Abstract:
An X-ray analysis apparatus including: a radiation source configured to irradiate an irradiation point on a sample with radiation; an X-ray detector configured to detect a characteristic X-ray emitted from the sample, and output a signal including energy information about the characteristic X-ray; an analyzer configured to analyze the signal; a sample stage configured to allow placement of the sample thereon; a shifting mechanism being capable of relatively shifting the sample on the sample stage and the radiation source and the X-ray detector with respect to each other; a height measuring mechanism being capable of measuring the height of the irradiation point on the sample; and a controller configured to control the shifting mechanism on the basis of the measured height of the irradiation point on the sample and adjust the distance of the sample with respect to the radiation source and the X-ray detector is used.
Abstract:
A focused ion beam apparatus includes an ion gun unit having an emitter tip, a gas supply unit that supplies gas to the tip, and an ion source gas supply source. An extracting electrode ionizes the gas adsorbed onto the surface of the tip and extracts ions by applying a voltage between the extracting electrode and the tip. A cathode electrode accelerates the ions toward a sample. An aperture member has an opening that passes therethrough a part of the ion beam ejected from the ion gun unit, and a lens system focuses the ion beam onto the sample.
Abstract:
To avoid an influence on measurement accuracy in a case where an observation window for a measurement sample is provided to a thermal analysis apparatus, the influence being imposed by thermal conduction through the observation window, the observation window is formed of layers of transparent members, and a gap layer is provided between the layers, to thereby reduce the thermal conduction. Gas or solid having a high heat insulation property is employed for the gap layer to further enhance a heat insulation property of the observation window. Accordingly, a change due to heating of the measurement sample is visually observed in the thermal analysis apparatus, to thereby obtain a thermal change or a physical change with higher accuracy.
Abstract:
The differential scanning calorimeter includes: a heat sink, which stores a measuring sample and a reference material; a heater, which heats the heat sink; a cooling block, which is separated away from the heat sink, and positioned below the heat sink; a thermal resistor, which is connected between the heat sink and the cooling block, and forms a heat flow path therebetween; a cooling head, which is detachably fitted to the cooling block, and is cooled by an external cooling device; and differential heat flow detectors, which output a temperature difference between the measuring sample and the reference material as a heat-flow-difference signal, in which: the cooling block forms a side wall to fit the bore of the cooling head outward from the joint of the thermal resistance body; the top surface of the cooling head is lower than the joint.
Abstract:
Provided is a cantilever that is capable of bending and deforming in an active manner by itself. The cantilever includes: a lever portion having a proximal end that is supported by a main body part; and a resistor member that is formed in the cantilever and generates heat when a voltage is applied, to thereby deform the lever portion by thermal expansion due to the heat.
Abstract:
An X-ray tube which irradiates a primary X-ray to an irradiation point on a sample, an X-ray detector which detects a characteristic X-ray and a scattered X-ray emitted from the sample and outputs a signal including energy information of the characteristic X-ray and scattered X-ray, an analyzer which analyzes the signal, a first observation system which optically observes a surface of the sample in order to determine the irradiation point, and a second observation system which has a smaller depth of field than the first observation system, optically observes a narrow region, and measures the distance from the determined irradiation point by focus adjustment are included.
Abstract:
An apparatus is provided that precisely conduct ion beam etching to a sample having the properties of which easily change by electron beam irradiation with no loss of ease of operation and throughput. An apparatus includes an ion beam lens barrel and an electron beam lens barrel, which can observe or measure the conditions of a sample with an electron beam in the process of etching with an ion beam, wherein first, an observation image is obtained that includes the entire process area formed by secondary signals generated by an electron beam, secondly, an irradiation permit area and an irradiation inhibit area are defined in the observation image, and thirdly, electron beam irradiation is restricted only to the irradiation permit area.
Abstract:
The thermal analyzer comprises temperature deviation approximation formula holder which holds an approximate formula of a temperature deviation between sample and furnace and an elevating or lowering rate of the temperature of furnace during measuring the temperature deviation, programmed temperature corrector which corrects a programmed temperature in proportion to the elevating or lowering rate of the temperature. So that, since the temperature deviation is corrected in proportion to the elevating or lowering rate of the temperature program, the temperature deviation between sample and furnace is controlled to diminish when heating or cooling the sample using the temperature program which elevates or lowers the temperature of the sample or the furnace.
Abstract:
There is provided a sample operation apparatus in which, by a static electricity force acting between a probe and a sample, an accurate position is gripped without the sample being moved, and the sample can be operated by the probe for an observation, a grip, a release, or the like. There is made such that an AC electric source applying an AC voltage to an observation probe having in its tip and a bias electric source applying a DC voltage are connected, a bias electric source applying the DC voltage a grip probe adjoining the observation probe is possessed, there is relatively moved by a scanner in a plane (XY) direction in regard to a substrate fixed to a sample base, a vibration of the observation probe, which occurs by a static electricity between the tip and the substrate or the sample on the substrate, or the like, is detected by a lock-in amplifier through a displacement detection means, there is applied to the observation probe by the bias electric source such that the vibration becomes small by a feedback circuit, and there is applied also to the grip probe similarly by the bias electric source.
Abstract:
A thermal analysis equipment includes a thermal analysis data preservation function that preserves, as thermal analysis data, signals from a temperature sensor and a physical quantity sensor that detect a temperature and a change in physical quantity, respectively, of a sample. An electromagnetic-wave data acquisition control function controls acquisition of electromagnetic wave data in accordance with setting of a trigger to acquire the electromagnetic wave data. An electromagnetic-wave data preservation function preserves the electromagnetic wave data. An electromagnetic-wave data correlation function correlates the preserved electromagnetic wave data to a position on the thermal analysis data when the trigger is set.