公开(公告)号：US07551263B2

公开(公告)日：2009-06-23

申请号：US11409387

申请日：2006-04-13

申请人： Toralf Gruner ,  Markus Deguenther

发明人： Toralf Gruner ,  Markus Deguenther

IPC分类号： G03B27/72

CPC分类号： G03F7/70066 ,  G03F7/70558

摘要： A device for adjusting the illumination dose on a photosensitive layer in a microlithographic projection exposure apparatus has a plurality of stop elements which are, in a direction perpendicularly to a scanning direction of the apparatus, arranged next to one another. Each stop element has an outer surface that absorbs substantially all projection light impinging thereon, and a substantially rectangular circumference. Each stop element furthermore has at least one recess in its circumference or at least one opening through which projection light is allowed to pass. A drive unit individually displaces the stop elements along the scanning direction into a light field.

摘要翻译： 用于调节微光刻投影曝光装置中的感光层上的照射剂量的装置具有多个在与装置的扫描方向垂直的方向上彼此相邻布置的止动元件。 每个停止元件具有吸收基本上所有投射在其上的投射光的外表面和基本上矩形的圆周。 每个止动元件还在其圆周上具有至少一个凹部或至少一个允许投射光通过的开口。 驱动单元将停止元件沿着扫描方向单独移位成光场。

公开(公告)号：US20080273248A1

公开(公告)日：2008-11-06

申请号：US11420103

申请日：2006-05-24

申请人： Susanne Beder ,  Wilhelm Ulrich ,  Heiko Feldmann ,  Wolfgang Singer ,  Toralf Gruner

发明人： Susanne Beder ,  Wilhelm Ulrich ,  Heiko Feldmann ,  Wolfgang Singer ,  Toralf Gruner

IPC分类号： G02B3/12

CPC分类号： G02B13/143 ,  G03F7/70341

摘要： The invention relates to a projection objective (6), in particular for applications in microlithography, serving to project an image of an object (3) arranged in an object plane (4) onto a substrate (18) arranged in an image plane (7). The projection objective (6) has an object-side-oriented part (10) which is arranged adjacent to the object plane (4) and includes a plurality of optical elements, and it also has an image-side-oriented part (11) of the objective which is arranged adjacent to the image plane (7) and includes a free space (16) serving to receive a fluid (13) and further includes at least a part of an optical end-position element (14) serving to delimit the free space (16) towards the object side. The projection objective (6) is operable in different modes of operation in which the free space (16) is filled with fluids (13) that differ in their respective indices of refraction.

摘要翻译： 本发明涉及一种投影物镜（6），特别是用于微光刻中的用于将布置在物平面（4）中的物体（3）的图像投影到布置在图像平面（7）中的基底（18）上的投影物镜 ）。 投影物镜（6）具有与物平面（4）相邻配置并具有多个光学元件的物体侧取向部（10），还具有图像侧取向部（11） 所述物镜布置成邻近所述图像平面（7）并且包括用于接收流体（13）的自由空间（16），并且还包括用于界定光学终点位置元件（14）的至少一部分 朝向物体侧的自由空间（16）。 投影物镜（6）可在不同的操作模式中操作，其中自由空间（16）填充有各自折射率不同的流体（13）。

公开(公告)号：US20080192225A1

公开(公告)日：2008-08-14

申请号：US11911454

申请日：2006-04-12

申请人： Hans-Jurgen Mann ,  Wolfgang Singer ,  Toralf Gruner ,  Olaf Dittmann ,  Michael Totzeck

发明人： Hans-Jurgen Mann ,  Wolfgang Singer ,  Toralf Gruner ,  Olaf Dittmann ,  Michael Totzeck

IPC分类号： G03B27/54

CPC分类号： G03F7/70566 ,  G03F7/70058

摘要： The invention relates to a projection exposure system, in particular for micro-lithography. The projection exposure system according to the invention comprises a light source (18) for producing light in the EUV region. The projection exposure system further comprises a first optical system (19, 20, 21, 22, 23, 24) for illuminating a mask (25) by the light of the light source (18) and a second optical system (26, 27, 28, 29, 30, 31) for imaging the mask (25) on a component (32). At least one polarization-optical element (1) is disposed on the beam path between the light source (18) and the component (32).

