公开(公告)号：US20070197398A1

公开(公告)日：2007-08-23

申请号：US10591476

申请日：2005-02-25

申请人： Yasuhiko Kojima ,  Naoki Yoshii

发明人： Yasuhiko Kojima ,  Naoki Yoshii

IPC分类号： H01L39/24

CPC分类号： H01L21/28562 ,  C23C16/18 ,  C23C16/452 ,  C23C16/45529 ,  C23C16/45553

摘要： A Cu film is deposited on a substrate by ALD (Atomic Layer Deposition) process, in which: a Cu-carboxyl acid complex or a derivative thereof having a high vapor pressure and wettability to a base is used in a gasified state; H2 is used as a reductive gas; and a step of adsorbing a source material gas to a substrate and a step of forming a Cu film by reducing the adsorbed gas with a reductive gas are repeated alternately. With this method, a conformal Cu film having excellent quality can be formed.

摘要翻译： 通过ALD（原子层沉积）方法将Cu膜沉积在基板上，其中：在气化状态下使用具有高蒸气压和对碱的润湿性的Cu-羧酸络合物或其衍生物; H 2 2被用作还原气体; 并且将源材料气体吸附到基板的步骤和通过用还原气体还原吸附气体形成Cu膜的步骤交替地重复。 通过这种方法，可以形成具有优良品质的共形Cu膜。

公开(公告)号：US20070160757A1

公开(公告)日：2007-07-12

申请号：US11717183

申请日：2007-03-13

申请人： Tadahiro Ishizaka ,  Hiroshi Kannan ,  Yasuhiko Kojima ,  Takashi Shigeoka ,  Yasuhiro Oshima ,  Kohei Kawamura

发明人： Tadahiro Ishizaka ,  Hiroshi Kannan ,  Yasuhiko Kojima ,  Takashi Shigeoka ,  Yasuhiro Oshima ,  Kohei Kawamura

IPC分类号： C23C16/00

CPC分类号： C23C16/45544 ,  C23C16/34 ,  C23C16/4401 ,  C23C16/4412

摘要： In a processing apparatus which performs a film deposition by alternately supplying a plurality of source gases, the source gases are prevented from reacting within an exhaust pipe so as to prevent the exhaust pipe from clogging due to a reaction by-product. A gas supply to a processing container is switched between a TiCl4 supply system and a NH3 supply system. Additionally, a gas exhaust from the processing container is switched between a TiCl4 exhaust system and a NH3 exhaust system. The gas exhaust is switched to the TiCl4 exhaust system when the gas supply is switched to the TiCl4 supply system, and the gas exhaust is switched to the NH3 exhaust system when the gas supply is switched to the NH3 supply system. The switching is performed by a stop valve provided to each of the supply system and the exhaust system.

摘要翻译： 在通过交替供给多个源气体进行膜沉积的处理装置中，防止源气体在排气管内发生反应，以防止排气管因反应副产物而堵塞。 供给到处理容器的气体在TiCl 4供应系统和NH 3供应系统之间切换。 此外，来自处理容器的排气在TiCl 4排气系统和NH 3排气系统之间切换。 当气体供应切换到TiCl 4供应系统时，排气被切换到TiCl 4排气系统，并且排气被切换到NH 3 3气体供应系统切换到NH 3供应系统时。 通过设置在供给系统和排气系统中的每一个的截止阀进行切换。

公开(公告)号：US07172657B2

公开(公告)日：2007-02-06

申请号：US09801825

申请日：2001-03-09

申请人： Yasuhiko Kojima ,  Yasuhiro Oshima

发明人： Yasuhiko Kojima ,  Yasuhiro Oshima

IPC分类号： B08B3/10 ,  B08B9/00

CPC分类号： C23C16/4405

摘要： In a state of the inside of a treatment chamber of treatment equipment being evacuated, therein a cleaning gas containing trifluoroaceticacid (TFA) as a cleaning agent is supplied. Metal such as copper used in the formation of an interconnection or an electrode and stuck on an inner wall surface of the treatment chamber, when coming into contact with the cleaning agent (TFA) in the cleaning gas, without forming an oxide or a metallic salt, is directly complexed. The complex is sublimed due to the evacuation and is exhausted outside the treatment chamber. Accordingly, at less labor and low cost, the cleaning can be efficiently implemented.

