公开(公告)号：US20050094268A1

公开(公告)日：2005-05-05

申请号：US10922380

申请日：2004-08-19

申请人： Damian Fiolka ,  Olaf Dittmann ,  Michael Totzeck ,  Nils Dieckmann ,  Jess Koehler ,  Toralf Gruner ,  Daniel Kraehmer

发明人： Damian Fiolka ,  Olaf Dittmann ,  Michael Totzeck ,  Nils Dieckmann ,  Jess Koehler ,  Toralf Gruner ,  Daniel Kraehmer

IPC分类号： G02B17/08 ,  G02B27/09 ,  G02B27/28 ,  G03F7/20 ,  G02F1/1335

CPC分类号： G03F7/70241 ,  G02B27/0994 ,  G02B27/286 ,  G03F7/70191 ,  G03F7/70966

摘要： An optical system (1) includes a first optical subsystem (3) with at least a first birefringent optical element (7), and further includes a second optical subsystem (5) with at least a second birefringent optical element (9). Between the first optical subsystem and the second optical subsystem, an optical retarding system (13) with at least a first optical retarding element (15) is arranged, which introduces a retardation of one-half of a wavelength between two mutually orthogonal states of polarization.

摘要翻译： 光学系统（1）包括具有至少第一双折射光学元件（7）的第一光学子系统（3），并且还包括具有至少第二双折射光学元件（9）的第二光学子系统（5）。 在第一光学子系统和第二光学子系统之间布置有至少具有第一光学延迟元件（15）的光学延迟系统（13），其引入两个相互正交的极化状态之间的波长的一半的延迟 。

公开(公告)号：US20050002111A1

公开(公告)日：2005-01-06

申请号：US10831293

申请日：2004-04-26

申请人： Toralf Gruner ,  Manfred Maul ,  Rudolf Von Buenau

发明人： Toralf Gruner ,  Manfred Maul ,  Rudolf Von Buenau

IPC分类号： G03F7/20 ,  G02B26/08 ,  G02B3/00 ,  G02B9/00

CPC分类号： G03F7/70058 ,  G03F7/70225 ,  G03F7/70566 ,  G03F7/70966 ,  Y10S359/90

摘要： A microlithographic illumination method for imaging a pattern arranged in an object plane of a projection lens onto an image plane of the projection lens, under which a special means for optically correcting the optical path lengths of s-polarized and p-polarized light such that light beams of both polarizations will either traverse essentially the same optical path length between the object plane and the image plane or any existing difference in their optical path lengths will be retained, largely independently of their angles of incidence on the image plane, which will allow avoiding contrast variations due to pattern orientation when imaging finely structured patterns, is disclosed. The contrast variations may be caused by uncorrected projection lenses due to their employment of materials that exhibit stress birefringence and/or coated optical components, such as deflecting mirrors, that are used at large angles of incidence.

摘要翻译： 一种用于将布置在投影透镜的物平面中的图案成像到投影透镜的图像平面上的微光刻照明方法，在该平面上用于光学校正s偏光和p偏振光的光路长度的特殊装置，使得光 两个极化的光束将在物平面和图像平面之间横穿基本上相同的光程长度，或者它们的光程长度中的任何存在的差异将被保留，这在很大程度上与其在图像平面上的入射角无关，这将允许避免 公开了当成像精细结构化图案时由于图案取向引起的对比度变化。 对比度变化可能由未矫正的投影透镜引起，因为它们使用呈现应力双折射的材料和/或以大的入射角度使用的涂覆的光学部件，例如偏转镜。

公开(公告)号：US06728043B2

公开(公告)日：2004-04-27

申请号：US10146915

申请日：2002-05-17

申请人： Toralf Gruner ,  Manfred Maul ,  Rudolf Von Buenau

发明人： Toralf Gruner ,  Manfred Maul ,  Rudolf Von Buenau

IPC分类号： G02B2714

CPC分类号： G03F7/70058 ,  G03F7/70225 ,  G03F7/70566 ,  G03F7/70966 ,  Y10S359/90

摘要： A microlithographic illumination method for imaging a pattern arranged in an object plane of a projection lens onto an image plane of the projection lens, under which a special means for optically correcting the optical path lengths of s-polarized and p-polarized light such that light beams of both polarizations will either traverse essentially the same optical path length between the object plane and the image plane or any existing difference in their optical path lengths will be retained, largely independently of their angles of incidence on the image plane, which will allow avoiding contrast variations due to pattern orientation when imaging finely structured patterns, is disclosed. The contrast variations may be caused by uncorrected projection lenses due to their employment of materials that exhibit stress birefringence and/or coated optical components, such as deflecting mirrors, that are used at large angles of incidence.

