公开(公告)号：US20170097572A1

公开(公告)日：2017-04-06

申请号：US15374533

申请日：2016-12-09

申请人： David C. Brandt ,  Alexander I. Ershov ,  Igor V. Fomenkov

发明人： David C. Brandt ,  Alexander I. Ershov ,  Igor V. Fomenkov

IPC分类号： G03F7/20 ,  H05G2/00 ,  G02B19/00 ,  G21K1/06 ,  G02B5/08 ,  G02B5/09

CPC分类号： G03F7/7015 ,  G02B5/0891 ,  G02B5/09 ,  G02B19/0019 ,  G02B19/0095 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70916 ,  G03F7/70933 ,  G21K1/062 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： A reflective EUV optic such as a collector mirror configured as an array of facets that are spaced apart to form respective gaps between adjacent facets. The gaps are used as inlets for gas flow across one of the facets such that flow is introduced parallel to the optic surface. The facets can be made with offsets such that loss of reflective area of the EUV optic can be minimized. The gas facilitates removal of target material from the surface of the facets.

公开(公告)号：US08785892B2

公开(公告)日：2014-07-22

申请号：US13493871

申请日：2012-06-11

申请人： Alexander I. Ershov ,  Igor V. Fomenkov

发明人： Alexander I. Ershov ,  Igor V. Fomenkov

IPC分类号： H05H1/00 ,  H05H1/24 ,  G21K5/04

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70916 ,  H05G2/005 ,  H05G2/008 ,  Y10S422/906

摘要： Devices and corresponding methods of use are described herein that may include an enclosing structure defining a closed loop flow path and a system generating a plasma at a plasma site, e.g. laser produced plasma system, where the plasma site may be in fluid communication with the flow path. For the device, a gas may be disposed in the enclosing structure which may include an ion-stopping buffer gas and/or an etchant. A pump may be provided to force the gas through the closed loop flow path. One or more heat exchangers removing heat from gas flowing in the flow path may be provided. In some arrangements, a filter may be used to remove at least a portion of a target species from gas flowing in the flow path.

摘要翻译： 本文描述了设备和相应的使用方法，其可以包括限定闭环流动路径的封闭结构和在等离子体位置处产生等离子体的系统，例如， 激光产生的等离子体系统，其中等离子体位置可以与流动路径流体连通。 对于该装置，气体可以设置在封闭结构中，其可以包括离子停止缓冲气体和/或蚀刻剂。 可以提供泵以迫使气体通过闭环流动路径。 可以提供一种或多种热交换器来从流动路径中流动的气体中除去热量。 在一些布置中，可以使用过滤器来从在流动路径中流动的气体中去除至少一部分目标物种。

公开(公告)号：US08633459B2

公开(公告)日：2014-01-21

申请号：US13088166

申请日：2011-04-15

申请人： Alexander N. Bykanov ,  Silvia De Dea ,  Alexander I. Ershov ,  Vladimir B. Fleurov ,  Igor V. Fomenkov ,  William N. Partlo

发明人： Alexander N. Bykanov ,  Silvia De Dea ,  Alexander I. Ershov ,  Vladimir B. Fleurov ,  Igor V. Fomenkov ,  William N. Partlo

IPC分类号： H05G2/00

CPC分类号： H05G2/008 ,  G03F7/70925 ,  H05G2/005

摘要： An extreme-ultraviolet (EUV) light source is described herein comprising an optic; a primary EUV light radiator generating an EUV light emitting plasma and producing a deposit on said optic; and a cleaning system comprising a gas and a secondary light radiator, the secondary light radiator generating a laser produced plasma and producing a cleaning species with the gas.

摘要翻译： 本文描述了一种极光紫外（EUV）光源，其包括光学元件; 产生EUV发光等离子体并在所述光学器件上产生沉积物的主要EUV光辐射体; 以及包括气体和次级光辐射器的清洁系统，所述次级光辐射体产生激光产生的等离子体并且产生具有气体的清洁物质。

公开(公告)号：US08461560B2

公开(公告)日：2013-06-11

申请号：US13087207

申请日：2011-04-14

申请人： Alexander I. Ershov ,  Alexander N. Bykanov ,  Oleh V. Khodykin ,  Igor V. Fomenkov

发明人： Alexander I. Ershov ,  Alexander N. Bykanov ,  Oleh V. Khodykin ,  Igor V. Fomenkov

IPC分类号： G01N21/00 ,  G01N21/33 ,  H05G2/00

CPC分类号： H05G2/003 ,  H05G2/008

摘要： An apparatus and method is disclosed which includes or employs an EUV light source comprising a laser device outputting a laser beam, a beam delivery system directing the laser beam to an irradiation site, and a material for interaction with the laser beam at the irradiation site to create an EUV light emitting plasma for use in processing substrates.