摘要翻译： 本发明涉及一种投影曝光系统，特别涉及微光刻技术。 根据本发明的投影曝光系统包括用于在EUV区域中产生光的光源（18）。 投影曝光系统还包括用于通过光源（18）的光照射掩模（25）的第一光学系统（19,20,21,22,23,24）和第二光学系统（26,27,24） 28,29,30,31），用于将所述掩模（25）成像在部件（32）上。 至少一个偏振光学元件（1）设置在光源（18）和部件（32）之间的光束路径上。

公开(公告)号：US07405808B2

公开(公告)日：2008-07-29

申请号：US11014199

申请日：2004-12-16

申请人： Toralf Gruner ,  Michael Totzeck ,  Damian Fiolka ,  Wilhelm Ulrich ,  Gerhard Fuerter

发明人： Toralf Gruner ,  Michael Totzeck ,  Damian Fiolka ,  Wilhelm Ulrich ,  Gerhard Fuerter

IPC分类号： G03B27/54 ,  G03B27/42 ,  G02B5/08

CPC分类号： G03F7/70191 ,  G02B5/04 ,  G02B5/3066 ,  G02B27/286 ,  G03F7/70566

摘要： An optical system, particularly an illumination system, of a microlithographic projection exposure apparatus contains at least one plane reflecting surface for folding the beam path. The at least one reflecting surface is arranged with respect to an optical axis of the optical system such that the intensity ratio between two mutually perpendicular polarization directions is at least substantially preserved for an axially parallel light ray deviated by the at least one reflecting surface. In accordance with a second aspect, the at least one reflecting surface is arranged such that a maximum effect on the polarization of the projection light is achieved, so as to be able to compensate for polarization dependencies which occur in other components of the illumination system.

摘要翻译： 微光刻投影曝光装置的光学系统，特别是照明系统包含用于折叠光束路径的至少一个平面反射表面。 所述至少一个反射表面相对于所述光学系统的光轴布置，使得对于由所述至少一个反射表面偏离的轴向平行的光线，至少基本上保留了两个相互垂直的偏振方向之间的强度比。 根据第二方面，至少一个反射表面被布置成使得能够实现对投射光的极化的最大影响，以便能够补偿在照明系统的其它部件中发生的偏振依赖性。

公开(公告)号：US07382536B2

公开(公告)日：2008-06-03

申请号：US11392027

申请日：2006-03-29

申请人： Daniel Krähmer ,  Toralf Gruner ,  Wilhelm Ulrich ,  Birgit Enkisch ,  Michael Gerhard ,  Martin Brunotte ,  Christian Wagner ,  Winfried Kaiser ,  Manfred Maul ,  Christof Zaczek

发明人： Daniel Krähmer ,  Toralf Gruner ,  Wilhelm Ulrich ,  Birgit Enkisch ,  Michael Gerhard ,  Martin Brunotte ,  Christian Wagner ,  Winfried Kaiser ,  Manfred Maul ,  Christof Zaczek

IPC分类号： G02B5/30

CPC分类号： G03F7/70966 ,  G02B1/02 ,  G02B1/08 ,  G02B5/3083 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70566 ,  G03F7/70958 ,  Y10S359/90

摘要： An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.

摘要翻译： 微光刻投影系统的目的在于至少有一个氟化物晶体透镜。 如果晶体透镜的透镜轴基本上垂直于氟化物晶体的{100} - 平面或{100}等价晶面而取向，对图像质量有害的双折射效应将被降低。 如果使用两个或多个氟化物晶体透镜，它们应该具有在晶体结构的（100） - ，（111） - 或（110）方向上定向的透镜轴，并且它们应当相对于每个 其他。 通过使用相互旋转（100） - 相互组合的组相互旋转（111） - 或（110） - 相组合来进一步减少双折射相关效应。 通过对物镜的至少一个光学元件施加补偿涂层也可实现进一步的改进。

公开(公告)号：US07256932B2

公开(公告)日：2007-08-14

申请号：US11252598

申请日：2005-10-19

申请人： Alexander Epple ,  Toralf Gruner ,  Wolfgang Singer

发明人： Alexander Epple ,  Toralf Gruner ,  Wolfgang Singer

IPC分类号： G02B13/14 ,  G02B1/06

CPC分类号： G02B17/0892 ,  G02B3/12 ,  G02B3/14 ,  G02B13/143 ,  G02B17/0812

摘要： An optical system for ultraviolet light having wavelengths λ≦200 nm, which may be designed in particular as a catadioptric projection objective for microlithography, has a plurality of optical elements including optical elements made of synthetic quartz glass or a fluoride crystal material transparent to a wavelength λ≦200 nm. At least two of the optical elements are utilized for forming at least one liquid lens group including a first delimiting optical element, a second delimiting optical element, and a liquid lens, which is arranged in an interspace between the first delimiting optical element and the second delimiting optical element and contains a liquid transparent to ultraviolet light having wavelengths λ≦200 nm. This enables effective correction of chromatic aberrations even in the case of systems that are difficult to correct chromatically.

