公开(公告)号：US06746756B2

公开(公告)日：2004-06-08

申请号：US10345693

申请日：2003-01-16

申请人： Jean-Yves Simon ,  Dao Viet Dung

发明人： Jean-Yves Simon ,  Dao Viet Dung

IPC分类号： B05D306

CPC分类号： E04F15/10 ,  B29C44/06 ,  B29C59/026 ,  B29C2035/0827 ,  B29K2075/00 ,  B29L2031/722 ,  B29L2031/732 ,  D06N3/08 ,  D06N7/001 ,  D06N7/0015 ,  E04F13/18 ,  Y10T428/24479 ,  Y10T428/24496 ,  Y10T428/24512 ,  Y10T428/24612

摘要： Mechanically embossed resilient surface coverings having superior textural fidelity are prepared by mechanically embossing a polyurethane coated floorcovering before the polyurethane is cured. The mechanical embossing is conducted when the polyurethane is dry and the underlying plastic layer and the polyurethane are softened by heating. After the mechanical embossing step, the polyurethane is cured using ultraviolet (UV) light. The product can be cooled before or after UV curing. The invention is applicable to a variety of resilient surface covering products including floor and wall coverings which otherwise have a wearlayer which can be softened by heating. This includes surface coverings having the full range of decorative effects available in the art, including surface coverings which also have been, for example, chemically embossed, mechanically embossed, chemically and mechanically embossed or not embossed at all prior to application of the process of the invention.

摘要翻译： 在聚氨酯固化之前通过机械压花聚氨酯涂覆的地板覆盖物来制备具有优异的纹理保真度的机械压花的弹性表面覆盖物。 当聚氨酯干燥并且下面的塑料层和聚氨酯通过加热软化时进行机械压花。 在机械压花步骤之后，使用紫外线（UV）光固化聚氨酯。 产品可以在紫外线固化之前或之后冷却。 本发明适用于各种弹性表面覆盖产品，包括地板和墙壁覆盖物，否则其具有可通过加热软化的耐磨层。 这包括具有本领域可用的全部装饰效果的表面覆盖物，包括表面覆盖物，其在例如化学压花，机械压花，化学和机械压花之前，或者在施加 发明。

公开(公告)号：US20040007799A1

公开(公告)日：2004-01-15

申请号：US10194411

申请日：2002-07-11

发明人： Byung Jin Choi ,  Mario J. Meissl ,  Sidlagata V. Sreenivasan ,  Michael P.C. Watts

IPC分类号： B29C035/08

CPC分类号： G03F7/0002 ,  B29C35/0888 ,  B29C59/022 ,  B29C59/026 ,  B29C2035/0827 ,  B29C2059/023 ,  B81C1/0046 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  H01L21/0271

摘要： Described are methods for patterning a substrate by imprint lithography. An imprint lithography method includes placing a curable liquid on a substrate. A template may be contacted with the curable liquid. Surface forces at the interface of the curable liquid and the template cause the curable liquid to gather in an area defined by a lower surface of the template. Alternately, the curable liquid may fill one or more relatively shallow recesses in the template and the area under the template lower surface. Activating light is applied to the curable liquid to form a patterned layer on the substrate.

摘要翻译： 描述了通过压印光刻图案化衬底的方法。 压印光刻方法包括将可固化液体放置在基底上。 模板可以与可固化液体接触。 在可固化液体和模板的界面处的表面力使得可固化液体聚集在由模板的下表面限定的区域中。 或者，可固化液体可以填充模板中的一个或多个较浅的凹部和模板下表面下方的区域。 将活化光施加到可固化液体上以在基底上形成图案化层。

公开(公告)号：US20030108718A1

公开(公告)日：2003-06-12

申请号：US10007934

申请日：2001-12-07

发明人： Jean-Yves Simon ,  Dao Viet Dung

IPC分类号： B32B003/30 ,  B29C035/08 ,  B29C044/06 ,  B29C059/02

CPC分类号： E04F15/10 ,  B29C44/06 ,  B29C59/026 ,  B29C2035/0827 ,  B29K2075/00 ,  B29L2031/722 ,  B29L2031/732 ,  D06N3/08 ,  D06N7/001 ,  D06N7/0015 ,  E04F13/18 ,  Y10T428/24479 ,  Y10T428/24496 ,  Y10T428/24512 ,  Y10T428/24612

