公开(公告)号：US06721344B2

公开(公告)日：2004-04-13

申请号：US10152822

申请日：2002-05-23

申请人： Kiyoharu Nakao ,  Osamu Wakabayashi

发明人： Kiyoharu Nakao ,  Osamu Wakabayashi

IPC分类号： H01S322

CPC分类号： H01S3/10092 ,  H01S3/0818 ,  H01S3/2366

摘要： An injection locking type or MOPA type of laser device capable of always obtaining stable output energy and wavelength is provided. For this purpose, the laser device includes an oscillator (11A) for oscillating seed laser light (21A) with wavelength band-narrowed by a band-narrowing unit (30), an amplifier (11B) for amplifying the seed laser light and emitting the amplified laser light (21B), a wavelength monitor (34A) for detecting at least a wavelength characteristic of the seed laser light, and a laser controller (29) for performing adjustment oscillation to contain a wavelength characteristic within a predetermined allowable range, at a time of startup or when laser oscillation is suspended for a predetermined period of time or more.

摘要翻译： 提供了能够始终获得稳定的输出能量和波长的注入锁定型或MOPA型激光装置。 为此，激光装置包括振荡器（11A），用于振荡由带宽变窄单元（30）带宽波长的种子激光（21A），放大器（11B），用于放大种子激光并发射 放大激光（21B），用于检测种子激光的至少波长特性的波长监视器（34A），以及激光控制器（29），用于执行调节振荡以将波长特性包含在预定允许范围内， 启动时间或当激光振荡暂停预定时间或更长时间时。

公开(公告)号：US09647415B2

公开(公告)日：2017-05-09

申请号：US14602208

申请日：2015-01-21

申请人： Hiroaki Tsushima ,  Osamu Wakabayashi ,  Takashi Matsunaga

发明人： Hiroaki Tsushima ,  Osamu Wakabayashi ,  Takashi Matsunaga

IPC分类号： H01S3/10 ,  H01S3/00 ,  H01S3/097 ,  H01S3/08 ,  H01S3/0971 ,  H01S3/23

CPC分类号： H01S3/09702 ,  H01S3/0014 ,  H01S3/08009 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/2366

摘要： A laser apparatus according to embodiment may include: a laser chamber filled with a laser gain medium; a pair of electrodes disposed in the laser chamber; a charger configured to apply a charge voltage for causing a discharge to occur between the pair of the electrodes; a pulse power module configured to covert the charge voltage applied by the charger into a short pulsed voltage, and apply the short pulsed voltage between the pair of the electrodes; and a controller configured to calculate input energies Ein applied to the pair of the electrodes based on the charge voltage, calculate an integration value Einsum of the input energies Ein by integrating the calculated input energies Ein, and determine whether the integration value Einsum exceeds an integration lifetime value Einsumlife of input energy or not.

公开(公告)号：US09257809B2

公开(公告)日：2016-02-09

申请号：US13401734

申请日：2012-02-21

申请人： Hidenori Watanabe ,  Hiroshi Tanaka ,  Osamu Wakabayashi

发明人： Hidenori Watanabe ,  Hiroshi Tanaka ,  Osamu Wakabayashi

IPC分类号： H01S3/223 ,  H01S3/03 ,  H01S3/134 ,  H01S3/23 ,  H01S3/036 ,  G03F7/20

CPC分类号： H01S3/03 ,  G03F7/70025 ,  H01S3/036 ,  H01S3/134 ,  H01S3/2316 ,  H01S3/2366

摘要： A laser device for an exposure apparatus may include: a MOPA-type or MOPO-type laser device including a seed laser and at least one gas discharge-pumped amplifier stage that receives output light from the seed laser as an input, amplifies the light, and outputs the amplified light; and at least one of a laser gas control device that at least changes the total pressure of a laser gas in said amplifier stage in accordance with requested energy and a laser power source control device that at least changes pump intensity of discharge electrodes in said amplifier stage in accordance with said requested energy, in a case where the energy of laser output light from said laser device is to be changed discontinuously in response to a request from an exposure apparatus.

摘要翻译： 用于曝光装置的激光装置可以包括：MOPA型或MOPO型激光装置，其包括种子激光器和至少一个气体放电泵浦放大器级，其接收来自种子激光器的输出光作为输入，放大光， 并输出放大的光; 以及激光气体控制装置中的至少一个，所述激光气体控制装置至少根据所要求的能量来改变所述放大器级中的激光气体的总压力，激光电源控制装置至少改变放大器级中的放电电极的泵浦强度 根据所述要求的能量，在来自所述激光装置的激光输出光的能量将根据来自曝光装置的请求而不连续地改变的情况下。

公开(公告)号：US09046651B2

公开(公告)日：2015-06-02

申请号：US13696528

申请日：2011-12-29

申请人： Hiroshi Someya ,  Yukio Watanabe ,  Katsuhiko Wakana ,  Osamu Wakabayashi

发明人： Hiroshi Someya ,  Yukio Watanabe ,  Katsuhiko Wakana ,  Osamu Wakabayashi

IPC分类号： G02B7/182 ,  G02B7/18 ,  G03F7/20

CPC分类号： G02B7/181 ,  G02B5/0891 ,  G02B5/10 ,  G03F7/70033 ,  G03F7/70175

摘要： A mirror device may include: a mirror including a base plate, a reflective film on a first surface of the base plate, and a plurality of first protrusions on a second surface of the base plate; a plurality of support parts for respectively supporting the plurality of the first protrusions, each support part having a groove formed therein for guiding the first protrusion; and a plurality of clamps for respectively pressing the plurality of the first protrusions against the respective grooves in the plurality of the support parts.