摘要翻译： 波长λ<= 200nm的紫外光的光学系统可以特别设计为用于微光刻的反射折射投影物镜，具有多个光学元件，包括由合成石英玻璃制成的光学元件或透明于 波长λ<= 200nm。 至少两个光学元件用于形成至少一个液体透镜组，该液体透镜组包括第一限定光学元件，第二限定光学元件和液体透镜，该液体透镜组布置在第一限定光学元件和第二限定光学元件之间的间隙中 限定光学元件并且包含对波长λ<= 200nm的透明紫外光的液体。 这使得即使在难以校正色彩的系统的情况下也能够有效地校正色像差。

公开(公告)号：US20070070316A1

公开(公告)日：2007-03-29

申请号：US11458216

申请日：2006-07-18

申请人： Albrecht Ehrmann ,  Ulrich Wegmann ,  Rainer Hoch ,  Joerg Mallmann ,  Karl-Heinz Schuster ,  Ulrich Loering ,  Toralf Gruner ,  Bernhard Kneer ,  Bernhard Geuppert ,  Franz Sorg ,  Jens Kugler ,  Norbert Wabra

发明人： Albrecht Ehrmann ,  Ulrich Wegmann ,  Rainer Hoch ,  Joerg Mallmann ,  Karl-Heinz Schuster ,  Ulrich Loering ,  Toralf Gruner ,  Bernhard Kneer ,  Bernhard Geuppert ,  Franz Sorg ,  Jens Kugler ,  Norbert Wabra

IPC分类号： G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/70591 ,  G03F7/70691 ,  G03F7/7085 ,  G03F7/70875 ,  G03F7/70891 ,  G03F7/70991

摘要： A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.

摘要翻译： 微光刻投影曝光装置包括配置为浸没操作的投影透镜。 为此，将浸没液体引入位于图像侧的投影透镜的最后一个透镜与待曝光的感光层之间的浸没空间中。 为了减少由浸没液体内发生的温度梯度引起的折射率的波动，投影曝光装置包括加热或冷却浸没液的部分体积的传热元件，以便达到至少基本均匀或至少基本上旋转对称的温度 在浸液中的分布。

公开(公告)号：US20070019305A1

公开(公告)日：2007-01-25

申请号：US11479574

申请日：2006-06-30

申请人： Wilhelm Ulrich ,  Thomas Okon ,  Norbert Wabra ,  Toralf Gruner ,  Boris Bittner ,  Volker Graeschus

发明人： Wilhelm Ulrich ,  Thomas Okon ,  Norbert Wabra ,  Toralf Gruner ,  Boris Bittner ,  Volker Graeschus

IPC分类号： G02B17/00 ,  G02B3/00

CPC分类号： G03F7/70308 ,  G02B17/08 ,  G02B27/0025 ,  G03F7/70216 ,  G03F7/70225 ,  G03F7/70258 ,  G03F7/70266

摘要： A method for correcting at least one image defect of a projection objective of a lithography projection exposure machine, the projection objective comprising an optical arrangement composed of a plurality of lenses and at least one mirror, the at least one mirror having an optically operative surface that can be defective and is thus responsible for the at least one image defect, comprises the steps of: at least approximately determining a ratio VM of principal ray height hMH to marginal ray height hMR at the optically operative surface of the at least one mirror, at least approximately determining at least one optically operative lens surface among the lens surfaces of the lenses, at which the magnitude of a ratio VL of principal ray height hLH to marginal ray height hLR comes at least closest to the ratio VM, and selecting the at least one determined lens surface for the correction of the image defect.