摘要翻译： 一种用于将布置在投影透镜的物平面中的图案成像到投影透镜的图像平面上的微光刻照明方法，在该平面上用于光学校正s偏光和p偏振光的光路长度的特殊装置，使得光 两个极化的光束将在物平面和图像平面之间横穿基本上相同的光程长度，或者它们的光程长度中的任何存在的差异将被保留，这在很大程度上与其在图像平面上的入射角无关，这将允许避免 公开了当成像精细结构化图案时由于图案取向引起的对比度变化。 对比度变化可能由未矫正的投影透镜引起，因为它们使用呈现应力双折射的材料和/或以大的入射角度使用的涂覆的光学部件，例如偏转镜。

公开(公告)号：US09360775B2

公开(公告)日：2016-06-07

申请号：US13364565

申请日：2012-02-02

申请人： Heiko Feldmann ,  Toralf Gruner ,  Alexander Epple

发明人： Heiko Feldmann ,  Toralf Gruner ,  Alexander Epple

IPC分类号： G03F7/20

CPC分类号： G03F7/70891 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/705 ,  G03F7/70983

摘要： The disclosure relates to a method of manufacturing a projection objective, and a projection objective, such as a projection objective configured to be used in a microlithographic process. The method can include defining an initial design for the projection objective and optimizing the design using a merit function. The method can be used in the manufacturing of projection objectives which may be used in a microlithographic process of manufacturing miniaturized devices.

摘要翻译： 本公开涉及一种制造投影物镜的方法，以及投影物镜，例如被配置为在微光刻工艺中使用的投影物镜。 该方法可以包括定义投影物镜的初始设计，并使用优值函数优化设计。 该方法可用于制造可用于制造小型化装置的微光刻工艺中的投影物镜。

公开(公告)号：US09081310B2

公开(公告)日：2015-07-14

申请号：US13604941

申请日：2012-09-06

申请人： Matthias Exler ,  Ulrich Loering ,  Toralf Gruner ,  Holger Walter

发明人： Matthias Exler ,  Ulrich Loering ,  Toralf Gruner ,  Holger Walter

IPC分类号： G03B27/54 ,  G03B27/52 ,  G03F7/20

CPC分类号： G03F7/70891 ,  G03F7/70266 ,  G03F7/70341

摘要： An optical system of a microlithographic projection exposure apparatus includes a wavefront correction device which has a plurality of fluid outlet apertures. The apertures are arranged so that fluid flows emerging from the outlet apertures enter a space through which projection light propagates during operation of the apparatus. A temperature controller sets the temperature of the fluid flows individually for each fluid flow. The temperature distribution is determined such that optical path length differences caused by the temperature distribution correct wavefront deformations.

摘要翻译： 微光刻投影曝光装置的光学系统包括具有多个流体出口孔的波前校正装置。 孔被布置成使得从出口孔流出的流体流入入射装置操作期间投射光通过该空间传播的空间。 温度控制器为每个流体流量分别设定流体流的温度。 确定温度分布，使得由温度分布导致的光程长度差校正波前变形。

公开(公告)号：US08896814B2

公开(公告)日：2014-11-25

申请号：US13431681

申请日：2012-03-27

申请人： Thomas Schicketanz ,  Toralf Gruner

发明人： Thomas Schicketanz ,  Toralf Gruner

IPC分类号： G03B27/54 ,  G03B27/42 ,  G02B17/08 ,  G03F7/20 ,  G02B13/14

CPC分类号： G02B17/0892 ,  G02B13/14 ,  G02B17/08 ,  G02B17/0896 ,  G03F1/26 ,  G03F7/702 ,  G03F7/70225 ,  G03F7/70258 ,  G03F7/70266 ,  G03F7/70275 ,  G03F7/70308 ,  G03F7/70316 ,  G03F7/70441 ,  G03F7/70791

摘要： A catadioptric projection objective has a multiplicity of lenses and at least one concave mirror, and also two deflection mirrors in order to separate a partial beam path running from the object field to the concave mirror from the partial beam path running from the concave mirror to the image field. The deflection mirrors are tilted relative to the optical axis of the projection objective about tilting axes running parallel to a first direction (x-direction). The first deflection mirror is arranged in optical proximity to a first field plane and the second deflection mirror is arranged in optical proximity to a second field plane, which is optically conjugate with respect to the first field plane. A displacement device for the synchronous displacement of the deflection mirrors is provided. The deflection mirrors have different local distributions of their reflection properties in first and second reflection regions, respectively.