摘要： Mechanically embossed resilient surface coverings having superior textural fidelity are prepared by mechanically embossing a polyurethane coated floorcovering before the polyurethane is cured. The mechanical embossing is conducted when the polyurethane is dry and the underlying plastic layer and the polyurethane are softened by heating. After the mechanical embossing step, the polyurethane is cured using ultraviolet (UV) light. The product can be cooled before or after UV curing. The invention is applicable to a variety of resilient surface covering products including floor and wall coverings which otherwise have a wearlayer which can be softened by heating. This includes surface coverings having the full range of decorative effects available in the art, including surface coverings which also have been, for example, chemically embossed, mechanically embossed, chemically and mechanically embossed or not embossed at all prior to application of the process of the invention.

公开(公告)号：US20030080472A1

公开(公告)日：2003-05-01

申请号：US10244296

申请日：2002-09-16

发明人： Stephen Y. Chou

IPC分类号： B29C033/60

CPC分类号： B29C43/021 ,  B29C33/62 ,  B29C43/003 ,  B29C43/52 ,  B29C59/022 ,  B29C59/026 ,  B29C2043/025 ,  B29C2043/3211 ,  B29C2043/568 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/7053

摘要： The addition of thin coatings (less than and approaching monomolecular coatings) of persistent release materials comprising preferred compounds of the formula: RELEASE-M(X)n-1-RELEASE-M(X)n-m-1Qm, or RELEASE-M(OR)n-1-, wherein RELEASE is a molecular chain of from 4 to 20 atoms in length, preferably from 6 to 16 atoms in length, which molecule has either polar or nonpolar properties; M is a metal atom, semiconductor atom, or semimetal atom; X is halogen or cyano, especially Cl, F, or Br, Q is hydrogen or alkyl group; m is the number of Q groups; R is hydrogen, alkyl or phenyl, preferably hydrogen or alkyl of 1 to 4 carbon atoms; and; n is the valence null1 of M, and n-m-1 is at least 1 provides good release properties. The coated substrates are particularly good for a lithographic method and apparatus for creating ultra-fine (sub-25 nm) patterns in a thin film coated on a substrate is provided, in which a mold having at least one protruding feature is pressed into a thin film carried on a substrate. The protruding feature in the mold creates a recess of the thin film. The mold is removed from the film. The thin film then is processed such that the thin film in the recess is removed exposing the underlying substrate. Thus, the patterns in the mold is replaced in the thin film, completing the lithography. The patterns in the thin film will be, in subsequent processes, reproduced in the substrate or in another material which is added onto the substrate.

摘要翻译： 持续释放材料的薄涂层（小于和接近单分子涂层）的添加包括优选的下式化合物：RELEASE-M（X）n-1-RELEASE-M（X）nm-1Qm或RELEASE-M（或 ）n-1-，其中RELEASE是长度为4至20个原子，优选6至16个原子长度的分子链，该分子具有极性或非极性; M是金属原子，半导体原子或半金属原子; X是卤素或氰基，特别是Cl，F或Br，Q是氢或烷基; m是Q组的数量; R是氢，烷基或苯基，优选氢或1至4个碳原子的烷基; 和; n是M的价数-1，n-m-1至少为1提供了良好的剥离性质。 涂布的基材特别适用于光刻方法，并且提供了在涂布在基材上的薄膜中产生超细（次25nm）图案的设备，其中具有至少一个突出特征的模具被压入薄 薄膜承载在基板上。 模具中的突出特征产生薄膜的凹部。 模具从薄膜中取出。 然后对薄膜进行处理，使得去除暴露下面的基底的凹槽中的薄膜。 因此，在薄膜中更换模具中的图案，完成光刻。 在随后的工艺中，薄膜中的图案将在衬底中或在添加到衬底上的另一种材料中再现。

