摘要:
A predetermined species such as nitrogen is placed at an interface between a bit line junction and a dielectric layer of a control dielectric structure of a flash memory device to minimize degradation of such an interface by minimizing formation of interface defects during program or erase operations of the flash memory device. The predetermined species such as nitrogen is implanted into a bit line junction of the flash memory device. A thermal process is performed that heats up the semiconductor wafer such that the predetermined species such as nitrogen implanted within the semiconductor wafer thermally drifts to the interface between the bit line junction and the control dielectric structure during the thermal process. The predetermined species such as nitrogen at the interface minimizes formation of interface defects and thus degradation of the interface with time during the program or erase operations of the flash memory device.
摘要:
Methods are provided for significantly reducing electron trapping in semiconductor devices having a floating gate and an overlying dielectric layer. The methods form a nitrogen-rich region within the floating gate near the interface to an overlying dielectric layer. The methods include selectively introducing nitrogen into the floating gate prior to forming the overlying dielectric layer. This forms an initial nitrogen concentration profile within the floating gate. An initial portion of the overlying dielectric layer is then formed of a high temperature oxide (HTO). The temperature within the floating gate is purposely raised to an adequately high temperature to cause the initial nitrogen concentration profile to change due to the migration of the majority of the nitrogen towards the interface with the overlying dielectric layer and an interface with an underlying layer. Consequently, the floating gate is left with a first nitrogen-rich region near the interface to the overlying dielectric layer and a second nitrogen-rich region near the interface to the underlying layer. The first nitrogen-rich region has been found to reduce electron trapping within the floating gate, which could lead to false programming of the floating gate. Unlike a conventional thermally grown oxide film, the high temperature oxide film within the interpoly dielectric layer advantageously prevents the surface of the floating gate from becoming too granular. As such, the resulting interpoly dielectric layer, which typically includes several films, can be formed more evenly.
摘要:
The present invention provides a semiconductor device and a method for providing such a semiconductor device which allows a field oxide etch while minimizing the damage to the silicon. This method is particularly useful for smaller semiconductor devices, for example, such as a semiconductor device utilizing core source spacing less than 0.4 microns. A method according to the present invention for providing a semiconductor device comprises the steps of depositing a first spacer oxide layer over a core area and a peripheral area of a semiconductor device; etching the first spacer oxide layer at the source side of core cell area; depositing a second spacer oxide layer over the core area and the peripheral area, and etching the first and second spacer oxide layers over the peripheral area only.
摘要:
A FLASH EPROM cell in accordance with the present invention is disclosed in which the erasure is accomplished under a constant electric field. The FLASH EPROM cell includes a semiconductor device including a source, a drain and a gate and a constant current circuit coupled to the source. The constant current circuit ensures that a constant field is applied to the tunneling oxide of the FLASH EPROM cell during erasure thereof. In so doing, the FLASH EPROM cell can be erased with a minimum of stress to the device. In addition, the FLASH EPROM cell of the present invention can be used with various power supplies without affecting the characteristics thereof. Finally, through the FLASH EPROM cell of the present invention, the short channel effect associated with smaller device sizes can be substantially reduced.
摘要:
A computer system including telephone functionality. The computer system includes a first keyboard and a first display. The computer system also includes a processor having at least a first functional unit and a second functional unit, and further includes a phone portion. The computer system may operate in a first mode, a second mode, or a third mode. In the first mode, only the phone portion is activated. In the second mode, the phone portion and first functional unit of the processor are activated. In the third mode, each of the phone portion, the first functional unit, and the second functional unit are activated.
摘要:
A computer system has an adjustable data transmission rate between a CPU and a core logic chip thereof. In the computer system, the CPU has a power state adjustable in response to a power management control signal issued by the core logic chip. For adjusting data transmission rate between the CPU and the core logic chip, a change of an asserted time of the power management control signal from a first time period to a second time period is first determined to obtain an index value. The data transmission rate is increased or decreased according to the index value.
摘要:
Dual storage node memory devices and methods for fabricating dual storage node memory devices have been provided. In accordance with an exemplary embodiment, a method includes the steps of etching a plurality of trenches in a semiconductor substrate and forming a layered structure within the trenches. The layered structure includes a tunnel dielectric layer and a charge storage layer. Bit lines are formed within the semiconductor substrate and a layer of conductive material is deposited overlying the layered structure.
摘要:
A method for extracting a clock in a clock data recovery system is provided. The method includes following steps. First, a serial link transmission data is sampled for a number of times, and a number of pulse signals are generated and sequentially arranged. Then, a mark is inserted after all pulse signals are generated and had been delayed for a predetermined delay time. The predetermined delay time is less than a period between two adjacent pulse signals, and a period between two adjacent pulse signals is divided into two sub-periods by the predetermined delay time. Then, it is checked whether the data status in each sub-period is changed or not, and this operation is repeated for a predetermined number of times. Finally, the clock is extracted when a pulse signal of no data status change within the predetermined number of times is being generated.
摘要:
A hybrid flash memory device and a control method of the hybrid flash memory device are provided. The hybrid flash memory device includes a micro controller connected to a host bus for receiving data to be written in the hybrid flash memory device from a host via the host bus; and a memory module coupled to the micro controller. The flash module includes a first type of flash memory and a second type of flash memory. The data are determined to be written in a first log block of the first type of flash memory when the data size is not greater than a predetermined data size. On the contrary, the data are determined to be written in a second log block of the second type of flash memory when the data size is greater than the predetermined data size.
摘要:
A method for detecting the data strobe signal from a Double Data Rate (DDR) Synchronous Dynamic Random Access Memory (SDRAM). The method executes a data reading process at first and records the latency period of the data read process to be a basis for detecting the arrival timing of the preamble in the data strobe signals in the subsequent data reading process.