公开(公告)号：US20130128256A1

公开(公告)日：2013-05-23

申请号：US13692865

申请日：2012-12-03

Applicant: Joeri LOF ,  Joannes Theodoor De Smit ,  Roelof Aeilko Siebrand Ritsema ,  Klaus Simon ,  Theodorus Marinus Modderman ,  Johannes Catharinus Hubertus Mulkens ,  Hendricus Johannes Maria Meijer ,  Erik Roelof Loopstra

Inventor： Joeri LOF ,  Joannes Theodoor De Smit ,  Roelof Aeilko Siebrand Ritsema ,  Klaus Simon ,  Theodorus Marinus Modderman ,  Johannes Catharinus Hubertus Mulkens ,  Hendricus Johannes Maria Meijer ,  Erik Roelof Loopstra

IPC: G03F9/00

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7003 ,  G03F9/7034 ,  G03F9/7088

Abstract: A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.

Abstract translation: 在测量站产生衬底表面的图。 然后将衬底移动到投影透镜和衬底之间的空间被液体填充到的位置。 然后使用例如透射图像传感器对衬底进行对准，并且使用先前的映射可以准确地暴露衬底。 因此，映射不会发生在液体环境中。

公开(公告)号：US20130044307A1

公开(公告)日：2013-02-21

申请号：US13658451

申请日：2012-10-23

Applicant: NIKON CORPORATION

Inventor： Yuichi SHIBAZAKI

IPC: G03B27/58

CPC classification number: G03F7/70716 ,  G03F7/707 ,  G03F7/70775

Abstract: A drive system drives a movable body, based on measurement results of a first measurement system which measures the position of the movable body in an XY plane by irradiating a measurement beam from an arm member on a grating placed on a surface parallel to the XY plane of the movable body. In this case, because a configuration in which the arm member irradiates a measurement beam on the grating is employed, there is no adverse effect due to the drive of the moving body, unlike the case when an encoder system is arranged on a stage surface plate. Accordingly, it becomes possible to drive the movable body with good precision.

Abstract translation: 驱动系统基于第一测量系统的测量结果来驱动移动体，第一测量系统通过从位于平行于XY平面的表面上的来自臂构件的测量光束照射测量可移动体在XY平面中的位置 的移动体。 在这种情况下，由于采用臂部件对光栅照射测量光束的结构，与编码器系统配置在台面板上的情况不同，不会由于移动体的驱动而产生不利影响 。 因此，能够高精度地驱动移动体。

公开(公告)号：US08368870B2

公开(公告)日：2013-02-05

申请号：US11629987

申请日：2005-06-21

Applicant: Makoto Shibuta

Inventor： Makoto Shibuta

IPC: G03B27/58 ,  G03B27/52

CPC classification number: G03F7/70716 ,  G03F7/2041 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70866

Abstract: An exposure apparatus that can prevent disadvantages due to a leaked liquid is provided. The exposure apparatus includes: a substrate holder (PH) that includes a peripheral wall portion (33) and supporting portions (34) located on an inside of the peripheral wall portion (33) and that supports a substrate (P) with the supporting portions (34) by negatively pressurizing a space (31) surrounded by the peripheral wall portion (33); and a recovery mechanism that includes a collection inlets (61) provided on the inside of the peripheral wall portion (33) and a vacuum system (63) connected to the collection inlets (61), in which a liquid penetrated from an outer periphery of the substrate (P) is sucked and recovered, in the state with an upper surface (33A) of the peripheral wall portion (33) and a back surface (Pb) of the substrate (P) being spaced at a first distance.

Abstract translation: 提供了可以防止由于泄漏的液体引起的缺点的曝光装置。 曝光装置包括：衬底保持器（PH），其包括周壁部分（33）和位于周壁部分（33）内侧的支撑部分（34），并且支撑部分 （34）通过对由所述周壁部（33）包围的空间（31）进行负压; 以及回收机构，其包括设置在所述周壁部33的内部的收集入口61和与所述收集入口61连接的真空系统63， 在周壁部33的上表面33A和基板P的背面（Pb）以第一距离隔开的状态下，将基板（P）吸引回收。

公开(公告)号：US08366872B2

公开(公告)日：2013-02-05

申请号：US13161185

申请日：2011-06-15

Applicant: Kenji Tsutsumi ,  Junichi Kitano ,  Osamu Miyahara ,  Hideharu Kyouda

Inventor： Kenji Tsutsumi ,  Junichi Kitano ,  Osamu Miyahara ,  Hideharu Kyouda

IPC: C23F1/02

CPC classification number: C23C26/00 ,  G03F1/80 ,  G03F7/707 ,  G03F7/70916 ,  H01L21/308 ,  H01L21/6708 ,  H01L21/6715 ,  H01L21/67178 ,  H01L21/67225 ,  H01L21/67742 ,  H01L21/67745 ,  H01L21/68707

