公开(公告)号：US07172839B2

公开(公告)日：2007-02-06

申请号：US10721522

申请日：2003-11-24

Applicant: Yasuhiko Sugiyama ,  Junichi Tashiro ,  Anto Yasaka

Inventor： Yasuhiko Sugiyama ,  Junichi Tashiro ,  Anto Yasaka

IPC: G03F9/00 ,  C03C15/00 ,  G01L21/30

CPC classification number: G03F1/74

Abstract: The object of the present invention is to provide a method for solving the problem of surface damage due to gallium ion irradiation that poses a problem when carrying out mask repair using currently established FIB techniques, and the problem of residual gallium, and to provide a device realizing this method. The device of the present invention has an electron beam lens barrel that can carry out processing, as well as an FIB lens barrel, provided inside the same sample chamber, which means that a mask repair method of the present invention, in correction processing to remove redundant sections such as a mask opaque defect, phase shift film bump defect or a glass substrate cut remnant defect, comprises a step of coarse correction by etching using a focused ion beam and a step of finishing processing using an electron beam, to remove surface damage due to gallium irradiation, and residual gallium.

Abstract translation: 本发明的目的是提供一种解决由于镓离子照射引起的表面损伤的问题的方法，当使用当前建立的FIB技术进行掩模修复时存在问题，并且存在残留镓的问题，并提供一种装置 实现这个方法。 本发明的装置具有能够进行处理的电子束透镜镜筒以及设置在同一样品室内的FIB镜筒，这意味着本发明的掩模修复方法在校正处理中去除 冗余部分如掩模不透明缺陷，相移膜凸起缺陷或玻璃衬底切割残余缺陷包括通过使用聚焦离子束的蚀刻进行粗略校正的步骤和使用电子束进行精加工的步骤以去除表面损伤 由于镓照射和残留的镓。

公开(公告)号：US07154106B2

公开(公告)日：2006-12-26

申请号：US11058945

申请日：2005-02-16

Applicant: Masamichi Oi ,  Takashi Ogawa

Inventor： Masamichi Oi ,  Takashi Ogawa

IPC: H01L21/66 ,  H01L21/00 ,  H01J37/305

CPC classification number: H01L22/26 ,  H01J37/28 ,  H01J37/3056 ,  H01J2237/31749

Abstract: A composite system of a scanning electron microscope (SEM) and a focused ion beam apparatus (FIB) has an FIB lens barrel for irradiating a focused ion beam to an irradiating position on a sample surface and an SEM lens barrel for observing a machining state of the machined sample surface. The FIB lens barrel has an aperture defining at least one slit of a preselected pattern so that during irradiation of the sample surface with the focused ion beam, the aperture is irradiated by the focused ion beam with a width covering the slit to thereby machine the sample surface in the form of the preselected pattern of the slit.

Abstract translation: 扫描电子显微镜（SEM）和聚焦离子束装置（FIB）的复合系统具有用于将聚焦离子束照射到样品表面上的照射位置的FIB透镜镜筒和用于观察加工状态的SEM透镜镜筒 加工样品表面。 FIB透镜镜筒具有限定至少一个预选图案的狭缝的孔，使得在用聚焦离子束照射样品表面期间，孔径被聚焦离子束照射，其宽度覆盖狭缝，从而加工样品 表面以狭缝的预选图案的形式。

公开(公告)号：US07002150B2

公开(公告)日：2006-02-21

申请号：US10854868

申请日：2004-05-27

Applicant: Kouji Iwasaki ,  Yutaka Ikku

Inventor： Kouji Iwasaki ,  Yutaka Ikku

IPC: G21K7/00

CPC classification number: G01N1/32 ,  H01J2237/3174

Abstract: A thin specimen producing method acquires a work amount in a 1-line scan by an FIB under a predetermined condition, measures a remaining work width of a thin film on an upper surface of a specimen by a microscopic length-measuring function, determines a required number of scan lines of work to reach a predetermined width by calculation, and executes a work to obtain a set thickness. The work amount in a one-line scan by the FIB under the predetermined condition is determined by working the specimen in scans of plural lines, measuring the etched dimension by the microscopic length-measuring function, and calculating an average work amount per one-line scan.

