公开(公告)号：US08675210B2

公开(公告)日：2014-03-18

申请号：US13603168

申请日：2012-09-04

申请人： Arie Jeffrey Den Boef ,  Jozef Petrus Henricus Benschop ,  Ralph Brinkhof ,  Willem Jurrianus Venema ,  Lukasz Jerzy Macht ,  Laurent Khuat Duy ,  Dimitra Sarri

发明人： Arie Jeffrey Den Boef ,  Jozef Petrus Henricus Benschop ,  Ralph Brinkhof ,  Willem Jurrianus Venema ,  Lukasz Jerzy Macht ,  Laurent Khuat Duy ,  Dimitra Sarri

IPC分类号： G01B11/14

CPC分类号： G03F9/7034 ,  G01B11/0625 ,  G03F9/7088

摘要： A level sensor for measuring a position of a surface of a substrate includes a projection unit including an emitter for emitting a radiation beam towards the substrate and a projection grating including a measurement grating and an aperture, such that the radiation beam incident on the projection grating is divided into a measurement radiation beam and a capture radiation beam. The level sensor further includes a detection unit including a first and second measurement detector, a first and second capture detector, a detection grating, and a first and second optical unit. The detection grating includes a ruled grating with multiple rules, which direct radiation towards the first and second measurement detector via the first and second optical unit, and a capture element directing radiation towards the first and second capture detector via the first and second optical unit.

摘要翻译： 用于测量衬底表面的位置的电平传感器包括：投影单元，包括用于向衬底发射辐射束的发射器和包括测量光栅和孔的投影光栅，使得入射在投影光栅上的辐射束 被分为测量辐射束和捕获辐射束。 液位传感器还包括检测单元，其包括第一和第二测量检测器，第一和第二捕获检测器，检测光栅以及第一和第二光学单元。 检测光栅包括具有多个规则的格状光栅，其经由第一和第二光学单元将辐射引向第一和第二测量检测器;以及捕获元件，经由第一和第二光学单元将辐射引向第一和第二捕获检测器。

公开(公告)号：US08488107B2

公开(公告)日：2013-07-16

申请号：US13178965

申请日：2011-07-08

申请人： Arie Jeffrey Den Boef ,  Frank Staals ,  Lukasz Jerzy Macht

发明人： Arie Jeffrey Den Boef ,  Frank Staals ,  Lukasz Jerzy Macht

IPC分类号： G03B27/58

CPC分类号： G01B11/0608 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/7034 ,  G03F9/7088

摘要： The invention provides a level sensor configured to determine a height level of a surface of a substrate supported on a movable substrate support, the level sensor including multiple projection units, multiple detection units, and a processing unit to calculate a height level for each of a plurality of measurement locations on the basis of the measurement beams from the projection units, wherein the level sensor is configured to measure height levels simultaneously at multiple measurement locations on the substrate, wherein the substrate support is configured to move the substrate in a first direction substantially parallel to the surface of the substrate to measure a height level at different locations on the substrate, and wherein at least part of the multiple measurement locations are at least spaced in a second direction that is substantially parallel to the surface of the substrate and perpendicular to the first direction.

摘要翻译： 本发明提供了一种水平传感器，其被配置为确定支撑在可移动衬底支撑件上的衬底的表面的高度水平，所述液位传感器包括多个投影单元，多个检测单元和处理单元，以计算每个 基于来自所述投影单元的测量光束的多个测量位置，其中所述液位传感器被配置为在所述基板上的多个测量位置处同时测量高度水平，其中所述基板支撑件被配置成基本上在第一方向上移动所述基板 平行于衬底的表面以测量衬底上不同位置处的高度水平，并且其中多个测量位置的至少一部分在基本上平行于衬底的表面并且垂直于衬底的第二方向上至少间隔开 第一个方向。

公开(公告)号：US08319968B2

公开(公告)日：2012-11-27

申请号：US12556818

申请日：2009-09-10

申请人： Arie Jeffrey Den Boef ,  Andre Bernardus Jeunink ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Pascal Antonius Smits ,  Sander Frederik Wuister ,  Yvonne Wendela Kruijt-Stegeman ,  Catharinus De Schiffart

发明人： Arie Jeffrey Den Boef ,  Andre Bernardus Jeunink ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Pascal Antonius Smits ,  Sander Frederik Wuister ,  Yvonne Wendela Kruijt-Stegeman ,  Catharinus De Schiffart

IPC分类号： G01B11/00

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/7049

摘要： A method of determining a position of a substrate relative to an imprint template is described, wherein the imprint template has at least three gratings and the substrate has at least three gratings positioned such that each imprint template grating forms a composite grating with an associated substrate grating, the at least three imprint template gratings and associated substrate gratings having offsets relative to one another. The method includes detecting an intensity of radiation which is reflected by the three composite gratings, and using the detected intensities to determine displacement of the substrate or imprint template from a position.

