charles C. Garretson ,  Sivakumar Dhandapani ,  Jeffrey Drue David ,  Harry Q Lee

IPC分类号： G06F19/00 ,  B24B49/04 ,  B24B49/12

CPC分类号： B24B49/04 ,  B24B49/12

摘要： A substrate having a plurality of zones is polished and spectra are measured. For each zone, a first linear function fits a sequence of index values associated with reference spectra that best match the measured spectra. A projected time at which a reference zone will reach the target index value is determined based on the first linear function, and for at least one adjustable zone, a polishing parameter adjustment is calculated such that the adjustable zone has closer to the target index at the projected time than without such adjustment. The adjustment is calculated based on a feedback error calculated for a previous substrate. The feedback error for a subsequent substrate is calculated based on a second linear function that fits a sequence of index values associated with reference spectra that best match spectra measured after the polishing parameter is adjusted.

摘要翻译： 研磨具有多个区域的基板并测量光谱。 对于每个区域，第一个线性函数拟合与参考光谱相关联的索引值序列，该参考光谱与测量的光谱最匹配。 基于第一线性函数确定参考区域将达到目标指标值的预计时间，并且对于至少一个可调整区域，计算抛光参数调整，使得可调节区域更接近目标索引处的目标索引 预计时间比没有这样的调整。 基于对先前基板计算的反馈误差来计算调整。 基于适合与调整抛光参数之后测量的最佳匹配光谱的参考光谱相关联的索引值序列的第二线性函数来计算后续衬底的反馈误差。

公开(公告)号：US20120028813A1

公开(公告)日：2012-02-02

申请号：US12847721

申请日：2010-07-30

申请人： Jun Qian ,  Boguslaw A. Swedek ,  Harry Q. Lee ,  Jeffrey Drue David ,  Sivakumar Dhandapani ,  Thomas H. Osterheld

发明人： Jun Qian ,  Boguslaw A. Swedek ,  Harry Q. Lee ,  Jeffrey Drue David ,  Sivakumar Dhandapani ,  Thomas H. Osterheld

IPC分类号： C40B20/00

CPC分类号： G05B23/0208 ,  G05B2219/31459 ,  G05B2219/45232

摘要： A method of configuring a polishing monitoring system includes receiving user input selecting a plurality of libraries, each library of the plurality of libraries comprising a plurality of reference spectra for use in matching to measured spectra during polishing, each reference spectrum of the plurality of reference spectra having an associated index value, for a first zone of a substrate, receiving user input selecting a first subset of the plurality of libraries, and for a second zone of the substrate, receiving user input selecting a second subset of the plurality of libraries.

摘要翻译： 配置抛光监视系统的方法包括接收选择多个库的用户输入，多个库的每个库包括多个参考光谱，用于与抛光期间的测量光谱匹配，多个参考光谱的每个参考光谱 具有相关联的索引值，对于衬底的第一区域，接收选择所述多个库的第一子集的用户输入以及所述衬底的第二区域，接收选择所述多个库的第二子集的用户输入。

公开(公告)号：US20110301847A1

公开(公告)日：2011-12-08

申请号：US13088144

申请日：2011-04-15

申请人： Jeffrey Drue David ,  Harry Q. Lee ,  Jun Qian ,  Jimin Zhang

发明人： Jeffrey Drue David ,  Harry Q. Lee ,  Jun Qian ,  Jimin Zhang

IPC分类号： G06F19/00

CPC分类号： G01J3/46 ,  B24B37/013 ,  B24B37/042 ,  B24B49/12

摘要： A method of generating reference spectra includes polishing a first substrate in a polishing apparatus, measuring a sequence of spectra from the first substrate during polishing with an in-situ optical monitoring system, for each spectrum in the sequence of spectra, determining a best matching reference spectrum from a first plurality of first reference spectra to generate a sequence of reference spectra, calculating a value of a metric of fit of the sequence of spectra to the sequence of reference spectra, comparing the value of the metric of fit to a threshold value and determining whether to generate a second library based on the comparison, and if the second library is determined to be generated, storing the sequence of spectra as a second plurality of reference spectra.

摘要翻译： 产生参考光谱的方法包括抛光抛光装置中的第一衬底，在光谱序列中的每个光谱下，用原位光学监测系统在抛光期间测量来自第一衬底的光谱序列，确定最佳匹配参考 频谱从第一多个第一参考光谱生成参考光谱序列，计算光谱序列的拟合度量与参考光谱序列的值，将拟合度量的值与阈值进行比较，以及 基于所述比较确定是否生成第二库，以及如果确定要生成所述第二库，则将所述光谱序列存储为第二多个参考光谱。

