摘要:
A durable etalon based laser output coupler. The output coupler is especially useful for ultraviolet lasers such as an ArF excimer laser or an F.sub.2 laser. The principal elements of the etalon based output coupler are two prisms aligned so that a first surface of one of the two prisms is parallel to a first surface of the other prism. The first of the two prisms have a second surface forming an angle with a beam from a laser cavity equal to or approximately equal to Brewster's angle. The second of the two prisms has a second surface forming an angle with the coupler exit beam equal to or approximately equal to Brewster's angle. Preferably, the prisms are comprised of CaF.sub.2 and surrounded by nitrogen at about one atmosphere. Assuming the laser beam is at a wavelength of 193 nm (for ArF excimer laser), Brewster's angle is about 57 degrees and each of the first and second surfaces define an apex angle of about 34 degrees. In a preferred embodiment, the device is used as an output coupler for line narrowed ArF excimer laser having a diffraction grating based line narrowing module. The etalon based output coupler is adjusted to preferentially reflect light at or near the spectral maximum produced by the grating. Substantial improvement in line narrowing results from the amplification in the laser resonance chamber of light at or near the grating spectral maximum which is preferentially reflected by the etalon based output coupler. Several preferred methods are disclosed for tuning the etalon based output coupler to match the wavelength selected by the grating based line narrowing module.
摘要:
A compact high resolution grating spectrometer. A beam of expanding light from a light source is collimated and the collimated beam is expanded with a beam expander before illuminating a reflecting grating. The expansion of the beam permits high resolution in a small package. In preferred embodiments mirror arrangements are provided to produce double reflections off the reflecting grating to further improve the resolution of the spectrometer.
摘要:
A line narrowed laser having a grating based line narrowing module, etalon-based line narrowing output coupler and a technique for tuning the laser. The etalon based output coupler is adjusted to preferentially reflect light at or near the spectral maximum produced by the grating. Substantial improvement in line narrowing results from the amplification in the laser resonance chamber of light at or near the grating spectral maximum which is preferentially reflected by the etalon based output coupler. Several preferred methods are disclosed for tuning the etalon based output coupler to match the wavelength selected by the grating based line narrowing module.
摘要:
A very narrow band pulse excimer laser capable of producing pulses at a rate in the range of about 500 to 2000 Hz with enhanced energy dose control and reproducibility. A prior art burst mode "slug effect" occuring at one gas circulation time after the beginning of a burst of pulses is eliminated by the addition of a minute quantity of oxygen. In a preferred embodiment very narrow bandwidth is achieved by reducing fluorine partial pressure to less than 0.10 percent and by increasing the reflectance of the output coupler to greater than 25 percent. In a preferred embodiment, prior art fused silica beam expansion prisms used in the prior art line narrowing module were replaced with calcium fluoride prisms.
摘要:
A very narrow band KrF excimer laser capable of producing 10 mJ laser pulses at 1000 Hz with a bandwidth of less than 0.6 nm (FWHM). The very narrow bandwidth is achieved by reducing fluorine partial pressure to less than 0.08 and by increasing the reflectance of the output coupler to greater than 25 percent. In a preferred embodiment, prior art fused silica beam expansion prisms used in the prior art line narrowing module were replaced with calcium fluoride prisms.
摘要:
A multi-pass spectrometer. Light from a source is expanded and collimated with a collimating optic into a collimated beam. The collimated beam illuminates a dispersing optic such as a grating from which light is reflected back toward the collimating optic. A transmitting-reflecting optic is positioned across the collimated beam to cause at least two reflections of at least a portion of the collimated beam from the dispersing optic. A photometer measures the double dispersed beam at a range of spacial locations in order to determine spectral characteristics of the light from the light source. In a preferred embodiment, a partially reflecting mirror is positioned between the grating and a collimated optic. This mirror is positioned at an angle slightly different from 90 degrees so that a portion of the light reflected from the dispersing optic is reflected back toward the dispersing optic at a slightly different range of angles. A portion of this second reflected beam is dispersed again and reflected at a different range of angles by the dispersing optic. A portion of this second reflected beam transmits the partially reflecting mirror and may be focused, and the intensity of the light at spatially distinct positions are measured by a photometer to access spectral characteristics of the light source. In a second preferred embodiment, the light from a third reflected beam is measured.
摘要:
A collector mirror of an extreme ultraviolet light source is cleaned by removing the collector mirror from a chamber of the extreme ultraviolet light source; mounting the collector mirror to a carrier; inserting the carrier with the collector mirror into a cleaning tank; applying a cleaning agent to a reflective surface of the collector mirror by spraying the cleaning agent through a plurality of nozzles directed toward the collector mirror reflective surface until the collector mirror reflective surface is clean; rinsing the applied cleaning agent from the collector mirror reflective surface; and drying the collector mirror reflective surface.
摘要:
Devices are disclosed herein which may comprise a vessel; a material disposed in the vessel for creating an EUV light emitting plasma at a plasma site, the plasma generating debris; a near normal incidence EUV reflective optic disposed in the vessel; and a source of a magnetic field for deflecting debris in the vessel to protect the optic, the source positioned to interpose the optic between the source and the plasma site.
摘要:
A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage.
摘要:
An apparatus and method is disclosed which includes or employs an EUV light source comprising a laser device outputting a laser beam, a beam delivery system directing the laser beam to an irradiation site, and a material for interaction with the laser beam at the irradiation site to create an EUV light emitting plasma for use in processing substrates.