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91.发明申请Method and System for Scanning an Information Carrier Via One-Dimensional Scanning 审中-公开通过一维扫描扫描信息载体的方法和系统公开(公告)号：US20080212430A1
公开(公告)日：2008-09-04
申请号：US12089776
申请日：2006-10-11
IPC分类号： G11B7/00
CPC分类号： G11B7/14 , G11B7/0033 , G11B7/24085 , G11B7/24088
摘要： A system for reading an information carrier having a data layer (101) on which is stored a data set. A probe array generating means (104) generates an array of light spots (102) which is applied to the data layer (101). The resultant output light beams are representative of the binary value of data stored in the data layer (101). Macro-cell scanning is effected in a single dimension by moving the array of light spots (102) relative to the data layer (101) along a path (A,B) which is non-parallel to the axes of the matrix defining the probe array. One-dimensional scanning results in a less complex system.
摘要翻译： 一种用于读取具有数据层（101）的信息载体的系统，其上存储有数据集。 探针阵列产生装置（104）产生施加到数据层（101）的光点阵列（102）。 所得到的输出光束代表存储在数据层（101）中的数据的二进制值。 通过沿着不平行于限定探针的矩阵的轴的路径（A，B）相对于数据层（101）移动光点阵列（102），在单个维度中实现宏小区扫描 数组。 一维扫描导致较不复杂的系统。
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92.发明授权Lithographic apparatus having a debris-mitigation system, a source for producing EUV radiation having a debris mitigation system and a method for mitigating debris 有权具有碎片减轻系统的光刻设备，用于产生具有碎片缓解系统的EUV辐射的源和用于减轻碎片的方法公开(公告)号：US07251012B2
公开(公告)日：2007-07-31
申请号：US10748851
申请日：2003-12-31
申请人： Vadim Yevgenyevich Banine , Levinus Pieter Bakker , Vladimir Vitalevitch Ivanov , Johannes Hubertus Josephina Moors , Givi Georgievitch Zukavishvili , Abraham Veefkind
发明人： Vadim Yevgenyevich Banine , Levinus Pieter Bakker , Vladimir Vitalevitch Ivanov , Johannes Hubertus Josephina Moors , Givi Georgievitch Zukavishvili , Abraham Veefkind
CPC分类号： G03F7/70916 , G03F7/70983
摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, and a debris-mitigation system that mitigates debris particles which are formed during use of at least a part of the lithographic apparatus. The debris-mitigation system is arranged to apply a magnetic field so that at least charged debris particles are mitigated.
摘要翻译： 公开了一种光刻设备。 该装置包括提供辐射束的照明系统和支撑图形结构的支撑结构。 图案形成结构被配置为在其横截面中赋予辐射束图案。 该装置还包括支撑基板的基板支撑件，将图案化的光束投影到基板的目标部分上的投影系统，以及减轻碎片颗粒的碎片减轻系统，该碎片减小系统在使用期间形成的碎屑颗粒的至少一部分 光刻设备 碎片减轻系统被布置成施加磁场，使得至少带电的碎屑颗粒被减轻。
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93.发明授权Grazing incidence mirror, lithographic apparatus including a grazing incidence mirror, method for providing a grazing incidence mirror, method for enhancing EUV reflection of a grazing incidence mirror, device manufacturing method and device manufactured thereby 有权掠入射镜，包括掠入射镜的光刻设备，用于提供掠入射镜的方法，用于增强掠射入射镜的EUV反射的方法，由此制造的器件制造方法和器件公开(公告)号：US07235801B2
公开(公告)日：2007-06-26
申请号：US10860656
申请日：2004-06-04
CPC分类号： G03F7/70958 , G21K1/06 , Y10T428/24355
摘要： A grazing incidence mirror includes a mirror substrate and a mirror surface layer, the mirror surface layer including a first layer and a second layer, the first layer being positioned between the mirror substrate and the second layer. The first layer includes a material selected from the group of Mo, Nb and combinations thereof, and the second layer includes a material selected from the group of B, C, B4C, SiC and combinations thereof. Such a grazing incidence mirror can be used in lithographic apparatus and in device manufacturing methods and provides a reflectivity that may be larger than state of the art grazing incidence mirrors based on Ru.
