公开(公告)号：US20130039372A1

公开(公告)日：2013-02-14

申请号：US13568232

申请日：2012-08-07

申请人： Osamu Wakabayashi ,  Takashi Onose

发明人： Osamu Wakabayashi ,  Takashi Onose

IPC分类号： H01S3/10 ,  H01S3/04

CPC分类号： H01S3/2251 ,  G02F1/353 ,  G02F2001/3505 ,  G02F2001/3546 ,  G02F2203/60 ,  H01S3/0092 ,  H01S3/0401 ,  H01S3/1625 ,  H01S3/1636 ,  H01S3/2316 ,  H01S3/2325 ,  H01S3/2375

摘要： A wavelength conversion device may include a wavelength conversion element that converts an entering first laser beam into a second laser beam by wavelength conversion, and a cooling mechanism that cools the wavelength conversion element from at least one surface of the wavelength conversion element.

摘要翻译： 波长转换装置可以包括通过波长转换将进入的第一激光束转换成第二激光束的波长转换元件，以及从波长转换元件的至少一个表面冷却波长转换元件的冷却机构。

公开(公告)号：US20130034116A1

公开(公告)日：2013-02-07

申请号：US13642464

申请日：2011-11-10

申请人： Krzysztof Nowak ,  Takashi Suganuma ,  Osamu Wakabayashi

发明人： Krzysztof Nowak ,  Takashi Suganuma ,  Osamu Wakabayashi

IPC分类号： H01S3/10 ,  H01S3/13

CPC分类号： H01S3/2366 ,  H01S3/005 ,  H01S3/0315 ,  H01S3/2375 ,  H05G2/008

摘要： An EUV light generation system includes a driver laser comprising a master oscillator such as a semiconductor laser, a spatial filter, gas slab amplification devices, relay optical systems, and high-speed axial-flow amplifiers. The slab amplification devices include beam adjusting optical units disposed, respectively, at input and output sides of the slab amplifiers SA to convert the beam profile and/or polarization direction and/or an elongated direction of the beam profile with the slab amplifiers is parallel to a free space axis AF of the slab waveguides, i.e. parallel to the discharge electrodes.

摘要翻译： EUV光发生系统包括：激光器，其包括诸如半导体激光器的主振荡器，空间滤波器，气体平板放大器件，中继光学系统和高速轴流放大器。 平板放大装置包括光束调节光学单元，分别设置在平板放大器SA的输入和输出侧，以将平板放大器的光束轮廓和/或偏振方向和/或光束轮廓的细长方向平行于 平板波导的自由空间轴AF，即平行于放电电极。

公开(公告)号：US20130032640A1

公开(公告)日：2013-02-07

申请号：US13483934

申请日：2012-05-30

申请人： Takayuki YABU ,  Takeshi Kodama ,  Osamu Wakabayashi ,  Junichi Fujimoto

发明人： Takayuki YABU ,  Takeshi Kodama ,  Osamu Wakabayashi ,  Junichi Fujimoto

IPC分类号： B05B15/02 ,  B05B17/04

CPC分类号： B05B15/52

摘要： An apparatus for physically cleaning a nozzle inside a chamber may include a cleaning member disposed inside the chamber. The nozzle is configured to output a target material into the chamber in which extreme ultraviolet light is generated. The cleaning member is configured to remove the target material deposited around the nozzle.

摘要翻译： 用于物理清洁腔室内的喷嘴的设备可以包括设置在室内的清洁部件。 喷嘴构造成将目标材料输出到产生极紫外光的室中。 清洁构件被构造成去除沉积在喷嘴周围的目标材料。

公开(公告)号：US20130020499A1

公开(公告)日：2013-01-24

申请号：US13636038

申请日：2011-07-05

申请人： Hidenobu Kameda ,  Masato Moriya ,  Osamu Wakabayashi

发明人： Hidenobu Kameda ,  Masato Moriya ,  Osamu Wakabayashi

IPC分类号： G21K5/04 ,  F16L3/00 ,  H01S3/13

CPC分类号： H01S3/0401 ,  G02B7/008 ,  H01S3/005 ,  H01S3/2316 ,  H05G2/008 ,  Y10T137/6851

摘要： A window unit may include: a window configured to allow a laser beam to be transmitted therethrough; and a holder for holding the window at a periphery thereof, the holder being provided with a flow channel thereinside configured to allow a fluid to flow.

