公开(公告)号：US08900401B2

公开(公告)日：2014-12-02

申请号：US12846403

申请日：2010-07-29

申请人： Eiji Ikegami ,  Shoji Ikuhara ,  Takeshi Shimada ,  Kenichi Kuwabara ,  Takao Arase ,  Tsuyoshi Matsumoto

发明人： Eiji Ikegami ,  Shoji Ikuhara ,  Takeshi Shimada ,  Kenichi Kuwabara ,  Takao Arase ,  Tsuyoshi Matsumoto

IPC分类号： H01L21/306 ,  H01J37/32

CPC分类号： H01J37/32963 ,  H01J37/32082 ,  H01J37/32091 ,  H01J37/321 ,  H01J37/3211 ,  H01J37/32192 ,  H01J37/32917 ,  H01J37/32926 ,  H01J37/32935 ,  H01J37/32981 ,  H01J37/3299 ,  H01J2237/1825 ,  H01J2237/327 ,  H01L21/67069 ,  H01L21/67242 ,  H05H1/46

摘要： Plasma processing of plural substrates is performed in a plasma processing apparatus, which is provided with a plasma processing chamber having an antenna electrode and a lower electrode for placing and retaining the plural substrates in turn within the plasma processing chamber, a gas feeder for feeding processing gas into the processing chamber, a vacuum pump for discharging gas from the processing chamber via a vacuum valve, and a solenoid coil for forming a magnetic field within the processing chamber. At least one of the plural substrates is placed on the lower electrode, and the processing gas is fed into the processing chamber. RF power is fed to the antenna electrode via a matching network to produce a plasma within the processing chamber in which a magnetic field has been formed by the solenoid coil. This placing of at least one substrate and this feeding of the processing gas are then repeated until the plasma processing of all of the plural substrates is completed. An end of seasoning is determined when a parameter including an internal pressure of the processing chamber has become stable to a steady value with plasma processing time.

摘要翻译： 在具有等离子体处理室的等离子体处理装置中进行多个基板的等离子体处理，该等离子体处理室具有用于在等离子体处理室内依次放置和保持多个基板的天线电极和下部电极，供给处理用气体供给装置 气体进入处理室，用于经由真空阀从处理室排出气体的真空泵和用于在处理室内形成磁场的螺线管线圈。 多个基板中的至少一个被放置在下电极上，并且处理气体被馈送到处理室中。 RF功率经由匹配网络馈送到天线电极，以在处理室内产生等离子体，其中已经由螺线管线圈形成了磁场。 然后重复这种至少一个基板的放置和该处理气体的进料，直至完成所有多个基板的等离子体处理。 当包括处理室的内部压力的参数在具有等离子体处理时间的稳定值变得稳定时，确定调味品的结束。

公开(公告)号：US08845400B2

公开(公告)日：2014-09-30

申请号：US13504381

申请日：2010-12-21

申请人： Atsumi Imai ,  Takehide Aiga ,  Masanori Nagai ,  Takayuki Sato ,  Kenji Fujimoto ,  Tsuyoshi Matsumoto ,  Hiroshi Kihira

发明人： Atsumi Imai ,  Takehide Aiga ,  Masanori Nagai ,  Takayuki Sato ,  Kenji Fujimoto ,  Tsuyoshi Matsumoto ,  Hiroshi Kihira

IPC分类号： B24D7/02 ,  B24D3/06

CPC分类号： B24D3/06 ,  B24D7/02

摘要： An inexpensive rotary grinding tool with reduced noise level of the grinding is provided. The rotary grinding tool comprises a metal disk having a grinding surface on at least a part of its surface and a holder for supporting the metal disk. The grinding surface has hard grains having a Mohs hardness in excess of 9 brazed thereon at a surface density of at least 20 grains/cm2. The holder has at its center a securing means for securing the holder on rotary shaft of a rotary drive unit. The holder and the metal disk are joined together to constitute the rotary grinding tool.

