公开(公告)号：US08653491B2

公开(公告)日：2014-02-18

申请号：US12725178

申请日：2010-03-16

Applicant: William N. Partlo ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  Chris C. Chrobak ,  James H. Crouch

Inventor： William N. Partlo ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  Chris C. Chrobak ,  James H. Crouch

IPC: H01G2/00 ,  H05G2/00 ,  G03F7/20

CPC classification number: H05G2/005 ,  G03F7/70033 ,  G21K5/00 ,  H05G2/003 ,  H05G2/006

Abstract: An extreme ultraviolet light system and method includes a drive laser, a chamber including an extreme ultraviolet light collector and a target material dispenser including an adjustable target material outlet capable of outputting multiple portions of target material along a target material path. Also included: a drive laser steering device, a detection system including at least one detector and a controller coupled to the target material dispenser, the detector system and the drive laser steering device. The controller includes logic for detecting a location of the first portion of target material from the first light reflected from the first portion of target material and logic for adjusting the target material dispenser outlet to output a subsequent portion of target material to a waist of the focused drive laser. A system and a method for optimizing an extreme ultraviolet light output is also disclosed.

Abstract translation: 一种极紫外光系统和方法包括驱动激光器，包括极紫外光收集器的腔室和包括可调靶材料出口的目标材料分配器，其能够沿目标材料路径输出目标材料的多个部分。 还包括：驱动激光转向装置，包括至少一个检测器和耦合到目标材料分配器的控制器，检测器系统和驱动激光转向装置的检测系统。 控制器包括用于从目标材料的第一部分反射的第一光和逻辑上检测目标材料的第一部分的位置的逻辑，用于调节目标材料分配器出口，以将目标材料的后续部分输出到聚焦的腰部 驱动激光 还公开了一种用于优化极紫外光输出的系统和方法。

公开(公告)号：US20140021374A1

公开(公告)日：2014-01-23

申请号：US13943167

申请日：2013-07-16

Applicant: XYLECO, INC.

Inventor： Marshall MEDOFF ,  Thomas Craig MASTERMAN ,  Kenny Kin-Chui IP

IPC: H02M5/458 ,  G21K5/00

CPC classification number: H02M5/458 ,  G21K5/00 ,  H02M7/49 ,  H02M2001/0077

Abstract: Methods and systems are described for providing a high frequency high voltage source. For example, a power source for use in a particle accelerator, an arc welder or an inductive heater.

Abstract translation: 描述了用于提供高频高压源的方法和系统。 例如，用于粒子加速器，电弧焊机或感应加热器的电源。

公开(公告)号：US20140019920A1

公开(公告)日：2014-01-16

申请号：US13937633

申请日：2013-07-09

Applicant: STMICROELECTRONICS (CROLLES 2) SAS

Inventor： Christian GARDIN

IPC: G06F17/50

CPC classification number: G06F17/5081 ,  G03F1/0069 ,  G03F1/0092 ,  G03F1/30 ,  G03F1/36 ,  G03F1/38 ,  G06F17/50 ,  G06F19/00 ,  G06F2217/12 ,  G06F2217/14 ,  G06K9/00 ,  G21K5/00

Abstract: A method may be for creating a photolithography mask from a set of initial mask cells arranged to form an initial mask. The set may include first and second initial mask cells having a mask element in common within an initial region of the initial mask. The method may include a creation of a first modified mask cell and of a second modified mask cell including OPC processing operations, a comparison of the position of the mask element in common between the first modified mask cell and the second modified mask cell, and if the result of the comparison is greater than a threshold, a creation of a new mask region including an optical proximity correction processing operation on the initial region, and a creation of the photolithography mask from the new mask region.

Abstract translation: 一种方法可以是用于从布置成形成初始掩模的一组初始掩模单元创建光刻掩模。 该组可以包括在初始掩模的初始区域内具有共同的掩模元件的第一和第二初始掩模单元。 该方法可以包括第一修改的屏蔽单元和包括OPC处理操作的第二修改的屏蔽单元的创建，第一修改的屏蔽单元和第二修改的屏蔽单元之间的掩模元件的位置的比较，以及如果 比较的结果大于阈值，创建包括初始区域上的光学邻近校正处理操作的新掩模区域，以及从新掩模区域创建光刻掩模。

公开(公告)号：US20130332894A1

公开(公告)日：2013-12-12

申请号：US13971381

申请日：2013-08-20

Applicant: Jun YE ,  Yen-Wen LU ,  Yu CAO

Inventor： Jun YE ,  Yen-Wen LU ,  Yu CAO

IPC: G06F17/50

CPC classification number: G06F17/5009 ,  G03F1/00 ,  G03F7/004 ,  G03F7/705 ,  G03F7/70666 ,  G06F17/5081 ,  G06F19/00 ,  G06F2217/12 ,  G06F2217/14 ,  G06T7/0004 ,  G06T2207/30148 ,  G21K5/00

Abstract: In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/or systems, and/or individual functions performed thereby or components used therein. In one embodiment, the present invention is a system and method that accelerates lithography simulation, inspection, characterization and/or evaluation of the optical characteristics and/or properties, as well as the effects and/or interactions of lithographic systems and processing techniques.