摘要翻译： 窗口单元可以包括：被配置为允许激光束透过其中的窗口; 以及用于在其周边保持窗口的保持器，所述保持器设置有配置成允许流体流动的内部的流动通道。

公开(公告)号：US08227778B2

公开(公告)日：2012-07-24

申请号：US12469176

申请日：2009-05-20

申请人： Masato Moriya ,  Osamu Wakabayashi ,  Georg Soumagne

发明人： Masato Moriya ,  Osamu Wakabayashi ,  Georg Soumagne

IPC分类号： G21K5/04

CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70575 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067

摘要： The exposure device is able to supply only EUV radiation to a mask, while eliminating radiation other than the EUV radiation. A multi layer made from a plurality of Mo/Si pair layers is provided upon the front surface of a mirror, and blazed grooves are formed in this multi layer. Radiation which is incident from a light source device is incident upon this mirror, and is reflected or diffracted. Since the reflected EUV radiation (including diffracted EUV radiation) and the radiation of other wavelengths are reflected or diffracted at different angles, accordingly their directions of progression are different. By eliminating the radiation of other wavelengths with an aperture and/or a dumper, it is possible to irradiate a mask only with EUV radiation of high purity.

摘要翻译： 曝光装置只能将EUV辐射提供给掩模，同时消除EUV辐射以外的辐射。 在反射镜的前表面上设置由多个Mo / Si对层制成的多层，并且在该多层中形成闪耀的凹槽。 从光源装置入射的辐射入射在该反射镜上并被反射或衍射。 由于反射的EUV辐射（包括衍射的EUV辐射）和其他波长的辐射在不同的角度被反射或衍射，因此它们的进展方向是不同的。 通过用孔和/或自卸车消除其它波长的辐射，可以仅用高纯度的EUV辐射照射掩模。

公开(公告)号：US08164076B2

公开(公告)日：2012-04-24

申请号：US12569194

申请日：2009-09-29

申请人： Akira Endo ,  Yoshifumi Ueno ,  Youichi Sasaki ,  Osamu Wakabayashi

发明人： Akira Endo ,  Yoshifumi Ueno ,  Youichi Sasaki ,  Osamu Wakabayashi

IPC分类号： H05G2/00

CPC分类号： G21K5/00 ,  G03F7/70033 ,  H05G2/00 ,  H05G2/003 ,  H05G2/008

摘要： An extreme ultraviolet light source apparatus, which is to generate an extreme ultraviolet light by irradiating a target with a main pulse laser light after irradiating the target with a prepulse laser light, the extreme ultraviolet light source apparatus comprises: a prepulse laser light source generating a pre-plasma by irradiating the target with the prepulse laser light while a part of the target remains, the pre-plasma being generated at a different region from a target region, the different region being located on an incident side of the prepulse laser light; and a main pulse laser light source generating the extreme ultraviolet light by irradiating the pre-plasma with the main pulse laser light.

摘要翻译： 一种极紫外光源装置，其特征在于，所述极紫外光源装置包括：前脉冲激光光源，其产生前脉冲激光光源，所述极紫外光源装置包括：前脉冲激光光源，其通过用前脉冲激光照射所述靶之后用主脉冲激光照射靶， 在一部分目标物保留的同时用前脉冲激光照射靶的预等离子体，在与目标区域不同的区域产生预等离子体，不同的区域位于预激光激光的入射侧; 以及通过用主脉冲激光照射预等离子体而产生极紫外光的主脉冲激光光源。

公开(公告)号：US20110309271A1

公开(公告)日：2011-12-22

申请号：US13160033

申请日：2011-06-14

申请人： Masato MORIYA ,  Osamu Wakabayashi

发明人： Masato MORIYA ,  Osamu Wakabayashi

IPC分类号： G21K5/00 ,  F21V9/06

CPC分类号： G21K1/10 ,  G03F7/70191 ,  H01J35/18

摘要： A spectral purity filter may include: a plurality of segments that each includes a mesh in which an array of apertures of an aperture size at or below a predetermined size is formed and which has electroconductivity; and a frame that supports the plurality of the segments at least at a periphery thereof.

摘要翻译： 光谱纯度滤光器可以包括：多个分段，每个分段包括一个网格，其中形成孔径大小为或小于预定尺寸的孔径阵列，并具有导电性; 以及至少在其周边支撑多个片段的框架。

公开(公告)号：US07792176B2

公开(公告)日：2010-09-07

申请号：US11985840

申请日：2007-11-16

申请人： Osamu Wakabayashi

发明人： Osamu Wakabayashi

IPC分类号： H01S3/22 ,  H01S3/223

CPC分类号： H01S3/2325 ,  H01S3/005 ,  H01S3/2251

摘要： A narrow-band laser device for exposure apparatus that allows to reduce damage to, and to hence extend the life of, optical elements such as chamber windows, output coupling mirrors or the like. A ring resonator is provided in an amplification stage laser of the narrow-band laser device for exposure apparatus that comprises an oscillation stage laser and an amplification stage laser. An OC, a high reflection mirror and a high reflection mirror are arranged to be offset, for instance, relative to a longitudinal direction axis of discharge electrodes. As a result, the beam width of laser light injected through the OC of the amplification stage laser becomes wider as the beam shifts inside the ring resonator, in each round trip within the ring resonator. The energy density of laser light in the optical elements of the amplification stage laser becomes reduced thereby, thus prolonging the life of the optical elements.