摘要翻译： 反射镜装置可以包括：反射镜，包括基板，在基板的第一表面上的反射膜，以及在基板的第二表面上的多个第一突起; 多个用于分别支撑多个第一突起的支撑部分，每个支撑部分具有形成在其中的槽，用于引导第一突起; 以及多个夹具，用于分别将多个第一突起抵靠在多个支撑部分中的相应凹槽上。

公开(公告)号：US08811436B2

公开(公告)日：2014-08-19

申请号：US13696497

申请日：2012-02-08

申请人： Kenichi Miyao ,  Motoki Niwano ,  Osamu Wakabayashi

发明人： Kenichi Miyao ,  Motoki Niwano ,  Osamu Wakabayashi

IPC分类号： H01S3/13

CPC分类号： H01S3/10046 ,  G03F7/70025 ,  G03F7/70033 ,  H01S3/0085 ,  H01S3/09702 ,  H01S3/10007 ,  H01S3/2316 ,  H01S3/235 ,  H01S3/2375 ,  H01S5/4025 ,  H05G2/005 ,  H05G2/008

摘要： A laser apparatus may include a master oscillator configured to output a laser beam, at least one amplifier disposed in a beam path of the laser beam from the master oscillator, at least one power source for applying a high-frequency voltage to the at least one amplifier, and a controller for varying the high-frequency voltage to be applied to the at least one amplifier from the at least one power source.

摘要翻译： 激光装置可以包括主振荡器，其被配置为输出激光束，至少一个放大器，设置在来自主振荡器的激光束的光束路径中，至少一个电源，用于将至少一个高频电压 放大器和控制器，用于改变要从至少一个电源施加到至少一个放大器的高频电压。

公开(公告)号：US08804780B2

公开(公告)日：2014-08-12

申请号：US11822126

申请日：2007-07-02

申请人： Osamu Wakabayashi ,  Takahito Kumazaki ,  Toru Suzuki ,  Masashi Shinbori ,  Masaya Yoshino

发明人： Osamu Wakabayashi ,  Takahito Kumazaki ,  Toru Suzuki ,  Masashi Shinbori ,  Masaya Yoshino

IPC分类号： H01S3/13 ,  H01S3/137

CPC分类号： G03F7/2006 ,  H01S3/08036 ,  H01S3/106 ,  H01S3/137 ,  H01S3/139 ,  H01S3/225

摘要： An upper limit and a lower limit are preliminarily set for a spectral line width common to a plurality of narrow-band laser devices. When delivered or subjected to maintenance, the narrow-band laser device is caused to laser oscillate to detect its spectral line width before it is used as a light source for semiconductor exposure. A spectral line width adjustment unit provided in the narrow-band laser device is adjusted so that the spectral line width assumes a value between the upper limit and the lower limit. The present invention is able to suppress the variation in spectral line width such as E95 bandwidth caused by machine differences during the manufacture of the laser device, or by replacement or maintenance of the laser device, whereby the quality of integrated circuit patterns formed by the semiconductor exposure tool can be stabilized.

摘要翻译： 对于多个窄带激光装置共有的谱线宽度，预先设定上限和下限。 当交付或进行维护时，使窄带激光装置激光振荡，以便在用作半导体曝光的光源之前检测其光谱线宽度。 调整设置在窄带激光装置中的谱线宽度调节单元，使得谱线宽度呈现上限和下限之间的值。 本发明能够抑制激光装置的制造时的机器差异引起的E95带宽等的频谱线宽度的变化，或者通过更换或维护激光装置，能够抑制由半导体形成的集成电路图案的质量 曝光工具可以稳定。

公开(公告)号：US08587863B2

公开(公告)日：2013-11-19

申请号：US13568232

申请日：2012-08-07

申请人： Osamu Wakabayashi ,  Takashi Onose

发明人： Osamu Wakabayashi ,  Takashi Onose

IPC分类号： G02F1/35 ,  G02F2/02 ,  H01S3/04

CPC分类号： H01S3/2251 ,  G02F1/353 ,  G02F2001/3505 ,  G02F2001/3546 ,  G02F2203/60 ,  H01S3/0092 ,  H01S3/0401 ,  H01S3/1625 ,  H01S3/1636 ,  H01S3/2316 ,  H01S3/2325 ,  H01S3/2375

摘要： A wavelength conversion device may include a wavelength conversion element that converts an entering first laser beam into a second laser beam by wavelength conversion, and a cooling mechanism that cools the wavelength conversion element from at least one surface of the wavelength conversion element.