Abstract translation: 在一个方面，本发明涉及用于模拟，验证，检查，表征，确定和/或评估光刻设计，技术和/或系统的技术和系统，和/或由其执行的各个功能或使用的组件 其中。 在一个实施例中，本发明是加速光刻特性和/或性质的光刻模拟，检查，表征和/或评估以及光刻系统和处理技术的效果和/或相互作用的系统和方法。

公开(公告)号：US08586948B2

公开(公告)日：2013-11-19

申请号：US13696736

申请日：2011-06-22

Applicant: Yuehu Pu ,  Hisashi Harada ,  Taizo Honda

Inventor： Yuehu Pu ,  Hisashi Harada ,  Taizo Honda

IPC: G21K5/04

CPC classification number: G21K1/046 ,  A61N5/1043 ,  A61N5/1045 ,  A61N5/1048 ,  A61N2005/1052 ,  A61N2005/1054 ,  A61N2005/1087 ,  A61N2005/1095 ,  G21K1/10 ,  G21K5/00

Abstract: A particle beam irradiation apparatus comprises a particle beam shielding member which shields a part of a particle beam which is scanned, a prompt signal detector which detects a prompt signal which is generated when the particle beam which is scanned collides with the particle beam shielding member and a signal comparison device which predicts and obtains a generation pattern of a prompt signal which is generated with a predetermined scanning pattern and stores as a signal time pattern for comparison, wherein the signal comparison device detects an abnormality of scanning of a particle beam or the particle beam shielding member by comparing a detected signal time pattern which is a time pattern of a signal which is detected by the prompt signal detector to a signal time pattern for comparison which is stored.

Abstract translation: 粒子束照射装置包括：屏蔽被扫描的粒子束的一部分的粒子束屏蔽构件;检测当被扫描的粒子束与粒子束屏蔽构件相撞时产生的提示信号的迅速信号检测器;以及 信号比较装置，其预测并获得以预定扫描图案生成的提示信号的生成模式，并存储为用于比较的信号时间图案，其中信号比较装置检测粒子束或粒子的扫描异常 通过将作为由快速信号检测器检测的信号的时间图案的检测信号时间图案与存储的用于比较的信号时间模式进行比较来检测光束屏蔽部件。

公开(公告)号：US08586942B2

公开(公告)日：2013-11-19

申请号：US13639998

申请日：2012-01-20

Applicant: Taizo Honda ,  Hisashi Harada ,  Yuehu Pu ,  Masahiro Ikeda ,  Kazushi Hanakawa ,  Toshihiro Otani ,  Tadashi Katayose ,  Yukiko Yamada

Inventor： Taizo Honda ,  Hisashi Harada ,  Yuehu Pu ,  Masahiro Ikeda ,  Kazushi Hanakawa ,  Toshihiro Otani ,  Tadashi Katayose ,  Yukiko Yamada

IPC: H01J3/10

CPC classification number: A61N5/1048 ,  A61N5/1043 ,  A61N5/1071 ,  A61N2005/1074 ,  A61N2005/1087 ,  G01T1/29 ,  G21K5/00 ,  G21K5/02

Abstract: A charged particle beam position monitor is provided with a plurality of position monitors and a beam data processing device that performs calculation processing of the state of a charged particle beam, based on a plurality of signals outputted from the position monitors. The beam data processing device includes a plurality of channel data conversion units that perform AD conversion processing of the plurality of signals outputted from the position monitors; a position size processing unit, for each of the position monitors, that calculates the beam position of the beam, based on voltage information obtained through the AD conversion processing; and an integrated control unit that controls the plurality of channel data conversion units in such a way that while the beam is irradiated onto an irradiation subject, AD conversion processing of the signals is performed at different timings for the respective position monitors.

Abstract translation: 带电粒子束位置监视器具有多个位置监视器和根据从位置监视器输出的多个信号执行带电粒子束的状态的计算处理的波束数据处理装置。 所述波束数据处理装置包括对从所述位置监视器输出的所述多个信号进行AD转换处理的多个信道数据变换部; 基于通过AD转换处理获得的电压信息，对位置监视器中的每一个计算光束位置的位置尺寸处理单元; 以及集成控制单元，其以这样的方式控制多个通道数据转换单元，即当将光束照射到照射对象时，对于各个位置监视器，在不同的定时执行信号的AD转换处理。

公开(公告)号：US08575575B2

公开(公告)日：2013-11-05

申请号：US12725167

申请日：2010-03-16

Applicant: William N. Partlo ,  Igor V. Fomenkov

Inventor： William N. Partlo ,  Igor V. Fomenkov

IPC: H01G2/00 ,  H05G2/00 ,  G03F7/20

CPC classification number: H05G2/005 ,  G03F7/70033 ,  G21K5/00 ,  H05G2/003 ,  H05G2/006

Abstract: A system and method for an extreme ultraviolet light chamber comprising a collector mirror, a cooling system coupled to a backside of the collector mirror operative to cool a reflective surface of the collector mirror and a buffer gas source coupled to the extreme ultraviolet light chamber.

