公开(公告)号：US20110126406A1

公开(公告)日：2011-06-02

申请号：US13020399

申请日：2011-02-03

申请人： Hubert Adriaan VAN MIERLO ,  Erik Leonardus Ham ,  Hendricus Johannes Maria Meijer ,  Hendrik Antony Johannes Neerhof ,  Joost Jeroen Ottens ,  Johannes Adrianus Petrus Leijtens ,  Marco Le Kluse ,  Jan Hopman ,  Johannes Hubertus Josephina Moors

发明人： Hubert Adriaan VAN MIERLO ,  Erik Leonardus Ham ,  Hendricus Johannes Maria Meijer ,  Hendrik Antony Johannes Neerhof ,  Joost Jeroen Ottens ,  Johannes Adrianus Petrus Leijtens ,  Marco Le Kluse ,  Jan Hopman ,  Johannes Hubertus Josephina Moors

IPC分类号： H01B13/00

CPC分类号： H01L21/6831 ,  G03F7/70708 ,  Y10T29/49117

摘要： The invention relates to a method of manufacturing an electrostatic clamp configured to electrostatically clamp an article to an article support in a lithographic apparatus. The method includes providing a first layer of material, etching a recess in the first layer of material, and disposing an electrode in the recess of the first layer of material.

摘要翻译： 本发明涉及一种制造静电夹具的方法，所述静电夹具被配置为将制品静电地夹持在光刻设备中的制品支撑件上。 该方法包括提供第一层材料，蚀刻第一层材料中的凹槽，以及将电极设置在第一层材料的凹槽中。

公开(公告)号：US20110090495A1

公开(公告)日：2011-04-21

申请号：US12935786

申请日：2009-03-27

申请人： Anastasius Jacobus Anicetus Bruinsma ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Abraham Veefkind ,  Peter Gerhardus Wilhelmu Bussink ,  Egbert Anne Martijn Brouwer

发明人： Anastasius Jacobus Anicetus Bruinsma ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Abraham Veefkind ,  Peter Gerhardus Wilhelmu Bussink ,  Egbert Anne Martijn Brouwer

IPC分类号： G01N21/17

CPC分类号： G03F7/70916 ,  G01N21/94 ,  G03F7/70525 ,  G03F7/70566 ,  G03F7/70591 ,  G03F7/70808 ,  G03F7/7085 ,  G03F7/70941

摘要： A lithographic apparatus includes a vessel that encloses a component with a test surface to be probed for contamination control; and an optical probe configured to transmit and receive an optical probing beam. The vessel includes a first optical port configured to transfer the optical probing beam towards the test surface, and a second optical port configured to receive a reflected optical probing beam. The optical probe includes a light source configured to provide the optical probing beam, a polarization conditioner configured to provide a predefined polarization state to the probing beam, and a spectral analyzer. The polarization conditioner is preset to provide a minimal transmission for a minimal transmission wavelength, and the spectral analyzer is arranged to detect a wavelength shift of the minimal transmission wavelength in response to a polarization change due to the presence of contamination.

摘要翻译： 光刻设备包括：容器，其包围具有待探测以用于污染控制的测试表面的部件; 以及被配置为发送和接收光学探测光束的光学探针。 该容器包括被配置为将光学探测光束传送到测试表面的第一光学端口和被配置为接收反射光学探测光束的第二光学端口。 光探头包括被配置为提供光学探测光束的光源，被配置为向探测光束提供预定极化状态的偏振光学调节器和光谱分析器。 偏振调节器被预设为为最小传输波长提供最小的传输，并且频谱分析仪布置成响应于由于污染的存在而导致的偏振变化来检测最小传输波长的波长偏移。

公开(公告)号：US20110013157A1

公开(公告)日：2011-01-20

申请号：US12735823

申请日：2009-02-19

申请人： Johannes Hubertus Josephina Moors ,  Norbertus Benedictus Koster ,  Erik Roelof Loopstra ,  Martin Frans Pierre Smeets ,  Antonius Theodorus Wilhelmus Kempen

发明人： Johannes Hubertus Josephina Moors ,  Norbertus Benedictus Koster ,  Erik Roelof Loopstra ,  Martin Frans Pierre Smeets ,  Antonius Theodorus Wilhelmus Kempen

IPC分类号： G03B27/32 ,  H01F7/02

CPC分类号： G03F7/70933 ,  G03F7/70808 ,  G03F7/70858 ,  G03F7/70916

摘要： A lithographic apparatus includes a magnet being contained in a protective enclosure, the protective enclosure being arranged to protect the magnet from contact with a H2-containing or H-atom containing gas. The enclosure may further contain a hydrogen getter, such as a magnet-surface modifying gas, or a non-hydrogen containing gas. A non-hydrogen containing gas flow may be provided or a non-hydrogen getter gas flow may be provided through at least part of the protective enclosure.