摘要翻译： 掠射入射镜包括镜面基板和镜面层，镜面层包括第一层和第二层，第一层位于镜面基板和第二层之间。 第一层包括选自Mo，Nb及其组合的材料，第二层包括选自B，C，B 4 C，SiC及其组合的材料。 这样的掠入射镜可以用于光刻设备和器件制造方法中，并提供可能比现有技术的基于Ru的掠入射镜更大的反射率。
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94.发明授权Apparatus including a radiation source, a filter system for filtering particles out of radiation emitted by the source, and a processing system for processing the radiation, a lithographic apparatus including such an apparatus, and a method of filtering particles out of radiation emitting and propagating from a radiation source 有权包括辐射源的装置，用于从源发射的辐射中过滤颗粒的过滤系统，以及用于处理辐射的处理系统，包括这种装置的光刻设备，以及从发射和传播辐射的辐射中过滤颗粒的方法 辐射源公开(公告)号：US07106832B2
公开(公告)日：2006-09-12
申请号：US11031535
申请日：2005-01-10
申请人： Derk Jan Wilfred Klunder , Levinus Pieter Bakker , Vadim Yevgenyevich Banine , Maarten Marinus Johannes Wilhelmus Van Herpen
发明人： Derk Jan Wilfred Klunder , Levinus Pieter Bakker , Vadim Yevgenyevich Banine , Maarten Marinus Johannes Wilhelmus Van Herpen
IPC分类号： G21K3/00
CPC分类号： G03F7/70916
摘要： Particles emitted by a radiation source, and moving from the radiation source towards a processing system for processing the radiation from the radiation source, are filtered out of radiation propagating through a predetermined cross section of the radiation as emitted by the radiation source by a filter system. The filter system includes a plurality of foils and a transporter for transporting the foils along a trajectory which extends within the beam so that the foils intercept the particles within the beam. The transporter is arranged to transport the foils by a substantially translatory movement of the foils along at least a part of the trajectory.
摘要翻译： 由辐射源发射并从辐射源朝向用于处理来自辐射源的辐射的处理系统移动的颗粒被从辐射源通过辐射源发射的预定横截面传播的辐射滤出，该辐射源由过滤系统 。 过滤器系统包括多个箔片和运送器，用于沿着在光束内延伸的轨迹传送箔片，使得箔片截取光束内的颗粒。 输送器布置成通过沿着轨迹的至少一部分的箔片的基本上平移的运动来运输箔片。
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95.发明授权Lithographic apparatus with contamination suppression, device manufacturing method, and device manufactured thereby 失效具有污染抑制的光刻设备，器件制造方法以及由此制造的器件公开(公告)号：US07061574B2
公开(公告)日：2006-06-13
申请号：US10985037
申请日：2004-11-10
申请人： Levinus Pieter Bakker , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Vladimir Mihailovitch Krivtsun
发明人： Levinus Pieter Bakker , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Vladimir Mihailovitch Krivtsun
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70908 , G03F7/70916
摘要： A lithographic projection apparatus is provided. The apparatus includes a radiation system for providing a beam of radiation, and a support for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam of radiation onto a target portion of the substrate, and a particle supply unit for supplying getter particles into the beam of radiation in order to act as a getter for contamination particles in the beam of radiation. The getter particles have a diameter of at least about 1 nm.