摘要翻译： 在处理设备的处理室的内部被抽真空的状态下，其中提供含有三氟乙酸（TFA）作为清洁剂的清洁气体。 当形成互连或电极并且在与清洁气体中的清洁剂（TFA）接触时粘附在处理室的内壁表面上的金属，例如铜，而不形成氧化物或金属盐 ，直接复合。 复合体由于排空而升华，并在处理室外排出。 因此，以较少的劳动力和低成本，可以有效地实施清洁。

公开(公告)号：US07153693B2

公开(公告)日：2006-12-26

申请号：US10369695

申请日：2003-02-21

申请人： Yoshihiro Tajiri ,  Takuya Hayabuchi ,  Naohiro Teramoto ,  Yasuhiko Kojima ,  Eiji Sakata ,  Haruyuki Morikawa

发明人： Yoshihiro Tajiri ,  Takuya Hayabuchi ,  Naohiro Teramoto ,  Yasuhiko Kojima ,  Eiji Sakata ,  Haruyuki Morikawa

IPC分类号： G01N33/00 ,  G01N27/08 ,  G01N27/10

CPC分类号： G01N31/002 ,  G01N27/021 ,  Y10T436/117497 ,  Y10T436/171538 ,  Y10T436/175383

摘要： A method for determining a urea concentration in an aqueous solution containing urea, includes: hydrolyzing the urea in the aqueous solution, measuring an electric conductivity χ of the aqueous solution, and determining the urea concentration in the aqueous solution from the electric conductivity χ using a correlation between the urea concentration and an electric conductivity.

公开(公告)号：US06991684B2

公开(公告)日：2006-01-31

申请号：US10381724

申请日：2001-09-28

申请人： Hiroshi Kannan ,  Noboru Tamura ,  Yasuhiko Kojima ,  Tadahiro Ishizaka

发明人： Hiroshi Kannan ,  Noboru Tamura ,  Yasuhiko Kojima ,  Tadahiro Ishizaka

IPC分类号： C23C16/00

CPC分类号： C23C16/45544 ,  C23C16/34 ,  C23C16/45527 ,  C23C16/4586 ,  C23C16/46 ,  C23C16/463 ,  C23C16/466 ,  H01L21/28562 ,  H01L21/67109 ,  Y10T29/41

摘要： A heater plate, which has a wafer W mounted thereon and which includes a heater in its interior, is placed on a cooling block including a coolant chamber in its interior. The cooling block includes a gas introduction pipe passing therethrough. The gas introduction pipe is connected to a space between the heater plate and the cooling block to make it possible to supply He gas as thermal conduction gas to the space. A gas suction pipe 34 is connected to the space to make it possible to suck He gas.

摘要翻译： 安装有晶片W并且在其内部包括加热器的加热器板被放置在包括其内部的冷却剂室的冷却块上。 冷却块包括通过其中的气体导入管。 气体导入管与加热板和冷却块之间的空间连接，能够将He气体作为导热气体供给到空间。 气体吸入管34连接到该空间，以便可以吸入He气体。

公开(公告)号：US20050211167A1

公开(公告)日：2005-09-29

申请号：US10517345

申请日：2003-06-09

申请人： Isao Gunji ,  Tadahiro Ishizaka ,  Hiroshi Kannan ,  Ikuo Sawada ,  Yasuhiko Kojima

发明人： Isao Gunji ,  Tadahiro Ishizaka ,  Hiroshi Kannan ,  Ikuo Sawada ,  Yasuhiko Kojima

IPC分类号： C23C16/44 ,  C30B25/14 ,  H01L21/285 ,  C23C16/00

CPC分类号： C30B25/14 ,  C23C16/44 ,  H01L21/28562

摘要： The ceiling surface (12b) of a chamber (12) is substantially entirely formed with a gas supply port (19). Further, the gas supply port (19) has shower head (20) fitted therein. The peripheral edge of the ceiling surface (12b) has connected thereto a second side wall (12d) forming an angle greater than 90 degrees with ceiling surface (12b). Further, the side surface of a susceptor (16) is formed such that it forms an angle greater than 90 degrees with a mounting surface for a wafer (W) and is substantially parallel with the second side wall (12d) of the chamber (12). Further, the susceptor (16) is disposed such that the distance (L2) between its side surface and the second side wall (12d) is greater than the distance (L1) between the shower head (20) and the wafer (W).

摘要翻译： 室（12）的顶表面（12b）基本上完全由气体供给口（19）形成。 此外，气体供给口（19）具有嵌入其中的喷头（20）。 天花板表面（12b）的周缘连接有形成与天花板表面（12b）大于90度的角度的第二侧壁（12d）。 此外，基座（16）的侧表面形成为与晶片（W）的安装表面形成大于90度的角度并且基本上平行于腔室的第二侧壁（12d） 12）。 此外，基座（16）设置成使得其侧表面和第二侧壁（12d）之间的距离（L 2）大于喷头（20）和晶片（20）之间的距离（L 1） W）。

公开(公告)号：US20050092250A1

公开(公告)日：2005-05-05

申请号：US10998738

申请日：2004-11-30

申请人： Yasuhiko Kojima ,  Vincent Vezin ,  Tomohisa Hoshino

发明人： Yasuhiko Kojima ,  Vincent Vezin ,  Tomohisa Hoshino

IPC分类号： C23C16/44 ,  C23C16/18 ,  C23C16/448 ,  H01L21/205 ,  C23C16/00

CPC分类号： C23C16/18 ,  C23C16/4485

摘要： When the vaporizer 2 does not vaporize an organometallic complex Cu (hfac) TMVS, a stabilizer TMVS for the organometallic complex is fed into the gas area Av of the vaporizer 2 or the pipe 14 connected to the vaporizer 1 on the downstream side thereof in a gaseous state.