摘要翻译： 光刻设备包括容纳在保护壳体中的磁体，保护壳体被布置成保护磁体免受含H2或含H原子气体的接触。 外壳还可以包含氢气吸气剂，例如磁体表面改性气体或非含氢气体。 可以提供不含氢的气流，或者可以通过保护外壳的至少一部分提供非氢吸气剂气流。

公开(公告)号：US07714306B2

公开(公告)日：2010-05-11

申请号：US11512432

申请日：2006-08-30

申请人： Johannes Hubertus Josephina Moors ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

发明人： Johannes Hubertus Josephina Moors ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

IPC分类号： G21K5/10

CPC分类号： G03F7/70916 ,  G03F7/70983

摘要： A lithographic apparatus includes a radiation source configured to emit radiation to form a radiation beam, the radiation being of a type which can create plasma in a low pressure environment in the apparatus, and an optical component configured to condition the radiation beam, impart the conditioned radiation beam with a pattern in its cross-section to form a patterned radiation beam, project the patterned radiation beam onto a target portion of a substrate, and/or to detect radiation. The optical component is provided with a plasma quenching structure, the plasma quenching structure being configured to provide electron-ion recombination in, on and/or near the optical component.

摘要翻译： 光刻设备包括被配置为发射辐射以形成辐射束的辐射源，该辐射是能够在该设备中的低压环境中产生等离子体的类型，以及被配置为调节辐射束的光学部件， 辐射束在其横截面上具有图案以形成图案化的辐射束，将图案化的辐射束投影到衬底的目标部分上和/或检测辐射。 光学部件设置有等离子体淬火结构，等离子体淬火结构被配置为在光学部件的内部和/或附近提供电子 - 离子复合。

公开(公告)号：US20100085547A1

公开(公告)日：2010-04-08

申请号：US12566060

申请日：2009-09-24

申请人： Dzmitry Labetski ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Gerardus Hubertus Petrus Maria Swinkels

发明人： Dzmitry Labetski ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Gerardus Hubertus Petrus Maria Swinkels

IPC分类号： B41F3/30 ,  A61N5/06

CPC分类号： H05G2/001 ,  H05G2/003

摘要： A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a fuel supply configured to supply a fuel to a plasma formation site; a laser configured to emit a beam of radiation to the plasma formation site so that a plasma that emits extreme ultraviolet radiation is generated when the beam of radiation impacts the fuel; a fuel particulate interceptor constructed and arranged to shield at least part of the radiation source from fuel particulates that are emitted by the plasma, the fuel particulate interceptor comprising a first portion and a second portion, the second portion being positioned closer to the plasma formation site than the first portion, and the first portion being rotatable; and a fuel particulate remover constructed and arranged to remove fuel particulates from a surface of the fuel particulate interceptor and to direct the fuel particulates towards a collection location.

摘要翻译： 辐射源被配置成产生极紫外辐射。 辐射源包括构造成将燃料供应到等离子体形成位置的燃料供应; 激光器被配置为向等离子体形成位置发射辐射束，使得当辐射束影响燃料时产生发射极紫外辐射的等离子体; 燃料颗粒拦截器，其被构造和布置成将辐射源的至少一部分屏蔽在由等离子体发射的燃料颗粒中，所述燃料颗粒拦截器包括第一部分和第二部分，所述第二部分位于更靠近等离子体形成位置 并且所述第一部分可旋转; 以及构造和布置成从燃料颗粒拦截器的表面去除燃料颗粒并将燃料颗粒引导到收集位置的燃料颗粒去除器。

公开(公告)号：US07515245B2

公开(公告)日：2009-04-07

申请号：US10942102

申请日：2004-09-16

申请人： Johannes Hubertus Josephina Moors ,  Vadim Yevgenyevich Banine

发明人： Johannes Hubertus Josephina Moors ,  Vadim Yevgenyevich Banine

IPC分类号： G03B27/32 ,  G03B27/42

CPC分类号： G03F7/70916

摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system for providing a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to impart the projection beam with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, an infrared radiation source for providing infrared radiation into a measurement zone within the lithographic apparatus, and a detector for receiving the infrared radiation from the infrared radiation source after having passed through the measurement zone, and for outputting a signal indicative of the presence of a gas present within the measurement zone.