摘要翻译： 公开了一种装置和方法，其包括或使用包括输出激光束的激光装置的EUV光源，将激光束引导到照射部位的光束传递系统，以及用于在照射部位与激光束相互作用的材料 创建用于处理衬底的EUV发光等离子体。

公开(公告)号：US20120313016A1

公开(公告)日：2012-12-13

申请号：US13156188

申请日：2011-06-08

申请人： Vladimir B. Fleurov ,  William N. Partlo ,  Igor V. Fomenkov ,  Alexander I. Ershov

发明人： Vladimir B. Fleurov ,  William N. Partlo ,  Igor V. Fomenkov ,  Alexander I. Ershov

IPC分类号： G21K5/00

CPC分类号： H05G2/005 ,  H05G2/008

摘要： An extreme-ultraviolet (EUV) light source comprising an optic, a target material, and a laser beam passing through said optic along a beam path to irradiate said target material. The EUV light source further includes a system generating a gas flow directed toward said target material along said beam path, said system having a tapering member surrounding a volume and a plurality of gas lines, each gas line outputting a gas stream into said volume.

摘要翻译： 一种极紫外（EUV）光源，包括光学元件，目标材料和沿着光束路径通过所述光学元件以照射所述目标材料的激光束。 EUV光源还包括沿着所述光束路径产生朝向所述目标材料的气流的系统，所述系统具有包围体积和多条气体管线的锥形构件，每条气体管线将气流输送到所述体积中。

公开(公告)号：US08304752B2

公开(公告)日：2012-11-06

申请号：US12638413

申请日：2009-12-15

申请人： Igor V. Fomenkov ,  Alexander I. Ershov ,  William N. Partlo ,  Jason Paxton ,  Nam-Hyong Kim ,  Jerzy R. Hoffman

发明人： Igor V. Fomenkov ,  Alexander I. Ershov ,  William N. Partlo ,  Jason Paxton ,  Nam-Hyong Kim ,  Jerzy R. Hoffman

IPC分类号： G01J1/04 ,  G01J1/18

CPC分类号： H01S3/2232 ,  G03F7/70033 ,  H01S3/0014 ,  H01S3/0407 ,  H01S3/041 ,  H01S3/086 ,  H01S3/2308 ,  H05G2/008

摘要： A method for producing extreme ultraviolet light includes producing a target material at a target location; supplying pump energy to a gain medium of at least one optical amplifier that has an amplification band to produce an amplified light beam; propagating the amplified light beam through the gain medium using one or more optical components of a set of optical components; delivering the amplified light beam to the target location using one or more optical components of the optical component set; producing with a guide laser a guide laser beam that has a wavelength outside of the amplification band of the gain medium and inside the wavelength range of the optical components; and directing the guide laser beam through the optical component set to thereby align one or more optical components of the optical component set.

摘要翻译： 用于生产极紫外光的方法包括在目标位置产生目标材料; 向具有放大频带的至少一个光放大器的增益介质提供泵浦能量以产生放大的光束; 使用一组光学部件的一个或多个光学部件将放大的光束传播通过增益介质; 使用所述光学部件组的一个或多个光学部件将放大的光束传送到目标位置; 用导向激光器产生具有波长在增益介质的放大频带之外且在光学部件的波长范围内的引导激光束; 并且引导所述引导激光束通过所述光学部件组，从而对准所述光学部件组的一个或多个光学部件。

公开(公告)号：US08017924B2

公开(公告)日：2011-09-13

申请号：US12322669

申请日：2009-02-04

申请人： Alexander N. Bykanov ,  Igor V. Fomenkov ,  Alexander I. Ershov

发明人： Alexander N. Bykanov ,  Igor V. Fomenkov ,  Alexander I. Ershov

IPC分类号： H01J35/20

CPC分类号： H05G2/003 ,  G03F7/70033 ,  H01S3/0064 ,  H01S3/073 ,  H01S3/0805 ,  H01S3/08054 ,  H01S3/08059 ,  H01S3/083 ,  H01S3/10092 ,  H01S3/105 ,  H01S3/1066 ,  H01S3/115 ,  H01S3/121 ,  H01S3/127 ,  H01S3/2232 ,  H01S3/2316 ,  H01S3/2325 ,  H01S3/2383 ,  H05G2/008

摘要： An LPP EUV light source is disclosed having an optic positioned in the plasma chamber for reflecting EUV light generated therein and a laser input window. For this aspect, the EUV light source may be configured to expose the optic to a gaseous etchant pressure for optic cleaning while the window is exposed to a lower gaseous etchant pressure to avoid window coating deterioration. In another aspect, an EUV light source may comprise a target material positionable along a beam path to participate in a first interaction with light on the beam path; an optical amplifier; and at least one optic directing photons scattered from the first interaction into the optical amplifier to produce a laser beam on the beam path for a subsequent interaction with the target material to produce an EUV light emitting plasma.