摘要翻译： 提供光刻投影装置。 该装置包括用于提供辐射束的辐射系统和用于支撑图案形成装置的支撑件。 图案形成装置用于根据期望的图案对辐射束进行图案化。 该装置还包括用于保持基板的基板台，用于将图案化的辐射束投射到基板的目标部分上的投影系统，以及用于将吸气剂颗粒供应到辐射束中的颗粒供应单元，以用作 吸收剂用于辐射束中的污染颗粒。 吸气剂颗粒具有至少约1nm的直径。
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96.发明授权Optical element, lithographic apparatus comprising such optical element and device manufacturing method 失效光学元件，包括这种光学元件的光刻设备和器件制造方法公开(公告)号：US07034923B2
公开(公告)日：2006-04-25
申请号：US10760558
申请日：2004-01-21
CPC分类号： G02B1/10 , G02B1/00 , G02B5/18 , G03F7/70191 , G03F7/70308 , G03F7/70575 , G03F7/70958
摘要： An optical element includes a substrate having at least one surface on which a layer of material is disposed, the layer of material being selected to be at least partially transmissive to radiation with a predetermined wavelength λ. The surface of material includes particles having a diameter in a range of 1–500 nm and the layer of material has a layer thickness in the range of 10–2000 nm. Undesired radiations, e.g. UV and DUV radiations, are substantially reduced or eliminated by scattering, e.g. Mie scattering and/or Raleigh scattering, and/or by absorption by the particles while desired radiations are transmitted to the surface of the optical element.
摘要翻译： 光学元件包括具有至少一个表面的衬底，在该表面上设置有一层材料，该材料层被选择为具有预定波长λ的辐射至少部分透射。 材料的表面包括直径在1-500nm范围内的颗粒，并且材料层具有在10-2000nm范围内的层厚度。 不期望的辐射，例如 UV和DUV辐射通过散射显着减少或消除，例如， 和/或罗利散射，和/或通过颗粒的吸收，同时期望的辐射被传递到光学元件的表面。
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公开(公告)号：US09980698B2
公开(公告)日：2018-05-29
申请号：US13321189
申请日：2010-05-07
IPC分类号： A61B19/00 , G06T7/00 , A61B5/00 , A61B6/12 , A61B8/08 , A61B6/00 , A61B17/34 , A61B8/00 , A61B90/00
CPC分类号： A61B8/0841 , A61B5/0062 , A61B5/0066 , A61B5/0068 , A61B5/0071 , A61B5/0073 , A61B5/0075 , A61B5/0084 , A61B5/6848 , A61B6/12 , A61B6/5247 , A61B8/00 , A61B8/5238 , A61B17/34 , A61B17/3403 , A61B17/3417 , A61B2090/3614 , A61B2090/374 , A61B2090/376 , A61B2090/378 , A61B2090/3784
摘要： Re-calibration of pre-recorded images during interventions uses an interventional system including an imaging device providing images of an object, a needle device, and a processing device. The needle device includes a sensor for providing data corresponding to tissue properties. The processing device is configured to perform an overlay registration of pre-recorded images and live images provided by the imaging device, utilizing the data from the sensor. Thus, the accuracy of an overlay of images is increased.
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公开(公告)号：US09398877B2
公开(公告)日：2016-07-26
申请号：US12094670
申请日：2006-11-17
IPC分类号： A61B5/1455 , A61B5/00
CPC分类号： A61B5/4312 , A61B5/0091 , A61B5/1455 , A61B5/14551
摘要： Disclosed is a method and a device for optical imaging of a turbid medium. This method comprises a reference measurement of reference intensities of light emanating from the turbid medium at a reference blood oxygen saturation (SaO2) in the turbid medium and a reference imaging step for reconstructing a reference image of the turbid medium from the measured reference intensities. Furthermore the method comprises a contrast measurement of the contrast intensity of the light emanating from the turbid medium at a contrast blood oxygen saturation (SaO2) level in the turbid medium and a contrast imaging step for reconstructing a contrast image of the turbid medium from the measured contrast intensities. A comparison is made between the contrast image to the reference image of the turbid medium.
