摘要:
The invention relates to Corynebacterium ammoniagenes CJXSP 0201 KCCM 10448 producing 5′-xanthylic acid. More specifically, the invention relates to Corynebacterium ammoniagenes CJXSP 0201 KCCM 10448 which is a mutant strain of Corynebacterium ammoniagenes KCCM 10340 having a resistance to osmotic pressure. In order to obtain mutant strain having enhanced respiratory activity, the present invention adopted Corynebacterium ammoniagenes KCCM 10340 as parent strain and treated it with UV radiation and mutation derivatives such as N-methyl-N′-nitro-n-nitrosoguanidine (NTG) according to ordinary procedure. Therefore, Corynebacterium ammoniagenes CJXSP 0201 KCCM 10448 of the present invention makes it possible to overcome growth-standing phase rapidly on early culture and for same period of fermentation, can accumulate 5′-xanthylic acid in culture medium at a high yield and concentration rate.
摘要:
Provided are a promoter including at least one polynucleotide selected from the group consisting of SEQ ID NOS: 1 to 7, an expression cassette including the same, a vector including the expression cassette, a host cell including the vector, and a method of expressing a gene using the host cell.
摘要翻译:提供了包含选自SEQ ID NO:1至7的至少一种多核苷酸的启动子,包含其的表达盒,包含表达盒的载体,包含载体的宿主细胞,以及表达 基因使用宿主细胞。
摘要:
A CMOS image sensor and a method of fabricating the same are provided. The image sensor includes a blocking layer protecting a photodiode at a diode region. The blocking layer is formed to cover a top of the diode region and extended to an active region so as to cover a transfer gate and a floating diffusion layer. Therefore, the floating diffusion layer may not be attacked by an etching during a formation of sidewall spacers of various gates or by ion implantation during a formation of a junction region of a DDD or LDD structure, thus reducing a leakage current and a dark current at the floating diffusion layer.
摘要:
An image sensor comprising a transfer gate electrode having a uniform impurity doping distribution is provided. The image sensor further comprises a semiconductor substrate comprising a pixel area, wherein the pixel area comprises an active region and the transfer gate electrode is disposed on the active region. A method of fabricating the image sensor is also provided. The method comprises preparing a semiconductor substrate, forming a polysilicon layer on the semiconductor substrate, doping the polysilicon layer with impurity ions, and patterning the polysilicon layer.
摘要:
The invention relates to Corynebacterium ammoniagenes CJXOL 0201 KCCM 10447 producing 5′-xanthylic acid. More specifically, the invention relates to Corynebacterium ammoniagenes CJXOL 0201 KCCM 10447 which is a mutant strain of Corynebacterium ammoniagenes KCCM 10340 having a resistance to oligomycin. In order to obtain mutant strain having enhanced respiratory activity, the present invention adopted Corynebacterium ammoniagenes KCCM 10340 as parent strain and treated it with UV radiation and mutation derivatives such as N-methyl-N′-nitro-n-nitrosoguanidine(NTG) according to ordinary procedure. Therefore, Corynebacterium ammoniagenes CJXOL 0201 KCCM 10447 of the present invention makes it possible to increase ATP reproducing activity for same period of fermentation and can accumulate 5′xanthylic acid in culture medium at a high yield and concentration rate.
摘要:
A CMOS image sensor and a method of fabricating the same are provided. The image sensor includes a blocking layer protecting a photodiode at a diode region. The blocking layer is formed to cover a top of the diode region and extended to an active region so as to cover a transfer gate and a floating diffusion layer. Therefore, the floating diffusion layer may not be attacked by an etching during a formation of sidewall spacers of various gates or by ion implantation during a formation of a junction region of a DDD or LDD structure, thus reducing a leakage current and a dark current at the floating diffusion layer.
摘要:
An CMOS image sensor includes a photodiode region generating electrical charges in response to incident light received thereat. In one example, the CMOS image sensor further includes first and second transfer gates adapted to prevent or substantially prevent the electrical charges from overflowing into a floating diffusion region or a storage diffusion region located on opposite sides of the photodiode region. In this example, a read diffusion region is formed in the semiconductor substrate on an opposite side of the storage diffusion region relative to the photodiode region and a reset diffusion region is formed in the semiconductor substrate on an opposite side of the floating diffusion region relative to the photodiode region. The read diffusion region may be electrically connected to the floating diffusion region by a connection line.
摘要:
Image sensors and methods of fabricating the same are provided. The image sensor includes a blocking pattern disposed on photodiodes. The blocking pattern is formed of insulation material having a metal diffusion coefficient which is lower than a silicon oxide diffusion coefficient. Therefore, dark defects of the image sensor are reduced. In addition, the image sensor includes a color-ratio control layer. The color ratio control layer controls color ratios between the sensitivities to blue, green and red. As a result, color distinction of the picture that is embodied by the image sensor can be improved.
摘要:
A thin film deposition reactor including a reactor block on which a wafer is placed, a shower head plate for uniformly maintaining a predetermined pressure by covering the reactor block, a wafer block installed in the reactor block, on which the wafer is to be seated; an exhausting portion connected to the reactor block for exhausting a gas from the reactor block; a first connection line in communication with the shower head plate, through which a first reaction gas and/or inert gas flow, a second connection line in communication with the shower head plate, through which a second reaction gas and/or inert gas flow, and a diffusion plate mounted on a lower surface of the shower head plate. The diffusion plate has a plurality of spray holes which are in communication with the first connection line and face the upper surface of the wafer to spray the first reaction gas and/or inert gas onto the wafer, and a plurality of nozzles which are in communication with the second connection line and extend toward the inner side surface of the reactor block to spray the second reaction gas and/or inert gas toward edges of the wafer.
摘要:
A semiconductor memory device for reducing parasitic bit line capacitance and a method of fabricating the same are provided. The semiconductor memory device includes a conductive pad formed on a semiconductor substrate and a first interlayer insulating layer having a first contact hole that exposes the conductive pad. The first interlayer insulating layer is formed on the conductive pad and the semiconductor substrate. Bit line stacks are formed on the first interlayer insulating layer. Bit line spacers are formed from a combination of materials having different dielectric constants on the sidewalls of the bit line stack to reduce the parasitic bit line capacitance. Preferably, the bit line spacers are stack layers including silicon nitride, silicon oxide, and silicon nitride. A second interlayer insulating layer having a second contact hole is formed on the bit line stack. A conductive plug fills the first and second contact holes. A storage electrode of a capacitor is formed on the conductive plug to be connected to the conductive pad.