摘要翻译： 公开了一种LPP EUV光源，其具有位于等离子体室中的光学器件，用于反射在其中产生的EUV光和激光输入窗口。 对于该方面，EUV光源可以被配置为将窗口暴露于更低的气体蚀刻剂压力以将窗口暴露于气体蚀刻剂压力以进行光学清洁，以避免窗口涂层变质。 在另一方面，EUV光源可以包括沿着光束路径定位以参与与光束路径上的光的第一相互作用的目标材料; 光放大器; 以及至少一个光导向光子从第一相互作用散射到光放大器中以在光束路径上产生激光束，用于随后与目标材料的相互作用以产生EUV发光等离子体。

公开(公告)号：US07999915B2

公开(公告)日：2011-08-16

申请号：US11981450

申请日：2007-10-30

申请人： Alexander I. Ershov ,  William N. Partlo ,  Daniel J. W. Brown ,  Igor V. Fomenkov ,  Robert A. Bergstedt ,  Ivan Lalovic

发明人： Alexander I. Ershov ,  William N. Partlo ,  Daniel J. W. Brown ,  Igor V. Fomenkov ,  Robert A. Bergstedt ,  Ivan Lalovic

IPC分类号： G03B27/32 ,  G03B27/42 ,  G03B27/54 ,  H01S3/10 ,  H01S3/22

CPC分类号： G03F7/70625 ,  G03F7/70025 ,  G03F7/70583 ,  G03F7/70616 ,  H01S3/08004 ,  H01S3/08059 ,  H01S3/10092 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2308

摘要： A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage.

摘要翻译： 一种方法和装置可以包括线变窄的脉冲准分子或分子氟气放电激光系统，其可以包括种子激光振荡器，其产生包括可以包括第一气体放电准分子或分子氟激光室的脉冲的激光输出光束的输出; 第一振荡器腔内的线窄模块; 在第二气体放电准分子或分子氟激光室中包含放大增益介质的激光放大级，其接收种子激光振荡器的输出并放大种子激光振荡器的输出，以形成激光系统输出，其包括激光输出光束 脉冲，其可以包括环形功率放大级。

公开(公告)号：US20100294953A1

公开(公告)日：2010-11-25

申请号：US12721317

申请日：2010-03-10

申请人： Georgiy O. Vaschenko ,  Alexander I. Ershov ,  Richard L. Sandstrom

发明人： Georgiy O. Vaschenko ,  Alexander I. Ershov ,  Richard L. Sandstrom

IPC分类号： H05G2/00

CPC分类号： B82Y10/00 ,  G03F7/70033 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

摘要： A device is disclosed herein which may include a plasma generating system comprising a source of target material droplets and a laser producing a beam irradiating the droplets at an irradiation region, the plasma producing EUV radiation, wherein the droplet source comprises a fluid exiting an orifice and a sub-system producing a disturbance in the fluid which generates droplets having differing initial velocities causing the spacing between at least some adjacent droplets to decrease as the droplets travel to the irradiation region.

摘要翻译： 本文公开了一种装置，其可以包括等离子体产生系统，其包括目标材料液滴源和产生在照射区域照射液滴的光束的激光器，等离子体产生EUV辐射，其中液滴源包括离开孔口的流体， 产生流体中的扰动的子系统产生具有不同初始速度的液滴，导致至少一些相邻液滴之间的间隔随着液滴行进到照射区域而减小。

公开(公告)号：US20100258750A1

公开(公告)日：2010-10-14

申请号：US12725178

申请日：2010-03-16

申请人： William N. Partlo ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  Chris C. Chrobak ,  James H. Crouch

发明人： William N. Partlo ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  Chris C. Chrobak ,  James H. Crouch

IPC分类号： G21K5/02 ,  G21K5/10

CPC分类号： H05G2/005 ,  G03F7/70033 ,  G21K5/00 ,  H05G2/003 ,  H05G2/006

摘要： An extreme ultraviolet light system includes a drive laser system, an extreme ultraviolet light chamber including an extreme ultraviolet light collector and a target material dispenser including a target material outlet capable of outputting a plurality of portions of target material along a target material path, wherein the target material outlet is adjustable. The extreme ultraviolet light system further includes a drive laser steering device, a detection system including at least one detector directed to detect a reflection of the drive laser reflected from the first one of the plurality of portions of target material and a controller coupled to the target material dispenser, the detector system and the drive laser steering device. The controller includes logic for detecting a location of a first one of the plurality of portions of target material from a first light reflected from the first target material and logic for adjusting the target material dispenser outlet to output a subsequent one of the plurality of portions of target material to a waist of the focused drive laser. A method for generating an extreme ultraviolet light is also disclosed. A system and a method for optimizing an extreme ultraviolet light output is also disclosed.

摘要翻译： 一种极紫外光系统包括驱动激光系统，包括极紫外光收集器的极紫外光室和包括能够沿目标材料路径输出多个目标材料部分的靶材料出口的目标材料分配器，其中， 目标材料出口可调。 所述极紫外光系统还包括驱动激光转向装置，所述检测系统包括至少一个检测器，所述检测器被引导以检测从所述目标材料的所述多个部分中的第一部分反射的所述驱动激光的反射;以及耦合到所述目标的控制器 材料分配器，检测器系统和驱动激光转向装置。 所述控制器包括用于从第一目标材料反射的第一光检测多个目标材料部分中的第一部分的位置的逻辑，以及用于调整目标材料分配器出口的逻辑，以输出多个部分中的后续部分 目标材料到聚焦驱动激光的腰部。 还公开了一种用于产生极紫外光的方法。 还公开了一种用于优化极紫外光输出的系统和方法。