Abstract translation: 薄标本制作方法通过FIB在预定条件下获取1行扫描中的工作量，通过微观长度测量功能测量样品上表面上的薄膜的剩余工作宽度，确定所需的 通过计算达到预定宽度的扫描线的数量，并执行获得设定厚度的工作。 通过FIB在预定条件下的单行扫描中的工作量通过在多行扫描中进行样品的工作，通过微观长度测量功能测量蚀刻尺寸并计算每行的平均工作量来确定 扫描

公开(公告)号：US06855940B2

公开(公告)日：2005-02-15

申请号：US10395672

申请日：2003-03-24

Applicant: Hiroto Mutou

Inventor： Hiroto Mutou

IPC: H01J37/20

CPC classification number: H01J37/20 ,  H01J2237/20214

Abstract: In a charged particle microscope equipped with a sample stage having an inclination function, the invention provides a construction that prevents inclination driving of the sample stage from affecting other peripheral devices to be additionally installed such as an optical microscope. In the charged particle microscope according to the invention, a sample stage having an inclination mechanism includes a rotation support portion of the inclination mechanism on sidewalls of a vacuum chamber, and at least a detection portion of other peripheral devices additionally installed such as (1) an optical microscope, (2) a laser scattering microscope and (3) an optical height detection system is fitted to the rotation support portion inside the chamber in such a fashion as to be capable of moving with a rotary shaft of the inclination mechanism, and members that cannot be arranged in vacuum are installed outside the chamber.

Abstract translation: 在配备有具有倾斜功能的样品台的带电粒子显微镜中，本发明提供了防止样品台的倾斜驱动影响另外安装的其它外围设备的结构的结构，例如光学显微镜。 在根据本发明的带电粒子显微镜中，具有倾斜机构的样品台包括在真空室的侧壁上的倾斜机构的旋转支撑部分，以及另外安装的其它外围装置的检测部分，例如（1） 光学显微镜，（2）激光散射显微镜和（3）光学高度检测系统以能够与倾斜机构的旋转轴一起移动的方式装配在腔室内的旋转支撑部分上，以及 不能排列在真空中的构件安装在室外。

公开(公告)号：US08869311B2

公开(公告)日：2014-10-21

申请号：US13409255

申请日：2012-03-01

Applicant: Ryusuke Hirose

Inventor： Ryusuke Hirose

IPC: G01Q60/00 ,  G01Q60/30 ,  G01Q20/00 ,  B82Y35/00

CPC classification number: G01Q20/00 ,  B82Y35/00 ,  G01Q60/30

Abstract: A displacement detection mechanism for a vibrationally driven cantilever includes a vibration frequency detector comprised of an LC resonator that detects a change of capacitance between the cantilever and a sample surface due to a change of vibration of the cantilever, and an F-V converter or an FM demodulator that detects a voltage based on the vibration frequency, whereby displacement of the cantilever can be detected. The displacement detection mechanism can be used in a scanning probe microscope to perform shape measurement and physical property measurement without the presence of light.

Abstract translation: 用于振动驱动的悬臂的位移检测机构包括振动频率检测器，该振动频率检测器由LC谐振器组成，该谐振器由于悬臂的振动的变化而检测悬臂与样品表面之间的电容变化，以及FV转换器或FM解调器 其基于振动频率检测电压，从而可以检测悬臂的位移。 位移检测机构可以用于扫描探针显微镜中以进行形状测量和物理性能测量而不存在光。

公开(公告)号：US08705698B2

公开(公告)日：2014-04-22

申请号：US13027881

申请日：2011-02-15

Applicant: Hiroshi Matsumura ,  Kiyoshi Hasegawa

Inventor： Hiroshi Matsumura ,  Kiyoshi Hasegawa

IPC: H05G1/62 ,  G01N23/201 ,  G06K9/78 ,  G06K9/82

CPC classification number: G01N23/223 ,  G01N2223/076 ,  G06T7/001 ,  G06T2207/10061 ,  G06T2207/10121 ,  G06T2207/30148

Abstract: Provided are an X-ray analyzer and a mapping method for an X-ray analysis which, in a inspection for a harmful substance contained in, for example, a material or a composite electronic component, enable determination as to whether a sample is normal or abnormal to be performed visually based on an image obtained by the X-ray mapping analysis. In the X-ray analyzer, an X-ray mapping image of a sample which is confirmed to be normal in advance is obtained as a reference mapping image. A mapping analysis is performed on a inspection sample. A difference from the reference mapping image is obtained for each pixel, to thereby display a difference mapping image. A region in which the amount of specific element is larger than a reference amount is displayed with high brightness, and hence an abnormal portion may be easily found.