摘要翻译： 波长转换装置可以包括通过波长转换将进入的第一激光束转换成第二激光束的波长转换元件，以及从波长转换元件的至少一个表面冷却波长转换元件的冷却机构。

公开(公告)号：US08536551B2

公开(公告)日：2013-09-17

申请号：US12482796

申请日：2009-06-11

申请人： Masato Moriya ,  Osamu Wakabayashi ,  Tamotsu Abe ,  Takashi Suganuma ,  Akira Endo ,  Akira Sumitani

发明人： Masato Moriya ,  Osamu Wakabayashi ,  Tamotsu Abe ,  Takashi Suganuma ,  Akira Endo ,  Akira Sumitani

IPC分类号： G21K5/00

CPC分类号： G21K5/04 ,  G03F7/70191 ,  G03F7/70575 ,  G03F7/70858 ,  G03F7/70941 ,  G21K1/10 ,  H05G2/005 ,  H05G2/008

摘要： An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser.

摘要翻译： 一种使用能够获得高光谱纯度的EUV光的光谱纯度滤光片的极紫外光源装置。 该装置包括一个室; 用于提供目标材料的目标供应单元; 使用包含二氧化碳气体的激光气体作为激光介质的激光激光器，用于向目标材料施加激光以产生等离子体; 用于收集和输出从等离子体辐射的极紫外光的收集器反射镜; 以及设置在极紫外光的光路中的光谱纯度滤光片，用于透射极紫外光并反射激光束，光谱纯度滤光器包括具有导电性的网格，并且形成为具有间距不大的孔 超过由驱动器激光器施加的激光束的最短波长的一半。

公开(公告)号：US20130208742A1

公开(公告)日：2013-08-15

申请号：US13817818

申请日：2012-02-17

申请人： Hakaru Mizoguchi ,  Takashi Suganuma ,  Hideo Hoshino ,  Osamu Wakabayashi

发明人： Hakaru Mizoguchi ,  Takashi Suganuma ,  Hideo Hoshino ,  Osamu Wakabayashi

IPC分类号： H01S3/10

CPC分类号： H01S3/0071 ,  H01S3/0014 ,  H01S3/10061 ,  H01S3/1305 ,  H05G2/008

摘要： An optical device may include: an optical module disposed in a beam delivery path of a laser beam; a beam adjusting unit disposed in the beam delivery path for adjusting the beam delivery path of the laser beam; a measuring unit disposed in the beam delivery path for detecting the beam delivery path; and a control unit for controlling the beam adjusting unit based on a detection result of the beam delivery path of the laser beam detected by the measuring unit.

摘要翻译： 光学装置可以包括：设置在激光束的光束输送路径中的光学模块; 设置在所述光束传送路径中用于调节所述激光束的光束传送路径的光束调节单元; 设置在所述光束传送路径中用于检测所述光束传送路径的测量单元; 以及控制单元，用于基于由测量单元检测到的激光束的光束传递路径的检测结果来控制光束调节单元。

公开(公告)号：US08455850B2

公开(公告)日：2013-06-04

申请号：US13416884

申请日：2012-03-09

申请人： Akira Endo ,  Yoshifumi Ueno ,  Youichi Sasaki ,  Osamu Wakabayashi

发明人： Akira Endo ,  Yoshifumi Ueno ,  Youichi Sasaki ,  Osamu Wakabayashi

IPC分类号： H05G2/00

CPC分类号： G21K5/00 ,  G03F7/70033 ,  H05G2/00 ,  H05G2/003 ,  H05G2/008

摘要： An extreme ultraviolet light source apparatus, which is to generate an extreme ultraviolet light by irradiating a target with a main pulse laser light after irradiating the target with a prepulse laser light, the extreme ultraviolet light source apparatus comprises: a prepulse laser light source generating a pre-plasma by irradiating the target with the prepulse laser light while a part of the target remains, the pre-plasma being generated at a different region from a target region, the different region being located on an incident side of the prepulse laser light; and a main pulse laser light source generating the extreme ultraviolet light by irradiating the pre-plasma with the main pulse laser light.

摘要翻译： 一种极紫外光源装置，其特征在于，所述极紫外光源装置包括：前脉冲激光光源，其产生前脉冲激光光源，所述极紫外光源装置包括：前脉冲激光光源，其通过用前脉冲激光照射所述靶之后用主脉冲激光照射靶， 在一部分目标物保留的同时用前脉冲激光照射靶的预等离子体，在与目标区域不同的区域产生预等离子体，不同的区域位于预激光激光的入射侧; 以及通过用主脉冲激光照射预等离子体而产生极紫外光的主脉冲激光光源。