Durable etalon based output coupler
    121.
    发明授权
    Durable etalon based output coupler 有权
    基于可靠的标准信号输出耦合器

    公开(公告)号:US6137821A

    公开(公告)日:2000-10-24

    申请号:US217340

    申请日:1998-12-21

    摘要: A durable etalon based laser output coupler. The output coupler is especially useful for ultraviolet lasers such as an ArF excimer laser or an F.sub.2 laser. The principal elements of the etalon based output coupler are two prisms aligned so that a first surface of one of the two prisms is parallel to a first surface of the other prism. The first of the two prisms have a second surface forming an angle with a beam from a laser cavity equal to or approximately equal to Brewster's angle. The second of the two prisms has a second surface forming an angle with the coupler exit beam equal to or approximately equal to Brewster's angle. Preferably, the prisms are comprised of CaF.sub.2 and surrounded by nitrogen at about one atmosphere. Assuming the laser beam is at a wavelength of 193 nm (for ArF excimer laser), Brewster's angle is about 57 degrees and each of the first and second surfaces define an apex angle of about 34 degrees. In a preferred embodiment, the device is used as an output coupler for line narrowed ArF excimer laser having a diffraction grating based line narrowing module. The etalon based output coupler is adjusted to preferentially reflect light at or near the spectral maximum produced by the grating. Substantial improvement in line narrowing results from the amplification in the laser resonance chamber of light at or near the grating spectral maximum which is preferentially reflected by the etalon based output coupler. Several preferred methods are disclosed for tuning the etalon based output coupler to match the wavelength selected by the grating based line narrowing module.

    摘要翻译: 坚固耐用的基于标准具的激光输出耦合器。 输出耦合器对于诸如ArF准分子激光器或F2激光器的紫外激光器特别有用。 基于标准具的输出耦合器的主要元件是两个棱镜对准,使得两个棱镜中的一个的第一表面平行于另一个棱镜的第一表面。 两个棱镜中的第一个具有与来自等于或近似等于布鲁斯特角的激光腔的光束成一角度的第二表面。 两个棱镜中的第二个具有与耦合器出射光束成一角度的第二表面等于或近似等于布鲁斯特角。 优选地,棱镜由CaF 2组成并在约一个大气压下被氮包围。 假设激光束的波长为193nm(对于ArF准分子激光器),布鲁斯特的角度约为57度,并且第一和第二表面中的每一个限定了约34度的顶角。 在优选实施例中,该器件用作具有基于衍射光栅的线窄化模块的线狭窄ArF准分子激光器的输出耦合器。 调整基于标准信号的输出耦合器以优先反射由光栅产生的光谱最大值处或附近的光。 由于在基于标准具的输出耦合器优先反射的光栅最大值处或附近的激光谐振腔中的放大引起线窄的显着改善。 公开了几种优选的方法,用于调谐基于标准具的输出耦合器以匹配由基于光栅的线窄化模块选择的波长。

    Compact high resolution grating spectrometer
    122.
    发明授权
    Compact high resolution grating spectrometer 有权
    紧凑型高分辨率光栅光谱仪

    公开(公告)号:US6061129A

    公开(公告)日:2000-05-09

    申请号:US236148

    申请日:1999-01-22

    IPC分类号: G01J3/18 G01J3/22

    CPC分类号: G01J3/22 G01J3/18

    摘要: A compact high resolution grating spectrometer. A beam of expanding light from a light source is collimated and the collimated beam is expanded with a beam expander before illuminating a reflecting grating. The expansion of the beam permits high resolution in a small package. In preferred embodiments mirror arrangements are provided to produce double reflections off the reflecting grating to further improve the resolution of the spectrometer.