公开(公告)号：US06518189B1

公开(公告)日：2003-02-11

申请号：US09430602

申请日：1999-10-29

申请人： Stephen Y. Chou

发明人： Stephen Y. Chou

IPC分类号： H01L21302

CPC分类号： B29C33/60 ,  B29C43/021 ,  B29C43/222 ,  B29C59/022 ,  B29C59/026 ,  B29C2043/023 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/7053 ,  G11B5/855 ,  Y10S977/887

摘要： A method and apparatus for high density nanostructures is provided. The method and apparatus include Nano-compact optical disks, such as nano-compact disks (Nano-CDS). In one embodiment a 400 Gbit/in2 topographical bit density nano-CD with nearly three orders of magnitude higher than commercial CDS has been fabricated using nanoimprint lithography. The reading and wearing of such Nano-CDS have been studied using scanning proximal probe methods. Using a tapping mode, a Nano-CD was read 1000 times without any detectable degradation of the disk or the silicon probe tip. In accelerated wear tests with a contact mode, the damage threshold was found to be 19 &mgr;N. This indicates that in a tapping mode, both the Nano-CD and silicon probe tip should have a lifetime that is at least four orders of magnitude longer than that at the damage threshold.

摘要翻译： 提供了一种用于高密度纳米结构的方法和装置。 该方法和装置包括纳米紧凑型光盘，例如纳米光盘（Nano-CDS）。 在一个实施例中，使用纳米压印光刻技术制造了比商业CDS高近三个数量级的400Gbit / in2地形比特密度纳米CD。 使用扫描近端探针方法研究了这种纳米CDS的阅读和佩戴。 使用敲击模式，Nano-CD读取1000次，没有任何可检测到的光盘劣化或硅探针尖端。 在接触模式的加速磨损试验中，发现损伤阈值为19μN。 这表明在攻丝模式下，纳米CD和硅探针尖端都应该具有比破坏阈值长至少四个数量级的寿命。

公开(公告)号：US20020170668A1

公开(公告)日：2002-11-21

申请号：US10125498

申请日：2002-04-17

申请人： WISCONSIN ALUMNI RESEARCH FOUNDATION

发明人： David J. Beebe ,  Joseph M. Bauer

IPC分类号： C09J005/02

CPC分类号： B29C59/026 ,  B29C59/022 ,  B29C2059/023 ,  Y10S264/44

摘要： A method of fabricating a microstructure is provided. The method includes the step of providing a layer of a polyermizable material. A solid is brought into contact with the layer of polymerizable material so as to alter the shape of the upper surface of the layer. Thereafter, the layer of polymerizable material is polymerized such that the layer solidifies and the upper surface thereof assumes a desired three-dimensional configuration.

摘要翻译： 提供了一种制造微结构的方法。 该方法包括提供多层可熔化材料层的步骤。 使固体与可聚合材料层接触，以改变层的上表面的形状。 此后，聚合材料层使得层固化，并且其上表面呈现所需的三维构型。

公开(公告)号：US06309580B1

公开(公告)日：2001-10-30

申请号：US09107006

申请日：1998-06-30

申请人： Stephen Y. Chou

发明人： Stephen Y. Chou

IPC分类号： H01L1304

CPC分类号： B29C33/60 ,  B29C33/62 ,  B29C43/003 ,  B29C43/021 ,  B29C43/222 ,  B29C43/52 ,  B29C59/022 ,  B29C59/026 ,  B29C2043/023 ,  B29C2043/025 ,  B29C2043/3211 ,  B29C2043/568 ,  B29C2059/023 ,  G03F7/0002 ,  G03F9/7053 ,  Y10S977/887