Abstract translation: 提供了一种X射线分析仪和用于X射线分析的映射方法，其在包含在例如材料或复合电子部件中的有害物质的检查中能够确定样品是正常还是 基于通过X射线映射分析获得的图像，可视化地进行异常。 在X射线分析装置中，作为基准对照图像，获得确认为正常的样本的X射线映射图像。 对检查样品进行映射分析。 对于每个像素获得与参考映射图像的差异，从而显示差异映射图像。 特定元素的量大于基准量的区域以高亮度显示，因此可能容易发现异常部分。

公开(公告)号：US08615811B2

公开(公告)日：2013-12-24

申请号：US13428136

申请日：2012-03-23

Applicant: Masatsugu Shigeno ,  Yoshiteru Shikakura

Inventor： Masatsugu Shigeno ,  Yoshiteru Shikakura

IPC: G01Q20/00

CPC classification number: G01Q20/02 ,  G01Q60/32

Abstract: A method of measuring vibration characteristics of a cantilever in a scanning probe microscope (SPM). An excitation signal is generated by a forward and backward frequency sweep signal in a frequency range including a resonance frequency of the cantilever. The cantilever is vibrated by supplying the excitation signal to a vibrating portion of the cantilever. The largest amplitude of a displacement of the cantilever in a forward path and in a backward path is directly measured, and an intermediate value of a frequency between frequencies measured on the basis of the directly measured largest amplitude of the displacement of the cantilever is detected as the resonance frequency of the cantilever.

Abstract translation: 测量扫描探针显微镜（SPM）中悬臂振动特性的方法。 在包括悬臂的共振频率的频率范围内，通过正向和反向频率扫描信号产生激励信号。 通过将激励信号提供给悬臂的振动部分来振动悬臂。 直接测量前进路径和后向路径中的悬臂的位移的最大幅度，并且基于直接测量的悬臂的位移的最大振幅测量的频率的中间值被检测为 悬臂的共振频率。

公开(公告)号：US08596866B2

公开(公告)日：2013-12-03

申请号：US12932122

申请日：2011-02-17

Applicant: Yoshiki Matoba

Inventor： Yoshiki Matoba

IPC: A61B6/08

CPC classification number: G01N23/083

Abstract: To prevent erroneous detection in detecting a foreign matter, which is caused by a change in distance between a sample and an X-ray detector, provided is an X-ray transmission inspection apparatus including an X-ray tube (11) that irradiates an inspection sample element with an X-ray, an X-ray detector (13) that detects a transmission X-ray when the X-ray is transmitted through a sample, an operation portion (17) that obtains a contrast image from a transmission image of a transmission X-ray, a sensor that calculates a distance between the sample and the detector, and a mechanism that adjusts the position of the X-ray detector, in which an X-ray transmission image is picked up while the distance between the sample and the X-ray detector is kept constant.

Abstract translation: 为了防止检测由于样品和X射线检测器之间的距离的变化引起的异物的错误检测，提供了一种X射线透射检查装置，其包括：X射线管（11），其照射检查 具有X射线的采样元件，当通过样本透射X射线时检测透射X射线的X射线检测器（13），从透射图像的透射图像获得对比度图像的操作部（17） 透射X射线，计算样品和检测器之间的距离的传感器，以及调整X射线检测器的位置的机构，其中拾取X射线透射图像，同时样品之间的距离 并且X射线检测器保持恒定。

公开(公告)号：US08513602B2

公开(公告)日：2013-08-20

申请号：US12712863

申请日：2010-02-25

Applicant: Takashi Ogawa ,  Kenichi Nishinaka ,  Yoshihiro Koyama

Inventor： Takashi Ogawa ,  Kenichi Nishinaka ,  Yoshihiro Koyama

IPC: H01J37/00

CPC classification number: H01J37/08 ,  H01J37/28 ,  H01J2237/0807 ,  H01J2237/31749