摘要翻译： 当蒸发器2不蒸发有机金属配合物Cu（hfac）TMVS时，将用于有机金属配合物的稳定剂TMVS进料到蒸发器2的气体区域Av或其蒸发器1的下游侧的管14中 气态。

公开(公告)号：US06723489B2

公开(公告)日：2004-04-20

申请号：US10060470

申请日：2002-01-30

申请人： Maru Aburano ,  Shoichi Hotate ,  Shinji Shimizu ,  Yasuhiko Kojima

发明人： Maru Aburano ,  Shoichi Hotate ,  Shinji Shimizu ,  Yasuhiko Kojima

IPC分类号： G03F738

CPC分类号： B41N3/00 ,  B41C1/1008 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/262 ,  B41N3/03 ,  Y10S430/145

摘要： Lithographic printing form precursors comprising positive working polymeric coatings on substrates may during storage or transportation undergo undesirable changes in their imaging properties. It has been found that acceptable properties can be restored by carrying out a heat treatment which involves a relatively short heating stage followed by accelerated cooling.

摘要翻译： 包含在基底上的正性聚合物涂层的平版印刷版本的前体可能在储存或运输期间经历其成像性能的不期望的改变。 已经发现通过进行涉及相对较短的加热阶段然后加速冷却的热处理可以恢复可接受的性能。

公开(公告)号：US06627380B2

公开(公告)日：2003-09-30

申请号：US09860459

申请日：2001-05-21

申请人： Naohito Saito ,  Yasuyuki Watanabe ,  Yasuhiko Kojima ,  Eiji Hayakawa ,  Koji Oe

发明人： Naohito Saito ,  Yasuyuki Watanabe ,  Yasuhiko Kojima ,  Eiji Hayakawa ,  Koji Oe

IPC分类号： G03C1492

CPC分类号： B41C1/1008 ,  B41C2210/02 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  Y10S430/145

摘要： The present invention relates to a lithographic printing plate in which images can be inscribed by laser beams, and which has high resolving power, high sensitivity, and the improved reservation stability, and relates to its image-producing method, and a photosenstitive composition which can preferably be used as an original plate for lithographic printing. The photosenstitive composition includes an aqueous resin composition including fine particles (a) of a resin having at least one neutralized anionic group and having a heat fusion property, and a water soluble resin (b) having at least one neutralized anionic group, wherein the water soluble resin (b) is included in a range of 1 to 30% by weight, relative to the total weight of the aqueous resin composition; and a substance (c) which absorbs light and generates heat.

公开(公告)号：US5936122A

公开(公告)日：1999-08-10

申请号：US939126

申请日：1997-09-26

申请人： Yasuhiko Kojima ,  Hidetsugu Fujii

发明人： Yasuhiko Kojima ,  Hidetsugu Fujii

IPC分类号： B01D5/00 ,  B01J10/00 ,  B01J19/00 ,  C07C273/04 ,  C07C275/00

CPC分类号： C07C273/04 ,  B01D5/0063 ,  B01J19/006 ,  B01J2219/00006 ,  B01J2219/00108 ,  B01J2219/0011 ,  B01J2219/00777

摘要： A vertical condenser is installed on or above a urea synthesis column to condense the mixed gas from the stripper by bringing it into contact with an absorption medium under cooling. A first down pipe for making the top part of the condenser communicate with the bottom part of the synthesis column is provided to allow the resultant condensate to flow down to the bottom part of the synthesis column by gravity. The condensate is subjected to urea synthesis together with feed ammonia or a part of feed carbon dioxide supplied thereto. The urea synthesis solution thus formed is introduced into the stripper by gravity through a second down pipe having an opening in the top part of the synthesis column. Unreacted ammonia and carbon dioxide are separated as the aforesaid mixed gas by the rest of the feed carbon dioxide and introduced into the bottom part of the aforesaid condenser so as to be condensed. Alternatively, the condensate from the vertical condenser is sucked by means of an ejector using preheated feed liquid ammonia as the driving fluid, so that it is introduced into the bottom part of the urea synthesis column and is subjected to urea synthesis.

摘要翻译： 立式冷凝器安装在尿素合成塔上或上方，通过使其与冷却下的吸收介质接触而将来自汽提塔的混合气体冷凝。 提供用于使冷凝器的顶部与合成塔的底部连通的第一下管，以使所得的冷凝物通过重力向下流到合成塔的底部。 冷凝物与供给氨或供给二氧化碳的一部分进行尿素合成。 如此形成的尿素合成溶液通过重力通过在合成塔的顶部具有开口的第二下管引入汽提器。 未反应的氨和二氧化碳作为前述混合气体被剩余的进料二氧化碳分离，并被引入上述冷凝器的底部以便冷凝。 或者，来自垂直冷凝器的冷凝物借助于使用预热的进料液氨作为驱动流体的喷射器吸入，从而将其引入到尿素合成塔的底部并进行尿素合成。