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314 条记录 (耗时 0.062 秒)

    Methods and apparatus for a high resolution inkjet fire pulse generator
    91.
    发明授权
    Methods and apparatus for a high resolution inkjet fire pulse generator 失效
    高分辨率喷墨式脉冲发生器的方法和装置

    公开(公告)号：US07637580B2

    公开(公告)日：2009-12-29

    申请号：US11238637

    申请日：2005-09-29

    申请人： Bassam Shamoun ,  Eugene Mirro ,  Janusz Jozwiak ,  Quanyuan Shang ,  Shinichi Kurita ,  John M. White

    发明人： Bassam Shamoun ,  Eugene Mirro ,  Janusz Jozwiak ,  Quanyuan Shang ,  Shinichi Kurita ,  John M. White

    IPC分类号： B41J29/38

    CPC分类号： B41J3/407 ,  B41J2/04505 ,  B41J2/04541 ,  B41J2/04581 ,  B41J2/04588 ,  B41J2/0459 ,  B41J2/04593 ,  B41J2/125 ,  B41J3/28 ,  B41J3/543 ,  B41J25/001 ,  B41J25/003 ,  B41J25/005 ,  B41J29/15 ,  B41J29/393

    摘要： The invention provides methods, systems, and drivers for controlling an inkjet printing system. The driver may include logic including a processor, memory coupled to the logic, and a fire pulse generator circuit coupled to the logic. The fire pulse generator may include a connector to facilitate coupling the driver to a print head. The fire pulse generator circuit may also include a fixed current source circuit adapted to generate a fire pulse with a constant slew rate that facilitates easy adjustment of ink drop size. The logic is adapted to receive an image and to convert the image to an image data file. The image data file is adapted to be used by the driver to trigger the print head to deposit ink into pixel wells on a substrate as the substrate is moved in a print direction. Numerous other aspects are disclosed.

    摘要翻译： 本发明提供了用于控制喷墨打印系统的方法，系统和驱动程序。 驱动器可以包括逻辑，其包括处理器，耦合到逻辑的存储器和耦合到逻辑的触发脉冲发生器电路。 火脉冲发生器可以包括用于便于将驱动器连接到打印头的连接器。 火脉冲发生器电路还可以包括固定电流源电路，其适于产生具有恒定压摆率的发射脉冲，其有利于容易地调节墨滴尺寸。 该逻辑适于接收图像并将图像转换为图像数据文件。 图像数据文件适于由驱动器使用，以在基板沿着打印方向移动时触发打印头将墨水沉积在基板上的像素孔中。 公开了许多其他方面。

    Methods and systems for inkjet drop positioning
    92.
    发明授权
    Methods and systems for inkjet drop positioning 失效
    喷墨定位方法和系统

    公开(公告)号：US07611217B2

    公开(公告)日：2009-11-03

    申请号：US11238636

    申请日：2005-09-29

    申请人： Bassam Shamoun ,  Janusz Jozwiak ,  Eugene Mirro ,  Quanyuan Shang ,  Shinichi Kurita ,  John M. White

    发明人： Bassam Shamoun ,  Janusz Jozwiak ,  Eugene Mirro ,  Quanyuan Shang ,  Shinichi Kurita ,  John M. White

    IPC分类号： B41J29/38

    CPC分类号： B41J29/393

    摘要： Methods and apparatus for inkjet inkjet drop positioning are provided. A first method includes determining an intended deposition location of an ink drop on a substrate, depositing the ink drop on the substrate using an inkjet printing system, detecting a deposited location of the deposited ink drop on the substrate, comparing the deposited location to the intended location, determining a difference between the deposited location and the intended location, and compensating for the difference between the deposited location and the intended location by adjusting a parameter of an inkjet printing system. Numerous other aspects are provided.