Abstract: The crystal structure of the emitter can be accurately grasped from a FIM image without being influenced by disturbances, such as contamination, and even if the rearrangement of atoms has been performed, whether or not the crystal structure of the emitter has returned to the original state can also be accurately determined. There is a provided a focused ion beam apparatus including an emitter 10, a gas source 11 which supplies gas G2, a cooling unit 12 which cools the emitter, a heating unit 13 which heats the tip of the emitter, an extraction power source unit 15 which applies an extraction voltage to ionize the gas into gas ions at the tip of the emitter, and then extract the gas ions, a beam optical system 16 which makes the extracted gas ions into a focused ion beam (FIB), and then radiates the focused ion beam onto a sample S, an image acquiring mechanism 17 which acquires a FIM image of the tip of the emitter, and a control unit 7 having a display unit and a storage unit 7b. A guide which displays an ideal crystal structure of the tip of the emitter is stored in advance in the storage unit. The control unit is enabled to display the guide in the state of overlapping the acquired FIM image on the display unit.

Abstract translation: 可以从FIM图像中精确地掌握发射体的晶体结构，而不受诸如污染等干扰的影响，即使原子的重排已经被执行，发射体的晶体结构是否已经恢复到初始状态 也可以准确确定。 提供了一种聚焦离子束装置，其包括发射极10，供应气体G2的气体源11，冷却发射极的冷却单元12，加热发射极顶端的加热单元13，提取电源单元15 其施加提取电压以将气体离子化为发射体顶端的气体离子，然后提取气体离子，使得提取的气体离子成为聚焦离子束（FIB）的束光学系统16，然后辐射 聚焦离子束到样本S上，获取发射器的尖端的FIM图像的图像获取机构17以及具有显示单元和存储单元7b的控制单元7。 将显示发射器顶端的理想晶体结构的引导件预先存储在存储单元中。 控制单元能够在显示单元上与获取的FIM图像重叠的状态下显示引导件。

公开(公告)号：US08460842B2

公开(公告)日：2013-06-11

申请号：US12931412

申请日：2011-01-28

Applicant: Takashi Ogawa ,  Hiroshi Oba ,  Fumio Aramaki ,  Anto Yasaka

Inventor： Takashi Ogawa ,  Hiroshi Oba ,  Fumio Aramaki ,  Anto Yasaka

IPC: G03F1/74 ,  G21G5/00

CPC classification number: G21K1/062 ,  B82Y10/00 ,  G03F1/24 ,  G03F1/74 ,  G03F1/86 ,  H01J2237/31742

Abstract: A defect repair apparatus for an EUV mask has an ion beam column that scans and irradiates the EUV mask with a focused hydrogen ion beam such that no region of the EUV mask receives an amount of beam irradiation exceeding 4×1016 ions/cm2. The ion beam column comprises a gas field ion source having an emitter with a pointed tip end that emits hydrogen ions that form the hydrogen ion beam, and an ion optical system that focuses and scans the hydrogen ion beam onto the EUV mask. A detector detects secondary charged particles generated from the EUV mask when irradiated with the hydrogen ion beam, and an image forming section forms and displays an observation image of the EUV mask on the basis of an output signal from the detector so that a defect in the EUV mask and the progress of the defect repair can be observed.

Abstract translation: 用于EUV掩模的缺陷修复装置具有离子束柱，其利用聚焦的氢离子束扫描和照射EUV掩模，使得EUV掩模的区域不会接收超过4×1016个离子/ cm 2的光束照射量。 离子束柱包括气体离子源，其具有发射体，其具有发射形成氢离子束的氢离子的尖端，以及将氢离子束聚焦并扫描到EUV掩模上的离子光学系统。 当用氢离子束照射时，检测器检测从EUV掩模产生的二次带电粒子，并且图像形成部分基于来自检测器的输出信号形成并显示EUV掩模的观察图像，使得在 可以观察到EUV面罩和缺陷修复的进展。