摘要翻译： 一种用于校正光刻投影曝光机的投影物镜的至少一个图像缺陷的方法，所述投影物镜包括由多个透镜和至少一个反射镜构成的光学装置，所述至少一个反射镜具有光学操作表面， 可能是有缺陷的，并且因此对至少一个图像缺陷负责，包括以下步骤：至少近似地确定主光线高度h M H的比率VM与边缘光线高度h M 在至少一个反射镜的光学操作表面处至少近似地确定透镜的透镜表面中的至少一个光学透镜表面，其中主光线高度h的比值VL的大小， 对于边缘射线高度h L L至少最接近比率VM，并且选择至少一个确定的透镜表面用于校正图像缺陷。

公开(公告)号：US20060146304A1

公开(公告)日：2006-07-06

申请号：US11294860

申请日：2005-12-05

申请人： Markus Schwab ,  Aksel Goehnermeier ,  Toralf Gruner ,  Tammo Uitterdijk

发明人： Markus Schwab ,  Aksel Goehnermeier ,  Toralf Gruner ,  Tammo Uitterdijk

IPC分类号： G03B27/42

CPC分类号： G03B27/42 ,  G03F7/70258

摘要： A lithographic method of manufacturing a miniaturized device using a projection exposure system comprises illuminating the object plane of an imaging optics of the projection exposure system with measuring light; detecting, for each of a plurality of locations on an image plane of the imaging optics, an angular distribution of an intensity of the measuring light traversing the image plane at the respective location; adjusting a telecentricity of the projection exposure system based on a selected patterning structure to be imaged and on the plurality of the detected angular distributions; disposing the selected pattern structure to be imaged in a region of the object plane of the imaging optics; disposing a substrate carrying a resist in a region of the image plane of the imaging optics and exposing the resist with imaging light using the projection exposure system with the adjusted telecentricity; and developing the exposed resist and processing the substrate with the developed resist.

摘要翻译： 使用投影曝光系统制造小型化装置的光刻方法包括用测量光照射投影曝光系统的成像光学元件的物平面; 针对所述摄像光学元件的像平面上的多个位置中的每一个检测在相应位置处穿过所述图像平面的测量光的角度分布; 基于要成像的所选择的图案化结构和所述多个所检测的角度分布来调整所述投影曝光系统的远心度; 将要成像的所选择的图案结构设置在成像光学器件的物平面的区域中; 在所述成像光学元件的像面的区域中设置携带抗蚀剂的基板，并且利用所述投影曝光系统以调节的远心度将成像光曝光; 并显影出曝光的抗蚀剂并用显影的抗蚀剂处理衬底。

公开(公告)号：US20060066764A1

公开(公告)日：2006-03-30

申请号：US11251300

申请日：2005-10-14

申请人： Vladimir Kamenov ,  Toralf Gruner

发明人： Vladimir Kamenov ,  Toralf Gruner

IPC分类号： G02F1/1335

CPC分类号： G03F7/70225 ,  G02B5/3091 ,  G02B17/02 ,  G02B17/08 ,  G02B17/0892 ,  G03F7/70241 ,  G03F7/70958 ,  G03F7/70966

摘要： An optical system, for example a lens for a photolithography tool, includes a group of optical elements (L1, L2) that each comprise a birefringent cubic crystal such as CaF2. The crystal lattices of the crystals have different orientations, e.g. for reducing the overall retardance of the group by mutual compensation. The [110] crystal axis of at least one optical element (L1, L2) is tilted with respect to an optical axis (34) of the system (10) by a predefined tilting angle (θ1, θ2) having an absolute value between 1° and 20°. This reduces the magnitude, but not significantly changes the orientation of intrinsic birefringence. By selecting an appropriate tilting angle it is possible to achieve a better performance of the optical system. For example, the overall retardance of the optical system may be reduced, or the angular retardance distribution may be symmetrized.

摘要翻译： 光学系统，例如用于光刻工具的透镜，包括一组各自包括诸如CaF 2 2的双折射立方晶体的光学元件（L 1，L 2）。 晶体的晶格具有不同的取向，例如 通过相互补偿减少集团的整体延迟。 至少一个光学元件（L 1，L 2）的[110]晶轴相对于系统（10）的光轴（34）倾斜预定倾斜角（θ1 >，θ2> 2），其绝对值在1°和20°之间。 这降低了幅度，但并没有显着地改变固有双折射的取向。 通过选择适当的倾斜角度，可以实现光学系统的更好的性能。 例如，可以减小光学系统的总体延迟，或者可以对角度延迟分布进行对称化。