摘要翻译： 公开了一种光刻设备。 该装置包括用于提供辐射束的照明系统和用于支撑图案形成装置的支撑结构。 图案形成装置用于使投影光束在其横截面上具有图案。 该装置还包括用于保持基板的基板台，用于将图案化的光束投影到基板的目标部分上的投影系统，用于将红外辐射提供到光刻设备内的测量区域的红外辐射源，以及用于接收 来自红外线辐射源的红外辐射在经过测量区域之后，并且用于输出指示存在于测量区域内的气体的信号。

公开(公告)号：US07485881B2

公开(公告)日：2009-02-03

申请号：US11319199

申请日：2005-12-28

申请人： Arnoud Cornelis Wassink ,  Levinus Pieter Bakker ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans

发明人： Arnoud Cornelis Wassink ,  Levinus Pieter Bakker ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans

IPC分类号： G02B5/08 ,  G03B27/54 ,  G21G5/00

CPC分类号： G03F7/70916

摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, a projection system configured to project the radiation beam onto a substrate, and a filter system for filtering debris particles out of the radiation beam. The filter system includes a plurality of foils for trapping the debris particles, a support for holding the plurality of foils, and a cooling system having a surface that is arranged to be cooled. The cooling system and the support are positioned with respect to each other such that a gap is formed between the surface of the cooling system and the support. The cooling system is further arranged to inject gas into the gap.

摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统，配置成将辐射束投影到衬底上的投影系统，以及用于将碎屑颗粒从辐射束中过滤的过滤系统。 过滤器系统包括用于捕集碎片颗粒的多个箔，用于保持多个箔的支撑件，以及具有布置成要冷却的表面的冷却系统。 冷却系统和支撑件相对于彼此定位，使得在冷却系统的表面和支撑件之间形成间隙。 冷却系统还被布置成将气体注入到间隙中。

公开(公告)号：US07473908B2

公开(公告)日：2009-01-06

申请号：US11486386

申请日：2006-07-14

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Wouter Anton Soer

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Wouter Anton Soer

IPC分类号： A61N5/00 ,  A61N5/06 ,  G21G5/00 ,  G01J3/10 ,  H05G2/00

CPC分类号： G03F7/70925 ,  G03F7/70916

摘要： A lithographic apparatus includes a radiation source and an object with a first surface which is configured to retain metal contaminants. This surface has the function of a getter. The first surface is arranged substantially outside the region traversed by the radiation beam generated by the radiation source during lithographic processing. The first surface may further be used to retain volatile contaminants generated in a cleaning method.

摘要翻译： 光刻设备包括辐射源和具有构造成保持金属污染物的第一表面的物体。 该表面具有吸气剂的功能。 在光刻处理期间，第一表面基本上布置在由辐射源产生的辐射束穿过的区域的外侧。 第一表面可以进一步用于保持在清洁方法中产生的挥发性污染物。

公开(公告)号：US07372623B2

公开(公告)日：2008-05-13

申请号：US11091923

申请日：2005-03-29

申请人： Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Leonid Shmaenok ,  Nikolay Salashchenko

发明人： Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Leonid Shmaenok ,  Nikolay Salashchenko

IPC分类号： G02B5/20

CPC分类号： G03F7/70916 ,  G03F7/70191 ,  G03F7/70308 ,  G03F7/70575 ,  G03F7/70941

摘要： A multi-layered spectral purity filter improves the spectral purity of extreme ultra-violet (EUV) radiation and also collects debris emitted from a radiation source.

摘要翻译： 多层光谱纯度过滤器提高了极紫外（EUV）辐射的光谱纯度，并且还收集了辐射源发射的碎屑。

公开(公告)号：US07251012B2

公开(公告)日：2007-07-31

申请号：US10748851

申请日：2003-12-31

申请人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Vladimir Vitalevitch Ivanov ,  Johannes Hubertus Josephina Moors ,  Givi Georgievitch Zukavishvili ,  Abraham Veefkind

发明人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Vladimir Vitalevitch Ivanov ,  Johannes Hubertus Josephina Moors ,  Givi Georgievitch Zukavishvili ,  Abraham Veefkind

IPC分类号： G03B27/52 ,  G03B27/54

CPC分类号： G03F7/70916 ,  G03F7/70983

摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, and a debris-mitigation system that mitigates debris particles which are formed during use of at least a part of the lithographic apparatus. The debris-mitigation system is arranged to apply a magnetic field so that at least charged debris particles are mitigated.

摘要翻译： 公开了一种光刻设备。 该装置包括提供辐射束的照明系统和支撑图形结构的支撑结构。 图案形成结构被配置为在其横截面中赋予辐射束图案。 该装置还包括支撑基板的基板支撑件，将图案化的光束投影到基板的目标部分上的投影系统，以及减轻碎片颗粒的碎片减轻系统，该碎片减小系统在使用期间形成的碎屑颗粒的至少一部分 光刻设备 碎片减轻系统被布置成施加磁场，使得至少带电的碎屑颗粒被减轻。