摘要:
A semiconductor memory device includes a memory cell array, which includes a cell array having multiple cell blocks. Each cell block includes source and word lines arranged in one direction, bit lines arranged in a perpendicular direction, and memory cells having corresponding floating bodies. Adjacent memory cells share source or drain regions to form common source or drain regions, respectively. The source regions are arranged in a word line direction and connected to corresponding source lines, and the drain regions are arranged in the bit line direction and connected to corresponding bit lines. Gates of the memory cells are arranged in the word line direction and are connected to form the word lines. The source lines are formed on a layer of the word lines, and the bit lines are formed at a different layer to be insulated from the word and source lines.
摘要:
A semiconductor memory device and methods thereof. The example semiconductor memory device may include a semiconductor substrate, a first source line and a second source line oriented in a first direction, the first and second source lines not in contact with each other, at least one bit line oriented in the first direction and at least one drain positioned between the first and second source lines and the at least one bit line. A first example method may include applying a first voltage to a source line, connected to the memory cell, during a write operation of the memory cell and applying a second voltage to the source line during a read operation of the memory cell, the first and second voltages not being the same and the second voltage not being a ground voltage. A second example method may include applying a first positive voltage to a word line, applying a second positive voltage to a source line, detecting a voltage at a bit line, the detected bit line voltage based on the applied first and second positive voltages and determining whether the memory cell stores data at a first logic level or a second logic level based on the detected bit line voltage.
摘要:
Disclosed is a semiconductor device and method of fabricating the same. The device is disposed on a substrate, including a fin constructed with first and second sidewalls, a first gate line formed in the pattern of spacer on the first sidewall of the fin, and a second gate line formed in the pattern of spacer on the second sidewall of the fin. First and second impurity regions are disposed in the fin. The first and second impurity regions are isolated from each other and define a channel region in the fin between the first and second gate lines.
摘要:
In one aspect, a semiconductor memory device is provided which includes complementary first and second bit lines, a unit memory cell including complementary first and second floating body transistor capacitorless memory cells respectively coupled to the complementary first and second bit lines, and a voltage sense amplifier coupled between the complementary first and second bit lines which amplifies a voltage differential between the complementary first and second bit lines.
摘要:
A semiconductor memory device includes first and second memory cells having floating bodies, each of which includes a gate connected to a word line and an electrode connected to a common source line to store data. A controller applies a first voltage to the common source line, a negative second voltage to the word line, a third voltage as a first sense enable control voltage and the first voltage as a second sense enable control voltage during a first write period of a write operation. The controller also applies a fourth voltage to the common source line and the first voltage to the word line during a second write period of the write operation. The sensing portion amplifies a bit line and an inverted bit line to the third voltage or the first voltage, respectively, during the first write period in response to the first and second sense enable control voltages.
摘要:
One embodiment includes a plurality of word lines, a plurality of source lines, a plurality of bit lines intersecting with the plurality of word lines, and a plurality of memory cells formed at intersections of the plurality of word lines and the plurality of bit lines. Each of the plurality of memory cells is a floating body cell. A gate of each floating body cell is connected to one of the word lines, a drain of each floating body cell is connected to one of the bit lines, and a source of each floating body cell is connected to one of the source lines. At least one bit line and source line selecting circuit is configured to selectively connect each of the plurality of bit lines to a first output bit line and to selectively connect the source lines to a source voltage. At least one sense amplifier is configured to sense data based on a voltage on the first output bit line.
摘要:
A semiconductor memory device includes a semiconductor substrate including an insulating layer, a charge storage region of a first conductivity type on the insulating layer, and an insulating film on the insulating layer and surrounding the charge storage region. A body region of the first conductivity type is on an upper surface of the charge storage region, and a gate stack including a gate electrode and a gate insulating film is on the body region. A source region and a drain region of a second conductivity type are on opposite sides of the body region. The charge storage region extends further towards the semiconductor substrate than the source region and/or the drain region. Methods of forming semiconductor memory devices are also disclosed.
摘要:
A semiconductor memory device and methods thereof. The example semiconductor memory device may include a semiconductor substrate, a first source line and a second source line oriented in a first direction, the first and second source lines not in contact with each other, at least one bit line oriented in the first direction and at least one drain positioned between the first and second source lines and the at least one bit line. A first example method may include applying a first voltage to a source line, connected to the memory cell, during a write operation of the memory cell and applying a second voltage to the source line during a read operation of the memory cell, the first and second voltages not being the same and the second voltage not being a ground voltage. A second example method may include applying a first positive voltage to a word line, applying a second positive voltage to a source line, detecting a voltage at a bit line, the detected bit line voltage based on the applied first and second positive voltages and determining whether the memory cell stores data at a first logic level or a second logic level based on the detected bit line voltage.
摘要:
A silicon controlled rectifier (SCR) may include a first well and a second well formed within a substrate. A first junction region and a second junction region may be formed within the first well. A third junction region may include a first portion formed within the first well and a second portion formed within the substrate. A fourth junction region may include a first portion formed within the second well and a second portion formed within the substrate. A gate electrode may be formed on the substrate between the third junction region and the fourth junction region. A fifth junction region may be formed within a region of the substrate.