摘要翻译： 提供了具有降低的磨削噪音水平的廉价的旋转磨削工具。 旋转研磨工具包括在其表面的至少一部分上具有研磨表面的金属盘和用于支撑金属盘的保持器。 磨削表面具有以至少20个/ cm 2的表面密度在其上钎焊的莫氏硬度超过9的硬质粒。 保持器在其中心具有用于将保持器固定在旋转驱动单元的旋转轴上的固定装置。 保持器和金属盘连接在一起以构成旋转研磨工具。

公开(公告)号：US08801951B2

公开(公告)日：2014-08-12

申请号：US13210490

申请日：2011-08-16

申请人： Yoshiharu Inoue ,  Michikazu Morimoto ,  Tsuyoshi Matsumoto ,  Tetsuo Ono ,  Tadamitsu Kanekiyo ,  Mamoru Yakushiji ,  Masakazu Miyaji

发明人： Yoshiharu Inoue ,  Michikazu Morimoto ,  Tsuyoshi Matsumoto ,  Tetsuo Ono ,  Tadamitsu Kanekiyo ,  Mamoru Yakushiji ,  Masakazu Miyaji

IPC分类号： C03C15/00

CPC分类号： H01L21/31116

摘要： In a plasma processing method for conducting etching on an object to be processed by generating plasma from depositional gas introduced into a processing chamber and exposing the object to be processed to the plasma in a state in which radio frequency power is applied, the object to be processed is etched under etching conditions that a deposit film on an inner wall of the processing chamber becomes amorphous by repeating a first period during which the object to be processed is exposed to plasma and a second period during which the object to be processed is exposed to plasma and an etching rate is lower as compared with the first period. Consequently, particles due to increase in the number of processed sheets of the object to be processed can be suppressed.

摘要翻译： 在等离子体处理方法中，通过在施加射频电力的状态下，通过从引入到处理室中的沉积气体产生等离子体并将待处理物体暴露于等离子体，对待处理对象进行蚀刻， 在处理室的内壁上的沉积膜通过重复将被处理物暴露于等离子体的第一期间和第二期间，使被处理室的暴露于 等离子体和蚀刻速率比第一阶段低。 因此，能够抑制由于加工对象物的加工张数而增加的粒子。

公开(公告)号：US20130269597A1

公开(公告)日：2013-10-17

申请号：US13996077

申请日：2011-06-29

申请人： Satoshi Torimi ,  Satoru Nogami ,  Tsuyoshi Matsumoto

发明人： Satoshi Torimi ,  Satoru Nogami ,  Tsuyoshi Matsumoto

IPC分类号： C30B19/12 ,  C30B29/36

CPC分类号： C30B19/12 ,  C30B28/14 ,  C30B29/36 ,  Y10T428/26

摘要： Provided is an inexpensive seed material for liquid phase epitaxial growth of silicon carbide. A seed material 12 for liquid phase epitaxial growth of a monocrystalline silicon carbide includes a surface layer containing a polycrystalline silicon carbide with a 3C crystal polymorph. Upon X-ray diffraction of the surface layer thereof, a first-order diffraction peak corresponding to a (111) crystal plane is observed as a diffraction peak corresponding to the polycrystalline silicon carbide with a 3C crystal polymorph but no other first-order diffraction peak having a diffraction intensity of 10% or more of the diffraction intensity of the first-order diffraction peak corresponding to the (111) crystal plane is observed.

摘要翻译： 提供了用于碳化硅的液相外延生长的廉价种子材料。 用于单晶碳化硅的液相外延生长的种子材料12包括含有具有3C晶体多晶型物的多晶碳化硅的表面层。 在其表面层的X射线衍射中，观察到对应于（111）晶面的一级衍射峰，作为与具有3C晶体多晶型物的多晶碳化硅相对应的衍射峰，但没有其它一级衍射峰 观察到与（111）晶面对应的一级衍射峰的衍射强度为10％以上的衍射强度。

公开(公告)号：US08520279B2

公开(公告)日：2013-08-27

申请号：US12614903

申请日：2009-11-09

申请人： Norinao Kouma ,  Osamu Tsuboi ,  Tsuyoshi Matsumoto

发明人： Norinao Kouma ,  Osamu Tsuboi ,  Tsuyoshi Matsumoto

IPC分类号： G02B26/08

CPC分类号： G02B26/0841 ,  G01J3/4535 ,  H02N1/006

摘要： A micro movable device includes a movable member, a stationary portion, and connecting portions each connected to the movable member and the stationary portion. The movable member includes a pair of electrodes. The stationary portion includes a pair of electrodes cooperating with the electrodes of the movable member to generate a driving force for translating the movable member in its thickness direction. The connection points at which the respective connecting portions are connected to the movable member are spaced from each other. The electrodes of the movable member are positioned between two mutually spaced connection points, as viewed along the spacing direction of the two connection points.