摘要翻译： 描述了确定衬底相对于压印模板的位置的方法，其中压印模板具有至少三个光栅，并且衬底具有至少三个定位的光栅，使得每个压印模板光栅与相关联的衬底光栅形成复合光栅 ，所述至少三个压印模板光栅和相关联的衬底光栅相对于彼此具有偏移。 该方法包括检测由三个复合光栅反射的辐射强度，并且使用检测到的强度来确定基板或压印模板从位置的位移。

公开(公告)号：US08031337B2

公开(公告)日：2011-10-04

申请号：US12493606

申请日：2009-06-29

申请人： Arie Jeffrey Den Boef

发明人： Arie Jeffrey Den Boef

IPC分类号： G01J3/28 ,  G01J3/06

CPC分类号： G01N21/956 ,  G01N21/47 ,  G03F7/70625 ,  G03F7/70633 ,  G03F9/7065

摘要： An angularly resolved scatterometer uses a broadband radiation source and an acousto-optical tunable filter to select one or more narrowband components from the broadband beam emitted by the source for use in measurements. A feedback loop can be used to control the intensity of the selected narrowband components to reduce noise.

摘要翻译： 角度分辨的散射仪使用宽带辐射源和声光可调谐滤波器从源发射的宽带光束中选择一个或多个窄带分量用于测量。 可以使用反馈回路来控制所选窄带分量的强度以降低噪声。

公开(公告)号：US20110095455A1

公开(公告)日：2011-04-28

申请号：US12912586

申请日：2010-10-26

申请人： Yvonne Wendela KRUIJT-STEGEMAN ,  Arie Jeffrey Den Boef ,  Andre Bernardus Jeunink

发明人： Yvonne Wendela KRUIJT-STEGEMAN ,  Arie Jeffrey Den Boef ,  Andre Bernardus Jeunink

IPC分类号： B29C59/02

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/7076

摘要： An imprint lithography template is provided with an alignment mark, wherein the alignment mark is formed from dielectric material having a refractive index which differs from the refractive index of the imprint lithography template, the dielectric material having a thickness which is such that it provides a phase difference between alignment radiation which has passed through the dielectric material and alignment radiation which has not passed through the dielectric material.

摘要翻译： 压印光刻模板设置有对准标记，其中对准标记由具有不同于压印光刻模板的折射率的折射率的介电材料形成，所述电介质材料具有使得其提供相位的厚度 通过电介质材料的取向辐射与未通过电介质材料的对准辐射之间的差异。

公开(公告)号：US20110043795A1

公开(公告)日：2011-02-24

申请号：US12805808

申请日：2010-08-19

申请人： Arie Jeffrey Den Boef ,  Vadim Yevgenyevich Banine ,  Sander Frederik Wuister ,  Luigi Scaccabarozzi

发明人： Arie Jeffrey Den Boef ,  Vadim Yevgenyevich Banine ,  Sander Frederik Wuister ,  Luigi Scaccabarozzi

IPC分类号： G01N21/01

CPC分类号： G01N21/95623

摘要： In an aspect, an inspection method for detecting the presence or absence of a defect on an object, the object comprising a recess having a physical depth, is disclosed. The method includes directing radiation at the object, the radiation having a wavelength that is substantially equal to twice an optical depth of the recess, detecting radiation that is re-directed by the object or a defect on the object, and determining the presence or absence of a defect from the re-directed radiation.

摘要翻译： 在一方面，公开了一种用于检测物体上缺陷的存在或不存在的检查方法，该物体包括具有物理深度的凹部。 该方法包括在物体上引导辐射，辐射具有基本上等于凹部的光学深度的两倍的波长，检测由对象重新引导的辐射或物体上的缺陷，以及确定存在或不存在 来自重新导向的辐射的缺陷。

公开(公告)号：US07880889B2

公开(公告)日：2011-02-01

申请号：US12504855

申请日：2009-07-17

申请人： Arie Jeffrey Den Boef

发明人： Arie Jeffrey Den Boef

IPC分类号： G01N21/47 ,  G01B1/00

CPC分类号： G01N21/47 ,  G01N21/956 ,  G01N2021/95615

摘要： An inspection method is provided to determine a value related to a parameter of a target pattern printed on a substrate by a lithographic process used to manufacture a device layer on a substrate. The inspection method can include using an optical system with a high-NA objective lens, where the high-NA objective lens includes an object plane and a pupil plane. The inspection method can also include providing an aperture member to define at least one obscuration, determining a radial distance between a radially innermost point of each dark area and a nominal center of an image in a pupil plane, and determining an axial distance between the target and an object plane from the determined radial distance.