    摘要翻译: 紧凑型高分辨率光栅光谱仪。 来自光源的扩展光束被准直,并且在照射反射光栅之前用光束扩展器扩展准直光束。 梁的扩展允许在小包装中的高分辨率。 在优选实施例中,提供反射镜布置以产生离开反射光栅的双反射,以进一步提高光谱仪的分辨率。

    Narrow band laser with etalon based output coupler
    123.
    发明授权
    Narrow band laser with etalon based output coupler 有权
    窄带激光器与基于标准具的输出耦合器

    公开(公告)号:US6028879A

    公开(公告)日:2000-02-22

    申请号:US204111

    申请日:1998-12-02

    摘要: A line narrowed laser having a grating based line narrowing module, etalon-based line narrowing output coupler and a technique for tuning the laser. The etalon based output coupler is adjusted to preferentially reflect light at or near the spectral maximum produced by the grating. Substantial improvement in line narrowing results from the amplification in the laser resonance chamber of light at or near the grating spectral maximum which is preferentially reflected by the etalon based output coupler. Several preferred methods are disclosed for tuning the etalon based output coupler to match the wavelength selected by the grating based line narrowing module.

    摘要翻译: 具有基于光栅的线窄化模块,基于标准具的线窄输出耦合器和调谐激光技术的线窄化激光器。 调整基于标准信号的输出耦合器以优先反射由光栅产生的光谱最大值处或附近的光。 由于在基于标准具的输出耦合器优先反射的光栅最大值处或附近的激光谐振腔中的放大引起线窄的显着改善。 公开了几种优选的方法,用于调谐基于标准具的输出耦合器以匹配由基于光栅的线窄化模块选择的波长。

    Multi-pass spectrometer
    126.
    发明授权
    Multi-pass spectrometer 失效
    多光谱仪

    公开(公告)号:US5835210A

    公开(公告)日:1998-11-10

    申请号:US926948

    申请日:1997-09-10

    IPC分类号: G01J3/22 G01J3/18

    CPC分类号: G01J3/18

    摘要: A multi-pass spectrometer. Light from a source is expanded and collimated with a collimating optic into a collimated beam. The collimated beam illuminates a dispersing optic such as a grating from which light is reflected back toward the collimating optic. A transmitting-reflecting optic is positioned across the collimated beam to cause at least two reflections of at least a portion of the collimated beam from the dispersing optic. A photometer measures the double dispersed beam at a range of spacial locations in order to determine spectral characteristics of the light from the light source. In a preferred embodiment, a partially reflecting mirror is positioned between the grating and a collimated optic. This mirror is positioned at an angle slightly different from 90 degrees so that a portion of the light reflected from the dispersing optic is reflected back toward the dispersing optic at a slightly different range of angles. A portion of this second reflected beam is dispersed again and reflected at a different range of angles by the dispersing optic. A portion of this second reflected beam transmits the partially reflecting mirror and may be focused, and the intensity of the light at spatially distinct positions are measured by a photometer to access spectral characteristics of the light source. In a second preferred embodiment, the light from a third reflected beam is measured.

    摘要翻译: 多通光谱仪。 来自源的光被扩展并且用准直光学器件准直成准直光束。 准直光束照射诸如光栅的分散光学器件,光从该光栅反射回准直光学元件。 发射反射光学器件被定位在准直光束两端,以引起来自分光镜的准直光束的至少一部分的至少两次反射。 光度计在一定范围的空间位置测量双分散光束,以便确定来自光源的光的光谱特性。 在优选实施例中,部分反射镜位于光栅和准直光学元件之间。 该镜被定位成与90度稍微不同的角度,使得从分散光学镜反射的光的一部分以稍微不同的角度范围向着分散光学器件反射回来。 该第二反射光束的一部分再次分散,并通过分散光学器件以不同的角度范围反射。 该第二反射光束的一部分透射部分反射镜并且可以被聚焦,并且通过光度计测量空间不同位置处的光的强度,以访问光源的光谱特性。 在第二优选实施例中,测量来自第三反射光束的光。

    Light collector mirror cleaning
    127.
    发明授权
    Light collector mirror cleaning 有权
    集光镜清洗