摘要翻译： 微型可移动装置包括可移动部件，固定部分和连接到可移动部件和固定部分的连接部分。 可动构件包括一对电极。 固定部分包括与可动构件的电极配合的一对电极，以产生用于在可移动构件的厚度方向上平移的驱动力。 各连接部分连接到可移动部件的连接点彼此间隔开。 当沿着两个连接点的间隔方向观察时，可动构件的电极位于两个相互间隔的连接点之间。

公开(公告)号：US08471152B2

公开(公告)日：2013-06-25

申请号：US13091728

申请日：2011-04-21

申请人： Yoshihiro Mizuno ,  Norinao Kouma ,  Hisao Okuda ,  Hiromitsu Soneda ,  Tsuyoshi Matsumoto ,  Osamu Tsuboi

发明人： Yoshihiro Mizuno ,  Norinao Kouma ,  Hisao Okuda ,  Hiromitsu Soneda ,  Tsuyoshi Matsumoto ,  Osamu Tsuboi

IPC分类号： H05K1/03

CPC分类号： B81C1/00698 ,  Y10T29/49117

摘要： A microstructure comprises a laminate structure having a first conductor, a second conductor, and an intervening insulator located between the first and the second conductors. The first conductor includes opposite faces in relation to the second conductor, side faces, and edge parts which form the boundaries of the aforementioned opposite faces and side faces. The second conductor includes an extended face extending beyond the edge parts exceeding the first conductor. The insulation film includes an area covering at least part of an edge part and/or at least part of a side face.

摘要翻译： 微结构包括具有第一导体，第二导​​体和位于第一和第二导体之间的中间绝缘体的层压结构。 第一导体包括相对于第二导体的相对面，侧面和形成上述相对面和侧面的边界的边缘部分。 第二导体包括延伸超过超过第一导体的边缘部分的延伸面。 绝缘膜包括覆盖边缘部分的至少一部分和/或侧面的至少一部分的区域。

公开(公告)号：US08390415B2

公开(公告)日：2013-03-05

申请号：US13399794

申请日：2012-02-17

申请人： Hideki Ogawa ,  Tsuyoshi Matsumoto

发明人： Hideki Ogawa ,  Tsuyoshi Matsumoto

IPC分类号： H01F27/02 ,  H01F38/12 ,  H01F27/29 ,  H01F17/04 ,  H01F27/24

CPC分类号： H01F1/26 ,  H01F1/24 ,  H01F1/33 ,  H01F17/04 ,  H01F41/0246 ,  H01F2003/106

摘要： A coil component 10 includes: a magnetic core made of a magnetic alloy; a coil having a spiral part placed around a pillar part of the magnetic core; a magnetic sheath formed on the magnetic core in a manner covering the coil except for the bottom face of the magnetic core; and a first external terminal and second external terminal formed on the magnetic core and magnetic sheath; wherein the magnetic sheath has numerous voids inside.

摘要翻译： 线圈部件10包括：由磁性合金制成的磁芯; 线圈，其具有围绕所述磁芯的柱部配置的螺旋部; 以除了磁芯的底面之外的线圈的方式形成在磁芯上的磁性护套; 以及形成在所述磁芯和磁性护套上的第一外部端子和第二外部端子; 其中磁性护套内部具有许多空隙。

公开(公告)号：US08223766B2

公开(公告)日：2012-07-17

申请号：US12543216

申请日：2009-08-18

申请人： Tsuyoshi Matsumoto ,  Takeshi Yamazaki ,  Mako Kawaguchi ,  Shuichi Kitaguchi ,  Yuusuke Shimada ,  Kotaro Okazaki

发明人： Tsuyoshi Matsumoto ,  Takeshi Yamazaki ,  Mako Kawaguchi ,  Shuichi Kitaguchi ,  Yuusuke Shimada ,  Kotaro Okazaki

IPC分类号： H04L12/28

CPC分类号： H04L12/1868 ,  H04L43/0817 ,  H04L45/00 ,  H04L45/28 ,  H04L67/14 ,  H04L67/145 ,  H04L69/16 ,  H04L69/161 ,  H04L69/164 ,  H04L69/22 ,  H04L69/40

摘要： An objective of the present invention is to secure the continuity of the communication between a client device and a standby server device, when a failure occurs and switch to the standby device is performed. A communication processing unit of the client device establishes connection with a plurality of server devices simultaneously by transmitting a UDP packet to the plurality of server devices by multicast. After establishing the connection, data of the application is transmitted by multicast to the plurality of the server devices. In the even of a failure, a standby server device receives the data packet multicast from the client device to continue the inter-application communication.