摘要翻译： 公开了一种用于浑浊介质的光学成像的方法和装置。 该方法包括在混浊介质中以参考血氧饱和度（SaO2）从混浊介质发出的光的参考光强度的参考测量值，以及用于根据测量的参考光强度重建浊度介质的参考图像的参考成像步骤。 此外，该方法包括在浑浊培养基中以对比血氧饱和度（SaO2）水平从浑浊培养基发出的光的对比度强度的对比度测量，以及用于从所测量的重量中重建浑浊培养基的对比度图像的对比度成像步骤 对比强度。 对比图像与混浊介质的参考图像之间进行比较。
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99.发明授权Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method 有权用于多层反射镜的光谱纯度滤光器，包括这种多层反射镜的光刻设备，用于扩大所需辐射和不期望辐射的比率的方法，以及器件制造方法公开(公告)号：US08139200B2
公开(公告)日：2012-03-20
申请号：US13028795
申请日：2011-02-16
申请人： Maarten Marinus Johannes Wilhelmus Van Herpen , Levinus Pieter Bakker , Vadim Yevgenyevich Banine , Derk Jan Wilfred Klunder
发明人： Maarten Marinus Johannes Wilhelmus Van Herpen , Levinus Pieter Bakker , Vadim Yevgenyevich Banine , Derk Jan Wilfred Klunder
CPC分类号： G02B1/10 , B82Y10/00 , B82Y40/00 , G02B5/0816 , G02B5/0891 , G02B5/283 , G03F1/24 , G03F7/70575 , G03F7/70958 , G21K1/062 , G21K2201/067
摘要： A lithographic apparatus comprising a support configured to support a patterning device; a substrate table configured to hold a substrate; a projection system configured to project a pattern imparted to a radiation beam by the patterning device onto a target portion of the substrate; and a first multi-layer mirror and a second multi-layer mirror, the first multi-layer mirror and the second multi-layer minor being arranged along a path of the radiation beam, the first multi-layer minor and the second multi-layer mirror each having a reflectivity of at least about 50% in extreme ultra violet wavelength range, and the first multi-layer mirror configured to reduce radiation having wavelengths in a first wavelength range and the second multi-layer minor configured to reduce radiation having wavelengths in a second wavelength range different from the first wavelength range, wherein the first wavelength range and the second wavelength range are outside extreme ultra violet wavelength range.
摘要翻译： 一种光刻设备，包括被配置为支撑图案形成装置的支撑件; 被配置为保持基板的基板台; 投影系统，被配置为将通过图案形成装置赋予辐射束的图案投影到基板的目标部分上; 以及第一多层反射镜和第二多层反射镜，所述第一多层反射镜和所述第二多层次要沿着所述辐射束的路径布置，所述第一多层次要层和所述第二多层反射镜 每个反射镜在极紫外波长范围内具有至少约50％的反射率，并且第一多层反射镜被配置为减少具有第一波长范围波长的辐射，而第二多层次镜被配置为减少具有波长的辐射 与第一波长范围不同的第二波长范围，其中第一波长范围和第二波长范围在极紫外波长范围之外。
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100.发明申请RE-CALIBRATION OF PRE-RECORDED IMAGES DURING INTERVENTIONS USING A NEEDLE DEVICE 有权使用针头装置进行干预时预先记录的图像重新校准公开(公告)号：US20120059251A1
公开(公告)日：2012-03-08
申请号：US13321189
申请日：2010-05-07
CPC分类号： A61B8/0841 , A61B5/0062 , A61B5/0066 , A61B5/0068 , A61B5/0071 , A61B5/0073 , A61B5/0075 , A61B5/0084 , A61B5/6848 , A61B6/12 , A61B6/5247 , A61B8/00 , A61B8/5238 , A61B17/34 , A61B17/3403 , A61B17/3417 , A61B2090/3614 , A61B2090/374 , A61B2090/376 , A61B2090/378 , A61B2090/3784
摘要： Re-calibration of pre-recorded images during interventions is proposed, utilizing an interventional system comprising an imaging device providing images of an object, a needle device, and a processing device. The needle device comprises a sensor for providing data corresponding to tissue properties. The processing device is adapted to perform an overlay registration of pre-recorded images and live images provided by the imaging device, utilizing the data from the sensor. Thus, the accuracy of an overlay of images is increased.
摘要翻译： 提出了在干预期间重新校准预先记录的图像，利用包括提供物体，针装置和处理装置的图像的成像装置的介入系统。 针装置包括用于提供对应于组织性质的数据的传感器。 处理装置适用于利用来自传感器的数据来执行由成像装置提供的预先记录的图像和实况图像的重叠登记。 因此，图像的重叠的精度增加。
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