摘要翻译： 一种用于曝光装置的窄带激光装置，其允许减少诸如室窗，输出耦合镜等的光学元件的损坏并因此延长其使用寿命。 在用于包括振荡级激光器和放大级激光器的曝光装置的窄带激光装置的放大级激光器中设置环形谐振器。 OC，高反射镜和高反射镜被布置为例如相对于放电电极的纵向轴线偏移。 结果，在环形谐振器内的每个往返行程中，通过放大级激光器的OC注入的激光的光束宽度随着光束在环形谐振器内移动而变宽。 放大级激光器的光学元件中的激光的能量密度降低，从而延长了光学元件的寿命。

公开(公告)号：US07756183B2

公开(公告)日：2010-07-13

申请号：US11453519

申请日：2006-06-15

申请人： Osamu Wakabayashi ,  Takahito Kumazaki

发明人： Osamu Wakabayashi ,  Takahito Kumazaki

IPC分类号： H01S3/09 ,  H01S3/10

CPC分类号： H01S3/08009 ,  H01S3/08031 ,  H01S3/0971 ,  H01S3/1055 ,  H01S3/137 ,  H01S3/225 ,  H01S3/2258 ,  H01S3/2308

摘要： The control of the spectral purity width E95 is performed while imparting practically no effect to the control of a central wavelength, and the spectral purity width E95 is stabilized. A wavefront adjuster 32 is provided on an output side of the interior of an optical resonator, i.e., on an output coupler 31 side. Light generated in a laser chamber 10 is transmitted through the wavefront adjuster 32 from the laser chamber 10 side, and reaches the output coupler 31. In the wavefront adjuster 32, the distance between concave and convex lenses 33 and 34 is adjusted so that a desired spectral purity width E95 can be obtained. Then, when the light passes through the wavefront adjuster 32, the wavefront of the light is adjusted to a desired wavefront.

摘要翻译： 光谱纯度宽度E95的控制在对中心波长的控制实际上没有影响的同时进行，光谱纯度宽度E95稳定。 波前调整器32设置在光谐振器的内部的输出侧，即在输出耦合器31侧。 在激光室10中产生的光从激光室10侧透射通过波前调整器32，并到达输出耦合器31.在波前调整器32中，调节凹凸透镜33和34之间的距离，使得期望的 可以得到光谱纯度宽度E95。 然后，当光通过波前调整器32时，光的波前被调整到期望的波前。

公开(公告)号：US06721344B2

公开(公告)日：2004-04-13

申请号：US10152822

申请日：2002-05-23

申请人： Kiyoharu Nakao ,  Osamu Wakabayashi

发明人： Kiyoharu Nakao ,  Osamu Wakabayashi

IPC分类号： H01S322

CPC分类号： H01S3/10092 ,  H01S3/0818 ,  H01S3/2366

摘要： An injection locking type or MOPA type of laser device capable of always obtaining stable output energy and wavelength is provided. For this purpose, the laser device includes an oscillator (11A) for oscillating seed laser light (21A) with wavelength band-narrowed by a band-narrowing unit (30), an amplifier (11B) for amplifying the seed laser light and emitting the amplified laser light (21B), a wavelength monitor (34A) for detecting at least a wavelength characteristic of the seed laser light, and a laser controller (29) for performing adjustment oscillation to contain a wavelength characteristic within a predetermined allowable range, at a time of startup or when laser oscillation is suspended for a predetermined period of time or more.

摘要翻译： 提供了能够始终获得稳定的输出能量和波长的注入锁定型或MOPA型激光装置。 为此，激光装置包括振荡器（11A），用于振荡由带宽变窄单元（30）带宽波长的种子激光（21A），放大器（11B），用于放大种子激光并发射 放大激光（21B），用于检测种子激光的至少波长特性的波长监视器（34A），以及激光控制器（29），用于执行调节振荡以将波长特性包含在预定允许范围内， 启动时间或当激光振荡暂停预定时间或更长时间时。