摘要： The addition of thin coatings (less than and approaching monomolecular coatings) of persistent release materials comprising preferred compounds of the formula: RELEASE-M(X)n−1— RELEASE-M(X)n−m−1 Qm, or RELEASE-M(OR)n−1—, wherein RELEASE is a molecular chain of from 4 to 20 atoms in length, preferably from 6 to 16 atoms in length, which molecule has either polar or non-polar properties; M is a metal atom, semiconductor atom, or semimetal atom; X is halogen or cyano, especially Cl, F, or Br; Q is hydrogen or alkyl group; m is the number of Q groups; R is hydrogen, alkyl or phenyl, preferably hydrogen or alkyl of 1 to 4 carbon atoms; and; n is the valence −1 of M, and n−m−1 is at least 1 provides good release properties. The coated substrates are particularly good for a lithographic method and apparatus for creating ultra-fine (sub-25 nm) patterns in a thin film coated on a substrate is provided, in which a mold having at least one protruding feature is pressed into a thin film carried on a substrate. The protruding feature in the mold creates a recess of the thin film. The mold is removed from the film. The thin film then is processed such that the thin film in the recess is removed exposing the underlying substrate. Thus, the patterns in the mold is replaced in the thin film, completing the lithography. The patterns in the thin film will be, in subsequent processes, reproduced in the substrate or in another material which is added onto the substrate.

摘要翻译： 持续释放材料的薄涂层（小于和接近单分子涂层）的添加包括优选的下式化合物：或RELEASE是长度为4至20个原子，优选6至16个原子长度的分子链，该分子具有 极性或非极性; M是金属原子，半导体原子或半金属原子; X是卤素或氰基，特别是Cl，F或Br; Q是氢或烷基; m是Q基团的数目; R是氢，烷基或苯基，优选氢或1至4个碳原子的烷基; 和n是M的化合价-1，n-m-1至少为1提供了良好的脱模性能。 涂布的基材特别适用于光刻方法，并且提供了在涂布在基材上的薄膜中产生超细（次25nm）图案的设备，其中具有至少一个突出特征的模具被压入薄 薄膜承载在基板上。 模具中的突出特征产生薄膜的凹部。 模具从薄膜中取出。 然后对薄膜进行处理，使得去除暴露下面的基底的凹槽中的薄膜。 因此，在薄膜中更换模具中的图案，完成光刻。 在随后的工艺中，薄膜中的图案将在衬底中或在添加到衬底上的另一种材料中再现。

公开(公告)号：US5834037A

公开(公告)日：1998-11-10

申请号：US772726

申请日：1996-12-23

申请人： Sze Tsang Wu

发明人： Sze Tsang Wu

IPC分类号： B29C33/02 ,  B29C35/02 ,  B29C35/12 ,  B29C59/02 ,  B29C59/16

CPC分类号： B29C33/02 ,  B29C35/12 ,  B29C59/026 ,  B29C2035/0211 ,  B29C2791/001 ,  B29K2995/0021 ,  B29L2031/722 ,  B29L2031/7232 ,  Y10T156/1039 ,  Y10T156/1041 ,  Y10T156/1054

摘要： A method and apparatus for making insignias with a raised design is capable of providing more aesthetic appearance to the insignias thus made. A base material consisting of a base sheet and a surface sheet overlaying the base sheet is prepared for making into an insignia. The base material is coating with a surface coating of decorative material. A bottom mold and an upper mold are used to press the base material to form raised design of patterns. The bottom and upper molds are coupled to a composite heating device including high-frequency induction and electric heating means for applying both high-frequency induction heat and electric heat to the base material while the upper molding is being pressed against the bottom mold. The upper mold is formed with a plurality of edge-defining blades for cutting an edge for the insignia, a plurality of pattern-defining blades for forming a pre-designed pattern on the insignia. During the pressing, the composite heat is concurrently applied to the upper and bottom mold so as to cut and melt away part of the surface sheet to form the pattern. The remnants cut away by the pattern-defining blades can be easily removed by brushes. The final product is an insignia with raised design of patterns with shining appearance.