Abstract: According to the present invention, during the photolithography processing of a substrate, exposure processing is performed immediately after removal of a coating film on the rear surface of the substrate, and a coating film is formed on the rear surface of the substrate immediately after the exposure processing. Thereafter, etching treatment and so on are performed, and a series of these treatment and processing steps are performed a predetermined number of times. The coating film has been formed on the rear surface of the substrate at the time for the etching treatment, so that even if the coating film gets minute scratches, the rear surface of the substrate itself is protected by the coating film and thus never scratched. Further, since the coating film on the rear surface of the substrate is removed immediately before the exposure processing, the rear surface of the substrate can be flat for the exposure processing.

Abstract translation: 根据本发明，在基板的光刻处理中，在除去基板背面的涂膜后立即进行曝光处理，在曝光后立即在基板的背面形成涂膜 处理。 此后，进行蚀刻处理等，并且进行一系列这些处理和处理步骤预定次数。 在蚀刻处理时，已经在基板的背面形成了涂膜，使得即使涂膜受到微小的划痕，基板本身的后表面也被涂膜保护，因此不会被刮伤。 此外，由于在曝光处理之前立即除去基板后表面上的涂膜，所以基板的后表面可以是平坦的，用于曝光处理。

公开(公告)号：US08330940B2

公开(公告)日：2012-12-11

申请号：US12580082

申请日：2009-10-15

Applicant: Dirk-Jan Bijvoet

Inventor： Dirk-Jan Bijvoet

IPC: G03B27/62 ,  G03B27/32 ,  G03B27/42 ,  G03B27/58

CPC classification number: G03B27/58 ,  G03F7/707 ,  G03F7/70783 ,  G03F7/7085

Abstract: A lithographic apparatus includes a support configured to support a patterning device, the patterning device configured to pattern a beam of radiation to form a patterned beam of radiation; a positioning device configured to move the support in a first direction; a measurement device configured to measure a relative position of the patterning device with respect to the support and to generate a measuring signal, the measurement device including a reference unit constructed and arranged to be coupled to the patterning device at a fixed relative position, and a position sensor configured to measure the position of the reference unit with respect to the support, wherein the positioning device is constructed and arranged to correct a position of the support based on the measuring signal.

Abstract translation: 光刻设备包括被配置为支撑图案形成装置的支撑件，所述图案形成装置被配置为对辐射束进行图案化以形成图案化的辐射束; 定位装置，其构造成沿着第一方向移动所述支撑件; 测量装置，其被配置为测量图案形成装置相对于支撑件的相对位置并产生测量信号，所述测量装置包括参考单元，所述参考单元构造和布置成在固定的相对位置处联接到图案形成装置，以及 位置传感器被配置为测量参考单元相对于支撑件的位置，其中定位装置被构造和布置成基于测量信号校正支撑件的位置。

公开(公告)号：US08264670B2

公开(公告)日：2012-09-11

申请号：US11343219

申请日：2006-01-31

Applicant: Erik Roelof Loopstra ,  Bernardus Antonius Johannes Luttikhuis ,  Harmen Klaas Van Der Schoot ,  Fransicus Mathijs Jacobs

Inventor： Erik Roelof Loopstra ,  Bernardus Antonius Johannes Luttikhuis ,  Harmen Klaas Van Der Schoot ,  Fransicus Mathijs Jacobs

IPC: G03B27/62

CPC classification number: G03F7/707

Abstract: The invention provides a lithographic apparatus including an illumination system configured to condition a radiation beam, a patterning device support constructed to support a transmissive patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the patterning device support is configured to hold a patterning device and wherein the lithographic apparatus includes a clamping device, the clamping device being configured to clamp the patterning device at the top side.

Abstract translation: 本发明提供一种光刻设备，其包括配置成调节辐射束的照明系统，构造成支撑透射式图案形成装置的图案形成装置支撑件，所述图案形成装置能够在其横截面上赋予辐射束图案以形成 图案化的辐射束，构造成保持衬底的衬底台，以及被配置为将图案化的辐射束投影到衬底的目标部分上的投影系统，其中，图案形成装置支撑件构造成保持图案形成装置，并且其中光刻装置包括 夹持装置，夹持装置构造成将图案形成装置夹在顶侧。

公开(公告)号：US08253929B2

公开(公告)日：2012-08-28

申请号：US12153772

申请日：2008-05-23

Applicant: Yuichi Shibazaki

Inventor： Yuichi Shibazaki

IPC: G03B27/32 ,  G03B27/58 ,  G03B27/62

CPC classification number: G03F7/707

Abstract: A stage apparatus including: a movement member movable with a plate member placed on a placement surface; and a fixing apparatus that fixes said plate member to said placement surface in parallel with said movement member passing through a prescribed first region.