公开(公告)号：US20110282477A1

公开(公告)日：2011-11-17

申请号：US12781654

申请日：2010-05-17

申请人： Harry Q. Lee ,  Jimin Zhang ,  Jeffrey Drue David ,  Boguslaw A. Swedek

发明人： Harry Q. Lee ,  Jimin Zhang ,  Jeffrey Drue David ,  Boguslaw A. Swedek

IPC分类号： G06F19/00

CPC分类号： B24B37/013 ,  B24B37/042

摘要： A plurality of substrates are polished simultaneously on the same polishing pad. A sequence of spectra is measured from each zone of each substrate, and for each measured spectrum in the sequence of spectra for each zone of each substrate, a best matching reference spectrum is determined from a library of reference spectra. For each zone of each substrate, a linear function is fit to a sequence of index values associated with the best matching reference spectra. For at least one zone, a projected time at which the zone will reach a target index value is determined based on the linear function, and the polishing parameter for at least one zone on at least one substrate is adjusted such that the at least one zone of the at least one substrate has closer to the target index at the projected time than without such adjustment.

摘要翻译： 多个基板在同一抛光垫上同时被抛光。 从每个底物的每个区域测量光谱序列，并且对于每个底物的每个区域的光谱序列中的每个测量的光谱，从参考光谱库确定最佳匹配的参考光谱。 对于每个衬底的每个区域，线性函数适合于与最佳匹配参考光谱相关联的索引值序列。 对于至少一个区域，基于线性函数确定区域将达到目标指标值的预计时间，并且调整至少一个基底上的至少一个区域的抛光参数，使得至少一个区域 的至少一个基板在投影时间比没有这种调整更接近于目标指标。

公开(公告)号：US07025658B2

公开(公告)日：2006-04-11

申请号：US10643583

申请日：2003-08-18

申请人： Jeffrey Drue David

发明人： Jeffrey Drue David

IPC分类号： B24B49/00 ,  B24B1/00

CPC分类号： B24B37/013 ,  B24B49/006 ,  B24B49/105 ,  B24B49/12

摘要： Methods system and apparatus, including computer program products, for monitoring polishing a substrate. A polishing pad mounted on a platen, is rotated at a first rotation rate, and a carrier head is rotated at a second rotation rate that is different from the first rotation rate. The carrier head carries a substrate and presses the substrate against the polishing pad. A sequence of data traces is acquired using a sensor mounted in the platen, wherein each data trace results from a separate scan with the sensor along a path across the substrate, and wherein the first and second rotation rates are such that a plurality of paths corresponding to a predetermined number of consecutive scans are substantially evenly radially distributed across the substrate.

摘要翻译： 方法系统和装置，包括计算机程序产品，用于监控抛光衬底。 安装在台板上的抛光垫以第一旋转速度旋转，并且以与第一旋转速度不同的第二旋转速度旋转行星架头。 载体头承载衬底并将衬底压靠在抛光垫上。 使用安装在压板中的传感器获取数据迹线序列，其中每个数据轨迹来自沿着穿过衬底的路径的传感器的单独扫描，并且其中第一和第二旋转速率使得多个路径对应 到预定数量的连续扫描基本均匀地径向地分布在衬底上。

公开(公告)号：US06991516B1

公开(公告)日：2006-01-31

申请号：US10920726

申请日：2004-08-17

申请人： Jeffrey Drue David ,  Dirk De Roover ,  Jimin Zhang ,  Boguslaw A. Swedek ,  Doyle E. Bennett ,  Manoocher Birang

发明人： Jeffrey Drue David ,  Dirk De Roover ,  Jimin Zhang ,  Boguslaw A. Swedek ,  Doyle E. Bennett ,  Manoocher Birang

IPC分类号： B24B49/00 ,  B24B51/00

CPC分类号： B24B49/105 ,  B24B37/04 ,  B24B49/12

摘要： A plurality of portions of a substrate are monitored during polishing at a first polishing station with an in-situ monitoring system. A plurality of thicknesses are determined based on measurements by the in-situ monitoring system, and the plurality of pressures to apply to the plurality of regions of the substrate are calculated in a closed-loop control system. However, if a representative thickness of the layer is less than a threshold thickness, calculation of the plurality of pressures by the closed-loop control system is halted and a plurality of predetermined pressures are applied to the plurality of regions of the substrate.

摘要翻译： 在具有原位监测系统的第一抛光站的抛光期间，监测基板的多个部分。 基于通过原位监测系统的测量确定多个厚度，并且在闭环控制系统中计算应用于衬底的多个区域的多个压力。 然而，如果层的代表性厚度小于阈值厚度，则闭环控制系统的多个压力的计算被停止，并且多个预定压力施加到基板的多个区域。

公开(公告)号：US06945845B2

公开(公告)日：2005-09-20

申请号：US10643773

申请日：2003-08-18

申请人： Doyle E Bennett ,  Sandeep R Koppikar ,  Jeffrey Drue David ,  Boguslaw A Swedek ,  Nils Johansson

发明人： Doyle E Bennett ,  Sandeep R Koppikar ,  Jeffrey Drue David ,  Boguslaw A Swedek ,  Nils Johansson

IPC分类号： B24B37/04 ,  B24B49/10 ,  B24B49/00 ,  B24B51/00

CPC分类号： B24B37/013 ,  B24B37/04 ,  B24B49/105

摘要： Conductive elements of a chemical mechanical polishing system may generate undesired eddy currents under the influence of a time-dependent magnetic field used in an eddy current monitoring system. To improve the accuracy of an eddy current monitoring system, elements that may contribute an undesired signal to the sensed eddy current signal may be fabricated from a non-conductive material such as plastic or ceramic. In some implementations, elements may be fabricated from non-magnetic materials.