摘要翻译： 用于制造具有凸起设计的徽章的方法和装置能够为这样制作的徽章提供更美观的外观。 制备由基片和覆盖基片的表面片组成的基材，制成徽章。 基材是用装饰材料的表面涂层涂覆的。 使用底模和上模来按压基材以形成凸起的图案设计。 底模和上模耦合到复合加热装置，该复合加热装置包括高频感应和电加热装置，用于在上模具压靠底模的同时将高频感应热和电热施加到基材。 上模具形成有用于切割徽章的边缘的多个边缘限定刀片，用于在徽章上形成预先设计的图案的多个图案限定刀片。 在压制过程中，将复合热量同时施加到上模和下模上，以切割和熔化部分表面片以形成图案。 由图案定义的刀片切掉的残余物可以通过刷子容易地去除。 最终产品是具有凸起外观设计的徽章。

公开(公告)号：US5676983A

公开(公告)日：1997-10-14

申请号：US739160

申请日：1996-10-30

申请人： Walter Bacher ,  Peter Bley ,  Michael Harmening

发明人： Walter Bacher ,  Peter Bley ,  Michael Harmening

IPC分类号： B29C33/42 ,  B29C59/02 ,  B81B1/00 ,  C25D1/10 ,  B29C43/36

CPC分类号： C25D1/10 ,  B29C59/022 ,  B29C59/026 ,  B81C99/009 ,  B29C2059/023

摘要： For a process of making a microstructured plastic mold from which structures can be formed galvanically, a compound layer, including an electrically conductive and an insulating layer portion, is provided and is heated and impressed into the insulating layer portion, a tool is provided which has microstructured bodies disposed thereon of a height corresponding at least to the thickness of the insulating layer portion and with rough from surfaces having points and ridges adapted to penetrate the electrically insulating layer thereby to expose the electrically insulating layer at the bottom of the cavities formed by microstructured bodies.

摘要翻译： 对于可以电气地形成结构的微结构化塑料模具的制造方法，提供包含导电绝缘层部分的化合物层，并将其加热并印刷到绝缘层部分中，提供具有 其上设置有至少对应于绝缘层部分的厚度的高度的微结构体，并且具有适于穿透电绝缘层的点和脊的表面的粗糙度，从而暴露由微结构化形成的空腔底部的电绝缘层 身体。

公开(公告)号：US5334135A

公开(公告)日：1994-08-02

申请号：US18004

申请日：1993-02-16

申请人： Tracy E. Grim ,  Alec D. Bobroff

发明人： Tracy E. Grim ,  Alec D. Bobroff

IPC分类号： A61F5/01 ,  A61F5/02 ,  B29C44/04 ,  B29C59/02 ,  A61F5/00

CPC分类号： B29C44/0446 ,  A61F5/0102 ,  A61F5/0106 ,  A61F5/0111 ,  A61F5/012 ,  A61F5/0123 ,  A61F5/028 ,  B29C59/026 ,  A61F2005/0176 ,  B29K2105/04 ,  B29L2031/753

摘要： An orthopaedic support includes a sheet of foam material that has been compression molded in specific areas. These areas have a thickness and density that is different from other areas of the support and serve to better fit the support to the body. The support may include compression molded grooves or cavities to accommodate straps, struts, gel-filled pads, inflatable bladders, pumps, and other accessories. The support may be compression molded into a shape that conforms to the general contour of the part of the human anatomy that it supports. The support may also include compression molded grooves that reduce bunching when the support is bent, and may include molded edges to minimize skin irritation during activity.

摘要翻译： 矫形支架包括已在特定区域压缩成型的泡沫材料片。 这些区域的厚度和密度与支撑体的其他区域不同，并且用于更好地将支撑件适合身体。 支撑件可以包括压缩模制的凹槽或空腔以适应带子，支柱，凝胶填充的垫，可充气囊，泵和其它附件。 支撑件可以被压缩成符合其支撑的人体解剖结构部分的一般轮廓的形状。 支撑件还可以包括当支撑件弯曲时减少聚束的压缩模制凹槽，并且可以包括模制边缘以最小化活动期间的皮肤刺激。