摘要翻译： 本发明的目的是确保客户端设备和备用服务器设备之间的通信的连续性，当故障发生并且切换到备用设备时。 客户端设备的通信处理单元通过多播向多个服务器设备发送UDP分组，同时与多个服务器设备建立连接。 建立连接后，应用程序的数据通过组播传输到多个服务器设备。 即使发生故障，备用服务器设备从客户端设备接收数据包多播，继续进行应用间通信。

公开(公告)号：US08202382B2

公开(公告)日：2012-06-19

申请号：US12509584

申请日：2009-07-27

申请人： Norinao Kouma ,  Osamu Tsuboi ,  Yoshihiro Mizuno ,  Hiromitsu Soneda ,  Hisao Okuda ,  Tsuyoshi Matsumoto ,  Ippei Sawaki

发明人： Norinao Kouma ,  Osamu Tsuboi ,  Yoshihiro Mizuno ,  Hiromitsu Soneda ,  Hisao Okuda ,  Tsuyoshi Matsumoto ,  Ippei Sawaki

IPC分类号： B32B37/12

CPC分类号： B81C1/00825 ,  B81B2201/042 ,  B81B2203/0154 ,  G02B6/3518 ,  G02B6/3556 ,  G02B26/0841 ,  H04Q2213/13003

摘要： A method for manufacturing a micro movable element includes: forming a movable section, a frame, and a connecting section connecting the movable section with the frame on a substrate; bonding a film to a surface of the substrate in forming the movable section, the frame, and the connecting section; and patterning the film to form a support structure being bridged between the movable section and the frame.

摘要翻译： 微型可动元件的制造方法包括：在基板上形成可动部，框架和将可动部与框架连接的连接部， 在形成可移动部分，框架和连接部分的过程中将薄膜粘合到基板的表面上; 以及图案化所述膜以形成桥接在所述可移动部分和所述框架之间的支撑结构。

公开(公告)号：US20120125900A1

公开(公告)日：2012-05-24

申请号：US13388177

申请日：2010-07-26

申请人： Tsuyoshi Matsumoto ,  Seiji Sasabe

发明人： Tsuyoshi Matsumoto ,  Seiji Sasabe

IPC分类号： B23K26/00 ,  B23K35/24 ,  B23K9/00

CPC分类号： B23K35/286 ,  B23K9/173 ,  B23K9/232 ,  B23K26/206 ,  B23K26/211 ,  B23K35/0266 ,  B23K35/36 ,  B23K35/3605 ,  B23K35/368 ,  B23K2103/20 ,  C22C21/02

摘要： A flux-cored wire for laser welding or MIG welding different materials, wherein the different materials are aluminum or an aluminum alloy material and a galvanized steel material. The flux-cored wire contains a cylindrical aluminum alloy sheath containing: aluminum, 0.8-1.9 mass % Si, at most 0.1 mass % Mn, 0.1 mass % Mg, and 0.1 mass % Fe; and a flux filled in a space within the sheath and containing 20-60 mass % cesium fluoride, wherein the percentage filling of the flux is 5-20 mass % with respect to the total mass of the flux-core wire.

摘要翻译： 用于激光焊接或MIG焊接不同材料的药芯焊丝，其中不同的材料是铝或铝合金材料和镀锌钢材料。 药芯焊丝包含圆筒形铝合金护套，其包含：铝，0.8-1.9质量％的Si，至多0.1质量％的Mn，0.1质量％的Mg和0.1质量％的Fe; 以及填充在护套内的空间内的助熔剂，含有20-60质量％的氟化铯，其中焊剂的填充百分比相对于磁芯线的总质量为5〜20质量％。