摘要翻译： 化学机械抛光系统的导电元件可能在涡流监测系统中使用的时间依赖磁场的影响下产生不期望的涡流。 为了提高涡流监测系统的精度，可能会对非传导性材料（如塑料或陶瓷）制造可能对感测到的涡流信号造成不必要信号的元件。 在一些实施方案中，元件可以由非磁性材料制成。

公开(公告)号：US20160020157A1

公开(公告)日：2016-01-21

申请号：US14800246

申请日：2015-07-15

申请人： Tomohiko Kitajima ,  Jeffrey Drue David ,  Jun Qian ,  Taketo Sekine ,  Garlen C. Leung ,  Sidney P. Huey

发明人： Tomohiko Kitajima ,  Jeffrey Drue David ,  Jun Qian ,  Taketo Sekine ,  Garlen C. Leung ,  Sidney P. Huey

IPC分类号： H01L21/66 ,  H01L21/3105 ,  H01L21/67 ,  H01L21/321

CPC分类号： H01L22/26 ,  B24B37/013 ,  B24B49/105 ,  H01L21/31053 ,  H01L21/31055 ,  H01L21/31111 ,  H01L21/31116 ,  H01L21/3212 ,  H01L21/67075 ,  H01L21/67092 ,  H01L21/67253 ,  H01L22/14 ,  H01L22/20 ,  H01L22/34 ,  H01L27/11556 ,  H01L27/11582

摘要： A method of controlling polishing includes storing a base measurement, the base measurement being an eddy current measurement of a substrate after deposition of at least one layer overlying a semiconductor wafer and before deposition of a conductive layer over the at least one layer, after deposition of the conductive layer over the at least one layer and during polishing of the conductive layer on substrate, receiving a sequence of raw measurements of the substrate from an in-situ eddy current monitoring system, normalizing each raw measurement in the sequence of raw measurement to generate a sequence of normalized measurements using the raw measurement and the base measurement, and determining at least one of a polishing endpoint or an adjustment for a polishing rate based on at least the sequence of normalized measurements.

摘要翻译： 控制抛光的方法包括：在淀积位于半导体晶片上方的至少一层之后，以及在沉积导电层之后，至少沉积一层之后，存储基底测量，基底测量是衬底的涡流测量， 在至少一层上的导电层和在衬底上的导电层的抛光期间，从原位涡流监测系统接收衬底的原始测量序列，使原始测量序列中的每个原始测量标准化以产生 使用原始测量和基础测量的归一化测量序列，以及至少基于归一化测量的序列来确定抛光终点或抛光速率的调整中的至少一个。

公开(公告)号：US20130288571A1

公开(公告)日：2013-10-31

申请号：US13456117

申请日：2012-04-25

申请人： Jeffrey Drue David ,  Jun Qian ,  Harry Q. Lee

发明人： Jeffrey Drue David ,  Jun Qian ,  Harry Q. Lee

IPC分类号： B24B49/10 ,  B24B1/00

CPC分类号： B24B37/013 ,  B24B49/12

摘要： During polishing of a substrate at a first platen and prior to a first time, a first sequence of values is obtained for a first zone of the first substrate and a second sequence of values is obtained for a different second zone of the substrate with an in-situ monitoring system. A first function is fit to a portion of the first sequence of values obtained prior to the first time, and a second function is fit to a portion of the second sequence of values obtained prior to the second time. At least one polishing parameter is adjusted based on the first fitted function and the second fitted function so as to reduce an expected difference between the zones. A second substrate is polished on the first platen using an adjusted polishing parameter calculated based on the first fitted function and the second fitted function.

摘要翻译： 在第一压板处理衬底并且在第一时间之前，在第一衬底的第一区域获得第一序列值，并且对于衬底的不同第二区域获得第二序列值，其中， 监测系统。 第一函数适合于在第一次之前获得的第一序列序列的一部分，并且第二函数适合于在第二次之前获得的第二值序列的一部分。 基于第一装配功能和第二装配功能来调整至少一个抛光参数，以便减少区域之间的预期差异。 使用基于第一拟合函数和第二拟合函数计算的调整的抛光参数在第一压板上抛光第二衬底。