Abstract translation: 一种用于极紫外光室的系统和方法，包括收集器反射镜，耦合到收集器反射镜的后侧的冷却系统，其用于冷却收集反射镜的反射表面和耦合到极紫外光室的缓冲气体源。

公开(公告)号：US20130256567A1

公开(公告)日：2013-10-03

申请号：US13903811

申请日：2013-05-28

Applicant: GIGAPHOTON INC.

Inventor： Kouji KAKIZAKI ,  Shinji NAGAI ,  Tatsuya YANAGIDA

IPC: G21K5/00

CPC classification number: G21K5/00 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/005 ,  H05G2/008

Abstract: An extreme ultraviolet light source apparatus in which a target material is irradiated with a laser beam and turned into plasma and extreme ultraviolet light is emitted from the plasma may include: a chamber in which the extreme ultraviolet light is generated; an electromagnetic field generation unit for generating at least one of an electric field and a magnetic field inside the chamber; and a cleaning unit for charging and separating debris adhered to an optical element inside the chamber.

Abstract translation: 从等离子体射出目标材料被照射激光并变成等离子体和极紫外光的极紫外光源装置可以包括：产生极紫外光的室; 电磁场产生单元，用于产生腔室内的电场和磁场中的至少一个; 以及用于对粘附到腔室内的光学元件的碎屑进行充填和分离的清洁单元。

公开(公告)号：US08525138B2

公开(公告)日：2013-09-03

申请号：US13024027

申请日：2011-02-09

Applicant: Donald K. Smith ,  Matthew Besen ,  Huiling Zhu ,  Daniil Stolyarov ,  Hongke Ye ,  Gordon Hill ,  Ron Collins

Inventor： Donald K. Smith ,  Matthew Besen ,  Huiling Zhu ,  Daniil Stolyarov ,  Hongke Ye ,  Gordon Hill ,  Ron Collins

IPC: G01J1/00

CPC classification number: H05G2/008 ,  B82Y10/00 ,  G03F7/70033 ,  G21K5/00 ,  G21K5/04 ,  H01J61/16 ,  H01J65/04 ,  H05B41/382 ,  H05G2/001 ,  H05G2/003 ,  H05G2/005 ,  Y02B20/204 ,  Y10T29/49002

Abstract: An apparatus for producing light includes a chamber and an ignition source that ionizes a gas within the chamber. The apparatus also includes at least one laser that provides energy to the ionized gas within the chamber to produce a high brightness light. The laser can provide a substantially continuous amount of energy to the ionized gas to generate a substantially continuous high brightness light.

公开(公告)号：US20130190548A1

公开(公告)日：2013-07-25

申请号：US13639998

申请日：2012-01-20

Applicant: Taizo Honda ,  Hisashi Harada ,  Yuehu Pu ,  Masahiro Ikeda ,  Kazushi Hanakawa ,  Toshihiro Otani ,  Tadashi Katayose ,  Yukiko Yamada

Inventor： Taizo Honda ,  Hisashi Harada ,  Yuehu Pu ,  Masahiro Ikeda ,  Kazushi Hanakawa ,  Toshihiro Otani ,  Tadashi Katayose ,  Yukiko Yamada

IPC: A61N5/10 ,  G21K5/00

CPC classification number: A61N5/1048 ,  A61N5/1043 ,  A61N5/1071 ,  A61N2005/1074 ,  A61N2005/1087 ,  G01T1/29 ,  G21K5/00 ,  G21K5/02

Abstract: A charged particle beam position monitor is provided with a plurality of position monitors and a beam data processing device that performs calculation processing of the state of a charged particle beam, based on a plurality of signals outputted from the position monitors. The beam data processing device includes a plurality of channel data conversion units that perform AD conversion processing of the plurality of signals outputted from the position monitors; a position size processing unit, for each of the position monitors, that calculates the beam position of the beam, based on voltage information obtained through the AD conversion processing; and an integrated control unit that controls the plurality of channel data conversion units in such a way that while the beam is irradiated onto an irradiation subject, AD conversion processing of the signals is performed at different timings for the respective position monitors.

Abstract translation: 带电粒子束位置监视器具有多个位置监视器和根据从位置监视器输出的多个信号执行带电粒子束的状态的计算处理的波束数据处理装置。 所述波束数据处理装置包括对从所述位置监视器输出的所述多个信号进行AD转换处理的多个信道数据变换部; 基于通过AD转换处理获得的电压信息，对位置监视器中的每一个计算光束位置的位置尺寸处理单元; 以及集成控制单元，其以这样的方式控制多个通道数据转换单元，即当将光束照射到照射对象时，对于各个位置监视器，在不同的定时执行信号的AD转换处理。