摘要:
The present invention provides nonvolatile semiconductor memory devices and methods for manufacturing thereof, which provide inhibiting the shortcutting of the channel due to the creation of the bird's beak to promote the manufacturing of the devices with higher-density or higher-integration, lowering the operation voltage and improving the characteristics of maintaining the electric charge, without complicating the manufacturing process. Immediately after forming an ONO films 3 comprising a first silicon oxide film 3a, a second silicon nitride film 3b and a third silicon oxide film 3c on a silicon substrate 1, a silicon layer 4 is formed, and then, arsenic ions are implanted over the silicon layer 4 and/or ONO films 3 to form a bit line, and a second electrical conductive layer 7 is deposited while remaining the silicon layer 4 to form a word line comprising a dual layer structure of two electrical conductive layers. This inhibits the generation of the bird's beak to liberalize the limitation to the miniaturization due to the effect of the shortcutting of the channel, and prevents the deterioration of the characteristic for maintaining electric charge. Further, the interface between the ONO films 3 and the silicon layer 4 is stabilized by having a configuration of remaining a portion of the silicon layer 4 in the channel region.
摘要:
The bottom side of an N type silicon substrate is connected to a power supply terminal, a second P type epitaxial layer is formed on all sides of the N type silicon substrate, and a device forming portion is provided on the second P type epitaxial layer. A first P type epitaxial layer and an interlayer insulating film are provided on the device forming portion and an N well and a P well are formed on the top surface of the first P type epitaxial layer. The second P type epitaxial layer is connected to a ground terminal via the first P type epitaxial layer, the P well, a pnull diffusion region, a via and a wire. Accordingly, a pn junction is formed at the interface between the second P type epitaxial layer and the N type silicon substrate.
摘要:
A package is formed by mounting a plurality of semiconductor chips 6 and 7 on a substrate 1, arranging a heat spreader 13 on a resin surface opposite to a surface where pads 8 for the semiconductor chips are formed, via a curved intermediate plate 11 made of a metal, and filling with resin 14. The curved intermediate plate 11 is formed so as to easily bend in order to compensate the semiconductor chips 6 and 7 for the height difference relative to the heat spreader 13, and has a plurality of bumps 12 on the surface thereof in order to allow contact with the semiconductor chips by multipoint.
摘要:
In a flip-chip type semiconductor device, a plurality of pad electrodes are formed on a semiconductor substrate. An insulating stress-absorbing resin layer made of thermosetting resin is formed on the semiconductor substrate and has openings corresponding to the pad electrodes. A plurality of flexible conductive members are filled in the openings. A plurality of metal bumps are formed on the flexible conductive layers.
摘要:
A system including sub-networks mounted with different kinds of protocols/profiles, a gate way/proxy for connecting the sub-networks, a gate way/proxy for connecting the sub-networks, and nodes on the sub-networks, the gateway/proxy being mounted with processing of a physical layer and a data link layer as a protocol of the sub-network and processing of a physical layer and a data link layer as a protocol of the sub-network and having a common transport layer and a service proxy and a client proxy shared by the sub-networks.
摘要:
In an output buffer apparatus including a main-buffer circuit including a plurality of first transistors each connected between a first power supply terminal and an output terminal and a plurality of second transistors each connected between a second power supply terminal and the output terminal, and a pre-buffer circuit including a plurality of first pre-drivers each driving one of the first transistors in accordance with a data signal and a plurality of second pre-drivers each driving one of the second transistors in accordance with the data signal, a plurality of first sequential circuits are provided for receiving first impedance adjusting signals in synchronization with the data signal to turn ON the first pre-drivers, and a plurality of second sequential circuits are provided for receiving second impedance adjusting signals in synchronization with the data signal to turn ON the second pre-drivers.
摘要:
A temperature measuring sensor is incorporated in a substrate of a semiconductor device to measure a temperature of the substrate. The sensor has a diode formed in the substrate, and a resistor formed in the substrate and connected to the diode in series. When a first forward constant current is supplied to the diode through the resistor, a potential difference VA1 is produced between terminal ends of both the diode and the resistor connected in series, and a potential difference VF1 is produced between terminal ends of the diode. When a second forward constant current is supplied to the diode through the resistor, a potential difference VA2 is produced between the terminal ends of both the diode and the resistor connected in series, and a potential difference VF2 is produced between the terminal ends of the diode. A real temperature T of the substrate is calculated by the following formula: Tnull(q/k)(VF1nullVF2)null1/nullln((VA1nullVF1)/(VA2nullVF2))nullnullherein: T is an absolute temperature, k is Boltzmann's constant, and q is an electron charge.
摘要:
A semiconductor memory device includes a first insulating film provided on a semiconductor substrate between first and second diffusion regions, a first gate electrode provided on the first insulating film, a second insulating film provided on the semiconductor substrate between the second diffusion region and a third diffusion region, and a second gate electrode provided on the second insulating film are included, wherein the first and second diffusion regions, first insulating film, and first gate electrode constitute a first memory cell, while the second and third diffusion regions, second insulating film, and second gate electrode constitute a second memory cell. The first and second gate electrodes are connected in common to form a word line electrode. The first and third diffusion regions are connected to first and second read bit lines disposed on a layer overlying the semiconductor substrate. The second diffusion region is connected to a program and erase bit line disposed on a layer overlying the semiconductor substrate. Programming is performed to a selected memory cell transistor by hot electron injection, while erasing from the selected memory cell is performed by the hot hole injection.
摘要:
A register file includes a plurality of registers for storing therein data, a plurality of input ports for receiving therethrough the data to be stored in the registers, and a plurality of output ports for delivering therethrough the data stored in the registers. Each register includes an input port selector for selecting one of the write ports through which data is received. The register file also includes a read data selector block for specifying which data stored in the registers is to be read through one of the output ports. The output port selector is implemented by a combinational circuit which saves power dissipation of the register file.
摘要:
From the data of diffusion-length-dependent parameters extracted from the parameters of the transistor model of MOS transistors and from the parameters of transistors having various diffusion lengths, a diffusion-length-dependent parameter correcting unit creates approximate expressions of the diffusion length dependence of these parameters, and calculates parameter correction values to be used instead of original parameter values by using the created approximate expressions. Hence, the correction values can be used easily instead of the original parameter values, whereby a transistor model of MOS transistors having a different diffusion length DL can be created easily. Circuit simulation in consideration of the diffusion length dependence of the drain currents of MOS transistors can thus be carried out, whereby highly accurate simulation can be attained.