    摘要翻译： 提供喷墨喷墨滴定位的方法和装置。 第一种方法包括确定墨滴在基底上的预期沉积位置，使用喷墨印刷系统将墨滴沉积在基底上，检测沉积的墨滴在基底上的沉积位置，将沉积位置与预期的位置进行比较 确定存放位置与预期位置之间的差异，以及通过调整喷墨打印系统的参数来补偿存放位置与预期位置之间的差异。 提供了许多其他方面。

    CVD process gas flow, pumping and/or boosting
    95.
    发明授权
    CVD process gas flow, pumping and/or boosting 失效
    CVD工艺气体流动，泵送和/或增压

    公开(公告)号：US07588957B2

    公开(公告)日：2009-09-15

    申请号：US11873617

    申请日：2007-10-17

    申请人： John M. White

    发明人： John M. White

    IPC分类号： H01L21/00

    CPC分类号： H01L31/1804 ,  C23C16/5096 ,  C23C16/54 ,  Y02E10/547 ,  Y02P70/521

    摘要： The present invention generally comprises a method and apparatus for supplemental pumping, gas feed, and/or RF current for a process. When depositing amorphous silicon, the amount of process gases, RF current, and vacuum may be less than the amount of process gases, RF current, and vacuum necessary to deposit microcrystalline silicon. When a single chamber is used to deposit both amorphous and microcrystalline silicon, coupling a supplemental power supply, a supplemental gas source, and a supplemental vacuum pump to the chamber may be beneficial. The supplemental power supply, vacuum pump, and gas source, may be coupled with the chamber when the microcrystalline silicon is deposited and uncoupled when amorphous silicon is deposited. In a cluster tool arrangement, the supplemental power supply, vacuum pump, and gas source may serve multiple chambers that each deposit both amorphous and microcrystalline silicon.

    摘要翻译： 本发明通常包括用于过程的补充泵送，气体进料和/或RF电流的方法和装置。 当沉积非晶硅时，工艺气体的量，RF电流和真空度可以小于沉积微晶硅所需的工艺气体，RF电流和真空的量。 当使用单个室来沉积非晶硅和微晶硅时，将辅助电源，补充气体源和补充真空泵耦合到腔室可能是有益的。 补充电源，真空泵和气源可以在微晶硅沉积时与腔室耦合，当非晶硅沉积时，该电解质分离。 在集群工具装置中，补充电源，真空泵和气体源可以服务于多个室，每个室均沉积非晶硅和微晶硅。

    Thermally conductive dielectric bonding of sputtering targets using diamond powder filler or thermally conductive ceramic fillers
    96.
    发明授权
    Thermally conductive dielectric bonding of sputtering targets using diamond powder filler or thermally conductive ceramic fillers 失效
    使用金刚石粉末填料或导热陶瓷填料的溅射靶的导热介电键合

    公开(公告)号：US07588668B2

    公开(公告)日：2009-09-15

    申请号：US11368000

    申请日：2006-03-03

    申请人： Yan Ye ,  John M. White

    发明人： Yan Ye ,  John M. White

    IPC分类号： C23C14/34

    CPC分类号： C23C14/3407 ,  C23C14/35 ,  C23C14/352 ,  H01J37/3414 ,  H01J37/3435 ,  Y10T156/109

    摘要： A sputtering target assembly and method for bonding a sputtering target to a backing plate is disclosed. When insulatively bonding a sputtering target to a backing plate, it is necessary to ensure that the bonding material has good thermal conductivity so that the temperature of the target can be effectively controlled. It is also important to not have electrical conductivity through the bonding materials. In order to achieve both goals, it is beneficial to utilize an elastomer with diamond powder filler. Diamond power has very good thermal conductivity, and it also has very good dielectric strength. Diamond is a thermally effective and cost effective substitute for silver in insulative bonding.

    摘要翻译： 公开了一种用于将溅射靶结合到背板的溅射靶组件和方法。 当将溅射靶绝缘接合到背板时，需要确保接合材料具有良好的导热性，从而能够有效地控制靶的温度。 通过接合材料不具有导电性也是重要的。 为了实现这两个目标，使用具有金刚石粉末填料的弹性体是有益的。 金刚石功率具有非常好的导热性，并且也具有非常好的介电强度。 金刚石是绝缘粘合中银的热效应和成本效益的替代品。

    Multiple Phase RF Power for Electrode of Plasma Chamber
    97.
    发明申请
    Multiple Phase RF Power for Electrode of Plasma Chamber 有权
    等离子室电极的多相RF功率

    公开(公告)号：US20090202741A1

    公开(公告)日：2009-08-13

    申请号：US12363760

    申请日：2009-01-31

    申请人： Bradley O. Stimson ,  John M. White

    发明人： Bradley O. Stimson ,  John M. White

    IPC分类号： C23C4/00 ,  H02J3/00

    CPC分类号： H01J37/32174 ,  H01J37/32091 ,  H01J37/32577 ,  Y10T307/642

    摘要： RF power is coupled with different phase offsets to different RF connection points on an electrode of a plasma chamber. Preferably, the number of different RF connection points and corresponding phase offsets is at least four, and the positions of the RF connection points are distributed along two orthogonal dimensions of the electrode. Preferably, power to each respective RF connection point is supplied by a respective RF power supply, wherein each power supply synchronizes its phase to a common reference RF oscillator.