    公开(公告)号:US09073098B2

    公开(公告)日:2015-07-07

    申请号:US13473529

    申请日:2012-05-16

    摘要: A collector mirror of an extreme ultraviolet light source is cleaned by removing the collector mirror from a chamber of the extreme ultraviolet light source; mounting the collector mirror to a carrier; inserting the carrier with the collector mirror into a cleaning tank; applying a cleaning agent to a reflective surface of the collector mirror by spraying the cleaning agent through a plurality of nozzles directed toward the collector mirror reflective surface until the collector mirror reflective surface is clean; rinsing the applied cleaning agent from the collector mirror reflective surface; and drying the collector mirror reflective surface.

    摘要翻译: 通过从极紫外光源的室中除去集光镜来清洁极紫外光源的集光镜; 将集电镜安装到载体上; 将带有收集镜的载体插入清洗槽中; 通过喷射清洁剂通过指向集光镜反射表面的多个喷嘴将清洁剂施加到收集反射镜的反射表面,直到收集器反射表面清洁; 从收集器反射表面冲洗所施加的清洁剂; 并干燥收集器反射镜。

    Debris protection system having a magnetic field for an EUV light source
    128.
    发明授权
    Debris protection system having a magnetic field for an EUV light source 有权
    具有用于EUV光源的磁场的碎片保护系统

    公开(公告)号:US08519366B2

    公开(公告)日:2013-08-27

    申请号:US12221822

    申请日:2008-08-06

    IPC分类号: H05G2/00

    摘要: Devices are disclosed herein which may comprise a vessel; a material disposed in the vessel for creating an EUV light emitting plasma at a plasma site, the plasma generating debris; a near normal incidence EUV reflective optic disposed in the vessel; and a source of a magnetic field for deflecting debris in the vessel to protect the optic, the source positioned to interpose the optic between the source and the plasma site.

    摘要翻译: 本文公开的装置可以包括容器; 设置在容器中的用于在等离子体位置处产生EUV发光等离子体的材料,等离子体产生碎片; 设置在容器中的近似正常入射的EUV反射光学器件; 以及用于偏转容器中的碎屑以保护光学元件的磁场源,所述源被定位成将光学元件插入在源和等离子体位置之间。

    Laser System
    129.
    发明申请
    Laser System 有权
    激光系统

    公开(公告)号:US20120002687A1

    公开(公告)日:2012-01-05

    申请号:US13231882

    申请日:2011-09-13

    IPC分类号: H01S3/10

    摘要: A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage.

    摘要翻译: 一种方法和装置可以包括线变窄的脉冲准分子或分子氟气放电激光系统,其可以包括种子激光振荡器,其产生包括可以包括第一气体放电准分子或分子氟激光室的脉冲的激光输出光束的输出; 第一振荡器腔内的线窄模块; 在第二气体放电准分子或分子氟激光室中包含放大增益介质的激光放大级,其接收种子激光振荡器的输出并放大种子激光振荡器的输出,以形成激光系统输出,其包括激光输出光束 脉冲,其可以包括环形功率放大级。

    LPP EUV Light Source Drive Laser System
    130.
    发明申请
    LPP EUV Light Source Drive Laser System 有权
    LPP EUV光源驱动激光系统

    公开(公告)号:US20110192995A1

    公开(公告)日:2011-08-11

    申请号:US13087207

    申请日:2011-04-14

    IPC分类号: H05G2/00

    CPC分类号: H05G2/003 H05G2/008

    摘要: An apparatus and method is disclosed which includes or employs an EUV light source comprising a laser device outputting a laser beam, a beam delivery system directing the laser beam to an irradiation site, and a material for interaction with the laser beam at the irradiation site to create an EUV light emitting plasma for use in processing substrates.

    摘要翻译: 公开了一种装置和方法,其包括或使用包括输出激光束的激光装置的EUV光源,将激光束引导到照射部位的光束传递系统,以及用于在照射部位与激光束相互作用的材料 创建用于处理衬底的EUV发光等离子体。