摘要翻译： 反射折射投射物镜具有多个透镜和至少一个凹面镜，以及两个偏转镜，以便将从物镜场延伸的部分光束路径与从凹面镜到 图像字段。 偏转镜相对于投影物镜的光轴相对于平行于第一方向（x方向）延伸的倾斜轴线倾斜。 第一偏转镜被布置成光接近第一场平面，并且第二偏转镜布置成光学接近于相对于第一场平面光学共轭的第二场平面。 提供了用于偏转镜的同步位移的位移装置。 偏转镜在第一反射区域和第二反射区域中的反射特性分别具有不同的局部分布。

公开(公告)号：US08767181B2

公开(公告)日：2014-07-01

申请号：US12946380

申请日：2010-11-15

申请人： Toralf Gruner ,  Daniel Kraehmer ,  Michael Totzeck ,  Johannes Wangler ,  Markus Brotsack ,  Nils Dieckmann ,  Aksel Goehnermeier ,  Markus Schwab ,  Damian Fiolka ,  Markus Zenzinger

发明人： Toralf Gruner ,  Daniel Kraehmer ,  Michael Totzeck ,  Johannes Wangler ,  Markus Brotsack ,  Nils Dieckmann ,  Aksel Goehnermeier ,  Markus Schwab ,  Damian Fiolka ,  Markus Zenzinger

IPC分类号： G03B27/72 ,  G03B27/54 ,  G03F7/20

CPC分类号： G03F7/70566 ,  G03F7/70108 ,  G03F7/70225 ,  G03F7/70308

摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.

摘要翻译： 在用于曝光布置在投影物镜的像面的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，产生了指向基板并具有输出偏振态的输出辐射。 通过借助于至少一个偏振操纵装置对输出偏振状态的可变调节，输出偏振状态可以形成为接近标称输出偏振状态。 可以在基于偏振光学测量数据的控制回路中进行极化处理。

公开(公告)号：US08508854B2

公开(公告)日：2013-08-13

申请号：US12966552

申请日：2010-12-13

申请人： Eric Eva ,  Payam Tayebati ,  Michael Thier ,  Markus Hauf ,  Ulrich Schoenhoff ,  Ole Fluegge ,  Arif Kazi ,  Alexander Sauerhoefer ,  Gerhard Focht ,  Jochen Weber ,  Toralf Gruner

发明人： Eric Eva ,  Payam Tayebati ,  Michael Thier ,  Markus Hauf ,  Ulrich Schoenhoff ,  Ole Fluegge ,  Arif Kazi ,  Alexander Sauerhoefer ,  Gerhard Focht ,  Jochen Weber ,  Toralf Gruner

IPC分类号： G02B9/00

CPC分类号： G03F7/70891 ,  G02B7/028 ,  G02B27/0068 ,  G03F7/70266

摘要： The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.

摘要翻译： 本公开涉及一种光学元件，其被配置为至少部分空间地解决可以应用光辐射的光学系统（例如，用于微光刻的投影曝光设备）的波前像差的校正，以及相关的系统和方法。

公开(公告)号：US20130182264A1

公开(公告)日：2013-07-18

申请号：US13788042

申请日：2013-03-07

申请人： Jochen Hetzler ,  Sascha Bleidistel ,  Toralf Gruner ,  Joachim Hartjes

发明人： Jochen Hetzler ,  Sascha Bleidistel ,  Toralf Gruner ,  Joachim Hartjes

IPC分类号： G03F7/20

CPC分类号： G03F7/70133 ,  G03F7/70608 ,  G03F7/70733 ,  G03F9/7003 ,  G03F9/7034 ,  G03F9/7049

摘要： A projection exposure tool for microlithography for exposing a substrate is disclosed. The tool includes a projection objective. The tool also includes an optical measuring apparatus for determining a surface topography of the substrate before the substrate is exposed. The measuring apparatus has a measuring beam path which extends outside of the projection objective. The measuring apparatus is a wavefront measuring apparatus configured to determine topography measurement values simultaneously at a number of points on the substrate surface.

摘要翻译： 公开了一种用于曝光衬底的用于微光刻的投影曝光工具。 该工具包括投影物镜。 该工具还包括用于在衬底暴露之前确定衬底的表面形貌的光学测量装置。 测量装置具有延伸到投影物镜外部的测量光束路径。 所述测量装置是波面测量装置，其被配置为在所述基板表面上的多个点处同时确定地形测量值。

公开(公告)号：US20130016331A1

公开(公告)日：2013-01-17

申请号：US13604941

申请日：2012-09-06

申请人： Matthias Exler ,  Ulrich Loering ,  Toralf Gruner ,  Holger Walter

发明人： Matthias Exler ,  Ulrich Loering ,  Toralf Gruner ,  Holger Walter

IPC分类号： G03B27/52

CPC分类号： G03F7/70891 ,  G03F7/70266 ,  G03F7/70341

摘要： An optical system of a microlithographic projection exposure apparatus includes a wavefront correction device which has a plurality of fluid outlet apertures. The apertures are arranged so that fluid flows emerging from the outlet apertures enter a space through which projection light propagates during operation of the apparatus. A temperature controller sets the temperature of the fluid flows individually for each fluid flow. The temperature distribution is determined such that optical path length differences caused by the temperature distribution correct wavefront deformations.

摘要翻译： 微光刻投影曝光装置的光学系统包括具有多个流体出口孔的波前校正装置。 孔被布置成使得从出口孔流出的流体流入入射装置操作期间投射光通过该空间传播的空间。 温度控制器为每个流体流量分别设定流体流的温度。 确定温度分布，使得由温度分布导致的光程长度差校正波前变形。