    摘要翻译： RF功率与不同的相位偏移耦合到等离子体室的电极上的不同RF连接点。 优选地，不同的RF连接点的数量和对应的相位偏移量至少为4，并且RF连接点的位置沿电极的两个正交尺寸分布。 优选地，每个相应RF连接点的功率由相应的RF电源提供，其中每个电源将其相位同步到公共参考RF振荡器。

    COOLED BACKING PLATE
    99.
    发明申请
    COOLED BACKING PLATE 审中-公开
    冷却背板

    公开(公告)号：US20090071406A1

    公开(公告)日：2009-03-19

    申请号：US11858020

    申请日：2007-09-19

    申请人： SOO YOUNG CHOI ,  Robin L. Tiner ,  John M. White

    发明人： SOO YOUNG CHOI ,  Robin L. Tiner ,  John M. White

    IPC分类号： C23C16/00

    CPC分类号： C23C16/45572 ,  C03C17/002 ,  C03C17/02 ,  C03C17/245 ,  C03C2217/213 ,  C03C2218/153 ,  C23C16/4411 ,  C23C16/505

    摘要： A plasma enhanced chemical vapor deposition chamber (PECVD) which includes a backing plate that provides support to a diffuser. The backing plate includes a plurality of fluid conduits adapted for circulation of a cooling fluid therethrough to remove excess heat generated in the chamber by the plasma to thereby maintain the backing plate in a stable condition thereby maintaining the diffuser in a stable position during the deposition of material from the plasma.

    摘要翻译： 等离子体增强化学气相沉积室（PECVD），其包括提供对扩散器的支撑的背板。 背板包括适于使冷却流体循环通过其中的多个流体导管，以通过等离子体去除腔室中产生的多余热量，从而将背板保持在稳定状态，从而在沉积期间将扩散器保持在稳定的位置 来自等离子体的材料

    DIFFUSER GRAVITY SUPPORT
    100.
    发明申请
    DIFFUSER GRAVITY SUPPORT 有权
    DIFFUSER GRAVITY支持

    公开(公告)号：US20090007846A1

    公开(公告)日：2009-01-08

    申请号：US12234359

    申请日：2008-09-19

    申请人： ERNST KELLER ,  John M. White ,  Robin L. Tiner ,  Jiri Kucera ,  Soo Young Choi ,  Beom Soo Park ,  Michael Starr

    发明人： ERNST KELLER ,  John M. White ,  Robin L. Tiner ,  Jiri Kucera ,  Soo Young Choi ,  Beom Soo Park ,  Michael Starr

    IPC分类号： C23C16/00

    CPC分类号： H01J37/3244 ,  C23C16/45565

    摘要： An apparatus and method for supporting a substantial center portion of a gas distribution plate is disclosed. At least one support member is capable of engaging and disengaging the diffuser with a mating connection without prohibiting flow of a gas or gases through the diffuser and is designed to provide vertical suspension to a diffuser that is supported at its perimeter, or capable of supporting the diffuser without a perimeter support. In one aspect, the at least one support member is a portion of a gas delivery conduit and in another embodiment is a plurality of support members separated from the gas delivery conduit. The at least one support member is capable of translating vertical lift, or vertical compression to a center area of the diffuser. A method and apparatus for controlling gas flow from the gas delivery conduit to the gas distribution plate is also disclosed.

    摘要翻译： 公开了一种用于支撑气体分布板的大部分中心部分的装置和方法。 至少一个支撑构件能够通过配合连接件接合和分离扩散器，而不阻止气体或气体流过扩散器，并且被设计成向在其周边支撑的扩散器提供垂直悬架，或者能够支撑 扩散器没有周界支撑。 在一个方面，所述至少一个支撑构件是气体输送导管的一部分，并且在另一个实施例中是与气体输送导管分离的多个支撑构件。 至少一个支撑构件能够将垂直升降或垂直压缩平移到扩散器的中心区域。 还公开了一种用于控制从气体输送管道到气体分配板的气流的方法和装置。