Abstract translation: 一种舞台装置，包括：可移动的移动构件，其具有放置在放置表面上的板构件; 以及定影装置，其将所述板构件平行于通过规定的第一区域的所述移动构件固定在所述放置面上。

公开(公告)号：US08243259B2

公开(公告)日：2012-08-14

申请号：US12486458

申请日：2009-06-17

Applicant: Vitally Prosyentsov ,  Sanjaysingh Lalbahadoersing ,  Sami Musa ,  Hyun-Woo Lee

Inventor： Vitally Prosyentsov ,  Sanjaysingh Lalbahadoersing ,  Sami Musa ,  Hyun-Woo Lee

IPC: G01B11/00 ,  G03B27/42 ,  G03B27/54 ,  G03B27/58 ,  G03B27/74

CPC classification number: G03B27/52 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/7085

Abstract: A substrate stage for an immersion type lithographic apparatus is arranged to project a patterned radiation beam from a patterning device onto a substrate, the substrate stage being constructed to hold the substrate and including at least a sensor for sensing the patterned radiation beam, the sensor including an at least partially transmissive layer having a front side facing the incoming radiation beam and a back side opposite the front side, wherein the back side is provided with at least a sensor mark to be subjected to the radiation beam transmitted through the layer.

Abstract translation: 用于浸入式光刻设备的衬底台被布置成将来自图案形成装置的图案化辐射束投影到衬底上，衬底台被构造成保持衬底并且至少包括用于感测图案化辐射束的传感器，传感器包括 至少部分透射层，其具有面向所述入射辐射束的前侧和与所述前侧相对的后侧，其中，所述后侧设置有至少一个传感器标记，所述传感器标记经受穿过所述层的辐射束。

公开(公告)号：US08208120B2

公开(公告)日：2012-06-26

申请号：US12078997

申请日：2008-04-09

Applicant: Joeri Lof ,  Antonius Theodorus Anna Maria Derksen ,  Christiaan Alexander Hoogendam ,  Aleksey Kolesnychenko ,  Erik Roelof Loopstra ,  Theodorus Marinus Modderman ,  Johannes Catharinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen ,  Sjoerd Nicolaas Lambertus Donders

Inventor： Joeri Lof ,  Antonius Theodorus Anna Maria Derksen ,  Christiaan Alexander Hoogendam ,  Aleksey Kolesnychenko ,  Erik Roelof Loopstra ,  Theodorus Marinus Modderman ,  Johannes Catharinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen ,  Sjoerd Nicolaas Lambertus Donders

IPC: G03B27/42

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7088

Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space.

Abstract translation: 在光刻投影装置中，结构围绕投影系统与光刻投影装置的基板台之间的空间。 在结构和衬底的表面之间使用气体以在空间中容纳液体。

公开(公告)号：US08208117B2

公开(公告)日：2012-06-26

申请号：US12232063

申请日：2008-09-10

Applicant: Soichi Owa ,  Nobutaka Magome ,  Shigeru Hirukawa ,  Yoshihiko Kudo ,  Jiro Inoue ,  Hirotaka Kohno ,  Masahiro Nei ,  Motokatsu Imai ,  Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Yasufumi Nishii ,  Hiroaki Takaiwa

Inventor： Soichi Owa ,  Nobutaka Magome ,  Shigeru Hirukawa ,  Yoshihiko Kudo ,  Jiro Inoue ,  Hirotaka Kohno ,  Masahiro Nei ,  Motokatsu Imai ,  Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Yasufumi Nishii ,  Hiroaki Takaiwa

IPC: G03B27/52 ,  G03B27/42 ,  G03B27/58 ,  G03B27/54 ,  G03B27/60

CPC classification number: G03F7/70341 ,  G03B27/58 ,  G03F7/2041 ,  G03F7/707 ,  G03F7/70716

Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

Abstract translation: 曝光装置通过液体将图案图像投影到基板上来曝光基板。 曝光装置包括投影光学系统，通过该投影光学系统将图案图像投射到基板上，以及可移动部件，其相对于投影光学系统可移动。 至少其一部分表面为疏液性的防液构件可拆卸地设置在可动件上，该防液构件与该基板不同。