摘要翻译： 提供了一种检查方法，用于通过用于制造衬底上的器件层的光刻工艺来确定与印刷在衬底上的目标图案的参数相关的值。 检查方法可以包括使用具有高NA物镜的光学系统，其中高NA物镜包括物平面和瞳面。 检查方法还可以包括提供孔径构件以限定至少一个遮蔽，确定每个暗区域的径向最内点与瞳孔平面中的图像的标称中心之间的径向距离，以及确定目标之间的轴向距离 和从所确定的径向距离的物平面。

公开(公告)号：US07852459B2

公开(公告)日：2010-12-14

申请号：US11701516

申请日：2007-02-02

申请人： Arie Jeffrey Den Boef ,  Stanislav Y. Smirnov ,  Adel Joobeur

发明人： Arie Jeffrey Den Boef ,  Stanislav Y. Smirnov ,  Adel Joobeur

IPC分类号： G03B27/42

CPC分类号： G03F7/70625

摘要： A scatterometer has a radiation source capable of emitting radiation in distinct first and second wavelength ranges. An adjustable optical element is provided to effect a chromatic correction as necessary according to which wavelength range is in use. A single scatterometer can thereby effect measurements using widely separated wavelengths.

摘要翻译： 散射仪具有能够以不同的第一和第二波长范围发射辐射的辐射源。 提供可调节的光学元件以根据所使用的波长范围根据需要实现色彩校正。 因此，单个散射仪可以使用广泛分离的波长来实现测量。

公开(公告)号：US07834975B2

公开(公告)日：2010-11-16

申请号：US11441348

申请日：2006-05-26

申请人： Jacobus Burghoorn ,  Jan Hauschild ,  Arie Jeffrey Den Boef ,  Martinus Hendrikus Antonius Leenders ,  Uwe Mickan ,  Roeland Nicolaas Maria Vanneer

发明人： Jacobus Burghoorn ,  Jan Hauschild ,  Arie Jeffrey Den Boef ,  Martinus Hendrikus Antonius Leenders ,  Uwe Mickan ,  Roeland Nicolaas Maria Vanneer

IPC分类号： G03B27/42

CPC分类号： G03F7/70641 ,  G03F7/70283 ,  G03F9/7026 ,  G03F9/7069

摘要： A method for performing a tilted focus test includes the steps of providing a target object, providing a projection beam of radiation using a radiation source, providing a reflective device to introduce a projected projection beam of radiation onto the target portion, introducing a first projected projection beam of radiation onto the target object using the reflective device in a first orientation, using a tilting device for tilting the reflective device to a second orientation to provide a second projection beam with a tilt relative to said first projection beam, introducing a second projected projection beam of radiation onto the target object, and determining a lateral shift of the first and second projected projection beams on the target object and determining from said lateral shift a defocus of the target object with respect to the projected projection beam.

摘要翻译： 执行倾斜聚焦测试的方法包括以下步骤：提供目标物体，使用辐射源提供辐射投影光束，提供反射装置以将投射的投影射束投射到目标部分上，引入第一投射投影 使用倾斜装置将反射装置倾斜到第二取向以提供具有相对于所述第一投影光束的倾斜的第二投影光束，引入第二投射投影 确定目标物体上的第一和第二投影投影光束的横向位移，并根据所述横向偏移确定目标物体相对于投影投影光束的散焦。

公开(公告)号：US07738103B2

公开(公告)日：2010-06-15

申请号：US12258719

申请日：2008-10-27

申请人： Antione Gaston Marie Kiers ,  Arie Jeffrey Den Boef ,  Hugo Augustinus Joseph Cramer

发明人： Antione Gaston Marie Kiers ,  Arie Jeffrey Den Boef ,  Hugo Augustinus Joseph Cramer

IPC分类号： G01B9/08 ,  G01B11/00 ,  G01N21/00

CPC分类号： G03F7/70633 ,  G01N21/47 ,  G03F1/36 ,  G03F1/68

摘要： In a method for determining a structure parameter of a target pattern, a first series of calibration spectra are determined from at least one reference pattern, each spectra being determined using a different known value of at least one structure parameter of the respective reference pattern. The first series of calibration spectra does not take into account parameters of an apparatus used to produce the reference pattern. A representation of each of the first series calibration spectra is stored in a central library. A second series of calibration spectra corresponding to at least one of the stored spectra for a target spectrum is determined using the parameters of the apparatus for measuring the target spectrum. A measured target spectrum is produced by directing a beam of radiation onto the target pattern. The measured target spectrum and the second series of calibration spectra are compared, where this comparison is used to derive a value for the structure parameter of the target pattern.

摘要翻译： 在用于确定目标图案的结构参数的方法中，从至少一个参考图案确定第一系列校准光谱，每个光谱使用相应参考图案的至少一个结构参数的不同已知值来确定。 第一系列校准光谱没有考虑用于产生参考图案的装置的参数。 每个第一系列校准光谱的表示存储在中央库中。 使用用于测量目标光谱的装置的参数来确定对应于目标光谱的存储光谱中的至少一个的第二系列校准光谱。 通过将辐射束引导到目标图案上来产生测量的目标光谱。 比较测量的目标光谱和第二系列校准光谱，其中该比较用于导出目标图案的结构参数的值。